Digitale Bibliotheek
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                             135 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Activated calcium silicate thinfilm by He plasma treatments Han, Inho
2008
202 22-23 p. 5746-5749
4 p.
artikel
2 All-solid-state switchable mirror on flexible sheet Tajima, K.
2008
202 22-23 p. 5633-5636
4 p.
artikel
3 A novel pulsing method for the enhancement of the deposition rate in high power pulsed magnetron sputtering In, Jung-Hwan
2008
202 22-23 p. 5298-5301
4 p.
artikel
4 Antibacterial behavior of TaN–Ag nanocomposite thin films with and without annealing Hsieh, J.H.
2008
202 22-23 p. 5586-5589
4 p.
artikel
5 A study about the bio-compatibility of Ti–8Ta–3Nb alloys with surface modification Ahn, Hoon
2008
202 22-23 p. 5779-5783
5 p.
artikel
6 A study on HVOF coatings of micron and nano WC–Co powders Cho, T.Y.
2008
202 22-23 p. 5556-5559
4 p.
artikel
7 Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam Lim, Woong Sun
2008
202 22-23 p. 5701-5704
4 p.
artikel
8 12CaO·7Al2O3 doped indium-tin-oxide thin film for transparent cathode in organic light-emitting devices Jung, C.H.
2008
202 22-23 p. 5421-5424
4 p.
artikel
9 Carburizing of low-melting-point metals by pulsed nanocrystalline plasma electrolytic carburizing Aliofkhazraei, M.
2008
202 22-23 p. 5493-5496
4 p.
artikel
10 Cathode spot craters in pulse vacuum arc cleaning of a metal surface oxide layer Arai, Y.
2008
202 22-23 p. 5293-5297
5 p.
artikel
11 Characteristics of ionized gas metal arc processing Tanaka, M.
2008
202 22-23 p. 5251-5254
4 p.
artikel
12 Characteristics of Nickel-doped Zinc Oxide thin films prepared by sol–gel method Kim, Kyoung-Tae
2008
202 22-23 p. 5650-5653
4 p.
artikel
13 Characteristic studies on the Zr-based metallic glass thin film fabricated by magnetron sputtering process Chu, C.W.
2008
202 22-23 p. 5564-5566
3 p.
artikel
14 Characterization of MONOS nonvolatile memory by solid phase crystallization on glass Jin, Zhenghai
2008
202 22-23 p. 5637-5640
4 p.
artikel
15 Characterization of the single and double films consisting of Al, Sc-co-doped ZnO/Al-doped ZnO and Al-doped ZnO/Al, Sc-co-doped ZnO Peng, Kun-Cheng
2008
202 22-23 p. 5425-5430
6 p.
artikel
16 Characterization of zinc oxide thin films prepared by pulsed laser deposition at room temperature Sakai, Norihiro
2008
202 22-23 p. 5467-5470
4 p.
artikel
17 Comparison of carbon deposition on tungsten between molecular dynamics and dynamic Monte Carlo simulation Inai, Kensuke
2008
202 22-23 p. 5374-5378
5 p.
artikel
18 Continuous synthesis of carbon nanoclusters using well-controlled thermal plasmas Ohishi, T.
2008
202 22-23 p. 5329-5332
4 p.
artikel
19 Control of site-selective adsorption reaction on a biomimetic super-hydrophilic/super-hydrophobic micropatterned template Ishizaki, Takahiro
2008
202 22-23 p. 5535-5538
4 p.
artikel
20 Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD Cech, V.
2008
202 22-23 p. 5572-5575
4 p.
artikel
21 Corrosion resistance of plasma-oxidized stainless steel Okado, Jiro
2008
202 22-23 p. 5595-5598
4 p.
artikel
22 Cutting performance of CrN and Cr-Si–N coated end-mill deposited by hybrid coating system for ultra-high speed micro machining Shin, S.H.
2008
202 22-23 p. 5613-5616
4 p.
artikel
23 Cutting performance of CrN-based coatings tool deposited by hybrid coating method for micro drilling applications Kang, M.C.
