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                                       Details for article 23 of 63 found articles
 
 
  Ion-assisted deposition of copper using an inverter plasma
 
 
Title: Ion-assisted deposition of copper using an inverter plasma
Author: Kiuchi, Masato
Murai, Kensuke
Tanaka, Katsutoshi
Takechi, Seiji
Sugimoto, Satoshi
Goto, Seiichi
Appeared in: Surface & coatings technology
Paging: Volume 136 (2001) nr. 1-3 pages 3 p.
Year: 2001
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 23 of 63 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands