| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Characterization of flexible switchable mirror film prepared by DC magnetron sputtering
|
Tajima, Kazuki
|
|
2010
|
84 |
12 |
p. 1460-1465
6 p.
|
artikel
|
| 2 |
Completely flat erosion magnetron sputtering using a rotating asymmetrical yoke magnet
|
Iseki, Takayuki
|
|
2010
|
84 |
12 |
p. 1372-1376
5 p.
|
artikel
|
| 3 |
Deposition and characterization of ultra-high barrier coatings for flexible electronic applications
|
Chen, Tsai-Ning
|
|
2010
|
84 |
12 |
p. 1444-1447
4 p.
|
artikel
|
| 4 |
Development of large diameter ECR plasma source
|
Kawai, Yoshinobu
|
|
2010
|
84 |
12 |
p. 1381-1384
4 p.
|
artikel
|
| 5 |
Editorial Board & Publication Information
|
|
|
2010
|
84 |
12 |
p. IFC-
1 p.
|
artikel
|
| 6 |
Effect of the electrode material on the atmospheric plasma conversion of NO in air mixtures
|
Baránková, Hana
|
|
2010
|
84 |
12 |
p. 1385-1388
4 p.
|
artikel
|
| 7 |
Effect of the target bias voltage during off-pulse period on the impulse magnetron sputtering
|
Nakano, Takeo
|
|
2010
|
84 |
12 |
p. 1368-1371
4 p.
|
artikel
|
| 8 |
Etch damage characteristics of TiO2 thin films by capacitively coupled RF Ar plasmas
|
Kawakami, Retsuo
|
|
2010
|
84 |
12 |
p. 1393-1397
5 p.
|
artikel
|
| 9 |
Fabrication and testing of sputtered-sliced kinoform style Fresnel zone plate
|
Tamura, Shigeharu
|
|
2010
|
84 |
12 |
p. 1457-1459
3 p.
|
artikel
|
| 10 |
Fabrication of carbon nanoflakes by RF sputtering for field emission applications
|
Shih, Wen-Ching
|
|
2010
|
84 |
12 |
p. 1452-1456
5 p.
|
artikel
|
| 11 |
Field emission properties of RuO2 thin film coated on carbon nanotubes
|
Chen, Ching-An
|
|
2010
|
84 |
12 |
p. 1427-1429
3 p.
|
artikel
|
| 12 |
Granular L10 FePt nanocomposite films fabricated by rapid thermal annealing
|
Chen, Sheng-Chi
|
|
2010
|
84 |
12 |
p. 1430-1434
5 p.
|
artikel
|
| 13 |
High rate reactive deposition of TiO2 films using two sputtering sources
|
Hoshi, Yoichi
|
|
2010
|
84 |
12 |
p. 1377-1380
4 p.
|
artikel
|
| 14 |
Influence of atmospheric pressure plasma treatment on various fibrous materials: Performance properties and surface adhesion analysis
|
Cheng, S.Y.
|
|
2010
|
84 |
12 |
p. 1466-1470
5 p.
|
artikel
|
| 15 |
Influence of the luminous gas phase on direct current plasma polymerized hydrocarbon film growth
|
Huang, Chun
|
|
2010
|
84 |
12 |
p. 1402-1406
5 p.
|
artikel
|
| 16 |
Interaction between ethanol cluster ion beam and silicon surface
|
Ryuto, Hiromichi
|
|
2010
|
84 |
12 |
p. 1419-1422
4 p.
|
artikel
|
| 17 |
Investigations of the electron-induced ablation in the surface wave plasma
|
Banno, Tatsuya
|
|
2010
|
84 |
12 |
p. 1407-1410
4 p.
|
artikel
|
| 18 |
Ion-beam sputtering and nanostructures of noble metals
|
Gangopadhyay, P.
|
|
2010
|
84 |
12 |
p. 1411-1414
4 p.
|
artikel
|
| 19 |
Magnetron sputtering – Milestones of 30 years
|
Bräuer, G.
|
|
2010
|
84 |
12 |
p. 1354-1359
6 p.
|
artikel
|
| 20 |
Measurement for dissociation ratio of source gases in plasmas using a quartz sensor
|
Suzuki, Atsushi
|
|
2010
|
84 |
12 |
p. 1389-1392
4 p.
|
artikel
|
| 21 |
Measurement of lifetimes of thin carbon stripper foils produced by ion-beam sputtering
|
Takeda, Yasuhiro
|
|
2010
|
84 |
12 |
p. 1448-1451
4 p.
|
artikel
|
| 22 |
Microstructure and magnetic properties of the FePt film on a membrane of anodized aluminum oxide
|
Chen, S.Y.
|
|
2010
|
84 |
12 |
p. 1435-1438
4 p.
|
artikel
|
| 23 |
Preface
|
Kikuchi, Naoto
|
|
2010
|
84 |
12 |
p. 1353-
1 p.
|
artikel
|
| 24 |
Schottky contacts of refractory metal nitrides on gallium nitride using reactive sputtering
|
Ao, Jin-Ping
|
|
2010
|
84 |
12 |
p. 1439-1443
5 p.
|
artikel
|
| 25 |
Structure modifications of vertically grown carbon nanotubes by plasma ion bombardment
|
Lee, Byeong-Joo
|
|
2010
|
84 |
12 |
p. 1398-1401
4 p.
|
artikel
|
| 26 |
Surface-enhanced Raman scattering substrate of silver nanoparticles depositing on AAO template fabricated by magnetron sputtering
|
Nuntawong, Noppadon
|
|
2010
|
84 |
12 |
p. 1415-1418
4 p.
|
artikel
|
| 27 |
Surface morphology analysis of natural single crystal diamond chips bombarded with Ar+ ion beam
|
Nagase, Takashi
|
|
2010
|
84 |
12 |
p. 1423-1426
4 p.
|
artikel
|
| 28 |
The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool
|
Gudmundsson, J.T.
|
|
2010
|
84 |
12 |
p. 1360-1364
5 p.
|
artikel
|
| 29 |
Time-dependent variation of the target mode in reactive sputtering of Al–O2 system
|
Abe, Yoshio
|
|
2010
|
84 |
12 |
p. 1365-1367
3 p.
|
artikel
|
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