nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Analysis of r.f.-sputtered TiB2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy
|
Lohmann, R. |
|
1991 |
139 |
C |
p. 259-263 5 p. |
artikel |
2 |
An electron cyclotron resonance plasma source
|
Lorenz, G. |
|
1991 |
139 |
C |
p. 302-306 5 p. |
artikel |
3 |
A new sputter process for hard coating of large machine parts at low temperatures
|
Hofmann, D. |
|
1991 |
139 |
C |
p. 290-293 4 p. |
artikel |
4 |
An XPS study of photoresist surfaces in SF6O2 r.f. plasmas
|
Coulon, J.F. |
|
1991 |
139 |
C |
p. 385-393 9 p. |
artikel |
5 |
Applications of ion-beam-assisted deposition
|
Colligon, J.S. |
|
1991 |
139 |
C |
p. 199-206 8 p. |
artikel |
6 |
A reactor for plasma polymerization on polymer films
|
Gerstenberg, K.W. |
|
1991 |
139 |
C |
p. 110-119 10 p. |
artikel |
7 |
Biocompatibility and corrosion resistance in biological media of hard ceramic coatings sputter deposited on metal implants
|
Sella, C. |
|
1991 |
139 |
C |
p. 49-57 9 p. |
artikel |
8 |
Biocompatibility of TiN preclinical and clinical investigations
|
Behrndt, H. |
|
1991 |
139 |
C |
p. 58-60 3 p. |
artikel |
9 |
Characteristics of ECR plasmas for weakly resonant conditions
|
Saigoh, Masao |
|
1991 |
139 |
C |
p. 307-311 5 p. |
artikel |
10 |
Characterization of electron cyclotron resonance process plasma and film deposition
|
Miyake, Shoji |
|
1991 |
139 |
C |
p. 294-301 8 p. |
artikel |
11 |
Characterization of microstructure and interfaces in TiCTiB2 coatings
|
Hilz, G. |
|
1991 |
139 |
C |
p. 268-275 8 p. |
artikel |
12 |
Characterization of TiN coatings prepared by ion-beam-enhanced deposition
|
Li, X.Y. |
|
1991 |
139 |
C |
p. 225-229 5 p. |
artikel |
13 |
Correlation of particle flux parameters with the properties of thin tungsten carbide films
|
Keller, G. |
|
1991 |
139 |
C |
p. 137-143 7 p. |
artikel |
14 |
Corrosion-resistant silica coatings obtained by plasma-assisted chemical vapour deposition
|
Bennett, M.J. |
|
1991 |
139 |
C |
p. 91-102 12 p. |
artikel |
15 |
D.c. magnetron sputtering of oxidation-resistant chromium and CrN films monitored by optical emission spectrometry
|
Benien, H. |
|
1991 |
139 |
C |
p. 126-131 6 p. |
artikel |
16 |
Development of coaxial ECR plasma source for tube inner coating
|
Shigemizu, Tetsuro |
|
1991 |
139 |
C |
p. 312-318 7 p. |
artikel |
17 |
Development of the quadrupole plasma chemical vapour deposition method for low temperature, high speed coating on an optical fibre
|
Kashima, Takeshi |
|
1991 |
139 |
C |
p. 79-84 6 p. |
artikel |
18 |
Editorial Board
|
|
|
1991 |
139 |
C |
p. iii- 1 p. |
artikel |
19 |
Effect of contamination on mechanical properties and adhesion of magnetron-sputtered TiN coatings on high speed steel substrates
|
Berg, S. |
|
1991 |
139 |
C |
p. 345-351 7 p. |
artikel |
20 |
Effect of process parameters on the atomic nitrogen concentration as measured by chemiluminescence in a post-discharge nitriding reactor
|
Falk, L. |
|
1991 |
139 |
C |
p. 132-136 5 p. |
artikel |
21 |
Electrical characterization of plasma-deposited hydrogenated amorphous carbon films
|
Hammer, P. |
|
1991 |
139 |
C |
p. 334-388 55 p. |
artikel |
22 |
Evidence for mixed-phase nanocrystalline boron nitride films
|
Gissler, W. |
|
1991 |
139 |
C |
p. 284-289 6 p. |
artikel |
23 |
Experimental study of a glow discharge electron source for soft X-ray spectroscopy
|
Legrand, P.B. |
|
1991 |
139 |
