| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Analysis of hydrophile process of a polymer surface with an inverter plasma
|
Murakami, Nariaki
|
|
2001
|
136 |
1-3 |
p. 265-268
4 p.
|
artikel
|
| 2 |
A new method to build a high-voltage pulse supply using only semiconductor switches for plasma-immersion ion implantation
|
Redondo, L.M
|
|
2001
|
136 |
1-3 |
p. 51-54
4 p.
|
artikel
|
| 3 |
A plasma immersion implantation system for materials modification
|
Current, Michael I
|
|
2001
|
136 |
1-3 |
p. 138-141
4 p.
|
artikel
|
| 4 |
Applications of plasma immersion ion implantation in microelectronics — a brief review
|
Chu, Paul K.
|
|
2001
|
136 |
1-3 |
p. 151-156
6 p.
|
artikel
|
| 5 |
Basic investigations of an integrated modulator for plasma immersion ion implantation
|
Günzel, R
|
|
2001
|
136 |
1-3 |
p. 47-50
4 p.
|
artikel
|
| 6 |
Characteristics of BF3 plasma-doped gate/source/drain for 0.18-μm pMOSFETs
|
Ha, Jung-Min
|
|
2001
|
136 |
1-3 |
p. 157-161
5 p.
|
artikel
|
| 7 |
Combined deposition and implantation in the cathodic arc for thick film preparation
|
Tarrant, R.N
|
|
2001
|
136 |
1-3 |
p. 188-191
4 p.
|
artikel
|
| 8 |
Corrosion resistance of TiN coatings produced by various dry processes
|
Morita, Ryuhei
|
|
2001
|
136 |
1-3 |
p. 207-210
4 p.
|
artikel
|
| 9 |
Determination of heat and ion fluxes in plasma immersion ion implantation by in situ measurement of temperature using laser interferometry
|
Takaki, K
|
|
2001
|
136 |
1-3 |
p. 261-264
4 p.
|
artikel
|
| 10 |
Development of hybrid pulse plasma coating system
|
Sakudo, N
|
|
2001
|
136 |
1-3 |
p. 23-27
5 p.
|
artikel
|
| 11 |
Development of internal-antenna-driven large-volume RF plasma sources for plasma-based ion implantation
|
Setsuhara, Yuichi
|
|
2001
|
136 |
1-3 |
p. 60-64
5 p.
|
artikel
|
| 12 |
Development of plasma-based ion implantation (PBII) techniques at Osaka National Research Institute (ONRI)
|
Chun, Sung-Yong
|
|
2001
|
136 |
1-3 |
p. 32-35
4 p.
|
artikel
|
| 13 |
DLC films formed by hybrid pulse plasma coating (HPPC) system
|
Awazu, K
|
|
2001
|
136 |
1-3 |
p. 172-175
4 p.
|
artikel
|
| 14 |
Dynamic MC simulations of diamond-like carbon film synthesis by plasma-based ion implantation
|
Miyagawa, Y
|
|
2001
|
136 |
1-3 |
p. 122-126
5 p.
|
artikel
|
| 15 |
Effects of carbon ion pre-implantation on the mechanical properties of ta-C coatings on Ti-6Al-4V
|
Tong, H.H
|
|
2001
|
136 |
1-3 |
p. 211-216
6 p.
|
artikel
|
| 16 |
Energy distribution and depth profile in BF3 plasma doping
|
Kwok, Dixon T.K
|
|
2001
|
136 |
1-3 |
p. 146-150
5 p.
|
artikel
|
| 17 |
Evolution of microstructure of instrumental AISI M2 steel after plasma immersion nitrogen and carbon implantation
|
Uglov, V.V
|
|
2001
|
136 |
1-3 |
p. 226-230
5 p.
|
artikel
|
| 18 |
Index
|
|
|
2001
|
136 |
1-3 |
p. 290-
1 p.
|
artikel
|
| 19 |
Index
|
|
|
2001
|
136 |
1-3 |
p. 291-296
6 p.
|
artikel
|
| 20 |
Influence of Al film deposition and following treatment on the high temperature isothermal oxidation behavior of a γ-TiAl-based alloy
|
Li, X.Y
|
|
2001
|
136 |
1-3 |
p. 276-280
5 p.
|
artikel
|
| 21 |
Inner wall coating of cylinders by plasma immersion ion implantation for corrosion protection
|
Ensinger, W
|
|
2001
|
136 |
1-3 |
p. 202-206
5 p.
