nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A brief review of dual-frequency capacitively coupled discharges
|
Bi, Zhen-hua |
|
2011 |
11 |
5S |
p. S2-S8 7 p. |
artikel |
2 |
Annealing of aluminum wire with radio frequency discharge plasma under atmospheric pressure
|
Ye, Rubin |
|
2011 |
11 |
5S |
p. S21-S25 5 p. |
artikel |
3 |
A study on the dry etching characteristics of indium gallium zinc oxide and molybdenum by the CCP-RIE system for the 4 mask process
|
Shin, Dong-Chae |
|
2011 |
11 |
5S |
p. S45-S48 4 p. |
artikel |
4 |
Atmospheric pressure microplasma source based on parallel stripline resonator
|
Tran, T.H. |
|
2011 |
11 |
5S |
p. S126-S130 5 p. |
artikel |
5 |
Beam Characteristics Study for the KSTAR neutral beam long pulse ion source
|
Kim, Tae-Seong |
|
2011 |
11 |
5S |
p. S145-S148 4 p. |
artikel |
6 |
Characterisation of an RF power splitter for multi-tile PECVD systems application
|
Michna, T. |
|
2011 |
11 |
5S |
p. S9-S11 3 p. |
artikel |
7 |
Characteristics of discharged sea water generated by underwater plasma system
|
Ryu, S.M. |
|
2011 |
11 |
5S |
p. S87-S93 7 p. |
artikel |
8 |
Characterization of pulse-driven gas-liquid interfacial discharge plasmas and application to synthesis of gold nanoparticle-DNA encapsulated carbon nanotubes
|
Chen, Qiang |
|
2011 |
11 |
5S |
p. S63-S66 4 p. |
artikel |
9 |
Decomposition of polyethylene using argon based radio-frequency steam plasma
|
Sung, Ta-Lun |
|
2011 |
11 |
5S |
p. S26-S29 4 p. |
artikel |
10 |
Development of high density plasma assisted sputtering source for high growth rate deposition process
|
Kim, Do-Geun |
|
2011 |
11 |
5S |
p. S169-S171 3 p. |
artikel |
11 |
Diffusion at interfaces of micro thermoelectric devices
|
Bae, Nam-Ho |
|
2011 |
11 |
5S |
p. S40-S44 5 p. |
artikel |
12 |
Dissociation fraction in low-pressure inductively coupled N2–Ar and O2–Ar plasmas
|
Lee, Young Wook |
|
2011 |
11 |
5S |
p. S187-S191 5 p. |
artikel |
13 |
Editorial Board
|
|
|
2011 |
11 |
5S |
p. IFC- 1 p. |
artikel |
14 |
Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films
|
Kim, Youn J. |
|
2011 |
11 |
5S |
p. S54-S57 4 p. |
artikel |
15 |
Effect of ammonia (NH3) plasma treatment on silicon nitride (SiNx) gate dielectric for organic thin film transistor with soluble organic semiconductor
|
Kim, DongWoo |
|
2011 |
11 |
5S |
p. S67-S72 6 p. |
artikel |
16 |
Effect of sputtering parameters on the adhesion force of copper/molybdenum metal on polymer substrate
|
Lee, Sang-Hyuk |
|
2011 |
11 |
5S |
p. S12-S15 4 p. |
artikel |
17 |
Effect of the electrode work function on the water plasma breakdown voltage
|
Miron, C. |
|
2011 |
11 |
5S |
p. S154-S158 5 p. |
artikel |
18 |
E–H mode transition in inductively coupled plasma using Ar, O2, N2, and mixture gas
|
Lee, Jung-Kyu |
|
2011 |
11 |
5S |
p. S149-S153 5 p. |
artikel |
19 |
Electrical characterization of a-axis oriented Y123 thin film grown using pulsed laser deposition
|
Saini, S. |
|
2011 |
11 |
5S |
p. S79-S81 3 p. |
artikel |
20 |
Electron interactions with plasma processing gases – Progress of magnetized electron-impact total cross section measurement system(ELECS-1)
|
Kim, Dae Chul |
|
2011 |
11 |
5S |
p. S192-S194 3 p. |
artikel |
21 |
Fabrication and characterization GDC electrolyte thin films by e-beam technique for IT-SOFC
|
Hong, Y.S. |
|
2011 |
11 |
5S |
p. S163-S168 6 p. |
artikel |
22 |
Fabrication of multi-level switching phase change nano-pillar device using InSe/GeSbTe stacked structure
|
Hong, Sung-Hoon |
|
2011 |
11 |
5S |
p. S16-S20 5 p. |
artikel |
23 |
