nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Ab initio modeling of defect levels in Ge clusters and supercells
|
Coutinho, J. |
|
2006 |
9 |
4-5 |
p. 477-483 7 p. |
artikel |
2 |
Ab initio studies of intrinsic point defects, interstitial oxygen and vacancy or oxygen clustering in germanium crystals
|
Sueoka, K. |
|
2006 |
9 |
4-5 |
p. 494-497 4 p. |
artikel |
3 |
A comparative study of ion implantation and irradiation-induced defects in Ge crystals
|
Markevich, V.P. |
|
2006 |
9 |
4-5 |
p. 589-596 8 p. |
artikel |
4 |
A deep-level transient spectroscopy study of Co- and Ni-germanided n-type germanium
|
Opsomer, K. |
|
2006 |
9 |
4-5 |
p. 554-558 5 p. |
artikel |
5 |
A deep-level transient spectroscopy study of transition metals in n-type germanium
|
Forment, S. |
|
2006 |
9 |
4-5 |
p. 559-563 5 p. |
artikel |
6 |
Amorphization kinetics of germanium under ion implantation
|
Koffel, S. |
|
2006 |
9 |
4-5 |
p. 664-667 4 p. |
artikel |
7 |
Atomic scale simulations of arsenic–vacancy complexes in germanium and silicon
|
Chroneos, A. |
|
2006 |
9 |
4-5 |
p. 536-540 5 p. |
artikel |
8 |
Atomic transport in germanium and the mechanism of arsenic diffusion
|
Bracht, Hartmut |
|
2006 |
9 |
4-5 |
p. 471-476 6 p. |
artikel |
9 |
Carrier lifetime studies in Ge using microwave and infrared light techniques
|
Gaubas, E. |
|
2006 |
9 |
4-5 |
p. 781-787 7 p. |
artikel |
10 |
Comparison of InGaAs MOSFETs with germanium-on-insulator CMOS
|
Chin, Albert |
|
2006 |
9 |
4-5 |
p. 711-715 5 p. |
artikel |
11 |
Defect imaging of SiGe strain relaxed buffers grown by LEPECVD
|
Marchionna, S. |
|
2006 |
9 |
4-5 |
p. 802-805 4 p. |
artikel |
12 |
Defects induced by irradiation with fast neutrons in n-type germanium
|
Kovačević, I. |
|
2006 |
9 |
4-5 |
p. 606-612 7 p. |
artikel |
13 |
Diffusion of interstitial Hydrogen molecules in Crystalline Germanium and Silicon: Quantumchemical simulation
|
Gusakov, Vasilii |
|
2006 |
9 |
4-5 |
p. 531-535 5 p. |
artikel |
14 |
Divacancy-related complexes in Si(1− x )Ge( x )
|
Khirunenko, L.I. |
|
2006 |
9 |
4-5 |
p. 525-530 6 p. |
artikel |
15 |
DLTS studies of irradiation-induced defects in p-type germanium
|
Christian Petersen, M. |
|
2006 |
9 |
4-5 |
p. 597-599 3 p. |
artikel |
16 |
Effect of Ba termination layer on chemical and electrical passivation of Ge (100) surfaces
|
Cattoni, A. |
|
2006 |
9 |
4-5 |
p. 701-705 5 p. |
artikel |
17 |
Electrical characterization of defects introduced during electron beam deposition of Schottky contacts on n-type Ge
|
Auret, F.D. |
|
2006 |
9 |
4-5 |
p. 576-579 4 p. |
artikel |
18 |
Electrochemical pore etching in Ge
|
Cheng, F. |
|
2006 |
9 |
4-5 |
p. 694-700 7 p. |
artikel |
19 |
Electron-beam-induced current imaging for the characterisation of structural defects in Si1− x Ge x films grown by LE-PECVD
|
Virtuani, A. |
|
2006 |
9 |
4-5 |
p. 798-801 4 p. |
artikel |
20 |
Energy levels of atomic hydrogen in germanium from ab-initio calculations
|
Almeida, L.M. |
|
2006 |
9 |
4-5 |
p. 503-506 4 p. |
artikel |
21 |
Enhanced formation of oxygen-related thermal donors in Ge crystals exposed to hydrogen plasma
|
Kazuchits, N.M. |
|
2006 |
9 |
4-5 |
p. 625-628 4 p. |
artikel |
22 |
Epitaxial growth of Ge and SiGe on Si substrates
|
Nylandsted Larsen, Arne |
|
2006 |
9 |
4-5 |
p. 454-459 6 p. |
artikel |
23 |
1/f noise performance of MOSFETs with HfO2 and metal gate on Ge-on-insulator substrates
|
Srinivasan, P. |
|
2006 |
9 |
4-5 |
p. 721-726 6 p. |
artikel |
24 |
Formation and ordering of Ge nanocrystals on SiO2 using FIB nanolithography
|
Berbezier, I. |
|
2006 |
9 |
4-5 |
p. 812-816 5 p. |
artikel |
25 |
Formation and stability of germanium oxide induced by atomic oxygen exposure
|
Molle, Alessandro |
|
2006 |
9 |
4-5 |
p. 673-678 6 p. |
artikel |
26 |
Formation energy and migration barrier of a Ge vacancy from ab initio studies
|
Pinto, H.M. |
|
2006 |
9 |
4-5 |
p. 498-502 5 p. |
artikel |
27 |
Formation of Ge nanocrystals and SiGe in PECVD grown SiN x :Ge thin films
|
Dana, Aykutlu |
|
2006 |
9 |
4-5 |
p. 848-852 5 p. |
artikel |
28 |
Formation of Ge nanocrystals by utilizing nanocluster source
|
Lee, P.F. |
|
2006 |
9 |
4-5 |
p. 817-822 6 p. |
artikel |
29 |
Formation of Mn5Ge3 nanoclusters in highly diluted Mn x Ge1− x alloys
|
Morresi, L. |
|
2006 |
9 |
4-5 |
p. 836-840 5 p. |
artikel |
30 |
Ge composition dependence of the minority carrier lifetime in monocrystalline alloys of Si1− x Ge x
|
Ulyashin, A.G. |
|
2006 |
9 |
4-5 |
p. 772-776 5 p. |
artikel |
31 |
Germanium-doped Czochralski silicon: Oxygen precipitates and their annealing behavior
|
Chen, Jiahe |
|
2006 |
9 |
4-5 |
p. 600-605 6 p. |
artikel |
32 |
Germanium: From its discovery to SiGe devices
|
Haller, E.E. |
|
2006 |
9 |
4-5 |
p. 408-422 15 p. |
artikel |
33 |
Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers
|
Depuydt, Ben |
|
2006 |
9 |
4-5 |
p. 437-443 7 p. |
artikel |
34 |
Germanium MOS capacitors with hafnium dioxide and silicon dioxide dielectrics
|
Wadsworth, H.J. |
|
2006 |
9 |
4-5 |
p. 685-689 5 p. |
artikel |
35 |
Germanium-on-insulator (GeOI) substrates—A novel engineered substrate for future high performance devices
|
Akatsu, Takeshi |
|
2006 |
9 |
4-5 |
p. 444-448 5 p. |
artikel |
36 |
Ge substrates made by Ge-condensation technique: Challenges and current understanding
|
Terzieva, Valentina |
|
2006 |
9 |
4-5 |
p. 449-453 5 p. |
artikel |
37 |
Hole band nonparabolicity and effective mass measurement in p-SiGe/Ge heterostructures
|
Rössner, Benjamin |
|
2006 |
9 |
4-5 |
p. 777-780 4 p. |
artikel |
38 |
Hydrogen in germanium
|
Weber, J. |
|
2006 |
9 |
4-5 |
p. 564-570 7 p. |
artikel |
39 |
Hydrogen-plasma-induced plate-like cavity clusters in single-crystalline germanium
|
Lauwaert, J. |
|
2006 |
9 |
4-5 |
p. 571-575 5 p. |
artikel |
40 |
Hydrogen-related shallow donors in Ge crystals implanted with protons
|
Pokotilo, Ju.M. |
|
2006 |
9 |
4-5 |
p. 629-633 5 p. |
artikel |
41 |
Impact of germanium surface passivation on the leakage current of shallow planar p–n junctions
|
Satta, A. |
|
2006 |
9 |
4-5 |
p. 716-720 5 p. |
artikel |
42 |