C |
p. 144-149 6 p. |
artikel |
24 |
Formation of intrinsic oxide layers by ion implantation of silicon and titanium in the low kiloelectronvolt regime
|
Oechsner, H. |
|
1991 |
139 |
C |
p. 214-219 6 p. |
artikel |
25 |
Growth kinetics and step coverage in plasma deposition of silicon dioxide from organosilicon compounds
|
Bourreau, C. |
|
1991 |
139 |
C |
p. 376-379 4 p. |
artikel |
26 |
High-thermal-resistant dielectric coating deposited by plasma polymerization
|
Tyczkowski, J. |
|
1991 |
139 |
C |
p. 120-125 6 p. |
artikel |
27 |
Hydrogen in plasma-enhanced chemical vapour deposition insulating films
|
Kelm, G. |
|
1991 |
139 |
C |
p. 401-407 7 p. |
artikel |
28 |
Improved magnetic behaviour of cobalt-based-alloy sputter-target material
|
Weigert, M. |
|
1991 |
139 |
C |
p. 359-363 5 p. |
artikel |
29 |
Influence of temperature on nitrogen ion implantation of Incoloy alloys 908 and 909
|
Xie, L |
|
1991 |
139 |
C |
p. 179-184 6 p. |
artikel |
30 |
Influence of the phase transformation of a metal on hollow cathode discharge characteristics
|
Simon, C. |
|
1991 |
139 |
C |
p. 29-32 4 p. |
artikel |
31 |
In situ diagnostics/spectroscopy
|
Griem, H.R. |
|
1991 |
139 |
C |
p. 1-5 5 p. |
artikel |
32 |
Insulation and passivation of three-dimensional substrates by plasma-CVD thin films using silicon-organic compounds
|
Peters, D. |
|
1991 |
139 |
C |
p. 380-384 5 p. |
artikel |
33 |
Interface problems in metallurgical coatings
|
Navinšek, B. |
|
1991 |
139 |
C |
p. 249-258 10 p. |
artikel |
34 |
Investigation and modification of free and adsorbate-covered surfaces by scanning tunneling microscopy
|
Eng, L.M. |
|
1991 |
139 |
C |
p. 230-238 9 p. |
artikel |
35 |
Langmuir probe plasma diagnostics during TiN x deposition
|
Lunk, A. |
|
1991 |
139 |
C |
p. 41-44 4 p. |
artikel |
36 |
Low frequency d.c. pulsed plasma for iron nitriding
|
Bougdira, J. |
|
1991 |
139 |
C |
p. 15-19 5 p. |
artikel |
37 |
Low temperature remote plasma-enhanced deposition of thin metal oxide films by decomposition of metal alkoxides
|
Frenck, H.J. |
|
1991 |
139 |
C |
p. 394-400 7 p. |
artikel |
38 |
Measurement of temperature distribution and cooling speed in metal on IR radiation
|
Ariyasu, Tomio |
|
1991 |
139 |
C |
p. 20-23 4 p. |
artikel |
39 |
Mechanism of controlling the self-bias voltage in a flat-bed reactor
|
Ohte, T. |
|
1991 |
139 |
C |
p. 24-28 5 p. |
artikel |
40 |
Microwave etching device for reactive ion etching
|
Schmid, H. |
|
1991 |
139 |
C |
p. 408-416 9 p. |
artikel |
41 |
Modification of alumina powders by nickel and platinum coating
|
Schils, H.W. |
|
1991 |
139 |
C |
p. 185-192 8 p. |
artikel |
42 |
Modification of Cr2N coatings on Al-3wt.%Mg substrates by xenon irradiation
|
Bolse, W. |
|
1991 |
139 |
C |
p. 159-164 6 p. |
artikel |
43 |
Nitrogen atoms in ArN2 flowing microwave discharges for steel surface nitriding
|
Ricard, A. |
|
1991 |
139 |
C |
p. 9-14 6 p. |
artikel |
44 |
On the adhesion of plasma-deposited TiN on M2 steel
|
Sanders, F.H.M. |
|
1991 |
139 |
C |
p. 85-90 6 p. |
artikel |
45 |
Plasma-assisted chemical vapour deposition of hard coatings with metallo-organic compounds
|
Rie, K.-T. |
|
1991 |
139 |
C |
p. 61-66 6 p. |
artikel |
46 |
Plasma deposition of superconducting films
|
Pfender, E. |
|
1991 |
139 |
C |
p. 352-355 4 p. |
artikel |
47 |
Plasma diagnostics of an ECR ion beam system
|
Möhl, W. |
|
1991 |
139 |
C |
p. 6-8 3 p. |
artikel |
