Digitale Bibliotheek
Sluiten Bladeren door artikelen uit een tijdschrift
 
Zoeken naar met titel:
ABCDEFGHIJKLMNOPQRSTUVWXYZ

     Tijdschrift beschrijving
       Alle jaargangen van het bijbehorende tijdschrift
         Alle afleveringen van het bijbehorende jaargang
                                       Alle artikelen van de bijbehorende aflevering
 
                             22 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A series of modeling of plasma etching and damage reduction: vertically integrated computer aided design for device processing Makabe, Toshiaki
 2001
 2 3-4 p. 547-554
8 p.
 artikel
2 Characteristics of the plasma sheath and the charging near the ion engine of the spacecraft Nejoh, Y.N.
 2001
 2 3-4 p. 483-488
6 p.
 artikel
3 Chemical-reaction dependence of plasma parameter in reactive silane plasma Takai, Madoka
 2001
 2 3-4 p. 495-503
9 p.
 artikel
4 Colossal magnetoresistive and ferroelectric thin films deposited by excimer laser induced plasma Mitsugi, F.
 2001
 2 3-4 p. 525-531
7 p.
 artikel
5 Cosmic plasmas: their research frontiers Terasawa, T.
 2001
 2 3-4 p. 461-472
12 p.
 artikel
6 Determination of metastable atom concentration by use of electrostatic probe technique Korzec, Dariusz
 2001
 2 3-4 p. 595-605
11 p.
 artikel
7 Electrical conductivity of metastable κ-CeZrO4 phase possessing ordered arrangement of Ce and Zr ions Izu, Noriya
 2001
 2 3-4 p. 443-448
6 p.
 artikel
8 Emission spectrometry for discharge plasma diagnosis Shimizu, Kazuo
 2001
 2 3-4 p. 577-585
9 p.
 artikel
9 Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching Tamura, Masashi
 2001
 2 3-4 p. 563-569
7 p.
 artikel
10 Experimental study of atmospheric pressure surface discharge in helium Štefečka, Miloslav
 2001
 2 3-4 p. 587-593
7 p.
 artikel
11 Fast magnetic reconnection with anomalous ion heating and its application Ono, Y.
 2001
 2 3-4 p. 473-482
10 p.
 artikel
12 Formation of a-C thin films by plasma-based ion implantation Watanabe, Toshiya
 2001
 2 3-4 p. 539-545
7 p.
 artikel
13 H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration Shiratani, Masaharu
 2001
 2 3-4 p. 505-515
11 p.
 artikel
14 Laser-ablated plasma for deposition of ZnO thin films on various substrates Ohshima, T.
 2001
 2 3-4 p. 517-523
7 p.
 artikel
15 [No title] Ono, Kouichi
 2001
 2 3-4 p. 459-
1 p.
 artikel
16 Plastic deformation behaviour and deformation substructure in Al-rich TiAl single crystals deformed at high temperatures Hayashi, K
 2001
 2 3-4 p. 433-441
9 p.
 artikel
17 Preparation of alumina–silica–nickel nanocomposite by in situ reduction through sol–gel route Bhattacharyya, A
 2001
 2 3-4 p. 449-454
6 p.
 artikel
18 Preparation of the hard CN x thin films using NO ambient gas by pulsed laser deposition Aoqui, Shin-ichi
 2001
 2 3-4 p. 533-537
5 p.
 artikel
19 Recent development of plasma pollution control technology: a critical review Chang, Jen-Shih
 2001
 2 3-4 p. 571-576
6 p.
 artikel
20 Studies of CF2 radical and O atom in oxygen/fluorocarbon plasmas by laser-induced fluorescence Hayashi, S
 2001
 2 3-4 p. 555-561
7 p.
 artikel
21 The dependence of hydrofluoric acid concentration during anodization on photoluminescence of porous silicon Ohmukai, Masato
 2001
 2 3-4 p. 455-457
3 p.
 artikel
22 The effect of the trapping of dust grains on the sheath structure and the charging in a plasma Nejoh, Y.N.
 2001
 2 3-4 p. 489-493
5 p.
 artikel
                             22 gevonden resultaten
 
 Koninklijke Bibliotheek - Nationale Bibliotheek van Nederland