| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A model for high-rate film deposition from dusty RF discharges
|
Tews, R.
|
|
1997
|
97 |
1-3 |
p. 79-84
6 p.
|
artikel
|
| 2 |
A new approach to ion beam modelling
|
Tartz, M
|
|
1997
|
97 |
1-3 |
p. 504-509
6 p.
|
artikel
|
| 3 |
An improved optical cantilever technique using image processing for measuring in situ stress in thin films
|
Moulard, G.
|
|
1997
|
97 |
1-3 |
p. 206-211
6 p.
|
artikel
|
| 4 |
Anisotropic patterning of copper-laminated polyimide foils by plasma etching
|
Richter, K.
|
|
1997
|
97 |
1-3 |
p. 481-487
7 p.
|
artikel
|
| 5 |
Applicative characterization of cathodic arc-deposited Ti–B–N coatings
|
Rother, B
|
|
1997
|
97 |
1-3 |
p. 564-566
3 p.
|
artikel
|
| 6 |
Barrier properties of thin films polymerized from CF3H/C2H4 electron cyclotron resonance plasmas
|
Walker, M.
|
|
1997
|
97 |
1-3 |
p. 291-294
4 p.
|
artikel
|
| 7 |
Characterization studies of the structure of Al, Zr, and W coatings deposited by closed-field unbalanced magnetron sputtering
|
Kelly, P.J
|
|
1997
|
97 |
1-3 |
p. 595-602
8 p.
|
artikel
|
| 8 |
Cluster ion formation on electrode surface with high electric field
|
Ariyasu, Tomio
|
|
1997
|
97 |
1-3 |
p. 341-346
6 p.
|
artikel
|
| 9 |
70cm radio frequency hollow cathode plasma source for modification of foils and membranes
|
Korzec, D.
|
|
1997
|
97 |
1-3 |
p. 759-767
9 p.
|
artikel
|
| 10 |
Conventional and new approaches towards the design of novel superhard materials
|
Vepřek, S.
|
|
1997
|
97 |
1-3 |
p. 15-22
8 p.
|
artikel
|
| 11 |
Correlation of boron and nitrogen contents with the flux of energetic Ar+ ions at the substrate during the deposition of BN coatings by RF magnetron sputtering
|
Rigato, V.
|
|
1997
|
97 |
1-3 |
p. 275-280
6 p.
|
artikel
|
| 12 |
Development of zirconium and boron containing coatings for the application on aluminium diecasting tools by means of MO–PACVD
|
Rie, K.T
|
|
1997
|
97 |
1-3 |
p. 232-237
6 p.
|
artikel
|
| 13 |
Diagnostic measurements and modelling of an ion-based PVD-process with high deposition rates
|
Bolt, H
|
|
1997
|
97 |
1-3 |
p. 521-527
7 p.
|
artikel
|
| 14 |
Diagnostic of Ar–BCl3 microwave discharges by optical emission spectroscopy
|
Pierson, J.F.
|
|
1997
|
97 |
1-3 |
p. 749-754
6 p.
|
artikel
|
| 15 |
DLC and metallic nanometer multilayers deposited by laser-arc
|
Ziegele, H.
|
|
1997
|
97 |
1-3 |
p. 385-390
6 p.
|
artikel
|
| 16 |
3D modeling of a microwave post-discharge nitriding reactor
|
Bockel, S.
|
|
1997
|
97 |
1-3 |
p. 618-625
8 p.
|
artikel
|
| 17 |
Duplex surface treatment of moulds for pressure casting of aluminium
|
Walkowicz, Jan
|
|
1997
|
97 |
1-3 |
p. 453-464
12 p.
|
artikel
|
| 18 |
Effect of an annealing process on the tribological properties of sputtered hard coatings
|
Herr, W.
|
|
1997
|
97 |
1-3 |
p. 669-674
6 p.
|
artikel
|
| 19 |
Effects of some parameters on corrosion behaviour of plasma-sprayed coatings
|
Çelik, E.
|
|
1997
|
97 |
1-3 |
p. 355-360
6 p.
|
artikel
|
| 20 |
Effects of surface properties on coating adhesion and wear behaviour of PACVD-coated cermets in interrupted cutting
|
Tönshoff, H.K
|
|
1997
|
97 |
1-3 |
p. 224-231
8 p.
|
artikel
|
| 21 |
Energy-resolved mass spectrometry and Monte Carlo simulation of atomic transport in magnetron sputtering
|
Kadlec, S.
|
|
1997
|
97 |
1-3 |
p. 633-641
9 p.
