| no |
title |
author |
magazine |
year |
volume |
issue |
page(s) |
type |
| 1 |
Domain Wall Precession in a Narrow Magnetic Nanowire
|
Trushin, O. S.
|
|
|
50 |
1 |
p. 69-73
|
article
|
| 2 |
Effect of a Mixture’s Composition on the Electrophysical Parameters and Emission Spectra of Hydrogen Chloride Plasma with Chlorine and Helium
|
Pivovarenok, S. A.
|
|
|
50 |
1 |
p. 39-44
|
article
|
| 3 |
Effect of Process-Related Impurities on the Electrophysical Parameters of a MOS Transistor
|
Odzhaev, V. B.
|
|
|
50 |
1 |
p. 63-68
|
article
|
| 4 |
Experimental Study of the Influence of the Porosity of Thin-Film Silicon-Based Anodes on Their Charge-Discharge Characteristics
|
Kulova, T. L.
|
|
|
50 |
1 |
p. 45-53
|
article
|
| 5 |
Influence of Deposition Conditions and Ion-Plasma Treatment of Thin Cobalt Films on Their Electrical Resistivity
|
Amirov, I. I.
|
|
|
50 |
1 |
p. 1-7
|
article
|
| 6 |
Influence of Resist Spreading during Its Dry Electron-Beam Etching on a Lateral Resolution
|
Isaev, A. G.
|
|
|
50 |
1 |
p. 19-23
|
article
|
| 7 |
Kinetics of the Volumetric and Heterogeneous Processes in the Plasma of a C4F8 + O2 + Ar Mixture
|
Efremov, A. M.
|
|
|
50 |
1 |
p. 24-32
|
article
|
| 8 |
Metallization of Vias in Silicon Wafers to Produce Three-Dimensional Microstructures
|
Vorobjova, A. I.
|
|
|
50 |
1 |
p. 8-18
|
article
|
| 9 |
Modification of Diazoquinone-Novolac Photoresist Films by the Implantation of Antimony Ions
|
Brinkevich, S. D.
|
|
|
50 |
1 |
p. 33-38
|
article
|
| 10 |
Numerical Simulation of Cryogenic Etching: Model with Delayed Desorption
|
Rudenko, M. K.
|
|
|
50 |
1 |
p. 54-62
|
article
|
Journal description