nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A coating thickness uniformity model for physical vapour deposition systems—further validity tests
|
Fancey, K.S. |
|
1991 |
140 |
C |
p. 576-582 7 p. |
artikel |
2 |
A comparative study of the corrosion performance of TiN, Ti(B,N) and (Ti,Al)N coatings produced by physical vapour deposition methods
|
Aromaa, J. |
|
1991 |
140 |
C |
p. 722-726 5 p. |
artikel |
3 |
A comparison of the corrosion behaviour and hardness of steel samples (100Cr6) coated with titanium nitride and chromium nitride by different institutions using different deposition techniques
|
Schröer, A. |
|
1991 |
140 |
C |
p. 625-630 6 p. |
artikel |
4 |
Amorphous and crystalline phases in PVD coatings after laser treatment
|
Knotek, O. |
|
1991 |
140 |
C |
p. 655-659 5 p. |
artikel |
5 |
An investigation into the effects of plasma bombardment anisotropy in low frequency r.f. glow discharges
|
James, A.S. |
|
1991 |
140 |
C |
p. 517-522 6 p. |
artikel |
6 |
Application of ion nitriding to wire-electrical-discharge-machined blanking dies
|
Sone, T. |
|
1991 |
140 |
C |
p. 486-493 8 p. |
artikel |
7 |
A review of the methods for the evaluation of coating-substrate adhesion
|
Chalker, P.R. |
|
1991 |
140 |
C |
p. 583-592 10 p. |
artikel |
8 |
Author index of vols. 139 and 140
|
|
|
1991 |
140 |
C |
p. 842-844 3 p. |
artikel |
9 |
Averaging effect of radical particle profile by the scanning plasma method in SiH4Ar plasmas
|
Fujiyama, Hiroshi |
|
1991 |
140 |
C |
p. 569-575 7 p. |
artikel |
10 |
Cathodic arc deposition of diamond-like carbon: effect of bias voltage and deposition angle
|
Rother, B. |
|
1991 |
140 |
C |
p. 780-783 4 p. |
artikel |
11 |
Cathodic arc deposition of TiN and Zr(C, N) at low substrate temperature using a pulsed bias voltage
|
Fessmann, J. |
|
1991 |
140 |
C |
p. 830-837 8 p. |
artikel |
12 |
Characterization of remote plasma-enhanced chemical vapour deposition processes
|
Kulisch, W. |
|
1991 |
140 |
C |
p. 715-721 7 p. |
artikel |
13 |
Characterization of surface chromium and molybdenum alloying on gray cast iron obtained by the plasma-transferred arc technique
|
Giordano, L. |
|
1991 |
140 |
C |
p. 727-732 6 p. |
artikel |
14 |
Characterization of TiN coatings deposited on plasma nitrided tool steel surfaces
|
Van Stappen, M. |
|
1991 |
140 |
C |
p. 554-562 9 p. |
artikel |
15 |
Deposition and properties of diamond thin films
|
Klages, Claus-Peter |
|
1991 |
140 |
C |
p. 741-746 6 p. |
artikel |
16 |
Deposition of diamond-like carbon films by the anodic arc technique
|
Buck, V. |
|
1991 |
140 |
C |
p. 770-774 5 p. |
artikel |
17 |
Deposition of hard coatings by a hollow-cathode arc evaporation device
|
Lunk, A. |
|
1991 |
140 |
C |
p. 666-669 4 p. |
artikel |
18 |
Development of a large area sputter-coating method using a new magnetron discharge
|
Kuwahara, Kiyoshi |
|
1991 |
140 |
C |
p. 691-695 5 p. |
artikel |
19 |
Development of large area sputter-coating method using magnetized a.c. plasmas with inclined electrodes
|
Matsuda, Yoshinobu |
|
1991 |
140 |
C |
p. 563-568 6 p. |
artikel |
20 |
Dynamic interactions in the physical properties of magnetron deposition systems
|
Rossnagel, S.M. |
|
1991 |
140 |
C |
p. 510-516 7 p. |
artikel |
21 |
Evaluation of some new titanium-based ceramic coatings in tribological model wear and metal-cutting tests
|
Ronkainen, H. |
|
1991 |
140 |
C |
p. 602-608 7 p. |
artikel |
22 |