|
artikel
|
| 22 |
Enhanced deposition rate of d.c. reactively sputtered TiO2 films by means of low-frequency modulation of the discharge current
|
Lapostolle, F.
|
|
1997
|
97 |
1-3 |
p. 574-581
8 p.
|
artikel
|
| 23 |
Etching characteristics of Si and SiO2 with a low energy argon/hydrogen d.c. plasma source
|
Strass, A
|
|
1997
|
97 |
1-3 |
p. 158-162
5 p.
|
artikel
|
| 24 |
Evaluation of bonding strength of thin hard films by spherical rolling test
|
He, Jia-Wen
|
|
1997
|
97 |
1-3 |
p. 295-298
4 p.
|
artikel
|
| 25 |
Evaluation of interface reactions in thermal barrier ceramic coatings
|
Çelik, E.
|
|
1997
|
97 |
1-3 |
p. 361-365
5 p.
|
artikel
|
| 26 |
Experimental study of an RF magnetron discharge for thin-film deposition
|
Clénet, F
|
|
1997
|
97 |
1-3 |
p. 528-532
5 p.
|
artikel
|
| 27 |
Fluorocarbon and tungsten carbide multilayer coatings
|
Costa, E
|
|
1997
|
97 |
1-3 |
p. 680-686
7 p.
|
artikel
|
| 28 |
Formation of boron nitride films with various amounts of the cubic phase
|
Ullmann, J.
|
|
1997
|
97 |
1-3 |
p. 281-290
10 p.
|
artikel
|
| 29 |
Growth of carbon layers on Ti–6Al–4V alloy by very high dose carbon implantation
|
Garcı́a, A.
|
|
1997
|
97 |
1-3 |
p. 499-503
5 p.
|
artikel
|
| 30 |
High-pressure non-equilibrium microwave plasma source by using carbon materials
|
Maeda, S.
|
|
1997
|
97 |
1-3 |
p. 404-409
6 p.
|
artikel
|
| 31 |
High-quality a–Si:H grown at high rate using an expanding thermal plasma
|
van de Sanden, M.C.M
|
|
1997
|
97 |
1-3 |
p. 719-722
4 p.
|
artikel
|
| 32 |
Imaging of atomic oxygen in a microwave excited oxygen plasma with two-dimensional optical emission spectroscopy
|
Behle, St.
|
|
1997
|
97 |
1-3 |
p. 734-741
8 p.
|
artikel
|
| 33 |
Improvement of the adhesion of sputtered cubic boron nitride films
|
Schütze, A
|
|
1997
|
97 |
1-3 |
p. 33-38
6 p.
|
artikel
|
| 34 |
Improvement of the adhesion of the resin to the metal surface by using plasma jet
|
Chen, S.
|
|
1997
|
97 |
1-3 |
p. 378-384
7 p.
|
artikel
|
| 35 |
Inductively coupled reactive high-density plasmas designed for sputter deposition
|
Miyake, S
|
|
1997
|
97 |
1-3 |
p. 768-772
5 p.
|
artikel
|
| 36 |
Industrial applications for plasma processes—examples and trends
|
Suchentrunk, R.
|
|
1997
|
97 |
1-3 |
p. 1-9
9 p.
|
artikel
|
| 37 |
Industrial applications of CrN (PVD) coatings, deposited at high and low temperatures
|
Navinšek, B
|
|
1997
|
97 |
1-3 |
p. 182-191
10 p.
|
artikel
|
| 38 |
Influence of a modulated magnetic field on the behavior of particulates in silane plasma CVD
|
Yang, Sung-Chae
|
|
1997
|
97 |
1-3 |
p. 366-371
6 p.
|
artikel
|
| 39 |
Influence of RF plasma properties on the deposited PACVD CN x layers
|
Grüger, H.
|
|
1997
|
97 |
1-3 |
p. 109-113
5 p.
|
artikel
|
| 40 |
Influence of the plasma current to Ti-melt on the plasma parameters and microstructure of TiN coatings in the triode ion plating system
|
Wouters, S.
|
|
1997
|
97 |
1-3 |
p. 114-121
8 p.
|
artikel
|
| 41 |
Influence of the substrate surface on ion concentrations in a large volume microwave plasma
|
Korzec, D.
|
|
1997
|
97 |
1-3 |
p. 122-130
9 p.
|
artikel
|
| 42 |
Investigation of physical processes in PLD of ceramics by eximer laser radiation
|
Kreutz, E.W.
|
|
1997
|
97 |
1-3 |
p. 85-89
5 p.
