| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Cross Sections of Scattering Processes in Electron-Beam Lithography
|
Rogozhin, A. E.
|
|
|
52 |
2 |
p. 57-73
|
artikel
|
| 2 |
Design of Ternary Multiplier Using Pseudo NCNTFETs
|
Ratan Kumar, S. V.
|
|
|
52 |
2 |
p. 119-127
|
artikel
|
| 3 |
Influence of the Passivation Layers on the Self-Heating Effect in the Double Channel AlGaN/GaN MOS-HEMT Device
|
Maryam Shaveisi,
|
|
|
52 |
2 |
p. 112-118
|
artikel
|
| 4 |
Investigation of the Optical Properties of Ultrathin Films Based on Metal Silicide
|
Kerimov, E. A.
|
|
|
52 |
2 |
p. 107-111
|
artikel
|
| 5 |
Investigation of the Possibility of Optimizing the Interaction of NV Centers and Photons by Changing the Shape of Microresonators
|
Tsukanov, A. V.
|
|
|
52 |
2 |
p. 43-56
|
artikel
|
| 6 |
Oxide Memristors for ReRAM: Approaches, Characteristics, and Structures
|
Isaev, A. G.
|
|
|
52 |
2 |
p. 74-98
|
artikel
|
| 7 |
Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture
|
Efremov, A. M.
|
|
|
52 |
2 |
p. 99-106
|
artikel
|
| 8 |
SEM Measurements of the Dimensions of Relief Structures in the Technological Process of Manufacturing Microcircuits
|
Novikov, Yu. A.
|
|
|
52 |
2 |
p. 35-42
|
artikel
|
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