|
artikel
|
| 22 |
Inverter plasma discharge system
|
Sugimoto, Satoshi
|
|
2001
|
136 |
1-3 |
p. 65-68
4 p.
|
artikel
|
| 23 |
Ion-assisted deposition of copper using an inverter plasma
|
Kiuchi, Masato
|
|
2001
|
136 |
1-3 |
p. 273-275
3 p.
|
artikel
|
| 24 |
Ion current analysis in pulsed RF plasma as a fundamental research of plasma-based ion implantation
|
Tenno, N
|
|
2001
|
136 |
1-3 |
p. 127-131
5 p.
|
artikel
|
| 25 |
Ion mass and scaling effects in PIII simulation
|
Keller, G
|
|
2001
|
136 |
1-3 |
p. 117-121
5 p.
|
artikel
|
| 26 |
Measurement of sheath expansion in plasma source ion implantation
|
Kim, Young-Woo
|
|
2001
|
136 |
1-3 |
p. 97-101
5 p.
|
artikel
|
| 27 |
Measurements of secondary electrons emitted from conductive substrates under high-current metal ion bombardment
|
Anders, André
|
|
2001
|
136 |
1-3 |
p. 111-116
6 p.
|
artikel
|
| 28 |
Modeling of energy distributions for plasma implantation
|
Linder, Barry P.
|
|
2001
|
136 |
1-3 |
p. 132-137
6 p.
|
artikel
|
| 29 |
Monitoring of ion mass composition in plasma immersion ion implantation
|
Kim, G.H.
|
|
2001
|
136 |
1-3 |
p. 255-260
6 p.
|
artikel
|
| 30 |
Nano-indentation testing for plasma-based ion-implanted surface of plastics
|
Tonosaki, Minehiro
|
|
2001
|
136 |
1-3 |
p. 249-251
3 p.
|
artikel
|
| 31 |
Negative bias effect on film growth using pulsed vacuum arc plasma for multilayers
|
Chun, Sung-Yong
|
|
2001
|
136 |
1-3 |
p. 285-289
5 p.
|
artikel
|
| 32 |
New trends in PBII technology: industrial perspectives and limitations
|
Pelletier, J
|
|
2001
|
136 |
1-3 |
p. 7-15
9 p.
|
artikel
|
| 33 |
Nitrogen and carbon expanded austenite produced by PI3
|
Blawert, C
|
|
2001
|
136 |
1-3 |
p. 181-187
7 p.
|
artikel
|
| 34 |
Operational parameter effects on inverter plasma performance
|
Takechi, Seiji
|
|
2001
|
136 |
1-3 |
p. 69-72
4 p.
|
artikel
|
| 35 |
Oxygen and hydrogen profiles in metal surfaces following plasma immersion ion implantation of helium
|
Johnson, P.B
|
|
2001
|
136 |
1-3 |
p. 217-222
6 p.
|
artikel
|
| 36 |
PIII-nitriding of boron implantated stainless steel
|
Mändl, S
|
|
2001
|
136 |
1-3 |
p. 176-180
5 p.
|
artikel
|
| 37 |
Plasma-based ion implantation and its application to three-dimensional materials
|
Yukimura, Ken
|
|
2001
|
136 |
1-3 |
p. 1-6
6 p.
|
artikel
|
| 38 |
Plasma-based nitrogen implantation of chrome-plated steel
|
Xu, G.C
|
|
2001
|
136 |
1-3 |
p. 231-235
5 p.
|
artikel
|
| 39 |
Plasma immersion ion implantation experiments at the Instituto Nacional de Pesquisas Espaciais (INPE), Brazil
|
Ueda, M.
|
|
2001
|
136 |
1-3 |
p. 28-31
4 p.
|
artikel
|
| 40 |
Plasma immersion ion implantation experiments with long and short rise time pulses using high voltage hard tube pulser
|
Rossi, J.O
|
|
2001
|
136 |
1-3 |
p. 43-46
4 p.
|
artikel
|
| 41 |
Plasma immersion ion implantation of nitrogen in Si: formation of SiO2, Si3N4 and stressed layers under thermal and sputtering effects
|
Ueda, M
|
|
2001
|
136 |
1-3 |
p. 244-248
5 p.
|
artikel
|
| 42 |
Preface
|
Yamada, Isao
|
|
2001
|
136 |
1-3 |
p. xi-xii
nvt p.
|
artikel
|
| 43 |
Preparation and properties of nitrogen and titanium oxide incorporated diamond-like carbon films by plasma source ion implantation
|
Baba, Koumei
|
|
2001
|
136 |
1-3 |
p. 192-196
5 p.
