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                             28 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A comparison of the critical thickness for MBE grown Lt-GaAs determined by In-Situ ellipsometry and transmission electron microscopy Eyink, K. G.

26 4 p. 391-396
artikel
2 A comparison of the critical thickness for MBE grown Lt-GaAs determined by In-Situ ellipsometry and transmission electron microscopy Eyink, K. G.
1997
26 4 p. 391-396
artikel
3 Characterization of organic thin films for OLEDs using spectroscopic ellipsometry Celii, Francis G.

26 4 p. 366-371
artikel
4 Characterization of organic thin films for OLEDs using spectroscopic ellipsometry Celii, Francis G.
1997
26 4 p. 366-371
artikel
5 Chemical beam epitaxial growth of inp using EDMIn and BPE Kim, C. W.

26 4 p. 355-360
artikel
6 Chemical beam epitaxial growth of inp using EDMIn and BPE Kim, C. W.
1997
26 4 p. 355-360
artikel
7 Chemical vapor deposition and characterization of amorphous teflon fluoropolymerthin films Sharangpani, R.

26 4 p. 402-409
artikel
8 Chemical vapor deposition and characterization of amorphous teflon fluoropolymerthin films Sharangpani, R.
1997
26 4 p. 402-409
artikel
9 Defect state assisted tunneling in intermediate temperature molecular beam epitaxy grown GaAs Youtz, A. E.

26 4 p. 372-375
artikel
10 Defect state assisted tunneling in intermediate temperature molecular beam epitaxy grown GaAs Youtz, A. E.
1997
26 4 p. 372-375
artikel
11 Deposition of tantalum oxide films by dual spectral source assisted metalorganic chemical vapor deposition (MOCVD) Chen, Y.

26 4 p. 350-354
artikel
12 Deposition of tantalum oxide films by dual spectral source assisted metalorganic chemical vapor deposition (MOCVD) Chen, Y.
1997
26 4 p. 350-354
artikel
13 Effects of aluminum sputtering process parameters on via step coverage in micro-electronic device manufacturing Depinto, G.

26 4 p. 376-382
artikel
14 Effects of aluminum sputtering process parameters on via step coverage in micro-electronic device manufacturing Depinto, G.
1997
26 4 p. 376-382
artikel
15 Effects of trimethylindium on the purity of In0.5Al0.5P and In0.5Al0.5as epilayers grown by metalorganic chemical vapor deposition Chen, J. C.

26 4 p. 361-365
artikel
16 Effects of trimethylindium on the purity of In0.5Al0.5P and In0.5Al0.5as epilayers grown by metalorganic chemical vapor deposition Chen, J. C.
1997
26 4 p. 361-365
artikel
17 InAsSb/InTISb superlattice: A proposed heterostructure for long wavelength infrared detectors Iyer, S.

26 4 p. 347-349
artikel
18 InAsSb/InTISb superlattice: A proposed heterostructure for long wavelength infrared detectors Iyer, S.
1997
26 4 p. 347-349
artikel
19 Influence of AIN protective film thickness on the hardness and electrophotographic properties of organic photoconductors Miao, X. S.

26 4 p. 387-390
artikel
20 Influence of AIN protective film thickness on the hardness and electrophotographic properties of organic photoconductors Miao, X. S.
1997
26 4 p. 387-390
artikel
21 InxGa1−xAs ohmic contacts to n-type GaAs with a tungsten nitride barrier Uchibori, Chihiro J.

26 4 p. 410-414
artikel
22 InxGa1−xAs ohmic contacts to n-type GaAs with a tungsten nitride barrier Uchibori, Chihiro J.
1997
26 4 p. 410-414
artikel
23 Role of interfacial-charge in the growth of GaN on α-SiC Ren, Shang Yuan

26 4 p. 341-346
artikel
24 Role of interfacial-charge in the growth of GaN on α-SiC Ren, Shang Yuan
1997
26 4 p. 341-346
artikel
25 Scanning tunneling potentiometry study of electron reflectivity of a single grain boundary in thin gold films Schneider, M. A.

26 4 p. 383-386
artikel
26 Scanning tunneling potentiometry study of electron reflectivity of a single grain boundary in thin gold films Schneider, M. A.
1997
26 4 p. 383-386
artikel
27 Study of amorphous Ta2O5 thin films by DC magnetron reactive sputtering Chen, K.

26 4 p. 397-401
artikel
28 Study of amorphous Ta2O5 thin films by DC magnetron reactive sputtering Chen, K.
1997
26 4 p. 397-401
artikel
                             28 gevonden resultaten
 
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