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                             44 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A brief review of dual-frequency capacitively coupled discharges Bi, Zhen-hua
2011
11 5S p. S2-S8
7 p.
artikel
2 Annealing of aluminum wire with radio frequency discharge plasma under atmospheric pressure Ye, Rubin
2011
11 5S p. S21-S25
5 p.
artikel
3 A study on the dry etching characteristics of indium gallium zinc oxide and molybdenum by the CCP-RIE system for the 4 mask process Shin, Dong-Chae
2011
11 5S p. S45-S48
4 p.
artikel
4 Atmospheric pressure microplasma source based on parallel stripline resonator Tran, T.H.
2011
11 5S p. S126-S130
5 p.
artikel
5 Beam Characteristics Study for the KSTAR neutral beam long pulse ion source Kim, Tae-Seong
2011
11 5S p. S145-S148
4 p.
artikel
6 Characterisation of an RF power splitter for multi-tile PECVD systems application Michna, T.
2011
11 5S p. S9-S11
3 p.
artikel
7 Characteristics of discharged sea water generated by underwater plasma system Ryu, S.M.
2011
11 5S p. S87-S93
7 p.
artikel
8 Characterization of pulse-driven gas-liquid interfacial discharge plasmas and application to synthesis of gold nanoparticle-DNA encapsulated carbon nanotubes Chen, Qiang
2011
11 5S p. S63-S66
4 p.
artikel
9 Decomposition of polyethylene using argon based radio-frequency steam plasma Sung, Ta-Lun
2011
11 5S p. S26-S29
4 p.
artikel
10 Development of high density plasma assisted sputtering source for high growth rate deposition process Kim, Do-Geun
2011
11 5S p. S169-S171
3 p.
artikel
11 Diffusion at interfaces of micro thermoelectric devices Bae, Nam-Ho
2011
11 5S p. S40-S44
5 p.
artikel
12 Dissociation fraction in low-pressure inductively coupled N2–Ar and O2–Ar plasmas Lee, Young Wook
2011
11 5S p. S187-S191
5 p.
artikel
13 Editorial Board 2011
11 5S p. IFC-
1 p.
artikel
14 Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films Kim, Youn J.
2011
11 5S p. S54-S57
4 p.
artikel
15 Effect of ammonia (NH3) plasma treatment on silicon nitride (SiNx) gate dielectric for organic thin film transistor with soluble organic semiconductor Kim, DongWoo
2011
11 5S p. S67-S72
6 p.
artikel
16 Effect of sputtering parameters on the adhesion force of copper/molybdenum metal on polymer substrate Lee, Sang-Hyuk
2011
11 5S p. S12-S15
4 p.
artikel
17 Effect of the electrode work function on the water plasma breakdown voltage Miron, C.
2011
11 5S p. S154-S158
5 p.
artikel
18 E–H mode transition in inductively coupled plasma using Ar, O2, N2, and mixture gas Lee, Jung-Kyu
2011
11 5S p. S149-S153
5 p.
artikel
19 Electrical characterization of a-axis oriented Y123 thin film grown using pulsed laser deposition Saini, S.
2011
11 5S p. S79-S81
3 p.
artikel
20 Electron interactions with plasma processing gases – Progress of magnetized electron-impact total cross section measurement system(ELECS-1) Kim, Dae Chul
2011
11 5S p. S192-S194
3 p.
artikel
21 Fabrication and characterization GDC electrolyte thin films by e-beam technique for IT-SOFC Hong, Y.S.
2011
11 5S p. S163-S168
6 p.
artikel
22 Fabrication of multi-level switching phase change nano-pillar device using InSe/GeSbTe stacked structure Hong, Sung-Hoon
2011
11 5S p. S16-S20
5 p.
artikel
23 Influence of temperature and pressure on solute decomposition efficiency by microwave-excited plasma Saito, R.
2011
11 5S p. S195-S198
4 p.
artikel
24 Ion emission and electric field characteristics in the liquid metal ion source with a new suppressor electrode Cho, Byeong Seong
2011
11 5S p. S172-S176
5 p.
artikel
25 Iron reduction process using transferred plasma Choi, Min Sik
2011
11 5S p. S82-S86
5 p.
artikel
26 Light and bias stability of a-IGZO TFT fabricated by r.f. magnetron sputtering Huh, Jun-Young
2011
11 5S p. S49-S53
5 p.
artikel
27 Measurement of excitation temperature and electron density in capillary Z-pinch argon plasma Park, Byungjae
2011
11 5S p. S159-S162
4 p.
artikel
28 Measurement of extreme ultraviolet light and electron temperature for a dense plasmas from hypocycloidal pinch device Hong, Young June
2011
11 5S p. S177-S181
5 p.
artikel
29 Numerical analysis on a thermal plasma reactor for HFC-23 treatment Choi, Sooseok
2011
11 5S p. S94-S98
5 p.
artikel
30 PIC simulation of RF hydrogen discharges in a transverse magnetic field Bai, Jing
2011
11 5S p. S140-S144
5 p.
artikel
31 Preparation of magnetic nanowires modified with functional groups Kalska-Szostko, B.
2011
11 5S p. S103-S108
6 p.
artikel
32 Redox reactions in liquid plasma during iron oxide and oxide-hydroxide nanoparticles synthesis Bratescu, M.A.
2011
11 5S p. S30-S34
5 p.
artikel
33 Spatial structure of plasma potential oscillation and ion saturation current in VHF multi-tile electrode plasma source Ryan, Kevin
2011
11 5S p. S114-S116
3 p.
artikel
34 Stability analysis of multi-phase AC arc discharge for in-flight glass melting Tanaka, Manabu
2011
11 5S p. S35-S39
5 p.
artikel
35 Study of an experimental system for hydrogen permeation in thin-solid materials for fusion plasma research Lee, S.K.
2011
11 5S p. S99-S102
4 p.
artikel
36 Study of the dust removal efficiency in capacitively coupled plasmas with annular electrodes Xu, Xiang
2011
11 5S p. S131-S134
4 p.
artikel
37 Study on mechanism of etching in low pressure radio-frequency plasmas Dai, Zhong-Ling
2011
11 5S p. S121-S125
5 p.
artikel
38 Study on the glow discharge in the atmospheric pressure Liu, Wenzheng
2011
11 5S p. S117-S120
4 p.
artikel
39 Surface morphological evolution of crystalline Si during chemical dry etching using F radicals and NO gas Ahn, J.H.
2011
11 5S p. S73-S78
6 p.
artikel
40 Surface treatment for Cu metallization on polyimide film by atmospheric pressure dielectric barrier discharge plasma system Cho, Sang-Jin
2011
11 5S p. S135-S139
5 p.
artikel
41 The proceeding of the 10th Asia-Pacific Conference on Plasma Science and Technology (APCPST) and the 23rd Symposium on Plasma Science for Materials (SPSM) Choi, Chi Kyu
2011
11 5S p. S1-
1 p.
artikel
42 Treatment of toluene by using adsorption and nonthermal plasma oxidation process Mok, Y.S.
2011
11 5S p. S58-S62
5 p.
artikel
43 Tribological effects of pores on an anodized Al alloy surface as lubricant reservoir Lee, Gyu-Sun
2011
11 5S p. S182-S186
5 p.
artikel
44 UV irradiation effects on the bonding structure and electrical properties of ultra low-k SiOC(–H) thin films for 45 nm technology node Choi, Chi Kyu
2011
11 5S p. S109-S113
5 p.
artikel
                             44 gevonden resultaten
 
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