| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Al-impurity-doped transparent conductive oxide films of In2O3−ZnO system
|
Tominaga, K.
|
|
2004
|
74 |
3-4 |
p. 683-687
5 p.
|
artikel
|
| 2 |
A new, room-temperature, high-rate plasma-based copper etch process
|
Kuo, Yue
|
|
2004
|
74 |
3-4 |
p. 473-477
5 p.
|
artikel
|
| 3 |
Changes in electron spin resonance spectra of carbon nanotubes by thermal annealing
|
Yokomichi, Haruo
|
|
2004
|
74 |
3-4 |
p. 677-681
5 p.
|
artikel
|
| 4 |
Characteristics of La0.5Sr0.5CoO3 thin films fabricated by a simple metal-organic decomposition technique
|
Kim, Kyoung-Tae
|
|
2004
|
74 |
3-4 |
p. 671-675
5 p.
|
artikel
|
| 5 |
Characteristics of the electron temperature in VHF-excited SiH4/H2 plasma produced using a ladder-shaped electrode
|
Mashima, H.
|
|
2004
|
74 |
3-4 |
p. 503-507
5 p.
|
artikel
|
| 6 |
Characterization of thermally stable Ir–Ta alloy thin films deposited by sputtering
|
Watanabe, E.
|
|
2004
|
74 |
3-4 |
p. 735-739
5 p.
|
artikel
|
| 7 |
Compact holey-plate plasma source
|
Yoshida, Y.
|
|
2004
|
74 |
3-4 |
p. 509-513
5 p.
|
artikel
|
| 8 |
Computed tomography imaging of optical emission from copper-sputter deposition plasma: evaluation of the atomic density using the self-absorption effect
|
Nakano, Takeo
|
|
2004
|
74 |
3-4 |
p. 387-390
4 p.
|
artikel
|
| 9 |
Current–voltage characteristics of high-resistive ZnO thin films deposited by RF magnetron sputtering
|
Kawamura, H.
|
|
2004
|
74 |
3-4 |
p. 567-570
4 p.
|
artikel
|
| 10 |
Dependence on gas pressure of μc-Si:H prepared by RF magnetron sputtering
|
Fukaya, K.
|
|
2004
|
74 |
3-4 |
p. 561-565
5 p.
|
artikel
|
| 11 |
Dependence to processing conditions of structure in TiN films deposited by arc ion plating
|
Matsue, Tatsuya
|
|
2004
|
74 |
3-4 |
p. 647-651
5 p.
|
artikel
|
| 12 |
Deposition of metal oxide thin films (HfO2 and RuO2) by oxygen radical-assisted MOCVD
|
Kumagai, A.
|
|
2004
|
74 |
3-4 |
p. 461-465
5 p.
|
artikel
|
| 13 |
Deposition of nitrogen-containing diamond-like carbon films on acrylic substrates by an ion beam process
|
Jan, Der-Jun
|
|
2004
|
74 |
3-4 |
p. 531-538
8 p.
|
artikel
|
| 14 |
Determination of absolute orientation-dependent TiN(001) and TiN(111) step energies
|
Kodambaka, S.
|
|
2004
|
74 |
3-4 |
p. 345-351
7 p.
|
artikel
|
| 15 |
3D surface modification of micro trenched structure
|
Tonosaki, M.
|
|
2004
|
74 |
3-4 |
p. 693-698
6 p.
|
artikel
|
| 16 |
Dual cathode DC–RF and MF–RF coupled S-Guns for reactive sputtering
|
Felmetsger, V.
|
|
2004
|
74 |
3-4 |
p. 403-408
6 p.
|
artikel
|
| 17 |
Editorial Board ; Publication Information
|
|
|
2004
|
74 |
3-4 |
p. IFC-
1 p.
|
artikel
|
| 18 |
Effect of ZnO buffer layer prepared by rf sputtering on heteroepitaxial growth of high-quality ZnO films
|
Sato, D.