|
artikel
|
| 43 |
Investigation of the mechanisms of magnetron sputtering of aluminium with mixtures of argon and nitrogen in the partially reactive mode
|
Schulte, J.
|
|
1997
|
97 |
1-3 |
p. 510-515
6 p.
|
artikel
|
| 44 |
Ion beam etching of lithium tantalate and its application for pyroelectric linear arrays
|
Sokoll, T
|
|
1997
|
97 |
1-3 |
p. 469-474
6 p.
|
artikel
|
| 45 |
Ion bombardment diagnostics in a nitrogen RF magnetron sputtering discharge
|
Kaltofen, R.
|
|
1997
|
97 |
1-3 |
p. 131-139
9 p.
|
artikel
|
| 46 |
Large area pulsed laser deposition of ceramic films
|
Kreutz, E.W
|
|
1997
|
97 |
1-3 |
p. 435-441
7 p.
|
artikel
|
| 47 |
Laser-Arc technology for industrial hard coating deposition
|
Scheibe, H.-J
|
|
1997
|
97 |
1-3 |
p. 410-413
4 p.
|
artikel
|
| 48 |
Laser-cladding process: a study using stationary and scanning CO2 laser beams
|
Kathuria, Y.P
|
|
1997
|
97 |
1-3 |
p. 442-447
6 p.
|
artikel
|
| 49 |
Low-pressure plasma cleaning: a process for precision cleaning applications
|
Petasch, W
|
|
1997
|
97 |
1-3 |
p. 176-181
6 p.
|
artikel
|
| 50 |
Low-temperature sputter deposition and characterisation of carbon nitride films
|
Baker, M.A
|
|
1997
|
97 |
1-3 |
p. 544-551
8 p.
|
artikel
|
| 51 |
Magnetron-sputtered superhard materials
|
Ulrich, S.
|
|
1997
|
97 |
1-3 |
p. 45-59
15 p.
|
artikel
|
| 52 |
Mass-separated broad beam ion implantation of 25keV N+ in titanium
|
Schlemm, H.
|
|
1997
|
97 |
1-3 |
p. 259-262
4 p.
|
artikel
|
| 53 |
Measurement and modelling of the bulk plasma in magnetron sputtering sources
|
Bradley, J.W
|
|
1997
|
97 |
1-3 |
p. 538-543
6 p.
|
artikel
|
| 54 |
Mechanical and tribological characterization of DC magnetron sputtered tantalum nitride thin films
|
Westergård, R
|
|
1997
|
97 |
1-3 |
p. 779-784
6 p.
|
artikel
|
| 55 |
Mechanical behaviour of TiN coatings
|
Oettel, H.
|
|
1997
|
97 |
1-3 |
p. 785-789
5 p.
|
artikel
|
| 56 |
Mechanical characterizations of nitride films deposited by ion-beam based techniques
|
Djouadi, M.A.
|
|
1997
|
97 |
1-3 |
p. 39-44
6 p.
|
artikel
|
| 57 |
Mechanical strength assessment of very thin films for optical and electronic applications
|
Consiglio, R
|
|
1997
|
97 |
1-3 |
p. 192-199
8 p.
|
artikel
|
| 58 |
Mechanisms in ion-assisted deposition of superhard coatings: cubic boron nitride–tetrahedral amorphous carbon
|
Reinke, S.
|
|
1997
|
97 |
1-3 |
p. 23-32
10 p.
|
artikel
|
| 59 |
Metastable states and nitriding plasmas
|
Baldwin, M.J.
|
|
1997
|
97 |
1-3 |
p. 97-101
5 p.
|
artikel
|
| 60 |
Microstructural gradients in thin hard coatings—tailor-made
|
Fischer, K.
|
|
1997
|
97 |
1-3 |
p. 308-312
5 p.
|
artikel
|
| 61 |
Microstructure and physical properties of B x N y (O z H k) coatings deposited by r.f. unbalanced magnetron sputtering
|
Rigato, V.
|
|
1997
|
97 |
1-3 |
p. 582-589
8 p.
|
artikel
|
| 62 |
Modelling the pulsed glow discharge of a nitriding reactor
|
Guiberteau, E
|
|
1997
|
97 |
1-3 |
p. 552-556
5 p.
|
artikel
|
| 63 |
Multilayer cracking resistance in bending
|
Wiklund, Urban
|
|
1997
|
97 |
1-3 |
p. 773-778
6 p.
|
artikel
|
| 64 |
Nitrogen and boron ion implantation into electrodeposited hard chrome
|
Walter, K.C.
|
|
1997
|
97 |
1-3 |
p. 250-253
4 p.
|
artikel
|
| 65 |
Non-Maxwellian effect on species and energy transport in moderate pressure H2 plasmas
|
Hassouni, K.
|
|
1997
|
97 |
1-3 |
p. 391-403
13 p.
|
artikel
|
| 66 |
Non-reactively sputtered TiN and TiB2 films: influence of activation energy on film growth
|
Losbichler, P.
|
|
1997
|
97 |
1-3 |
p. 567-573
7 p.
|
artikel
|
| 67 |
Numerical modelling of charged particle motion in electric and magnetic fields to assist magnetron design
|
Liebig, J.-S.
|
|
1997
|
97 |
1-3 |
p. 626-632
7 p.
|
artikel
|
| 68 |
On the capability of spectrally resolved optical emission tomography for the diagnostic of nonisothermal low-pressure technological plasmas
|
Schielke, W
|
|
1997
|
97 |
1-3 |
p. 742-748
7 p.
|
artikel
|
| 69 |
On the role of ion bombardment in cubic boron nitride deposition
|
Reinke, Stefan
|
|
1997
|
97 |
1-3 |
p. 263-269
7 p.
|
artikel
|
| 70 |
Particle energy and angle distributions in ion beam sputtering
|
Franke, E.
|
|
1997
|
97 |
1-3 |
p. 90-96
7 p.
|
artikel
|
| 71 |
Phase transition of pseudobinary Cr–Al–N films deposited by magnetron sputtering method
|
Sugishima, A.
|
|
1997
|
97 |
1-3 |
p. 590-594
5 p.
|
artikel
|
| 72 |
Phase variation and properties of (Ti, Al)N films prepared by ion beam assisted deposition
|
Setsuhara, Y
|
|
1997
|
97 |
1-3 |
p. 254-258
5 p.
|
artikel
|
| 73 |
Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure
|
Thyen, R
|
|
1997
|
97 |
1-3 |
p. 426-434
9 p.
|
artikel
|
| 74 |
Plasma-sprayed oxide ceramics on steel substrates
|
Vural, M.
|
|
1997
|
97 |
1-3 |
p. 347-354
8 p.
|
artikel
|
| 75 |
Plasma state in pulsed arc, laser and electron deposition
|
Witke, T
|
|
1997
|
97 |
1-3 |
p. 414-419
6 p.
|
artikel
|
| 76 |
Plasma–surface interaction modelling of d.c. reactive magnetron discharges
|
Bretagne, J.
|
|
1997
|
97 |
1-3 |
p. 611-617
7 p.
|
artikel
|
| 77 |
Problems and solutions for low pressure, high density, inductively coupled plasma dry etch applications
|
Puttock, Mark
|
|
1997
|
97 |
1-3 |
p. 10-14
5 p.
|
artikel
|
| 78 |
Production and surface analytical characterization of various chalcogenide glass thin films for analytical microdevices
|
Bruns, M
|
|
1997
|
97 |
1-3 |
p. 707-712
6 p.
|
artikel
|
| 79 |
Properties of sputtered hard coatings depending on macro- and micro-geometry of the substrates
|
Berg, G
|
|
1997
|
97 |
1-3 |
p. 326-334
9 p.
|
artikel
|
| 80 |
Property distribution on three-dimensionally shaped PVD-coated samples
|
Rother, B
|
|
1997
|
97 |
1-3 |
p. 200-203
4 p.
|
artikel
|
| 81 |
Pulsed laser deposition of crystalline PZT thin films
|
Husmann, A.
|
|
1997
|
97 |
1-3 |
p. 420-425
6 p.
|
artikel
|
| 82 |
PVD Cr x N coatings for tribological application on piston rings
|
Friedrich, C
|
|
1997
|
97 |
1-3 |
p. 661-668
8 p.
|
artikel
|
| 83 |
Reactive ion etching for high aspect ratio silicon micromachining
|
Rangelow, I.W.
|
|
1997
|
97 |
1-3 |
p. 140-150
11 p.
|
artikel
|
| 84 |
Reactive thermal plasmas: ultrafine particle synthesis and coating deposition
|
Fauchais, P.
|
|
1997
|
97 |
1-3 |
p. 66-78
13 p.
|
artikel
|
| 85 |
Reactivity of a DC-pulsed plasma: plasma diagnostics and nitrided sample analysis
|
Henrion, Gérard
|
|
1997
|
97 |
1-3 |
p. 729-733
5 p.
|
artikel
|
| 86 |
Scalable large volume ECR plasma generation for low pressure applications
|
Scholze, F.
|
|
1997
|
97 |
1-3 |
p. 755-758
4 p.
|
artikel
|
| 87 |
SEM image analysis of droplet formation during metal ion etching by a steered arc discharge
|
Creasey, S.
|
|
1997
|
97 |
1-3 |
p. 163-175
13 p.
|
artikel
|
| 88 |
Spatial variation of whistler wave in ECR plasma
|
Sugimoto, M.
|
|
1997
|
97 |
1-3 |
p. 533-537
5 p.
|
artikel
|
| 89 |
Stoichiometry of unbalanced magnetron sputtered Al–Mg alloy coatings
|
Shedden, B.A.
|
|
1997
|
97 |
1-3 |
p. 557-563
7 p.
|
artikel
|
| 90 |
Structural investigation of Pt–Al2O3 co-sputtered nano-cermet films studied by small angle X-ray scattering, grazing angle X-ray reflectometry, TEM and AFM
|
Sella, C.
|
|
1997
|
97 |
1-3 |
p. 603-610
8 p.
|
artikel
|
| 91 |
Structure and phase composition of low friction carbon coatings deposited on aluminium surface
|
Uglov, V.V
|
|
1997
|
97 |
1-3 |
p. 322-325
4 p.
|
artikel
|
| 92 |
Structure of deposited and annealed TiB2 layers
|
Wiedemann, Renate
|
|
1997
|
97 |
1-3 |
p. 313-321
9 p.
|
artikel
|
| 93 |
Studies of physical vapour deposition interfaces generated by Ti ions in a steered arc discharge
|
Davidson, J.L
|
|
1997
|
97 |
1-3 |
p. 713-718
6 p.
|
artikel
|
| 94 |
Studies of the evolution of the topography of selected materials as a function of etching in reactive and non-reactive r.f. plasmas
|
Anderson, C.A
|
|
1997
|
97 |
1-3 |
p. 151-157
7 p.
|
artikel
|
| 95 |
Study of the performance of PVD and PCVD coated cermets for different cutting applications
|
Vandierendonck, K
|
|
1997
|
97 |
1-3 |
p. 218-223
6 p.
|
artikel
|
| 96 |
Suitability of mechanical characterization methods for diamond-coated cemented carbide tools with regard to tooling applications
|
Jörgensen, G
|
|
1997
|
97 |
1-3 |
p. 238-243
6 p.
|
artikel
|
| 97 |
Surface modelling of reactive ion etching of silicon–germanium alloys in a SF6 plasma
|
Peignon, M.C.
|
|
1997
|
97 |
1-3 |
p. 465-468
4 p.
|
artikel
|
| 98 |
Surface nitriding of titanium and aluminium by laser-induced plasma
|
Thomann, A.L
|
|
1997
|
97 |
1-3 |
p. 448-452
5 p.
|
artikel
|
| 99 |
Surface technology for temperature-sensitive materials
|
Perry, Anthony J
|
|
1997
|
97 |
1-3 |
p. 244-249
6 p.
|
artikel
|
| 100 |
Synthesis of zirconia thin films by RPECVD
|
Belmonte, T.
|
|
1997
|
97 |
1-3 |
p. 642-648
7 p.
|
artikel
|
| 101 |
Taber abraser/liquid particle count coupling for the determination of sliding wear of metallized plastics
|
Riester, M.
|
|
1997
|
97 |
1-3 |
p. 649-655
7 p.
|
artikel
|
| 102 |
The effect of the sputter cleaning of steel substrates with neutral molecule source on the adhesion of TiN films
|
Eryılmaz, O.L
|
|
1997
|
97 |
1-3 |
p. 488-491
4 p.
|
artikel
|
| 103 |
The influence of a heat treatment on the microstructure and mechanical properties of sputtered coatings
|
Herr, W
|
|
1997
|
97 |
1-3 |
p. 335-340
6 p.
|
artikel
|
| 104 |
The influence of hydrogen on nucleation and growth of cubic boron nitride films
|
Freudenstein, Regine
|
|
1997
|
97 |
1-3 |
p. 270-274
5 p.
|
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Grabiec, P.B
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1997
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| 107 |
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1997
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| 108 |
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| 109 |
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Bárdoš, L.
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1997
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| 110 |
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Leyendecker, T
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| 111 |
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Pochner, K
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1997
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| 112 |
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Bellido-González, V
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| 113 |
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| 114 |
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| 116 |
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| 117 |
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| 118 |
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1997
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