nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
An in-depth analysis of temperature effect on DIBL in UTBB FD SOI MOSFETs based on experimental data, numerical simulations and analytical models
|
Pereira, A.S.N. |
|
2017 |
128 |
C |
p. 67-71 5 p. |
artikel |
2 |
Anisotropic interpolation method of silicon carbide oxidation growth rates for three-dimensional simulation
|
Šimonka, Vito |
|
2017 |
128 |
C |
p. 135-140 6 p. |
artikel |
3 |
Back-gated InGaAs-on-insulator lateral N+NN+ MOSFET: Fabrication and typical conduction mechanisms
|
Park, H.J. |
|
2017 |
128 |
C |
p. 80-86 7 p. |
artikel |
4 |
Benchmarks of a III-V TFET technology platform against the 10-nm CMOS FinFET technology node considering basic arithmetic circuits
|
Strangio, S. |
|
2017 |
128 |
C |
p. 37-42 6 p. |
artikel |
5 |
Characterization and modelling of layout effects in SiGe channel pMOSFETs from 14nm UTBB FDSOI technology
|
Berthelon, R. |
|
2017 |
128 |
C |
p. 72-79 8 p. |
artikel |
6 |
Confinement orientation effects in S/D tunneling
|
Medina-Bailon, C. |
|
2017 |
128 |
C |
p. 48-53 6 p. |
artikel |
7 |
DC and RF characterization of InGaAs replacement metal gate (RMG) nFETs on SiGe-OI FinFETs fabricated by 3D monolithic integration
|
Deshpande, V. |
|
2017 |
128 |
C |
p. 87-91 5 p. |
artikel |
8 |
Drain current local variability from linear to saturation region in 28nm bulk NMOSFETs
|
Karatsori, T.A. |
|
2017 |
128 |
C |
p. 31-36 6 p. |
artikel |
9 |
Editorial Board
|
|
|
2017 |
128 |
C |
p. IFC- 1 p. |
artikel |
10 |
Electrical characterization and modeling of 1T-1R RRAM arrays with amorphous and poly-crystalline HfO2
|
Grossi, Alessandro |
|
2017 |
128 |
C |
p. 187-193 7 p. |
artikel |
11 |
Elimination of the channel current effect on the characterization of MOSFET threshold voltage using junction capacitance measurements
|
Tomaszewski, Daniel |
|
2017 |
128 |
C |
p. 92-101 10 p. |
artikel |
12 |
Framework to model neutral particle flux in convex high aspect ratio structures using one-dimensional radiosity
|
Manstetten, Paul |
|
2017 |
128 |
C |
p. 141-147 7 p. |
artikel |
13 |
Inverse-magnetostriction-induced switching current reduction of STT-MTJs and its application for low-voltage MRAM
|
Takamura, Yota |
|
2017 |
128 |
C |
p. 194-199 6 p. |
artikel |
14 |
Low frequency noise assessment in n- and p-channel sub-10nm triple-gate FinFETs: Part II: Measurements and results
|
Boudier, D. |
|
2017 |
128 |
C |
p. 109-114 6 p. |
artikel |
15 |
Low frequency noise assessment in n- and p-channel sub-10nm triple-gate FinFETs: Part I: Theory and methodology
|
Boudier, D. |
|
2017 |
128 |
C |
p. 102-108 7 p. |
artikel |
16 |
Numerical investigation of plasma effects in silicon MOSFETs for THz-wave detection
|
Jungemann, C. |
|
2017 |
128 |
C |
p. 129-134 6 p. |
artikel |
17 |
Process modules for GeSn nanoelectronics with high Sn-contents
|
Schulte-Braucks, C. |
|
2017 |
128 |
C |
p. 54-59 6 p. |
artikel |
18 |
Reconfigurable field effect transistor for advanced CMOS: Advantages and limitations
|
Navarro, C. |
|
2017 |
128 |
C |
p. 155-162 8 p. |
artikel |
19 |
Reconfigurable ultra-thin film GDNMOS device for ESD protection in 28nm FD-SOI technology
|
Athanasiou, Sotirios |
|
2017 |
128 |
C |
p. 172-179 8 p. |
artikel |
20 |
Reliable gate stack and substrate parameter extraction based on C-V measurements for 14nm node FDSOI technology
|
Mohamad, B. |
|
2017 |
128 |
C |
p. 10-16 7 p. |
artikel |
21 |
RF SOI CMOS technology on 1st and 2nd generation trap-rich high resistivity SOI wafers
|
Kazemi Esfeh, B. |
|
2017 |
128 |
C |
p. 121-128 8 p. |
artikel |
22 |
Scaling/LER study of Si GAA nanowire FET using 3D finite element Monte Carlo simulations
|
Elmessary, Muhammad A. |
|
2017 |
128 |
C |
p. 17-24 8 p. |
artikel |
23 |
Sharp-switching band-modulation back-gated devices in advanced FDSOI technology
|
El Dirani, Hassan |
|
2017 |
128 |
C |
p. 180-186 7 p. |
artikel |
24 |
Simulation study of a novel 3D SPAD pixel in an advanced FD-SOI technology
|
Vignetti, M.M. |
|
2017 |
128 |
C |
p. 163-171 9 p. |
artikel |
25 |
SOI technology for power management in automotive and industrial applications
|
Stork, Johannes M.C. |
|
2017 |
128 |
C |
p. 3-9 7 p. |
artikel |
26 |
Special Issue of Solid-State Electronics, dedicated to EUROSOI-ULIS 2016
|
Sverdlov, Viktor |
|
2017 |
128 |
C |
p. 1-2 2 p. |
artikel |
27 |
Study of line-TFET analog performance comparing with other TFET and MOSFET architectures
|
Agopian, Paula Ghedini Der |
|
2017 |
128 |
C |
p. 43-47 5 p. |
artikel |
28 |
Study of silicon n- and p-FET SOI nanowires concerning analog performance down to 100K
|
Paz, Bruna Cardoso |
|
2017 |
128 |
C |
p. 60-66 7 p. |
artikel |
29 |
Systematic method for electrical characterization of random telegraph noise in MOSFETs
|
Marquez, Carlos |
|
2017 |
128 |
C |
p. 115-120 6 p. |
artikel |
30 |
Tuning the tunneling probability by mechanical stress in Schottky barrier based reconfigurable nanowire transistors
|
Baldauf, Tim |
|
2017 |
128 |
C |
p. 148-154 7 p. |
artikel |
31 |
Variability and self-average of impurity-limited resistance in quasi-one dimensional nanowires
|
Sano, Nobuyuki |
|
2017 |
128 |
C |
p. 25-30 6 p. |
artikel |