nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Activation analysis of rapid thermally annealed Si and Mg co-implanted semi-insulating GaAs
|
Lee, Chien-Chieh |
|
2001 |
178 |
1-4 |
p. 265-268 4 p. |
artikel |
2 |
Amorphization of GaN by ion implantation
|
Liu, C |
|
2001 |
178 |
1-4 |
p. 200-203 4 p. |
artikel |
3 |
A multi-scale atomistic study of the interstitials agglomeration in crystalline Si
|
La Magna, A. |
|
2001 |
178 |
1-4 |
p. 154-159 6 p. |
artikel |
4 |
Author index
|
|
|
2001 |
178 |
1-4 |
p. 346-353 8 p. |
artikel |
5 |
Buried ZnTe nanocrystallites in thermal SiO2 on silicon synthesized by high dose ion implantation
|
Karl, H |
|
2001 |
178 |
1-4 |
p. 126-130 5 p. |
artikel |
6 |
Coherent amorphization of Ge/Si multilayers with ion beams
|
Alves, E |
|
2001 |
178 |
1-4 |
p. 279-282 4 p. |
artikel |
7 |
Coherent precipitate formation and diffusion effects in Ge-implanted TiO2-single crystals
|
Fromknecht, R. |
|
2001 |
178 |
1-4 |
p. 97-100 4 p. |
artikel |
8 |
Colloidal assemblies modified by ion irradiation
|
Snoeks, E |
|
2001 |
178 |
1-4 |
p. 62-68 7 p. |
artikel |
9 |
Computer simulation of Ostwald ripening for ion beam synthesis of buried layers
|
Pohl, T |
|
2001 |
178 |
1-4 |
p. 135-137 3 p. |
artikel |
10 |
Contents
|
|
|
2001 |
178 |
1-4 |
p. ix-xii nvt p. |
artikel |
11 |
Correlation between distribution of nitrogen atoms implanted at high energy and high dose and nanohardness measurements into 316L stainless steel
|
Pelletier, H |
|
2001 |
178 |
1-4 |
p. 319-322 4 p. |
artikel |
12 |
Crystallization effects and diamond formation in amorphous carbon films under low energy ion beam irradiation
|
Patsalas, P |
|
2001 |
178 |
1-4 |
p. 247-251 5 p. |
artikel |
13 |
Dose rate and temperature dependence of Ge range profiles in Si obtained by channeling implantation
|
Posselt, M |
|
2001 |
178 |
1-4 |
p. 170-175 6 p. |
artikel |
14 |
Dwell-time dependence of irradiation damage in silicon
|
Bischoff, L |
|
2001 |
178 |
1-4 |
p. 165-169 5 p. |
artikel |
15 |
Dynamics of pattern formation during low-energy ion bombardment of Si(001)
|
Chason, Eric |
|
2001 |
178 |
1-4 |
p. 55-61 7 p. |
artikel |
16 |
Editorial
|
Bernas, Harry |
|
2001 |
178 |
1-4 |
p. vii- 1 p. |
artikel |
17 |
Formation of 2-D arrays of semiconductor nanocrystals or semiconductor-rich nanolayers by very low-energy Si or Ge ion implantation in silicon oxide films
|
Normand, P |
|
2001 |
178 |
1-4 |
p. 74-77 4 p. |
artikel |
18 |
Formation of supported nanoparticles from island thin films during ion etching
|
Pászti, Z |
|
2001 |
178 |
1-4 |
p. 131-134 4 p. |
artikel |
19 |
Heavy ion induced intermixing of metal/SiC interfaces
|
Nagel, R |
|
2001 |
178 |
1-4 |
p. 315-318 4 p. |
artikel |
20 |
Heavy ion irradiation induced effects in Ni3N/Al bilayers
|
Dhar, S. |
|
2001 |
178 |
1-4 |
p. 297-300 4 p. |
artikel |
21 |
He++-irradiated beryllium-doped Al0.5Ga0.5As MBE layers
|
Szatkowski, J |
|
2001 |
178 |
1-4 |
p. 252-255 4 p. |
artikel |
22 |
High Fe solubility in InP by high temperature ion implantation
|
Fraboni, B |
|
2001 |
178 |
1-4 |
p. 275-278 4 p. |
artikel |
23 |
High fluence ion beam modification of polymer surfaces: EPR and XPS studies
|
Popok, V.N |
|
2001 |
178 |
1-4 |
p. 305-310 6 p. |
artikel |
24 |
Indium-tin-oxide thin film deposited by a dual ion beam assisted e-beam evaporation system
|
Bae, J.W |
|
2001 |
178 |
1-4 |
p. 311-314 4 p. |
artikel |
25 |
Influence of annealing atmosphere on metal and metal alloy nanoclusters produced by ion implantation in silica
|
Battaglin, G |
|
2001 |
178 |
1-4 |