Implantation and diffusion of phosphorous in germanium
|
Chroneos, A. |
|
2006 |
9 |
4-5 |
p. 640-643 4 p. |
artikel |
43 |
Implantation and sputtering of Ge ions into SiO2 substrates with the use of Ge ions produced by repetitive laser pulses
|
Rosiński, M. |
|
2006 |
9 |
4-5 |
p. 655-658 4 p. |
artikel |
44 |
Influence of nucleation parameters in the spatial distribution of the Ge nanocrystals formed by LPCVD
|
Marins, E.S. |
|
2006 |
9 |
4-5 |
p. 828-831 4 p. |
artikel |
45 |
Interaction of self-interstitials with oxygen-related defects in electron-irradiated Ge crystals
|
Markevich, V.P. |
|
2006 |
9 |
4-5 |
p. 613-618 6 p. |
artikel |
46 |
Interface characterization of high-k dielectrics on Ge substrates
|
Misra, D. |
|
2006 |
9 |
4-5 |
p. 741-748 8 p. |
artikel |
47 |
Interface characterization of Si-passivated HfO2 germanium capacitors using DLTS measurements
|
Martens, K. |
|
2006 |
9 |
4-5 |
p. 749-752 4 p. |
artikel |
48 |
Investigation of dislocations in composition graded and strain relaxed SiGe epitaxial layer by cathodeluminescence
|
Sumitomo, Takamichi |
|
2006 |
9 |
4-5 |
p. 794-797 4 p. |
artikel |
49 |
Ion-implantation issues in the formation of shallow junctions in germanium
|
Simoen, E. |
|
2006 |
9 |
4-5 |
p. 634-639 6 p. |
artikel |
50 |
Kinetics of selective epitaxial growth of Si and relaxed Ge by ultrahigh vacuum chemical vapor deposition in Si(001) windows
|
Halbwax, M. |
|
2006 |
9 |
4-5 |
p. 460-464 5 p. |
artikel |
51 |
Laser annealing for n+/p junction formation in germanium
|
Tsouroutas, P. |
|
2006 |
9 |
4-5 |
p. 644-649 6 p. |
artikel |
52 |
Local vibrations of interstitial carbon in SiGe alloys
|
Khirunenko, L.I. |
|
2006 |
9 |
4-5 |
p. 514-519 6 p. |
artikel |
53 |
Metals in germanium
|
Clauws, P. |
|
2006 |
9 |
4-5 |
p. 546-553 8 p. |
artikel |
54 |
Modeling of low temperature SiGe oxidation
|
Mane, S.S. |
|
2006 |
9 |
4-5 |
p. 668-672 5 p. |
artikel |
55 |
Modeling of the Stark effect in strained Ge0.6Si0.4/Si/Ge0.6Si0.4 resonant tunneling diodes with graded Ge x Si1− x (0.3<x<0) spacer emitter and collector
|
Sfina, N. |
|
2006 |
9 |
4-5 |
p. 737-740 4 p. |
artikel |
56 |
Nanocalorimetric high-temperature characterization of ultrathin films of a-Ge
|
Lopeandía, A.F. |
|
2006 |
9 |
4-5 |
p. 806-811 6 p. |
artikel |
57 |
Non-collinear magnetic states of Mn5Ge3 compound
|
Stroppa, A. |
|
2006 |
9 |
4-5 |
p. 841-847 7 p. |
artikel |
58 |
Optical and crystallographic analysis of thin films of GeC deposited using a unique hollow cathode sputtering technique
|
Huguenin-Love, J.L. |
|
2006 |
9 |
4-5 |
p. 759-763 5 p. |
artikel |
59 |
Optical characterization of dislocation free Ge and GeOI wafers
|
Kalem, Seref |
|
2006 |
9 |
4-5 |
p. 753-758 6 p. |
artikel |
60 |
Oxygen loss and thermal double donor formation in germanium
|
Litvinov, V.V. |
|
2006 |
9 |
4-5 |
p. 619-624 6 p. |
artikel |
61 |
Phosphorus diffusion in the presence of threading dislocations in strain relaxed SiGe films
|
Christensen, J.S. |
|
2006 |
9 |
4-5 |
p. 650-654 5 p. |
artikel |
62 |
