nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A comparison between the irradiation damage response of spinel and zirconia due to Xe ion bombardment
|
E. Sickafus, Kurt |
|
1998 |
253 |
1-2 |
p. 78-85 8 p. |
artikel |
2 |
Amorphization of ceramic materials by ion beam irradiation
|
Wang, L.M. |
|
1998 |
253 |
1-2 |
p. 106-113 8 p. |
artikel |
3 |
Amorphization of the silicon substrate and stress-relaxation in HfN films bombarded with Au ions
|
Nowak, R |
|
1998 |
253 |
1-2 |
p. 328-336 9 p. |
artikel |
4 |
A new approach to thermal-spike sputtering with ions and laser pulses
|
Kelly, Roger |
|
1998 |
253 |
1-2 |
p. 178-193 16 p. |
artikel |
5 |
Climb of dislocations in GaAs by irradiation
|
Yonenaga, I. |
|
1998 |
253 |
1-2 |
p. 148-150 3 p. |
artikel |
6 |
Comparison of implantation with Ni2+ and Au2+ ions on the indentation response of sapphire
|
Nowak, R. |
|
1998 |
253 |
1-2 |
p. 167-177 11 p. |
artikel |
7 |
Critical issues in ion implantation of silicon below 5 keV: Defects and diffusion
|
Agarwal, Aditya |
|
1998 |
253 |
1-2 |
p. 269-274 6 p. |
artikel |
8 |
Editorial
|
|
|
1998 |
253 |
1-2 |
p. XI-XII nvt p. |
artikel |
9 |
Effect of nitrogen ion-implantation on the tribological properties and hardness of TiN films
|
Manory, R.R. |
|
1998 |
253 |
1-2 |
p. 319-327 9 p. |
artikel |
10 |
Formation of polycrystalline β-FeSi2 layers by ion-implantation and their optical properties
|
Kakemoto, Hirofumi |
|
1998 |
253 |
1-2 |
p. 284-291 8 p. |
artikel |
11 |
Formation of Si3N4 and SiC composite by nitrogen implantation
|
Miyagawa, S. |
|
1998 |
253 |
1-2 |
p. 143-147 5 p. |
artikel |
12 |
Implantation damage and epitaxial regrowth of silicon studied by differential reflectometry
|
Hummel, R.E. |
|
1998 |
253 |
1-2 |
p. 50-61 12 p. |
artikel |
13 |
Index
|
|
|
1998 |
253 |
1-2 |
p. 338-341 4 p. |
artikel |
14 |
Index
|
|
|
1998 |
253 |
1-2 |
p. 337- 1 p. |
artikel |
15 |
Ion beam deposition and surface characterization of thin multi-component oxide films during growth 1 Invited paper presented at the Engineering Conference on Ion Beam Surface Modification of Ceramics, Il Ciocco, Italy, May 19–23, 1997. 1
|
Krauss, A.R. |
|
1998 |
253 |
1-2 |
p. 221-233 13 p. |
artikel |
16 |
Ion beam modification of ceramics
|
McHargue, Carl J. |
|
1998 |
253 |
1-2 |
p. 94-105 12 p. |
artikel |
17 |
Ion beam modification of solids: towards intelligent materials
|
Takagi, Toshinori |
|
1998 |
253 |
1-2 |
p. 30-41 12 p. |
artikel |
18 |
Ion implantation as a tool in the synthesis of practical third-order nonlinear optical materials
|
Haglund Jr., Richard F. |
|
1998 |
253 |
1-2 |
p. 275-283 9 p. |
artikel |
19 |
Ion implantation of semiconductors
|
Williams, J.S. |
|
1998 |
253 |
1-2 |
p. 8-15 8 p. |
artikel |
20 |
Low-energy nitrogen-ion doping into GaAs and its optical properties
|
Shima, Takayuki |
|
1998 |
253 |
1-2 |
p. 301-305 5 p. |
artikel |
21 |
Measurement of mechanical properties by ultra-low load indentation
|
Pharr, G.M. |
|
1998 |
253 |
1-2 |
p. 151-159 9 p. |
artikel |
22 |
Mechanical property characterisation of small volumes of brittle materials with spherical tipped indenters
|
Swain, M.V. |
|
1998 |
253 |
1-2 |
