nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A comparison of the critical thickness for MBE grown Lt-GaAs determined by In-Situ ellipsometry and transmission electron microscopy
|
Eyink, K. G. |
|
|
26 |
4 |
p. 391-396 |
artikel |
2 |
A comparison of the critical thickness for MBE grown Lt-GaAs determined by In-Situ ellipsometry and transmission electron microscopy
|
Eyink, K. G. |
|
1997 |
26 |
4 |
p. 391-396 |
artikel |
3 |
Characterization of organic thin films for OLEDs using spectroscopic ellipsometry
|
Celii, Francis G. |
|
|
26 |
4 |
p. 366-371 |
artikel |
4 |
Characterization of organic thin films for OLEDs using spectroscopic ellipsometry
|
Celii, Francis G. |
|
1997 |
26 |
4 |
p. 366-371 |
artikel |
5 |
Chemical beam epitaxial growth of inp using EDMIn and BPE
|
Kim, C. W. |
|
|
26 |
4 |
p. 355-360 |
artikel |
6 |
Chemical beam epitaxial growth of inp using EDMIn and BPE
|
Kim, C. W. |
|
1997 |
26 |
4 |
p. 355-360 |
artikel |
7 |
Chemical vapor deposition and characterization of amorphous teflon fluoropolymerthin films
|
Sharangpani, R. |
|
|
26 |
4 |
p. 402-409 |
artikel |
8 |
Chemical vapor deposition and characterization of amorphous teflon fluoropolymerthin films
|
Sharangpani, R. |
|
1997 |
26 |
4 |
p. 402-409 |
artikel |
9 |
Defect state assisted tunneling in intermediate temperature molecular beam epitaxy grown GaAs
|
Youtz, A. E. |
|
|
26 |
4 |
p. 372-375 |
artikel |
10 |
Defect state assisted tunneling in intermediate temperature molecular beam epitaxy grown GaAs
|
Youtz, A. E. |
|
1997 |
26 |
4 |
p. 372-375 |
artikel |
11 |
Deposition of tantalum oxide films by dual spectral source assisted metalorganic chemical vapor deposition (MOCVD)
|
Chen, Y. |
|
|
26 |
4 |
p. 350-354 |
artikel |
12 |
Deposition of tantalum oxide films by dual spectral source assisted metalorganic chemical vapor deposition (MOCVD)
|
Chen, Y. |
|
1997 |
26 |
4 |
p. 350-354 |
artikel |
13 |
Effects of aluminum sputtering process parameters on via step coverage in micro-electronic device manufacturing
|
Depinto, G. |
|
|
26 |
4 |
p. 376-382 |
artikel |
14 |
Effects of aluminum sputtering process parameters on via step coverage in micro-electronic device manufacturing
|
Depinto, G. |
|
1997 |
26 |
4 |
p. 376-382 |
artikel |
15 |
Effects of trimethylindium on the purity of In0.5Al0.5P and In0.5Al0.5as epilayers grown by metalorganic chemical vapor deposition
|
Chen, J. C. |
|
|
26 |
4 |
p. 361-365 |
artikel |
16 |
Effects of trimethylindium on the purity of In0.5Al0.5P and In0.5Al0.5as epilayers grown by metalorganic chemical vapor deposition
|
Chen, J. C. |
|
1997 |
26 |
4 |
p. 361-365 |
artikel |
17 |
InAsSb/InTISb superlattice: A proposed heterostructure for long wavelength infrared detectors
|
Iyer, S. |
|
|
26 |
4 |
p. 347-349 |
artikel |
18 |
InAsSb/InTISb superlattice: A proposed heterostructure for long wavelength infrared detectors
|
Iyer, S. |
|
1997 |
26 |
4 |
p. 347-349 |
artikel |
19 |
Influence of AIN protective film thickness on the hardness and electrophotographic properties of organic photoconductors
|
Miao, X. S. |
|
|
26 |
4 |
p. 387-390 |
artikel |
20 |
Influence of AIN protective film thickness on the hardness and electrophotographic properties of organic photoconductors
|
Miao, X. S. |
|
1997 |
26 |
4 |
p. 387-390 |
artikel |
21 |
InxGa1−xAs ohmic contacts to n-type GaAs with a tungsten nitride barrier
|
Uchibori, Chihiro J. |
|
|
26 |
4 |
p. 410-414 |
artikel |
22 |
InxGa1−xAs ohmic contacts to n-type GaAs with a tungsten nitride barrier
|
Uchibori, Chihiro J. |
|
1997 |
26 |
4 |
p. 410-414 |
artikel |
23 |
Role of interfacial-charge in the growth of GaN on α-SiC
|
Ren, Shang Yuan |
|
|
26 |
4 |
p. 341-346 |
artikel |
24 |
Role of interfacial-charge in the growth of GaN on α-SiC
|
Ren, Shang Yuan |
|
1997 |
26 |
4 |
p. 341-346 |
artikel |
25 |
Scanning tunneling potentiometry study of electron reflectivity of a single grain boundary in thin gold films
|
Schneider, M. A. |
|
|
26 |
4 |
p. 383-386 |
artikel |
26 |
Scanning tunneling potentiometry study of electron reflectivity of a single grain boundary in thin gold films
|
Schneider, M. A. |
|
1997 |
26 |
4 |
p. 383-386 |
artikel |
27 |
Study of amorphous Ta2O5 thin films by DC magnetron reactive sputtering
|
Chen, K. |
|
|
26 |
4 |
p. 397-401 |
artikel |
28 |
Study of amorphous Ta2O5 thin films by DC magnetron reactive sputtering
|
Chen, K. |
|
1997 |
26 |
4 |
p. 397-401 |
artikel |