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                             70 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Analysis of r.f.-sputtered TiB2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy Lohmann, R.
 1991
 139 C p. 259-263
5 p.
 artikel
2 An electron cyclotron resonance plasma source Lorenz, G.
 1991
 139 C p. 302-306
5 p.
 artikel
3 A new sputter process for hard coating of large machine parts at low temperatures Hofmann, D.
 1991
 139 C p. 290-293
4 p.
 artikel
4 An XPS study of photoresist surfaces in SF6O2 r.f. plasmas Coulon, J.F.
 1991
 139 C p. 385-393
9 p.
 artikel
5 Applications of ion-beam-assisted deposition Colligon, J.S.
 1991
 139 C p. 199-206
8 p.
 artikel
6 A reactor for plasma polymerization on polymer films Gerstenberg, K.W.
 1991
 139 C p. 110-119
10 p.
 artikel
7 Biocompatibility and corrosion resistance in biological media of hard ceramic coatings sputter deposited on metal implants Sella, C.
 1991
 139 C p. 49-57
9 p.
 artikel
8 Biocompatibility of TiN preclinical and clinical investigations Behrndt, H.
 1991
 139 C p. 58-60
3 p.
 artikel
9 Characteristics of ECR plasmas for weakly resonant conditions Saigoh, Masao
 1991
 139 C p. 307-311
5 p.
 artikel
10 Characterization of electron cyclotron resonance process plasma and film deposition Miyake, Shoji
 1991
 139 C p. 294-301
8 p.
 artikel
11 Characterization of microstructure and interfaces in TiCTiB2 coatings Hilz, G.
 1991
 139 C p. 268-275
8 p.
 artikel
12 Characterization of TiN coatings prepared by ion-beam-enhanced deposition Li, X.Y.
 1991
 139 C p. 225-229
5 p.
 artikel
13 Correlation of particle flux parameters with the properties of thin tungsten carbide films Keller, G.
 1991
 139 C p. 137-143
7 p.
 artikel
14 Corrosion-resistant silica coatings obtained by plasma-assisted chemical vapour deposition Bennett, M.J.
 1991
 139 C p. 91-102
12 p.
 artikel
15 D.c. magnetron sputtering of oxidation-resistant chromium and CrN films monitored by optical emission spectrometry Benien, H.
 1991
 139 C p. 126-131
6 p.
 artikel
16 Development of coaxial ECR plasma source for tube inner coating Shigemizu, Tetsuro
 1991
 139 C p. 312-318
7 p.
 artikel
17 Development of the quadrupole plasma chemical vapour deposition method for low temperature, high speed coating on an optical fibre Kashima, Takeshi
 1991
 139 C p. 79-84
6 p.
 artikel
18 Editorial Board 1991
 139 C p. iii-
1 p.
 artikel
19 Effect of contamination on mechanical properties and adhesion of magnetron-sputtered TiN coatings on high speed steel substrates Berg, S.
 1991
 139 C p. 345-351
7 p.
 artikel
20 Effect of process parameters on the atomic nitrogen concentration as measured by chemiluminescence in a post-discharge nitriding reactor Falk, L.
 1991
 139 C p. 132-136
5 p.
 artikel
21 Electrical characterization of plasma-deposited hydrogenated amorphous carbon films Hammer, P.
 1991
 139 C p. 334-388
55 p.
 artikel
22 Evidence for mixed-phase nanocrystalline boron nitride films Gissler, W.
 1991
 139 C p. 284-289
6 p.
 artikel
23 Experimental study of a glow discharge electron source for soft X-ray spectroscopy Legrand, P.B.
 1991
 139 C p. 144-149
6 p.
 artikel
24 Formation of intrinsic oxide layers by ion implantation of silicon and titanium in the low kiloelectronvolt regime Oechsner, H.
 1991
 139 C p. 214-219
6 p.
 artikel
25 Growth kinetics and step coverage in plasma deposition of silicon dioxide from organosilicon compounds Bourreau, C.
 1991
 139 C p. 376-379
4 p.
 artikel
26 High-thermal-resistant dielectric coating deposited by plasma polymerization Tyczkowski, J.
 1991
 139 C p. 120-125
6 p.
 artikel
27 Hydrogen in plasma-enhanced chemical vapour deposition insulating films Kelm, G.
 1991
 139 C p. 401-407
7 p.
 artikel
28 Improved magnetic behaviour of cobalt-based-alloy sputter-target material Weigert, M.
 1991
 139 C p. 359-363
5 p.
 artikel
29 Influence of temperature on nitrogen ion implantation of Incoloy alloys 908 and 909 Xie, L
 1991
 139 C p. 179-184
6 p.
 artikel
30 Influence of the phase transformation of a metal on hollow cathode discharge characteristics Simon, C.
 1991
 139 C p. 29-32
4 p.
 artikel
31 In situ diagnostics/spectroscopy Griem, H.R.
 1991
 139 C p. 1-5
5 p.
 artikel
32 Insulation and passivation of three-dimensional substrates by plasma-CVD thin films using silicon-organic compounds Peters, D.
 1991
 139 C p. 380-384
5 p.
 artikel
33 Interface problems in metallurgical coatings Navinšek, B.
 1991
 139 C p. 249-258
10 p.
 artikel
34 Investigation and modification of free and adsorbate-covered surfaces by scanning tunneling microscopy Eng, L.M.
 1991
 139 C p. 230-238
9 p.
 artikel
35 Langmuir probe plasma diagnostics during TiN x deposition Lunk, A.
 1991
 139 C p. 41-44
4 p.
 artikel
36 Low frequency d.c. pulsed plasma for iron nitriding Bougdira, J.
 1991
 139 C p. 15-19
5 p.
 artikel
37 Low temperature remote plasma-enhanced deposition of thin metal oxide films by decomposition of metal alkoxides Frenck, H.J.