p. 160-166 7 p. |
artikel |
23 |
Mechanisms of ion beam induced atomic mixing in solids
|
Bolse, Wolfgang |
|
1998 |
253 |
1-2 |
p. 194-201 8 p. |
artikel |
24 |
Metastable materials formation by ion beam assisted deposition: application to metal clusters in ceramic matrices
|
Hubler, G.K. |
|
1998 |
253 |
1-2 |
p. 212-220 9 p. |
artikel |
25 |
Microstructural changes in ion implanted titanium nitride
|
Perry, Anthony J |
|
1998 |
253 |
1-2 |
p. 310-318 9 p. |
artikel |
26 |
Microstructure and composition of titanium nitride formed by ion beam enhanced nitrogen sorption of evaporated titanium under argon ion irradiation
|
Ensinger, W |
|
1998 |
253 |
1-2 |
p. 234-239 6 p. |
artikel |
27 |
Modification of silicon nitride ceramics with high intensity pulsed ion beams
|
Brenscheidt, F. |
|
1998 |
253 |
1-2 |
p. 86-93 8 p. |
artikel |
28 |
Modified structure of sapphire with 51V ion implantation followed by thermal annealing
|
Naramoto, Hiroshi |
|
1998 |
253 |
1-2 |
p. 114-120 7 p. |
artikel |
29 |
Nanometer-size dispersions of iron in sapphire prepared by ion implantation and annealing
|
McHargue, C.J. |
|
1998 |
253 |
1-2 |
p. 1-7 7 p. |
artikel |
30 |
Nitride layers formed by nitrogen implantation into metals
|
Miyagawa, Y. |
|
1998 |
253 |
1-2 |
p. 135-142 8 p. |
artikel |
31 |
Non-linear processes in the gas cluster ion beam modification of solid surfaces
|
Yamada, I |
|
1998 |
253 |
1-2 |
p. 249-257 9 p. |
artikel |
32 |
Optical and electrical properties of Si+ ion-implanted GaAs
|
Shima, T |
|
1998 |
253 |
1-2 |
p. 306-309 4 p. |
artikel |
33 |
Potassium niobate waveguides: He+ implantation in bulk single crystals and pulsed laser deposition of thin films
|
Beckers, L |
|
1998 |
253 |
1-2 |
p. 292-295 4 p. |
artikel |
34 |
Radiation response of FeTiO3, MgTiO3, and α-Al2O3
|
Devanathan, R. |
|
1998 |
253 |
1-2 |
p. 131-134 4 p. |
artikel |
35 |
Relaxation phenomena in keV-ion implanted hydrogenated amorphous silicon carbide
|
Musumeci, P |
|
1998 |
253 |
1-2 |
p. 296-300 5 p. |
artikel |
36 |
Semiconductor processing by plasma immersion ion implantation
|
Ensinger, W. |
|
1998 |
253 |
1-2 |
p. 258-268 11 p. |
artikel |
37 |
Stress, hydration, and optical absorption in ion-implanted aluminum oxide
|
Arnold, G.W. |
|
1998 |
253 |
1-2 |
p. 71-77 7 p. |
artikel |
38 |
Structure and properties of ion-beam-modified (6H) silicon carbide
|
Weber, W.J. |
|
1998 |
253 |
1-2 |
p. 62-70 9 p. |
artikel |
39 |
Tailoring of the properties of ferrites by latent track production
|
Costantini, J.M. |
|
1998 |
253 |
1-2 |
p. 121-130 10 p. |
artikel |
40 |
The influence of stress during ion beam mixing
|
Nastasi, M. |
|
1998 |
253 |
1-2 |
p. 202-211 10 p. |
artikel |
41 |
The role of defect excesses in damage formation in Si during ion implantation at elevated temperature
|
Holland, O.W. |
|
1998 |
253 |
1-2 |
p. 240-248 9 p. |
artikel |
42 |
The role of defects during amorphization and crystallization processes in ion implanted Si
|
Motooka, T. |
|
1998 |
253 |
1-2 |
p. 42-49 8 p. |
artikel |
43 |
Topological modeling of cascade amorphization in network structures using local rules
|
Hobbs, Linn W. |
|
1998 |
253 |
1-2 |
p. 16-29 14 p. |
artikel |