|
|
2004
|
74 |
3-4 |
p. 601-605
5 p.
|
artikel
|
| 19 |
Effects of neutralizers on the crystal orientation of YSZ films grown by using ion beam sputtering
|
Suh, Ju Hyung
|
|
2004
|
74 |
3-4 |
p. 423-430
8 p.
|
artikel
|
| 20 |
Effects of the TaN x interface layer on doped tantalum oxide high-k films
|
Lu, J.
|
|
2004
|
74 |
3-4 |
p. 539-547
9 p.
|
artikel
|
| 21 |
Enhancement of photocatalytic activity using UV light trapping effect
|
Nuida, T.
|
|
2004
|
74 |
3-4 |
p. 729-733
5 p.
|
artikel
|
| 22 |
Enhancement of reactive species density in nitrogen plasma by mixture of helium and nitridation experiment for silicon
|
Hino, T.
|
|
2004
|
74 |
3-4 |
p. 467-471
5 p.
|
artikel
|
| 23 |
Epitaxial growth of (Cu,C)Ba2Ca n−1Cu n O x (n=1) film deposited on SrTiO3 substrate by r.f. sputtering
|
Kikuchi, N.
|
|
2004
|
74 |
3-4 |
p. 585-590
6 p.
|
artikel
|
| 24 |
Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma
|
Kim, Gwan-Ha
|
|
2004
|
74 |
3-4 |
p. 485-489
5 p.
|
artikel
|
| 25 |
Evaluation of internal stresses in TiN thin films by synchrotron radiation
|
Hanabusa, T.
|
|
2004
|
74 |
3-4 |
p. 571-575
5 p.
|
artikel
|
| 26 |
Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition using an Fe3Si target
|
Nakagauchi, D.
|
|
2004
|
74 |
3-4 |
p. 653-657
5 p.
|
artikel
|
| 27 |
Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography
|
Taki, Yusuke
|
|
2004
|
74 |
3-4 |
p. 431-435
5 p.
|
artikel
|
| 28 |
Highly moisture-resistive silicon nitride films prepared by catalytic chemical vapor deposition and application to gallium arsenide field-effect transistors
|
Masuda, Atsushi
|
|
2004
|
74 |
3-4 |
p. 525-529
5 p.
|
artikel
|
| 29 |
High-rate, low-temperature radical-assisted sputtering coater and its applications for depositing high-performance optical filters
|
Song, Yizhou
|
|
2004
|
74 |
3-4 |
p. 409-415
7 p.
|
artikel
|
| 30 |
Hybrid PIG–ECR discharge as low-pressure sputtering system
|
Abolmasov, S.N.
|
|
2004
|
74 |
3-4 |
p. 497-501
5 p.
|
artikel
|
| 31 |
Improvement of crystallinity of ZnO thin film and electrical characteristics of film bulk acoustic wave resonator by using Pt buffer layer
|
Yamada, H.
|
|
2004
|
74 |
3-4 |
p. 689-692
4 p.
|
artikel
|
| 32 |
Influence of deposition parameters in the fabrication of a large-area narrow band-pass filter of bandwidth on subnanometer scale
|
Lee, Cheng-Chung
|
|
2004
|
74 |
3-4 |
p. 577-583
7 p.
|
artikel
|
| 33 |
Influence of metal electrodes on crystal orientation of aluminum nitride thin films
|
Akiyama, Morito
|
|
2004
|
74 |
3-4 |
p. 699-703
5 p.
|
artikel
|
| 34 |
Influence of oxygen flow ratio on the oxidation of Ti target and the formation process of TiO2 films by reactive sputtering
|
Takamura, K.
|
|
2004
|
74 |
3-4 |
p. 397-401
5 p.
|
artikel
|
| 35 |
InN films deposited by rf reactive sputtering in pure nitrogen gas
|
Inoue, S
|
|
2004
|
74 |
3-4 |
p. 443-448
6 p.