p. 176-179 4 p. |
artikel |
26 |
Influence of boron concentration on the enhanced diffusion observed after irradiation of boron delta-doped silicon at 570°C
|
Lévêque, P |
|
2001 |
178 |
1-4 |
p. 337-341 5 p. |
artikel |
27 |
Influence of ion energy on titanium oxide formation by vacuum arc deposition and implantation
|
Mändl, S |
|
2001 |
178 |
1-4 |
p. 148-153 6 p. |
artikel |
28 |
Influence of the annealing ambient on the relative thermal stability of dislocation loops in silicon
|
Cristiano, F |
|
2001 |
178 |
1-4 |
p. 84-88 5 p. |
artikel |
29 |
Interaction of defects and metals with nanocavities in silicon
|
Williams, J.S |
|
2001 |
178 |
1-4 |
p. 33-43 11 p. |
artikel |
30 |
Interface stability and self-organization of precipitates under irradiation
|
Bellon, P. |
|
2001 |
178 |
1-4 |
p. 1-6 6 p. |
artikel |
31 |
Investigation of the influence of a dislocation loop layer on interstitial kinetics during surface oxidation of silicon
|
Tsoukalas, D |
|
2001 |
178 |
1-4 |
p. 180-183 4 p. |
artikel |
32 |
Ion beam doping and epitaxial regrowth of α-quartz
|
Roccaforte, F |
|
2001 |
178 |
1-4 |
p. 237-241 5 p. |
artikel |
33 |
Ion beam induced preferential removal of oxygen from vanadium hydrates
|
Bondarenka, V. |
|
2001 |
178 |
1-4 |
p. 323-326 4 p. |
artikel |
34 |
Ion beam induced solid state reaction in Si/C layer systems
|
Harbsmeier, F. |
|
2001 |
178 |
1-4 |
p. 214-219 6 p. |
artikel |
35 |
Ion beam modification of thermal stress resistance of MgO single crystals with different crystallographic faces
|
Gurarie, V.N |
|
2001 |
178 |
1-4 |
p. 138-143 6 p. |
artikel |
36 |
Ion beam synthesis of buried SiC layers in silicon: Basic physical processes
|
Lindner, Jörg K.N. |
|
2001 |
178 |
1-4 |
p. 44-54 11 p. |
artikel |
37 |
Ion beam synthesis of CoSi2: Influence of surface kinetics on nucleation
|
Volkov, A.E. |
|
2001 |
178 |
1-4 |
p. 327-330 4 p. |
artikel |
38 |
Ion implantation and thermal annealing in silicon carbide and gallium nitride
|
Jiang, W |
|
2001 |
178 |
1-4 |
p. 204-208 5 p. |
artikel |
39 |
Ion irradiation induced solute clustering in steel: A 3D nanoanalysis with the tomographic atom-probe
|
Pareige, P |
|
2001 |
178 |
1-4 |
p. 233-236 4 p. |
artikel |
40 |
Ion irradiation of gold inclusions in SiO2: Experimental evidence for inverse Ostwald ripening
|
Rizza, G.C. |
|
2001 |
178 |
1-4 |
p. 78-83 6 p. |
artikel |
41 |
Irradiation-induced amorphization and growth of dodecagonal phase in an immiscible Co–Cu system
|
Li, Z.F. |
|
2001 |
178 |
1-4 |
p. 224-228 5 p. |
artikel |
42 |
Kinetic aspects of the growth of platelets and voids in H implanted Si
|
Grisolia, J. |
|
2001 |
178 |
1-4 |
p. 160-164 5 p. |
artikel |
43 |
Kinetic study of group IV nanoparticles ion beam synthesized in SiO2
|
Bonafos, C. |
|
2001 |
178 |
1-4 |
p. 17-24 8 p. |
artikel |
44 |
Laser annealing of sapphire with implanted copper nanoparticles
|
Stepanov, A.L |
|
2001 |
178 |
1-4 |
p. 120-125 6 p. |
artikel |
45 |
Lateral gettering of iron and platinum by cavities induced by helium implantation in silicon
|
Roqueta, F |
|
2001 |
178 |
1-4 |
p. 184-187 4 p. |
artikel |
46 |
Low energy ion implantation and high energy heavy ion irradiation in C60 films
|
Narayanan, K.L. |
|
2001 |
178 |
1-4 |
p. 301-304 4 p. |
artikel |
47 |
MeV gold irradiation induced damage in α-quartz: Competition between nuclear and electronic stopping
|
Toulemonde, M. |
|
2001 |
178 |
1-4 |
p. 331-336 6 p. |
artikel |
48 |
Model for efficient visible emission from Si nanocrystals ion beam synthesized in SiO2
|
López, M |
|
2001 |
178 |
1-4 |
p. 89-92 4 p. |
artikel |
49 |
Modeling of hydrogen passivation process of silicon for solar cells applications
|
Kuznicki, Z.T |
|
2001 |
178 |
1-4 |
p. 196-199 4 p. |
artikel |
50 |
Monte Carlo simulations of masked ion beam irradiation damage profiles in YBa2Cu3O7−δ thin films
|
Peng, Nianhua |
|
2001 |
178 |
1-4 |
p. 242-246 5 p. |
artikel |
51 |
Nanocomposites formed by ion implantation: Recent developments and future opportunities
|
Meldrum, A |
|
2001 |
178 |
1-4 |
p. 7-16 10 p. |
artikel |
52 |
Ordered quantum dot formation on GaSb surfaces during ion sputtering
|
Bobek, T |
|
2001 |
178 |
1-4 |
p. 101-104 4 p. |
artikel |
53 |
Oxidation of Ge implanted into SiO2 layers: Modeling and XPS
|
Borodin, V.A |
|
2001 |
178 |
1-4 |
p. 115-119 5 p. |
artikel |
54 |
Oxygen behaviour during PIII-nitriding of aluminium
|
Manova, D. |
|
2001 |
178 |
1-4 |
p. 291-296 6 p. |
artikel |
55 |
Point defect diffusion and clustering in ion implanted c-Si
|
Libertino, Sebania |
|
2001 |
178 |
1-4 |
p. 25-32 8 p. |
artikel |
56 |
Positron implantation depth profiles in α-irradiated 18 carats gold
|
Thomé, T |
|
2001 |
178 |
1-4 |
p. 342-345 4 p. |
artikel |
57 |
Shape evolution of oxidized silicon V-grooves during high dose ion implantation
|
Müller, T. |
|
2001 |
178 |
1-4 |
p. 109-114 6 p. |
artikel |
58 |
Sn nanoclusters formed in thermally grown SiO2 studied by Mössbauer spectroscopy
|
Koops, G.E.J |
|
2001 |
178 |
1-4 |
p. 93-96 4 p. |
artikel |
59 |
Structural and magnetic studies of CoCu granular alloy obtained by ion implantation of Co into a Cu matrix
|
Errahmani, H |
|
2001 |
178 |
1-4 |
p. 69-73 5 p. |
artikel |
60 |
Structural modifications in amorphous Ge produced by ion implantation
|
Desnica-Franković, I.D. |
|
2001 |
178 |
1-4 |
p. 192-195 4 p. |
artikel |
61 |
Structure and magnetic properties of Co+-implanted silica
|
Cı́ntora-González, O |
|
2001 |
178 |
1-4 |
p. 144-147 4 p. |
artikel |
62 |
Synthesis of buried metal oxide films by high fluence oxygen ion implantation into metals
|
Hammerl, C |
|
2001 |
178 |
1-4 |
p. 220-223 4 p. |
artikel |
63 |
Synthesis of cobalt silicide on porous silicon by high dose ion implantation
|
Ramos, A.R. |
|
2001 |
178 |
1-4 |
p. 283-286 4 p. |
artikel |
64 |
Synthesizing single-phase β-FeSi2 via ion beam irradiations of Fe/Si bilayers
|
Milosavljevic, M. |
|
2001 |
178 |
1-4 |
p. 229-232 4 p. |
artikel |
65 |
The behaviour of deuterium incorporated into the buried oxide of SIMOX
|
Rivera, A |
|
2001 |
178 |
1-4 |
p. 287-290 4 p. |
artikel |
66 |
The Dresden EBIT: An ion source for materials research and technological applications of low-energy highly charged ions
|
Werner, T. |
|
2001 |
178 |
1-4 |
p. 260-264 5 p. |
artikel |
67 |
The effects of ion mass, energy, dose, flux and irradiation temperature on implantation disorder in GaN
|
Kucheyev, S.O |
|
2001 |
178 |
1-4 |
p. 209-213 5 p. |
artikel |
68 |
The evolution of point defects in semiconductors studied using the decay of implanted radioactive isotopes
|
Henry, M.O |
|
2001 |
178 |
1-4 |
p. 256-259 4 p. |
artikel |
69 |
Theoretical and experimental investigations of defect evolution in silicon carbide during N+ and Al+ ion implantation taking into account internal stress fields
|
Rybin, P.V. |
|
2001 |
178 |
1-4 |
p. 269-274 6 p. |
artikel |
70 |
Three-dimensional kinetic lattice Monte-Carlo simulation of ion erosion of fcc(111) surfaces
|
Strobel, M. |
|
2001 |
178 |
1-4 |
p. 105-108 4 p. |
artikel |
71 |
Trapping of aluminium by dislocation loops in Si
|
Ortiz, Ch |
|
2001 |
178 |
1-4 |
p. 188-191 4 p. |
artikel |