48 |
Plasma immersion ion implantation of steels
|
Collins, G.A. |
|
1991 |
139 |
C |
p. 171-178 8 p. |
artikel |
49 |
Preface
|
Oechsner, H. |
|
1991 |
139 |
C |
p. v- 1 p. |
artikel |
50 |
Production of biocompatible coatings by atmospheric plasma spraying
|
Lugscheider, E. |
|
1991 |
139 |
C |
p. 45-48 4 p. |
artikel |
51 |
Production of thin metallic and dielectric coatings by a plasma technique and their investigation
|
Rasulov, P.M. |
|
1991 |
139 |
C |
p. 372-375 4 p. |
artikel |
52 |
Simulation of reactive ion-etching processes considering sheath dynamics
|
Fischelscher, A. |
|
1991 |
139 |
C |
p. 417- 1 p. |
artikel |
53 |
Spectroscopic investigation of N2H2ArTiCl4-assisted chemical vapour deposition discharge for plasma of TiN
|
Rie, K.-T. |
|
1991 |
139 |
C |
p. 37-40 4 p. |
artikel |
54 |
Sputter cleaning of iron substrates and contamination of TiN coatings studied by in situ Auger electron spectroscopy measurements in an ultrahigh vacuum physical vapour deposition apparatus
|
Eguchi, N. |
|
1991 |
139 |
C |
p. 339-344 6 p. |
artikel |
55 |
Stitching TiN films on high speed steel substrates by ion beams
|
Xiang, L. |
|
1991 |
139 |
C |
p. 193-198 6 p. |
artikel |
56 |
Structural study of titanium nitride coating interfaces related to plasma diagnostics
|
Czerwiec, T. |
|
1991 |
139 |
C |
p. 276-283 8 p. |
artikel |
57 |
Structure and properties of TiC x layers prepared by plasma-assisted chemical vapour deposition methods
|
Täschner, Ch. |
|
1991 |
139 |
C |
p. 67-70 4 p. |
artikel |
58 |
Study of Al2O3 and NiAlAl2O3 coatings with acoustic emission analysis
|
Novák, R. |
|
1991 |
139 |
C |
p. 264-267 4 p. |
artikel |
59 |
Surface treatment of polypropylene by oxygen microwave discharge
|
Normand, F. |
|
1991 |
139 |
C |
p. 103-109 7 p. |
artikel |
60 |
Synthesis of gradient thin films by ion beam enhanced deposition
|
Xianghuai, Liu |
|
1991 |
139 |
C |
p. 220-224 5 p. |
artikel |
61 |
Texture analysis of martensitic hot-worked tool steel H13 coated with TiN by physical vapour deposition
|
Quaeyhaegens, C. |
|
1991 |
139 |
C |
p. 242-248 7 p. |
artikel |
62 |
The economics of ion implantation
|
Garside, B.L. |
|
1991 |
139 |
C |
p. 207-213 7 p. |
artikel |
63 |
The influence of titanium interlayers on the adhesion of titanium nitride coatings obtained by plasma-assisted chemical vapour deposition
|
Bull, S.J. |
|
1991 |
139 |
C |
p. 71-78 8 p. |
artikel |
64 |
The parameters of a discharge in an AT-1 biased activated reactive evaporation system for TiN deposition
|
Markowski, J. |
|
1991 |
139 |
C |
p. 33-36 4 p. |
artikel |
65 |
Thin conductive films made by plasma polymerization of 2-chloroacrylonitrile in the presence of iodine
|
Grünwald, H. |
|
1991 |
139 |
C |
p. 356-358 3 p. |
artikel |
66 |
Thin film technology based on hydrogenated amorphous silicon
|
Schröder, Bernd |
|
1991 |
139 |
C |
p. 319-333 15 p. |
artikel |
67 |
Wear-resistant steel surfaces obtained by high dose implantation of carbon
|
Straede, C.A. |
|
1991 |
139 |
C |
p. 150-158 9 p. |
artikel |
68 |
Xenon and argon irradiation of TiN films on Al-3wt.%Mg
|
Müller, W. |
|
1991 |
139 |
C |
p. 165-170 6 p. |
artikel |
69 |
XPS investigation of polymer residues in reactive ion etching of SiO2 over poly-silicon
|
Pamler, W. |
|
1991 |
139 |
C |
p. 364-371 8 p. |
artikel |
70 |
X-ray studies of Al/Al2O3 multilayered films
|
Wang, Y. |
|
1991 |
139 |
C |
p. 239-241 3 p. |
artikel |