|
artikel
|
| 36 |
In situ optical spectroscopy of PLD of nano-structured TiO2
|
Kitazawa, Sin-iti
|
|
2004
|
74 |
3-4 |
p. 637-642
6 p.
|
artikel
|
| 37 |
Interfacial structure dependence of layered TiO2/WO3 thin films on the photoinduced hydrophilic property
|
Irie, Hiroshi
|
|
2004
|
74 |
3-4 |
p. 625-629
5 p.
|
artikel
|
| 38 |
Investigation of the electron energy distributions in Ar/N2 ECR plasmas with magnetic mirror
|
Muta, Hiroshi
|
|
2004
|
74 |
3-4 |
p. 373-377
5 p.
|
artikel
|
| 39 |
Light emission during negative heavy ion implantation into lithium niobate and sapphire
|
Plaksin, O.A.
|
|
2004
|
74 |
3-4 |
p. 367-371
5 p.
|
artikel
|
| 40 |
Low temperature synthesis and ferroelectric properties of (117)-oriented Bi3.25La0.75Ti3O12 thin films on LaNiO3 electrodes
|
Kim, Kyoung-Tae
|
|
2004
|
74 |
3-4 |
p. 665-670
6 p.
|
artikel
|
| 41 |
Magnetic tunnel junctions—principles and applications
|
Samant, Mahesh G.
|
|
2004
|
74 |
3-4 |
p. 705-709
5 p.
|
artikel
|
| 42 |
Measurement of crystal orientation and residual stress in GaN film deposited by RF sputtering with powder target
|
Kusaka, K.
|
|
2004
|
74 |
3-4 |
p. 613-618
6 p.
|
artikel
|
| 43 |
Measurement of ion temperature in N2/Ar and O2/Ar ECR plasma
|
Koga, M.
|
|
2004
|
74 |
3-4 |
p. 491-495
5 p.
|
artikel
|
| 44 |
Measurement of surface roughness and ion-induced secondary electron emission coefficient of MgO films prepared by high-pressure sputter deposition
|
Nakano, Takeo
|
|
2004
|
74 |
3-4 |
p. 595-599
5 p.
|
artikel
|
| 45 |
Metal deposition and oxygen-ion implantation for optical thin films
|
Chiba, S.
|
|
2004
|
74 |
3-4 |
p. 449-454
6 p.
|
artikel
|
| 46 |
Monte Carlo simulation of gas transport in a TiN reactive sputtering apparatus for large area deposition
|
Kobayashi, T.
|
|
2004
|
74 |
3-4 |
p. 379-385
7 p.
|
artikel
|
| 47 |
Morphology and characteristics of ultrathin Au films with ultraviolet transparency and conductivity deposited by dual ion beam sputtering
|
Iwatsubo, S.
|
|
2004
|
74 |
3-4 |
p. 631-636
6 p.
|
artikel
|
| 48 |
Near-surface sensitive infrared reflection spectroscopy on SiO2 implanted with high-flux negative ions
|
Amekura, H.
|
|
2004
|
74 |
3-4 |
p. 549-553
5 p.
|
artikel
|
| 49 |
Novel application of sputtered-sliced concentric multilayers to various optical elements for synchrotron radiation high-brilliance X-ray beamlines at SPring-8
|
Tamura, S.
|
|
2004
|
74 |
3-4 |
p. 741-746
6 p.
|
artikel
|
| 50 |
Numerical study of the characteristics of erosion in magnetron sputtering
|
Kusumoto, Y.
|
|
2004
|
74 |
3-4 |
p. 359-365
7 p.
|
artikel
|
| 51 |
Optical properties of Ag/dielectric-material multilayers
|
Tachibana, Yuko
|
|
2004
|
74 |
3-4 |
p. 555-559
5 p.
|
artikel
|
| 52 |
Optical properties of metal nanoparticles synthesized in insulators by negative ion implantation
|
Takeda, Yoshihiko
|
|
2004
|
74 |
3-4 |
p. 717-721
5 p.