2008
202 22-23 p. 5629-5632
4 p.
artikel
24 Decomposition of PFCs by steam plasma at atmospheric pressure Kim, Dong-yun
2008
202 22-23 p. 5280-5283
4 p.
artikel
25 Deposition of Al-doped and Al, Sc-co-doped zinc oxide films by RF- and DC-sputtering of the ZnO and Al–xSc (x =0, 0.4, 0.8 and 1.7 wt.%) targets Lin, Jing-Chie
2008
202 22-23 p. 5480-5483
4 p.
artikel
26 Deposition of nano-diamond-like carbon films by an atmospheric pressure plasma gun and diagnostic by optical emission spectrum on the process Bian, Xinchao
2008
202 22-23 p. 5383-5385
3 p.
artikel
27 Deposition of superhard nanolayered TiCrAlSiN thin films by cathodic arc plasma deposition Kim, Sun Kyu
2008
202 22-23 p. 5395-5399
5 p.
artikel
28 Development of surface-functionalized drug-eluting stent with diamond-like carbon nanocoated by using PECVD method Okamoto, Keishi
2008
202 22-23 p. 5750-5752
3 p.
artikel
29 Diffusion barriers performance of amorphous Ta–Zr films in Cu metallization Li, Chuan
2008
202 22-23 p. 5676-5679
4 p.
artikel
30 Discharge power dependence of Hα intensity and electron density of Ar+H2 discharges in H-assisted plasma CVD reactor Umetsu, Jun
2008
202 22-23 p. 5659-5662
4 p.
artikel
31 Discharge profiles of internal-antenna-driven inductively-coupled plasmas Setsuhara, Yuichi
2008
202 22-23 p. 5234-5237
4 p.
artikel
32 Dynamic simulation of secondary electron emission and charging up of an insulating material Ohya, K.
2008
202 22-23 p. 5310-5313
4 p.
artikel
33 Editorial Board 2008
202 22-23 p. IFC-
1 p.
artikel
34 Effect of admixture of metal vapor on cathode surface temperature of plasma torch Tashiro, Shinichi
2008
202 22-23 p. 5255-5258
4 p.
artikel
35 Effect of bias voltage on Diamond-like carbon film deposited on PMMA substrate Lin, Zeng
2008
202 22-23 p. 5386-5389
4 p.
artikel
36 Effect of bilayer period on CrN/Cu nanoscale multilayer thin films Kim, Youn J.
2008
202 22-23 p. 5508-5511
4 p.
artikel
37 Effect of cathode arc current and bias voltage on the mechanical properties of CrAlSiN thin films Kim, Sun Kyu
2008
202 22-23 p. 5400-5404
5 p.
artikel
38 Effect of laser irradiation on carbon nanotube films for NO x gas sensor Ueda, T.
2008
202 22-23 p. 5325-5328
4 p.
artikel
39 Effect of molybdenum and copper on S-phase layer thickness of low-temperature carburized austenitic stainless steel Tsujikawa, M.
2008
202 22-23 p. 5488-5492
5 p.
artikel
40 Effect of nozzle shape on the performance of high velocity oxygen-fuel thermal spray system Baik, Jae-Sang
2008
202 22-23 p. 5457-5462
6 p.
artikel
41 Effect of substrate temperature on the electrically conductive stability of sputtered NiO films Jang, Wei-Luen
2008
202 22-23 p. 5444-5447
4 p.
artikel
42 Effect of the minimum quantity lubrication in high-speed end-milling of AISI D2 cold-worked die steel (62 HRC) by coated carbide tools Kang, M.C.
2008
202 22-23 p. 5621-5624
4 p.
artikel
43 Effects of Al target power on the mechanical and oxidation resistance of the CrN/AlN multilayer coatings Kim, B.S.
2008
202 22-23 p. 5526-5529
4 p.
artikel
44 Effects of gas bubbling on water-solubilization of carbon nanotube using microplasma generated in water Imasaka, Kiminobu
2008
202 22-23 p. 5271-5274
4 p.
artikel
45 Effects of low temperature hydrogen peroxide gas on sterilization and cytocompatibility of porous poly(d,l-lactic-co-glycolic acid) scaffolds Lee, Mi Hee
2008
202 22-23 p. 5762-5767
6 p.
artikel
46 Effects of nitrogen partial pressure on titanium oxynitride films deposited by reactive RF magnetron sputtering onto PET substrates Lin, M.C.
2008
202 22-23 p. 5440-5443
4 p.
artikel
47 Effects of post annealing on the material characteristics and electrical properties of La doped BaTiO3 sputtered films Wu, C.H.
2008
202 22-23 p. 5448-5451
4 p.
artikel
48 Effects of radio frequency powers on the characteristics of a-C:N/p-Si photovoltaic solar cells prepared by plasma enhanced chemical vapor deposition Chu, Rong-Shian
2008
202 22-23 p. 5364-5366
3 p.
artikel
49 Effects of radio-frequency powers on the properties of carbon coatings on optical fibers prepared by plasma enhanced chemical vapor deposition Lin, Hung-Chien
2008
202 22-23 p. 5360-5363
4 p.
artikel
50 Electrical and optical properties of undoped p-type ZnO films Nam, K.H.
2008
202 22-23 p. 5463-5466
4 p.
artikel
51 Electrical characteristics of arc-free high-power pulsed sputtering glow plasma Yukimura, K.
2008
202 22-23 p. 5246-5250
5 p.
artikel
52 Electrical characterization of low-k films with nano-pore structure prepared with DMDMOS/O2 precursors Kim, Chang Young
2008
202 22-23 p. 5688-5692
5 p.
artikel
53 Electrically insulating Al2O3 and SiO2 films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activated deposition and magnetron-PECVD Frach, P.
2008
202 22-23 p. 5680-5683
4 p.
artikel
54 Electrochemical properties of modified carbon electrodes for electric double layer capacitors Tashima, D.
2008
202 22-23 p. 5560-5563
4 p.
artikel
55 Enhanced chondrogenic responses of articular chondrocytes onto porous silk fibroin scaffolds treated with microwave-induced argon plasma Baek, Hyun Sook
2008
202 22-23 p. 5794-5797
4 p.
artikel
56 Etching characteristic of ZnO thin films in an inductively coupled plasma Woo, J.C.
2008
202 22-23 p. 5705-5708
4 p.
artikel
57 Evaluation of porous poly(lactide-co-glycolide) scaffold surface-modified by irradiation of nitrogen ion beams Choi, Y.J.
2008
202 22-23 p. 5713-5717
5 p.
artikel
58 Evaluation of the high temperature characteristics of the CrZrN coatings Kim, S.M.
2008
202 22-23 p. 5521-5525
5 p.
artikel
59 Fabrication of the ZnO thin films using wet-chemical etching processes on application for organic light emitting diode (OLED) devices Yoo, D.-G.
2008
202 22-23 p. 5476-5479
4 p.
artikel
60 Formation of convex carbon micro- and nano-disk by atmospheric plasma system Meguro, T.
2008
202 22-23 p. 5356-5359
4 p.
artikel
61 Formation of super-hydrophobic and water-repellency surface with hexamethyldisiloxane (HMDSO) coating on polyethyleneteraphtalate fiber by atmosperic pressure plasma polymerization Ji, Young-Yeon
2008
202 22-23 p. 5663-5667
5 p.
artikel
62 Functional multilayer coatings of tetravinylsilane Studynka, J.
2008
202 22-23 p. 5505-5507
3 p.
artikel
63 Generation of microplasma jet at atmospheric pressure using a modified waveguide-based plasma torch Kanazawa, S.
2008
202 22-23 p. 5275-5279
5 p.
artikel
64 Gliding arc discharge — Application for adhesion improvement of fibre reinforced polyester composites Kusano, Y.
2008
202 22-23 p. 5579-5582
4 p.
artikel
65 Hydrogenated amorphous carbon nitride with controlled hydrogen density — Structural analysis and electric field emission property Ito, Haruhiko
2008
202 22-23 p. 5370-5373
4 p.
artikel
66 Improvement of copper plating adhesion of PPE printed wiring board by plasma treatment Ikari, Shohei
2008
202 22-23 p. 5583-5585
3 p.
artikel
67 Incorporation of cytochrome C with thin calcium phosphate film formed by electron-beam evaporation Li, Yan
2008
202 22-23 p. 5742-5745
4 p.
