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                             71 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Activation analysis of rapid thermally annealed Si and Mg co-implanted semi-insulating GaAs Lee, Chien-Chieh
2001
178 1-4 p. 265-268
4 p.
artikel
2 Amorphization of GaN by ion implantation Liu, C
2001
178 1-4 p. 200-203
4 p.
artikel
3 A multi-scale atomistic study of the interstitials agglomeration in crystalline Si La Magna, A.
2001
178 1-4 p. 154-159
6 p.
artikel
4 Author index 2001
178 1-4 p. 346-353
8 p.
artikel
5 Buried ZnTe nanocrystallites in thermal SiO2 on silicon synthesized by high dose ion implantation Karl, H
2001
178 1-4 p. 126-130
5 p.
artikel
6 Coherent amorphization of Ge/Si multilayers with ion beams Alves, E
2001
178 1-4 p. 279-282
4 p.
artikel
7 Coherent precipitate formation and diffusion effects in Ge-implanted TiO2-single crystals Fromknecht, R.
2001
178 1-4 p. 97-100
4 p.
artikel
8 Colloidal assemblies modified by ion irradiation Snoeks, E
2001
178 1-4 p. 62-68
7 p.
artikel
9 Computer simulation of Ostwald ripening for ion beam synthesis of buried layers Pohl, T
2001
178 1-4 p. 135-137
3 p.
artikel
10 Contents 2001
178 1-4 p. ix-xii
nvt p.
artikel
11 Correlation between distribution of nitrogen atoms implanted at high energy and high dose and nanohardness measurements into 316L stainless steel Pelletier, H
2001
178 1-4 p. 319-322
4 p.
artikel
12 Crystallization effects and diamond formation in amorphous carbon films under low energy ion beam irradiation Patsalas, P
2001
178 1-4 p. 247-251
5 p.
artikel
13 Dose rate and temperature dependence of Ge range profiles in Si obtained by channeling implantation Posselt, M
2001
178 1-4 p. 170-175
6 p.
artikel
14 Dwell-time dependence of irradiation damage in silicon Bischoff, L
2001
178 1-4 p. 165-169
5 p.
artikel
15 Dynamics of pattern formation during low-energy ion bombardment of Si(001) Chason, Eric
2001
178 1-4 p. 55-61
7 p.
artikel
16 Editorial Bernas, Harry
2001
178 1-4 p. vii-
1 p.
artikel
17 Formation of 2-D arrays of semiconductor nanocrystals or semiconductor-rich nanolayers by very low-energy Si or Ge ion implantation in silicon oxide films Normand, P
2001
178 1-4 p. 74-77
4 p.
artikel
18 Formation of supported nanoparticles from island thin films during ion etching Pászti, Z
2001
178 1-4 p. 131-134
4 p.
artikel
19 Heavy ion induced intermixing of metal/SiC interfaces Nagel, R
2001
178 1-4 p. 315-318
4 p.
artikel
20 Heavy ion irradiation induced effects in Ni3N/Al bilayers Dhar, S.
2001
178 1-4 p. 297-300
4 p.
artikel
21 He++-irradiated beryllium-doped Al0.5Ga0.5As MBE layers Szatkowski, J
2001
178 1-4 p. 252-255
4 p.
artikel
22 High Fe solubility in InP by high temperature ion implantation Fraboni, B
2001
178 1-4 p. 275-278
4 p.
artikel
23 High fluence ion beam modification of polymer surfaces: EPR and XPS studies Popok, V.N
2001
178 1-4 p. 305-310
6 p.
artikel
24 Indium-tin-oxide thin film deposited by a dual ion beam assisted e-beam evaporation system Bae, J.W
2001
178 1-4 p. 311-314
4 p.
artikel
25 Influence of annealing atmosphere on metal and metal alloy nanoclusters produced by ion implantation in silica Battaglin, G
2001
178 1-4 p. 176-179
4 p.
artikel
26 Influence of boron concentration on the enhanced diffusion observed after irradiation of boron delta-doped silicon at 570°C Lévêque, P
2001
178 1-4 p. 337-341
5 p.
artikel
27 Influence of ion energy on titanium oxide formation by vacuum arc deposition and implantation Mändl, S
2001
178 1-4 p. 148-153
6 p.
artikel
28 Influence of the annealing ambient on the relative thermal stability of dislocation loops in silicon Cristiano, F
2001
178 1-4 p. 84-88
5 p.
artikel
29 Interaction of defects and metals with nanocavities in silicon Williams, J.S
2001
178 1-4 p. 33-43
11 p.