Point defects in germanium: Reliable and questionable data in radiation experiments
|
Emtsev, Vadim |
|
2006 |
9 |
4-5 |
p. 580-588 9 p. |
artikel |
63 |
Positron probing of point V-group impurity-vacancy complexes in γ-irradiated germanium
|
Arutyunov, N.Yu. |
|
2006 |
9 |
4-5 |
p. 788-793 6 p. |
artikel |
64 |
Preface
|
Claeys, Cor |
|
2006 |
9 |
4-5 |
p. 407- 1 p. |
artikel |
65 |
Radiation damage in electron-irradiated strained Si n-MOSFETs
|
Takakura, K. |
|
2006 |
9 |
4-5 |
p. 732-736 5 p. |
artikel |
66 |
Residual strain in Ge films grown by surfactant-mediated epitaxy on Si(111) and Si(001) substrates
|
Wietler, Tobias F. |
|
2006 |
9 |
4-5 |
p. 659-663 5 p. |
artikel |
67 |
Simulation of intrinsic point defect properties and vacancy clustering during Czochralski germanium crystal growth
|
Śpiewak, P. |
|
2006 |
9 |
4-5 |
p. 465-470 6 p. |
artikel |
68 |
Spectroscopy of electron states at interfaces of (100)Ge with high-κ insulators
|
Afanas’ev, V.V. |
|
2006 |
9 |
4-5 |
p. 764-771 8 p. |
artikel |
69 |
Spontaneous Ge island ordering promoted by partial silicon capping
|
De Seta, M. |
|
2006 |
9 |
4-5 |
p. 823-827 5 p. |
artikel |
70 |
Strain and lattice engineering for Ge FET devices
|
Bedell, S.W. |
|
2006 |
9 |
4-5 |
p. 423-436 14 p. |
artikel |
71 |
Strain-induced shift of phonon modes in Si 1 - x Ge x alloys
|
Pezzoli, F. |
|
2006 |
9 |
4-5 |
p. 541-545 5 p. |
artikel |
72 |
Structural and magnetic properties of GeMn diluted magnetic semiconductor
|
Ayoub, J.-P. |
|
2006 |
9 |
4-5 |
p. 832-835 4 p. |
artikel |
73 |
Structural, optical and electrical properties of hydrogenated amorphous silicon germanium (a-Si1− x Ge x ) deposited by DC magnetron sputtering at high rate
|
Fedala, A. |
|
2006 |
9 |
4-5 |
p. 690-693 4 p. |
artikel |
74 |
Studies of the VO centre in Ge using first principles cluster calculations
|
Carvalho, A. |
|
2006 |
9 |
4-5 |
p. 489-493 5 p. |
artikel |
75 |
Sulfur passivation of Ge (001) surfaces and its effects on Schottky barrier contact
|
Maeda, Tatsuro |
|
2006 |
9 |
4-5 |
p. 706-710 5 p. |
artikel |
76 |
Supercell and cluster density functional calculations of the thermal stability of the divacancy in germanium
|
Janke, C. |
|
2006 |
9 |
4-5 |
p. 484-488 5 p. |
artikel |
77 |
The base current and related 1/f noise for SiGe HBTs realized by SEG/NSEG technology on SOI and bulk substrates
|
Lukyanchikova, N. |
|
2006 |
9 |
4-5 |
p. 727-731 5 p. |
artikel |
78 |
The effect of compressive biaxial stress on vacancy clustering in thin Si–Ge layers
|
Ganchenkova, M.G. |
|
2006 |
9 |
4-5 |
p. 507-513 7 p. |
artikel |
79 |
Thermoelectric properties of Si–Ge whiskers
|
Druzhinin, Anatolij |
|
2006 |
9 |
4-5 |
p. 853-857 5 p. |
artikel |
80 |
Thin epitaxial Si films as a passivation method for Ge(100): Influence of deposition temperature on Ge surface segregation and the high-k/Ge interface quality
|
Leys, F.E. |
|
2006 |
9 |
4-5 |
p. 679-684 6 p. |
artikel |
81 |
Vacancy-dioxygen centers in Si-rich SiGe alloys
|
Khirunenko, L.I. |
|
2006 |
9 |
4-5 |
p. 520-524 5 p. |
artikel |