nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Domain Wall Precession in a Narrow Magnetic Nanowire
|
Trushin, O. S. |
|
|
50 |
1 |
p. 69-73 |
artikel |
2 |
Effect of a Mixture’s Composition on the Electrophysical Parameters and Emission Spectra of Hydrogen Chloride Plasma with Chlorine and Helium
|
Pivovarenok, S. A. |
|
|
50 |
1 |
p. 39-44 |
artikel |
3 |
Effect of Process-Related Impurities on the Electrophysical Parameters of a MOS Transistor
|
Odzhaev, V. B. |
|
|
50 |
1 |
p. 63-68 |
artikel |
4 |
Experimental Study of the Influence of the Porosity of Thin-Film Silicon-Based Anodes on Their Charge-Discharge Characteristics
|
Kulova, T. L. |
|
|
50 |
1 |
p. 45-53 |
artikel |
5 |
Influence of Deposition Conditions and Ion-Plasma Treatment of Thin Cobalt Films on Their Electrical Resistivity
|
Amirov, I. I. |
|
|
50 |
1 |
p. 1-7 |
artikel |
6 |
Influence of Resist Spreading during Its Dry Electron-Beam Etching on a Lateral Resolution
|
Isaev, A. G. |
|
|
50 |
1 |
p. 19-23 |
artikel |
7 |
Kinetics of the Volumetric and Heterogeneous Processes in the Plasma of a C4F8 + O2 + Ar Mixture
|
Efremov, A. M. |
|
|
50 |
1 |
p. 24-32 |
artikel |
8 |
Metallization of Vias in Silicon Wafers to Produce Three-Dimensional Microstructures
|
Vorobjova, A. I. |
|
|
50 |
1 |
p. 8-18 |
artikel |
9 |
Modification of Diazoquinone-Novolac Photoresist Films by the Implantation of Antimony Ions
|
Brinkevich, S. D. |
|
|
50 |
1 |
p. 33-38 |
artikel |
10 |
Numerical Simulation of Cryogenic Etching: Model with Delayed Desorption
|
Rudenko, M. K. |
|
|
50 |
1 |
p. 54-62 |
artikel |