| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A Computational Examination of the Sources of Statistical Variance in Particle Parameters During Thermal Plasma Spraying
|
R. L. Williamson
|
|
2000
|
20 |
3 |
p. 299-324
26 p.
|
artikel
|
| 2 |
A Computational Examination of the Sources of Statistical Variance in Particle Parameters During Thermal Plasma Spraying
|
Williamson, R. L.
|
|
2000
|
20 |
3 |
p. 299-324
|
artikel
|
| 3 |
An Investigation of the Positive Column of a CdNe Glow Discharge. I: Steady State
|
Ts. Petrova
|
|
2000
|
20 |
3 |
p. 365-392
28 p.
|
artikel
|
| 4 |
An Investigation of the Positive Column of a Cd–Ne Glow Discharge. I: Steady State
|
Petrova, Ts.
|
|
2000
|
20 |
3 |
p. 365-392
|
artikel
|
| 5 |
A Proposed Process Control Chart for DC Plasma Spraying Process
|
C. B. Ang
|
|
2000
|
20 |
3 |
p. 325-342
18 p.
|
artikel
|
| 6 |
A Proposed Process Control Chart for DC Plasma Spraying Process
|
Ang, C. B.
|
|
2000
|
20 |
3 |
p. 325-342
|
artikel
|
| 7 |
Cleaning of Air Streams from Organic Pollutants by PlasmaCatalytic Oxidation
|
K.-P. Francke
|
|
2000
|
20 |
3 |
p. 393-403
11 p.
|
artikel
|
| 8 |
Cleaning of Air Streams from Organic Pollutants by Plasma–Catalytic Oxidation
|
Francke, K.-P.
|
|
2000
|
20 |
3 |
p. 393-403
|
artikel
|
| 9 |
Degradation of Acetophenone in Water by Pulsed Corona Discharges
|
Y. Wen
|
|
2000
|
20 |
3 |
p. 343-351
9 p.
|
artikel
|
| 10 |
Degradation of Acetophenone in Water by Pulsed Corona Discharges
|
Wen, Y.
|
|
2000
|
20 |
3 |
p. 343-351
|
artikel
|
| 11 |
Efficient Energy Delivery Condition from Pulse Generation Circuit to Corona Discharge Reactor
|
Y. S. Mok
|
|
2000
|
20 |
3 |
p. 353-364
12 p.
|
artikel
|
| 12 |
Efficient Energy Delivery Condition from Pulse Generation Circuit to Corona Discharge Reactor
|
Mok, Y. S.
|
|
2000
|
20 |
3 |
p. 353-364
|
artikel
|
| 13 |
Inductively Coupled Plasma Etching in ICl- and IBr-Based Chemistries. Part I: GaAs, GaSb, and AlGaAs
|
Y. B. Hahn
|
|
2000
|
20 |
3 |
p. 405-415
11 p.
|
artikel
|
| 14 |
Inductively Coupled Plasma Etching in ICl- and IBr-Based Chemistries. Part I: GaAs, GaSb, and AlGaAs
|
Hahn, Y. B.
|
|
2000
|
20 |
3 |
p. 405-415
|
artikel
|
| 15 |
Inductively Coupled Plasma Etching in ICl- and IBr-Based Chemistries. Part II: InP, InSb, InGaP, and InGaAs
|
Y. B. Hahn
|
|
2000
|
20 |
3 |
p. 417-427
11 p.
|
artikel
|
| 16 |
Inductively Coupled Plasma Etching in ICl- and IBr-Based Chemistries. Part II: InP, InSb, InGaP, and InGaAs
|
Hahn, Y. B.
|
|
2000
|
20 |
3 |
p. 417-427
|
artikel
|
| 17 |
Transport Coefficients of Hydrogen and ArgonHydrogen Plasmas
|
A. B. Murphy
|
|
2000
|
20 |
3 |
p. 279-297
19 p.
|
artikel
|
| 18 |
Transport Coefficients of Hydrogen and Argon–Hydrogen Plasmas
|
Murphy, A. B.
|
|
2000
|
20 |
3 |
p. 279-297
|
artikel
|
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