Formation of metallic coatings on non-heated substrates by the impulse plasma method
|
Zdunek, Krzysztof |
|
1991 |
140 |
C |
p. 709-714 6 p. |
artikel |
23 |
Formation of TiAl3 layer on titanium alloys
|
Kráľ, J. |
|
1991 |
140 |
C |
p. 479-485 7 p. |
artikel |
24 |
Formation of TiN layers by plasma-assisted chemical vapour deposition at temperatures greater than 823 K
|
Michalski, J. |
|
1991 |
140 |
C |
p. 499-504 6 p. |
artikel |
25 |
Forming of a grinding wheel using a dresser with brazed diamond film
|
Murakawa, Masao |
|
1991 |
140 |
C |
p. 759-763 5 p. |
artikel |
26 |
Fundamental properties and wear resistance of r.f.-sputtered TiB2 and Ti(B,N) coatings
|
Herr, W. |
|
1991 |
140 |
C |
p. 616-624 9 p. |
artikel |
27 |
High speed pipe inner coating using magnetron hollow-cathode discharge in a magnetic field
|
Kawasaki, H. |
|
1991 |
140 |
C |
p. 682-686 5 p. |
artikel |
28 |
Influence of deposition conditions on the adhesion of sputter-deposited WC(Co) films
|
Cavaleiro, A. |
|
1991 |
140 |
C |
p. 631-638 8 p. |
artikel |
29 |
Influence of pulsed d.c.-glow-discharge on the phase constitution of nitride layers during plasma nitrocarburizing of sintered materials
|
Rie, K.-T. |
|
1991 |
140 |
C |
p. 448-453 6 p. |
artikel |
30 |
Interaction of graphite with an energetic hydrogen isotope beam
|
Yamawaki, Michio |
|
1991 |
140 |
C |
p. 809-815 7 p. |
artikel |
31 |
Investigations of the structure of a-C:H films
|
Kleber, R. |
|
1991 |
140 |
C |
p. 775-779 5 p. |
artikel |
32 |
Ion-assisted deposition with a new plasma source
|
Matl, K. |
|
1991 |
140 |
C |
p. 523-527 5 p. |
artikel |
33 |
Manufacture of c-BN films with improved adhesion
|
Murakawa, M. |
|
1991 |
140 |
C |
p. 753-758 6 p. |
artikel |
34 |
Microstructure of diamond films near the interface with WC substrate
|
Takatsu, S. |
|
1991 |
140 |
C |
p. 747-752 6 p. |
artikel |
35 |
Microwave plasma apparatus for deposition of hydrogenated amorphous carbon layers
|
Hammer, K. |
|
1991 |
140 |
C |
p. 784-787 4 p. |
artikel |
36 |
Nitrogen microwave discharge as a source of excited neutral species for possible surface treatment
|
Chave, C. |
|
1991 |
140 |
C |
p. 494-498 5 p. |
artikel |
37 |
Physical vapour deposition of TiN hard coatings with additional electron beam heat treatment
|
Schulz, A. |
|
1991 |
140 |
C |
p. 639-646 8 p. |
artikel |
38 |
Plasma and particle flux characterization of the a-C:H deposition process by ion-assisted methods
|
Schaarschmidt, G. |
|
1991 |
140 |
C |
p. 788-794 7 p. |
artikel |
39 |
Plasma carburization of wear-resistant high chromium iron
|
Asano, I. |
|
1991 |
140 |
C |
p. 461-468 8 p. |
artikel |
40 |
Plasma heat treatment of steel: microstructure, properties and applications
|
Nitkiewicz, Z. |
|
1991 |
140 |
C |
p. 474-478 5 p. |
artikel |
41 |
Plasma impulse chemical vapour deposition—a novel technique for the production of high power laser mirrors
|
Segner, J. |
|
1991 |
140 |
C |
p. 733-740 8 p. |
artikel |
42 |
Plasma nitriding improvements of fatigue properties of nodular cast iron crankshafts
|
Tošić, M.M. |
|
1991 |
140 |
C |
p. 469-473 5 p. |
artikel |
43 |
Plasma nitriding in industry—problems, new solutions and limits
|
Grün, Reinar |
|
1991 |
140 |
C |
p. 435-441 7 p. |
artikel |
44 |
Plasma overcarburizing of chromium steels for hot working and wear applications
|
Souchard, J.P. |
|
1991 |
140 |
C |
p. 454-460 7 p. |
artikel |
45 |
Plasma surface engineering of low alloy steel
|
Sun, Y. |
|
1991 |
140 |
C |
p. 419-434 16 p. |