|
artikel
|
| 44 |
Preparation of gallium nitride (GaN) and related compounds by plasma immersion ion implantation and rapid thermal annealing
|
Ho, Aaron H.P
|
|
2001
|
136 |
1-3 |
p. 142-145
4 p.
|
artikel
|
| 45 |
Production of focused electron beams in a plasma implantation system
|
Adler, R.J
|
|
2001
|
136 |
1-3 |
p. 40-42
3 p.
|
artikel
|
| 46 |
Profile of implanted nitrogen ions in Al alloy for mold materials
|
Yamanishi, Tetsuji
|
|
2001
|
136 |
1-3 |
p. 223-225
3 p.
|
artikel
|
| 47 |
Results from 2 years of operation of a plasma implantation facility
|
Adler, R.J
|
|
2001
|
136 |
1-3 |
p. 252-254
3 p.
|
artikel
|
| 48 |
RF ion source for low energy ion implantation — beam profile control of a large-area ion source using 500-MHz discharge
|
Tanjyo, Masayasu
|
|
2001
|
136 |
1-3 |
p. 281-284
4 p.
|
artikel
|
| 49 |
Rutile formation and oxygen diffusion in oxygen PIII-treated titanium
|
Thorwarth, G
|
|
2001
|
136 |
1-3 |
p. 236-240
5 p.
|
artikel
|
| 50 |
Shunting arc as a pulsed ion source for solid-state materials for plasma-based ion implantation
|
Yukimura, K
|
|
2001
|
136 |
1-3 |
p. 55-59
5 p.
|
artikel
|
| 51 |
Shunting arc generation by co-axial electrode configuration
|
Yukimura, Ken
|
|
2001
|
136 |
1-3 |
p. 36-39
4 p.
|
artikel
|
| 52 |
Silicon carbide and amorphous carbon film formation by plasma immersion ion implantation: a comparison of methane and toluene as plasma forming gases
|
Volz, K
|
|
2001
|
136 |
1-3 |
p. 197-201
5 p.
|
artikel
|
| 53 |
Spatial and temporal growth and collapse in a PBII plasma
|
Yatsuzuka, M
|
|
2001
|
136 |
1-3 |
p. 93-96
4 p.
|
artikel
|
| 54 |
Spatial distributions of ion-species in a large-volume inductively coupled plasma source
|
Okuji, S
|
|
2001
|
136 |
1-3 |
p. 102-105
4 p.
|
artikel
|
| 55 |
Studies on treatment homogeneity of plasma immersion ion implantation by an optical method
|
Volz, K
|
|
2001
|
136 |
1-3 |
p. 80-84
5 p.
|
artikel
|
| 56 |
Surface processes and diffusion mechanisms of ion nitriding of stainless steel and aluminium
|
Möller, W.
|
|
2001
|
136 |
1-3 |
p. 73-79
7 p.
|
artikel
|
| 57 |
Surface treatment of steel by short pulsed injection of high-power ion beam
|
Akamatsu, Hiroshi
|
|
2001
|
136 |
1-3 |
p. 269-272
4 p.
|
artikel
|
| 58 |
Synthesis and properties of TiO2 thin films by plasma source ion implantation
|
Baba, Koumei
|
|
2001
|
136 |
1-3 |
p. 241-243
3 p.
|
artikel
|
| 59 |
The measurement of nitrogen ion species ratio in inductively coupled plasma source ion implantation
|
Cho, Jeonghee
|
|
2001
|
136 |
1-3 |
p. 106-110
5 p.
|
artikel
|
| 60 |
The use of plasma immersion ion processing in the synthesis of protective coatings for Al die casting
|
Nastasi, Michael
|
|
2001
|
136 |
1-3 |
p. 162-167
6 p.
|
artikel
|
| 61 |
TiN coating and ion implantation of materials with three-dimensional topology in metal DC plasma-based ion implantation
|
Sano, M
|
|
2001
|
136 |
1-3 |
p. 168-171
4 p.
|
artikel
|
| 62 |
Vacuum arc metal plasma production and the transition of processing mode from metal ion beam to dc metal plasma immersion
|
Brown, I.G
|
|
2001
|
136 |
1-3 |
p. 16-22
7 p.
|
artikel
|
| 63 |
Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: measurements and analytical considerations
|
Anders, André
|
|
2001
|
136 |
1-3 |
p. 85-92
8 p.
|
artikel
|
Tijdschrift beschrijving