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                                       Details for article 14 of 17 found articles
 
 
  MO-CVD growth of InGaAs using Me3Ga, AsMe3, AsH3 and Me3In or Et3In and analyses of adducts formed during the growth process
 
 
Title: MO-CVD growth of InGaAs using Me3Ga, AsMe3, AsH3 and Me3In or Et3In and analyses of adducts formed during the growth process
Author: Cheng, C.H.
Jones, K.A.
Motyl, K.M.
Appeared in: Progress in crystal growth and characterization
Paging: Volume 12 (1986) nr. 1-4 pages 15 p.
Year: 1986
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 14 of 17 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands