nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
An improved OM-CVD growth model for III–V semiconductors—Metalorganic halides for the CVD growth
|
Prakash, Hari |
|
1986 |
12 |
1-4 |
p. 265-269 5 p. |
artikel |
2 |
Characterization and kinetics of AlxGa1−x As by organometallic-CVD
|
Prakash, Hari |
|
1986 |
12 |
1-4 |
p. 243-256 14 p. |
artikel |
3 |
Compound index
|
|
|
1986 |
12 |
1-4 |
p. 341-342 2 p. |
artikel |
4 |
Editorial
|
Pamplin, Brian |
|
1986 |
12 |
1-4 |
p. vii- 1 p. |
artikel |
5 |
Editorial Board
|
|
|
1986 |
12 |
1-4 |
p. ii- 1 p. |
artikel |
6 |
Epitaxial growth of InP and related alloys
|
Sharma, B.L. |
|
1986 |
12 |
1-4 |
p. 295-318 24 p. |
artikel |
7 |
Gas source molecular beam epitaxy of InP, GaInAs and GaInAsP
|
Panish, M.B. |
|
1986 |
12 |
1-4 |
p. 1-28 28 p. |
artikel |
8 |
Implanted silicon epitaxy by thermal and laser processing
|
Campisano, Salvatore Ugo |
|
1986 |
12 |
1-4 |
p. 67-95 29 p. |
artikel |
9 |
Liquid phase electroepitaxy of semiconductor compounds
|
Bryskiewicz, T. |
|
1986 |
12 |
1-4 |
p. 29-43 15 p. |
artikel |
10 |
LPE growth of InGaAs/InP and AiGaInAs/InP structures
|
Nakajima, Kazuo |
|
1986 |
12 |
1-4 |
p. 97-213 117 p. |
artikel |
11 |
LPE growth of InP and related alloys
|
Nagai, Haruo |
|
1986 |
12 |
1-4 |
p. 271-294 24 p. |
artikel |
12 |
LPE of buried heterostructure laser devices
|
Logan, R.A. |
|
1986 |
12 |
1-4 |
p. 215-242 28 p. |
artikel |
13 |
MOCVD AlxGa1−x As solar cells
|
Prakash, Hari |
|
1986 |
12 |
1-4 |
p. 257-264 8 p. |
artikel |
14 |
MO-CVD growth of InGaAs using Me3Ga, AsMe3, AsH3 and Me3In or Et3In and analyses of adducts formed during the growth process
|
Cheng, C.H. |
|
1986 |
12 |
1-4 |
p. 319-333 15 p. |
artikel |
15 |
Preface
|
Bachrach, Robert Z. |
|
1986 |
12 |
1-4 |
p. ix-x nvt p. |
artikel |
16 |
Silicon molecular beam epitaxy
|
Shiraki, Yasuhiro |
|
1986 |
12 |
1-4 |
p. 45-66 22 p. |
artikel |
17 |
Subject index
|
|
|
1986 |
12 |
1-4 |
p. 335-339 5 p. |
artikel |