| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A double-chamber capacitively coupled RF discharge for plasma assisting deposition techniques
|
Dinescu, G
|
|
2000
|
56 |
1 |
p. 83-86
4 p.
|
artikel
|
| 2 |
Application of CCl2F2- and CCl4-based plasmas for RIE of GaSb and related materials
|
Piotrowska, A
|
|
2000
|
56 |
1 |
p. 57-61
5 p.
|
artikel
|
| 3 |
Editorial
|
|
|
2000
|
56 |
1 |
p. 1-2
2 p.
|
artikel
|
| 4 |
Effects of oxygen ion beam plasma conditions on the properties of Indium tin oxide thin films
|
Bae, J.W.
|
|
2000
|
56 |
1 |
p. 77-81
5 p.
|
artikel
|
| 5 |
Effects of plasma conditions on the etch properties of AlGaN
|
Kim, H.S
|
|
2000
|
56 |
1 |
p. 45-49
5 p.
|
artikel
|
| 6 |
Electrical and optical characterisation of capacitively and inductively coupled GEC reference cells
|
Graham, W.G
|
|
2000
|
56 |
1 |
p. 3-8
6 p.
|
artikel
|
| 7 |
Energy spectra of particles bombarding the cathode in glow discharges
|
Budtz-Jørgensen, C.V
|
|
2000
|
56 |
1 |
p. 9-13
5 p.
|
artikel
|
| 8 |
Etching of RuO2 and Pt thin films with ECR/RF reactor
|
Baborowski, J
|
|
2000
|
56 |
1 |
p. 51-56
6 p.
|
artikel
|
| 9 |
Plasma analyser for plasma-assisted surface process diagnostics up to 100mbar
|
Kátai, Sz
|
|
2000
|
56 |
1 |
p. 39-43
5 p.
|
artikel
|
| 10 |
Plasma diagnostics of a PECVD system using different R.F. electrode configurations
|
Águas, H
|
|
2000
|
56 |
1 |
p. 31-37
7 p.
|
artikel
|
| 11 |
Pyrometry applications in thermal plasma processing
|
Bertrand, Ph
|
|
2000
|
56 |
1 |
p. 71-76
6 p.
|
artikel
|
| 12 |
Research on physico-chemical bases of the ion nitriding process control with the use of plasma spectroscopic diagnostics
|
Walkowicz, Jan
|
|
2000
|
56 |
1 |
p. 63-69
7 p.
|
artikel
|
| 13 |
Role of the gas temperature and power to gas flow ratio on powder and voids formation in films grown by PECVD technique
|
Martins, R
|
|
2000
|
56 |
1 |
p. 25-30
6 p.
|
artikel
|
| 14 |
Spatially resolved optical emission spectroscopy of the secondary glow observed during biasing of a microwave plasma
|
Whitfield, Michael D
|
|
2000
|
56 |
1 |
p. 15-23
9 p.
|
artikel
|
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