|
artikel
|
| 53 |
Orientational ordering of iron silicide films on sputter etched Si substrate
|
Igarashi, Shinichi
|
|
2004
|
74 |
3-4 |
p. 619-624
6 p.
|
artikel
|
| 54 |
Photocatalytic efficiency of TiO2/SnO2 thin film stacks prepared by DC magnetron sputtering
|
Kanai, N.
|
|
2004
|
74 |
3-4 |
p. 723-727
5 p.
|
artikel
|
| 55 |
Plasma surface treatment effect of TiO2 thin film
|
Chiba, Yoshiaki
|
|
2004
|
74 |
3-4 |
p. 643-646
4 p.
|
artikel
|
| 56 |
Preparation of self-supporting boron films by sputtering with electron-beam-excited plasma
|
Ozawa, S.
|
|
2004
|
74 |
3-4 |
p. 417-421
5 p.
|
artikel
|
| 57 |
Preparation of ultra-thin carbon overcoat for magnetic recording medium by filtered cathodic vacuum arc technology
|
Fujimaki, S.
|
|
2004
|
74 |
3-4 |
p. 711-716
6 p.
|
artikel
|
| 58 |
Reactive sputtering process for depositing Er3+/Yb3+co-doped lead fluoride films
|
Okita, Hiroyuki
|
|
2004
|
74 |
3-4 |
p. 437-441
5 p.
|
artikel
|
| 59 |
Simplified model for the DC planar magnetron discharge
|
Buyle, G.
|
|
2004
|
74 |
3-4 |
p. 353-358
6 p.
|
artikel
|
| 60 |
Structural analysis of Cu–In alloy films with XPS depth profiling by ion etching
|
Nakano, Takeo
|
|
2004
|
74 |
3-4 |
p. 591-594
4 p.
|
artikel
|
| 61 |
Study on facing-target sputtering assisted by microwave plasma for enhanced ionization of sputtered atoms
|
Yonesu, Akira
|
|
2004
|
74 |
3-4 |
p. 521-524
4 p.
|
artikel
|
| 62 |
Surface modification of TiN films by nitrogen ion beam irradiation in ethylene gas atmosphere
|
Nakamura, Isao
|
|
2004
|
74 |
3-4 |
p. 659-663
5 p.
|
artikel
|
| 63 |
Surface smoothness of polycrystalline copper after ion irradiation
|
Yamauchi, Y.
|
|
2004
|
74 |
3-4 |
p. 479-484
6 p.
|
artikel
|
| 64 |
Thermal stability of electrical resistance of (ZnO:Ga,Y)/(ZnO:Ga)/(ZnO:Ga,Y) multilayers for electrically heated windows
|
Mitsui, A.
|
|
2004
|
74 |
3-4 |
p. 747-751
5 p.
|
artikel
|
| 65 |
The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter
|
Yoshitake, T.
|
|
2004
|
74 |
3-4 |
p. 515-520
6 p.
|
artikel
|
| 66 |
Ti ion density in inductively coupled plasma enhanced dc magnetron sputtering
|
Nakamura, Tadashi
|
|
2004
|
74 |
3-4 |
p. 391-395
5 p.
|
artikel
|
| 67 |
Tribological properties in a high vacuum of carbon films containing titanium prepared by magnetron sputtering
|
Sasaki, M.
|
|
2004
|
74 |
3-4 |
p. 455-459
5 p.
|
artikel
|
| 68 |
Volume contents and Author Index
|
|
|
2004
|
74 |
3-4 |
p. III-XII
nvt p.
|
artikel
|
| 69 |
ZnO–SnO2 transparent conductive films deposited by opposed target sputtering system of ZnO and SnO2 targets
|
Hayashi, Y.
|
|
2004
|
74 |
3-4 |
p. 607-611
5 p.
|
artikel
|
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