artikel
68 Influence of Ar gas flow rate in organosilicon plasma for the fabrication of SiO:CH thin films by PECVD method Yun, Yongsup
2008
202 22-23 p. 5259-5261
3 p.
artikel
69 Influence of interlayers on corrosion resistance of ion-plated Mg thin films Lee, Myeong-Hoon
2008
202 22-23 p. 5603-5606
4 p.
artikel
70 Influence of NH3 gas for GaN epilayer on β-Ga2O3 substrate by nitridation Lee, H.J.
2008
202 22-23 p. 5497-5500
4 p.
artikel
71 In situ structural evolution of arc-deposited Cr-based coatings Neves, A.M.
2008
202 22-23 p. 5550-5555
6 p.
artikel
72 Interface structure of microcrystalline silicon deposited by inductive coupled plasma using internal low inductance antenna Kaki, H.
2008
202 22-23 p. 5672-5675
4 p.
artikel
73 Introduction of carboxyl group onto polystyrene surface using plasma techniques Sasai, Yasushi
2008
202 22-23 p. 5724-5727
4 p.
artikel
74 Investigation on zirconium-coated polyurethane surfaces with regard to biocompatibility Wetzel, C.
2008
202 22-23 p. 5728-5732
5 p.
artikel
75 Ion-beam assisted deposited C–N coating on magnesium alloys Yang, J.X.
2008
202 22-23 p. 5737-5741
5 p.
artikel
76 Large-area low-damage plasma sources driven by multiple low-inductance-antenna modules for next-generation flat-panel display processes Setsuhara, Yuichi
2008
202 22-23 p. 5225-5229
5 p.
artikel
77 Large area SiH4/H2 VHF plasma produced at high pressure using multi-rod electrode Yamauchi, Yasuhiro
2008
202 22-23 p. 5668-5671
4 p.
artikel
78 Lattice effects in ferromagnetic La1− x Ba x MnO3 thin films Liang, Yuan-Chang
2008
202 22-23 p. 5436-5439
4 p.
artikel
79 Magnetron sputtering synthesis silver and organic PEO nanocomposite Chen, Qiang
2008
202 22-23 p. 5576-5578
3 p.
artikel
80 Mechanical and corrosion properties of (Ti,Si)N coating synthesized by cathodic arc plasma evaporation Chang, Chi-Lung
2008
202 22-23 p. 5516-5520
5 p.
artikel
81 Mechanical milling with capacitively coupled plasma for surface modification of particulate materials Noma, Jun-ichi
2008
202 22-23 p. 5347-5349
3 p.
artikel
82 Mechanical properties of TaN-Cu nanocomposite thin films Hsieh, J.H.
2008
202 22-23 p. 5530-5534
5 p.
artikel
83 Microstructure and mechanical properties of SiCN hard films deposited by an arc enhanced magnetic sputtering hybrid system Ma, Shengli
2008
202 22-23 p. 5379-5382
4 p.
artikel
84 Microstructure and thermal cyclic performance of laser-glazed plasma-sprayed ceria–yttria-stabilized zirconia thermal barrier coatings Lee, Jiing-Herng
2008
202 22-23 p. 5607-5612
6 p.
artikel
85 Microwave power absorption coefficient of an ECR xenon ion thruster Nishiyama, Kazutaka
2008
202 22-23 p. 5262-5265
4 p.
artikel
86 Modification of degradation behavior of magnesium alloy by IBAD coating of calcium phosphate Yang, J.X.
2008
202 22-23 p. 5733-5736
4 p.
artikel
87 Modification of yttrium-iron-oxide nanoparticle films using inductively-coupled plasma annealing Takenaka, Kosuke
2008
202 22-23 p. 5336-5338
3 p.
artikel
88 Morphology and crystal orientation on corrosion resistance of Mg thin films formed by PVD method onto Zn electroplated substrate Lee, Myeong-Hoon
2008
202 22-23 p. 5590-5594
5 p.
artikel
89 Nanoscale surface and interface engineering: Why plasma-aided? Ostrikov, K.
2008
202 22-23 p. 5314-5318
5 p.
artikel
90 Numerical simulation of metal vapor behavior in arc plasma Yamamoto, K.
2008
202 22-23 p. 5302-5305
4 p.
artikel
91 Optical spectroscopy to control a plasma reactor for surface treatments Ricard, A.
2008
202 22-23 p. 5220-5224
5 p.
artikel
92 Optimization of convex electrode geometry for surface discharge used for fabrication of the electrode groove on solar cells Hamada, T.