 1991
 139 C p. 394-400
7 p.
 artikel
38 Measurement of temperature distribution and cooling speed in metal on IR radiation Ariyasu, Tomio
 1991
 139 C p. 20-23
4 p.
 artikel
39 Mechanism of controlling the self-bias voltage in a flat-bed reactor Ohte, T.
 1991
 139 C p. 24-28
5 p.
 artikel
40 Microwave etching device for reactive ion etching Schmid, H.
 1991
 139 C p. 408-416
9 p.
 artikel
41 Modification of alumina powders by nickel and platinum coating Schils, H.W.
 1991
 139 C p. 185-192
8 p.
 artikel
42 Modification of Cr2N coatings on Al-3wt.%Mg substrates by xenon irradiation Bolse, W.
 1991
 139 C p. 159-164
6 p.
 artikel
43 Nitrogen atoms in ArN2 flowing microwave discharges for steel surface nitriding Ricard, A.
 1991
 139 C p. 9-14
6 p.
 artikel
44 On the adhesion of plasma-deposited TiN on M2 steel Sanders, F.H.M.
 1991
 139 C p. 85-90
6 p.
 artikel
45 Plasma-assisted chemical vapour deposition of hard coatings with metallo-organic compounds Rie, K.-T.
 1991
 139 C p. 61-66
6 p.
 artikel
46 Plasma deposition of superconducting films Pfender, E.
 1991
 139 C p. 352-355
4 p.
 artikel
47 Plasma diagnostics of an ECR ion beam system Möhl, W.
 1991
 139 C p. 6-8
3 p.
 artikel
48 Plasma immersion ion implantation of steels Collins, G.A.
 1991
 139 C p. 171-178
8 p.
 artikel
49 Preface Oechsner, H.
 1991
 139 C p. v-
1 p.
 artikel
50 Production of biocompatible coatings by atmospheric plasma spraying Lugscheider, E.
 1991
 139 C p. 45-48
4 p.
 artikel
51 Production of thin metallic and dielectric coatings by a plasma technique and their investigation Rasulov, P.M.
 1991
 139 C p. 372-375
4 p.
 artikel
52 Simulation of reactive ion-etching processes considering sheath dynamics Fischelscher, A.
 1991
 139 C p. 417-
1 p.
 artikel
53 Spectroscopic investigation of N2H2ArTiCl4-assisted chemical vapour deposition discharge for plasma of TiN Rie, K.-T.
 1991
 139 C p. 37-40
4 p.
 artikel
54 Sputter cleaning of iron substrates and contamination of TiN coatings studied by in situ Auger electron spectroscopy measurements in an ultrahigh vacuum physical vapour deposition apparatus Eguchi, N.
 1991
 139 C p. 339-344
6 p.
 artikel
55 Stitching TiN films on high speed steel substrates by ion beams Xiang, L.
 1991
 139 C p. 193-198
6 p.
 artikel
56 Structural study of titanium nitride coating interfaces related to plasma diagnostics Czerwiec, T.
 1991
 139 C p. 276-283
8 p.
 artikel
57 Structure and properties of TiC x layers prepared by plasma-assisted chemical vapour deposition methods Täschner, Ch.
 1991
 139 C p. 67-70
4 p.
 artikel
58 Study of Al2O3 and NiAlAl2O3 coatings with acoustic emission analysis Novák, R.
 1991
 139 C p. 264-267
4 p.
 artikel
59 Surface treatment of polypropylene by oxygen microwave discharge Normand, F.
 1991
 139 C p. 103-109
7 p.
 artikel
60 Synthesis of gradient thin films by ion beam enhanced deposition Xianghuai, Liu
 1991
 139 C p. 220-224
5 p.
 artikel
61 Texture analysis of martensitic hot-worked tool steel H13 coated with TiN by physical vapour deposition Quaeyhaegens, C.
 1991
 139 C p. 242-248
7 p.
 artikel
62 The economics of ion implantation Garside, B.L.
 1991
 139 C p. 207-213
7 p.
 artikel
63 The influence of titanium interlayers on the adhesion of titanium nitride coatings obtained by plasma-assisted chemical vapour deposition Bull, S.J.
 1991
 139 C p. 71-78
8 p.
 artikel
64 The parameters of a discharge in an AT-1 biased activated reactive evaporation system for TiN deposition Markowski, J.
 1991
 139 C p. 33-36
4 p.
 artikel
65 Thin conductive films made by plasma polymerization of 2-chloroacrylonitrile in the presence of iodine Grünwald, H.
 1991
 139 C p. 356-358
3 p.
 artikel
66 Thin film technology based on hydrogenated amorphous silicon Schröder, Bernd
 1991
 139 C p. 319-333
15 p.
 artikel
67 Wear-resistant steel surfaces obtained by high dose implantation of carbon Straede, C.A.
 1991
 139 C p. 150-158
9 p.
 artikel
68 Xenon and argon irradiation of TiN films on Al-3wt.%Mg Müller, W.
 1991
 139 C p. 165-170
6 p.
 artikel
69 XPS investigation of polymer residues in reactive ion etching of SiO2 over poly-silicon Pamler, W.
 1991
 139 C p. 364-371
8 p.
 artikel
70 X-ray studies of Al/Al2O3 multilayered films Wang, Y.
 1991
 139 C p. 239-241
3 p.
 artikel
                             70 gevonden resultaten
 
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