Influence of temperature and pressure on solute decomposition efficiency by microwave-excited plasma
|
Saito, R. |
|
2011 |
11 |
5S |
p. S195-S198 4 p. |
artikel |
24 |
Ion emission and electric field characteristics in the liquid metal ion source with a new suppressor electrode
|
Cho, Byeong Seong |
|
2011 |
11 |
5S |
p. S172-S176 5 p. |
artikel |
25 |
Iron reduction process using transferred plasma
|
Choi, Min Sik |
|
2011 |
11 |
5S |
p. S82-S86 5 p. |
artikel |
26 |
Light and bias stability of a-IGZO TFT fabricated by r.f. magnetron sputtering
|
Huh, Jun-Young |
|
2011 |
11 |
5S |
p. S49-S53 5 p. |
artikel |
27 |
Measurement of excitation temperature and electron density in capillary Z-pinch argon plasma
|
Park, Byungjae |
|
2011 |
11 |
5S |
p. S159-S162 4 p. |
artikel |
28 |
Measurement of extreme ultraviolet light and electron temperature for a dense plasmas from hypocycloidal pinch device
|
Hong, Young June |
|
2011 |
11 |
5S |
p. S177-S181 5 p. |
artikel |
29 |
Numerical analysis on a thermal plasma reactor for HFC-23 treatment
|
Choi, Sooseok |
|
2011 |
11 |
5S |
p. S94-S98 5 p. |
artikel |
30 |
PIC simulation of RF hydrogen discharges in a transverse magnetic field
|
Bai, Jing |
|
2011 |
11 |
5S |
p. S140-S144 5 p. |
artikel |
31 |
Preparation of magnetic nanowires modified with functional groups
|
Kalska-Szostko, B. |
|
2011 |
11 |
5S |
p. S103-S108 6 p. |
artikel |
32 |
Redox reactions in liquid plasma during iron oxide and oxide-hydroxide nanoparticles synthesis
|
Bratescu, M.A. |
|
2011 |
11 |
5S |
p. S30-S34 5 p. |
artikel |
33 |
Spatial structure of plasma potential oscillation and ion saturation current in VHF multi-tile electrode plasma source
|
Ryan, Kevin |
|
2011 |
11 |
5S |
p. S114-S116 3 p. |
artikel |
34 |
Stability analysis of multi-phase AC arc discharge for in-flight glass melting
|
Tanaka, Manabu |
|
2011 |
11 |
5S |
p. S35-S39 5 p. |
artikel |
35 |
Study of an experimental system for hydrogen permeation in thin-solid materials for fusion plasma research
|
Lee, S.K. |
|
2011 |
11 |
5S |
p. S99-S102 4 p. |
artikel |
36 |
Study of the dust removal efficiency in capacitively coupled plasmas with annular electrodes
|
Xu, Xiang |
|
2011 |
11 |
5S |
p. S131-S134 4 p. |
artikel |
37 |
Study on mechanism of etching in low pressure radio-frequency plasmas
|
Dai, Zhong-Ling |
|
2011 |
11 |
5S |
p. S121-S125 5 p. |
artikel |
38 |
Study on the glow discharge in the atmospheric pressure
|
Liu, Wenzheng |
|
2011 |
11 |
5S |
p. S117-S120 4 p. |
artikel |
39 |
Surface morphological evolution of crystalline Si during chemical dry etching using F radicals and NO gas
|
Ahn, J.H. |
|
2011 |
11 |
5S |
p. S73-S78 6 p. |
artikel |
40 |
Surface treatment for Cu metallization on polyimide film by atmospheric pressure dielectric barrier discharge plasma system
|
Cho, Sang-Jin |
|
2011 |
11 |
5S |
p. S135-S139 5 p. |
artikel |
41 |
The proceeding of the 10th Asia-Pacific Conference on Plasma Science and Technology (APCPST) and the 23rd Symposium on Plasma Science for Materials (SPSM)
|
Choi, Chi Kyu |
|
2011 |
11 |
5S |
p. S1- 1 p. |
artikel |
42 |
Treatment of toluene by using adsorption and nonthermal plasma oxidation process
|
Mok, Y.S. |
|
2011 |
11 |
5S |
p. S58-S62 5 p. |
artikel |
43 |
Tribological effects of pores on an anodized Al alloy surface as lubricant reservoir
|
Lee, Gyu-Sun |
|
2011 |
11 |
5S |
p. S182-S186 5 p. |
artikel |
44 |
UV irradiation effects on the bonding structure and electrical properties of ultra low-k SiOC(–H) thin films for 45 nm technology node
|
Choi, Chi Kyu |
|
2011 |
11 |
5S |
p. S109-S113 5 p. |
artikel |