2008
202 22-23 p. 5405-5409
5 p.
artikel
93 Oxidation behavior and corrosion resistance of Ti–10Ta–10Nb alloy Ahn, Hoon
2008
202 22-23 p. 5784-5789
6 p.
artikel
94 Plasma characteristics of low-k SiOC(–H) films prepared by using plasma enhanced chemical vapor deposition from DMDMS/O2 precursors Jung, An Soo
2008
202 22-23 p. 5693-5696
4 p.
artikel
95 Plasma nitriding to selective laser sintering parts made of SCM430 powder Nakamoto, Takayuki
2008
202 22-23 p. 5484-5487
4 p.
artikel
96 Plasma nitrosulfurizing techniques for low friction coefficient with H2S and C3H8 gas addition Ko, Y.K.
2008
202 22-23 p. 5501-5504
4 p.
artikel
97 Plasma polymer coating in a triode glow discharge Kusabiraki, M.
2008
202 22-23 p. 5709-5712
4 p.
artikel
98 PLGA scaffold incorporated with hydroxyapatite for cartilage regeneration Lee, Jung Bok
2008
202 22-23 p. 5757-5761
5 p.
artikel
99 Preface Shiratani, Masaharu
2008
202 22-23 p. 5219-
1 p.
artikel
100 Preparation and mechanical properties of aluminum-doped zinc oxide transparent conducting films Chang, Shou-Yi
2008
202 22-23 p. 5416-5420
5 p.
artikel
101 Preparation of molybdenum oxide film by a magnetic null discharge sputtering method Kwak, D.J.
2008
202 22-23 p. 5452-5456
5 p.
artikel
102 Preparation of water-repellent thin film by RF pulse-modulated plasma CVD using C2H2F2 gas Ohtsu, Y.
2008
202 22-23 p. 5367-5369
3 p.
artikel
103 Production of fine hydroxyapatite films using the well-controlled thermal plasma Kou, Masahiro
2008
202 22-23 p. 5753-5756
4 p.
artikel
104 Properties of argon/oxygen mixture plasmas driven by multiple internal-antenna units Setsuhara, Yuichi
2008
202 22-23 p. 5230-5233
4 p.
artikel
105 Properties of Si x N y thin film deposited by plasma enhanced chemical vapor deposition at low temperature using SiH4/NH3/Ar as diffusion barrier film Pham, Thuy T.T.
2008
202 22-23 p. 5617-5620
4 p.
artikel
106 Reactive sputtering deposition of V2O5− z on flexible PET/ITO substrates for electrochromic devices Lin, Yung-Sen
2008
202 22-23 p. 5641-5645
5 p.
artikel
107 Reciprocating wear properties of thermal sprayed titanium aluminide–alumina composite coatings Hung, Jenny Hao-Hsin
2008
202 22-23 p. 5599-5602
4 p.
artikel
108 Reduction of oxide leakage currents of EEPROM at STI corners using sacrificial oxide/liner SiN/LPCVD MTO Kim, M.S.
2008
202 22-23 p. 5697-5700
4 p.
artikel
109 Relationship of chemical and structural properties with the tribological behavior of sputtered SiCN films Hoche, H.
2008
202 22-23 p. 5567-5571
5 p.
artikel
110 RETRACTED: The size effect of oxygen impurities on the hardness of Ti–Si–N coatings Ma, Dayan
2008
202 22-23 p. 5512-5515
4 p.
artikel
111 Scalable internal linear double comb-type inductively coupled plasma source for large area flat panel display processing Kim, Kyong Nam
2008
202 22-23 p. 5242-5245
4 p.
artikel
112 Scaling behavior and coarsening transition of annealed ZnO films on Si substrate Liu, Z.W.
2008
202 22-23 p. 5410-5415
6 p.
artikel
113 Sculpting on polymers using focused ion beam Moon, M.-W.
2008
202 22-23 p. 5319-5324
6 p.
artikel
114 Size effect of Ag nanoparticles on surface plasmon resonance Lee, Kuang-Che
2008
202 22-23 p. 5339-5342
4 p.
artikel
115 Size-regulated gold nanoparticles fabricated by a discharge in reverse micelle solutions Hieda, Junko
2008
202 22-23 p. 5343-5346
4 p.
artikel
116 Sterilization of microorganisms in silk fabrics by microwave-induced argon plasma treatment at atmospheric pressure Park, Dong Jeong
2008
202 22-23 p. 5773-5778
6 p.
artikel
117 Structure and tribology of biocompatible Ti–C:H coatings Vitu, Tomas
2008
202 22-23 p. 5790-5793
4 p.
artikel
118 Study on In–Zn–Sn–O and In–Sn–Zn–O films deposited on PET substrate by magnetron co-sputtering system Lee, D.Y.
2008
202 22-23 p. 5718-5723
6 p.
artikel
119 Surface analysis of hydrophobicity of Thai silk treated by SF6 plasma Suanpoot, P.
2008
202 22-23 p. 5543-5549
7 p.
artikel
120 Surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach Zettsu, Nobuyuki
2008
202 22-23 p. 5284-5288
5 p.
artikel
121 Surface modification for enhancing behaviors of vascular endothelial cells onto polyurethane films by microwave-induced argon plasma Lim, Hye Ryeon
2008
202 22-23 p. 5768-5772
5 p.
artikel
122 Synthesis of conductive Ti–C:H films on the stainless steel plates by PECVD process Cho, Yong K.
2008
202 22-23 p. 5390-5394
5 p.
artikel
123 Synthesis of nano-sized tin oxide powder by argon plasma jet at atmospheric pressure Im, Ji-Hyoen
2008
202 22-23 p. 5471-5475
5 p.
artikel
124 Temperature behavior of atmospheric-pressure non-equilibrium microwave discharge plasma jets for poly(ethylene naptharate)-surface processing Yuji, Toshifumi
2008
202 22-23 p. 5289-5292
4 p.
artikel
125 Temperature effect on charge density of silicon nitride films deposited in SiH4–NH3–N2 plasma Kim, Byungwhan
2008
202 22-23 p. 5539-5542
4 p.
artikel
126 The characteristics of organic–inorganic hybrid low-k thin films by PECVD Cho, S.-J.
2008
202 22-23 p. 5654-5658
5 p.
artikel
127 The effects of deposition parameters on the structure and properties of titanium-containing DLC films synthesized by cathodic arc plasma evaporation Tsai, Pi-Chuen
2008
202 22-23 p. 5350-5355
6 p.
artikel
128 The growth of oriented titanate nanotube thin film on titanium metal flake Guo, Yupeng
2008
202 22-23 p. 5431-5435
5 p.
artikel
129 The preparation of oxygenated fullerene film and its photoelectrical properties Cho, Wook
2008
202 22-23 p. 5333-5335
3 p.
artikel
130 Thermal oxidation behavior of ceramic-coated Ni–Cr-base superalloys Cho, H.
2008
202 22-23 p. 5625-5628
4 p.
artikel
131 TiO2 thin film coating on a capillary inner surface using atmospheric-pressure microplasma Yoshiki, Hiroyuki
2008
202 22-23 p. 5266-5270
5 p.
artikel
132 Top-emitting organic light-emitting diodes based on semitransparent conducting cathode of Ba/Al/ITO Lim, J.T.
2008
202 22-23 p. 5646-5649
4 p.
artikel
133 Two-step reactive sputtering of piezoelectric AlN thin films Cherng, J.S.
2008
202 22-23 p. 5684-5687
4 p.
artikel
134 Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna units Setsuhara, Yuichi
2008
202 22-23 p. 5238-5241
4 p.
artikel
135 Wave analysis in microwave-excited plasma reactor using MSP antenna Tsuji, A.
2008
202 22-23 p. 5306-5309
4 p.
artikel
                             135 gevonden resultaten
 
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