artikel |
46 |
Plasma synthesis of disperse oxide materials from disintegrated solutions
|
Tumanov, Y.N. |
|
1991 |
140 |
C |
p. 539-548 10 p. |
artikel |
47 |
Preparation and properties of metastable TiC/SiC PVD coatings for wear protection
|
Fella, R. |
|
1991 |
140 |
C |
p. 676-681 6 p. |
artikel |
48 |
Properties and performance of plasma-assisted physically vapor-deposited TiC coatings
|
Upadhya, K. |
|
1991 |
140 |
C |
p. 549-553 5 p. |
artikel |
49 |
Properties of composite layers produced on stainless steel under glow discharge conditions
|
Wierzchoń, T. |
|
1991 |
140 |
C |
p. 505-509 5 p. |
artikel |
50 |
Properties of sputtered stainless steel-nitrogen coatings and structural analogy with low temperature plasma nitrided layers of austenitic steels
|
Saker, A. |
|
1991 |
140 |
C |
p. 702-708 7 p. |
artikel |
51 |
Relations between plasma properties and properties of thin copper films produced by an anodic vacuum arc
|
Mausbach, M. |
|
1991 |
140 |
C |
p. 825-829 5 p. |
artikel |
52 |
Sputter deposition of wear-resistant coatings within the system ZrBN
|
Mitterer, C. |
|
1991 |
140 |
C |
p. 670-675 6 p. |
artikel |
53 |
Sputtered stainless steel-carbon coatings as a substitute for hard electrolytic chromium for potential applications in mechanics
|
Billard, A. |
|
1991 |
140 |
C |
p. 802-808 7 p. |
artikel |
54 |
Sputtering, deposition, and diffusion in ion-nitriding of an austenitic stainless steel
|
Ichii, Kazuo |
|
1991 |
140 |
C |
p. 442-447 6 p. |
artikel |
55 |
Structural and mechanical properties of niobium-containing amorphous hydrogenated carbon films (NbC:H)
|
Benndorf, C. |
|
1991 |
140 |
C |
p. 795-801 7 p. |
artikel |
56 |
Structure and properties of ion-plated aluminium bronze films
|
Zhuoming, Gu |
|
1991 |
140 |
C |
p. 687-690 4 p. |
artikel |
57 |
Subject index of vols. 139 and 140
|
|
|
1991 |
140 |
C |
p. 845-853 9 p. |
artikel |
58 |
The deposition of AgC:H films: a tool to understand the role of carbide-forming metals in the MeC:H deposition process
|
Thomas Harnack, J. |
|
1991 |
140 |
C |
p. 764-769 6 p. |
artikel |
59 |
The influence of the reactive gas flow on the properties of AIN sputter-deposited films
|
Janczak-Bienk, E. |
|
1991 |
140 |
C |
p. 696-701 6 p. |
artikel |
60 |
(TiAl)N advanced films prepared by arc process
|
Coll, B.F. |
|
1991 |
140 |
C |
p. 816-824 9 p. |
artikel |
61 |
TiC x N1 − x coatings by using the arc evaporation technique
|
Damond, E. |
|
1991 |
140 |
C |
p. 838-841 4 p. |
artikel |
62 |
TiN films created in close vicinity of transition from α-Ti(N) to δ-TiN x phase
|
Poulek, V. |
|
1991 |
140 |
C |
p. 660-665 6 p. |
artikel |
63 |
TiN plasma CVD coatings deposited by different excitation methods for the gas discharge
|
Freller, H. |
|
1991 |
140 |
C |
p. 534-538 5 p. |
artikel |
64 |
Tribological properties and wear behaviour of sputtered titanium-based hard coatings under sheet-metal-forming conditions
|
Matthes, B. |
|
1991 |
140 |
C |
p. 593-601 9 p. |
artikel |
65 |
Tribological properties of r.f.-sputtered titanium-based hard coatings and their behaviour under plastics-processing conditions
|
Paller, G. |
|
1991 |
140 |
C |
p. 647-654 8 p. |
artikel |
66 |
Two-phase TiC/TiB2 hard coatings
|
Holleck, H. |
|
1991 |
140 |
C |
p. 609-615 7 p. |
artikel |
67 |
Zirconia thin film deposition on silicon by reactive gas flow sputtering: the influence of low energy particle bombardment
|
Jung, T. |
|
1991 |
140 |
C |
p. 528-533 6 p. |
artikel |