artikel
30 Interface stability and self-organization of precipitates under irradiation Bellon, P.
2001
178 1-4 p. 1-6
6 p.
artikel
31 Investigation of the influence of a dislocation loop layer on interstitial kinetics during surface oxidation of silicon Tsoukalas, D
2001
178 1-4 p. 180-183
4 p.
artikel
32 Ion beam doping and epitaxial regrowth of α-quartz Roccaforte, F
2001
178 1-4 p. 237-241
5 p.
artikel
33 Ion beam induced preferential removal of oxygen from vanadium hydrates Bondarenka, V.
2001
178 1-4 p. 323-326
4 p.
artikel
34 Ion beam induced solid state reaction in Si/C layer systems Harbsmeier, F.
2001
178 1-4 p. 214-219
6 p.
artikel
35 Ion beam modification of thermal stress resistance of MgO single crystals with different crystallographic faces Gurarie, V.N
2001
178 1-4 p. 138-143
6 p.
artikel
36 Ion beam synthesis of buried SiC layers in silicon: Basic physical processes Lindner, Jörg K.N.
2001
178 1-4 p. 44-54
11 p.
artikel
37 Ion beam synthesis of CoSi2: Influence of surface kinetics on nucleation Volkov, A.E.
2001
178 1-4 p. 327-330
4 p.
artikel
38 Ion implantation and thermal annealing in silicon carbide and gallium nitride Jiang, W
2001
178 1-4 p. 204-208
5 p.
artikel
39 Ion irradiation induced solute clustering in steel: A 3D nanoanalysis with the tomographic atom-probe Pareige, P
2001
178 1-4 p. 233-236
4 p.
artikel
40 Ion irradiation of gold inclusions in SiO2: Experimental evidence for inverse Ostwald ripening Rizza, G.C.
2001
178 1-4 p. 78-83
6 p.
artikel
41 Irradiation-induced amorphization and growth of dodecagonal phase in an immiscible Co–Cu system Li, Z.F.
2001
178 1-4 p. 224-228
5 p.
artikel
42 Kinetic aspects of the growth of platelets and voids in H implanted Si Grisolia, J.
2001
178 1-4 p. 160-164
5 p.
artikel
43 Kinetic study of group IV nanoparticles ion beam synthesized in SiO2 Bonafos, C.
2001
178 1-4 p. 17-24
8 p.
artikel
44 Laser annealing of sapphire with implanted copper nanoparticles Stepanov, A.L
2001
178 1-4 p. 120-125
6 p.
artikel
45 Lateral gettering of iron and platinum by cavities induced by helium implantation in silicon Roqueta, F
2001
178 1-4 p. 184-187
4 p.
artikel
46 Low energy ion implantation and high energy heavy ion irradiation in C60 films Narayanan, K.L.
2001
178 1-4 p. 301-304
4 p.
artikel
47 MeV gold irradiation induced damage in α-quartz: Competition between nuclear and electronic stopping Toulemonde, M.
2001
178 1-4 p. 331-336
6 p.
artikel
48 Model for efficient visible emission from Si nanocrystals ion beam synthesized in SiO2 López, M
2001
178 1-4 p. 89-92
4 p.
artikel
49 Modeling of hydrogen passivation process of silicon for solar cells applications Kuznicki, Z.T
2001
178 1-4 p. 196-199
4 p.
artikel
50 Monte Carlo simulations of masked ion beam irradiation damage profiles in YBa2Cu3O7−δ thin films Peng, Nianhua
2001
178 1-4 p. 242-246
5 p.
artikel
51 Nanocomposites formed by ion implantation: Recent developments and future opportunities Meldrum, A
2001
178 1-4 p. 7-16
10 p.
artikel
52 Ordered quantum dot formation on GaSb surfaces during ion sputtering Bobek, T
2001
178 1-4 p. 101-104
4 p.
artikel
53 Oxidation of Ge implanted into SiO2 layers: Modeling and XPS Borodin, V.A
2001
178 1-4 p. 115-119
5 p.
artikel
54 Oxygen behaviour during PIII-nitriding of aluminium Manova, D.
2001
178 1-4 p. 291-296
6 p.
artikel
55 Point defect diffusion and clustering in ion implanted c-Si Libertino, Sebania
2001
178 1-4 p. 25-32
8 p.
artikel
56 Positron implantation depth profiles in α-irradiated 18 carats gold Thomé, T
2001
178 1-4 p. 342-345
4 p.
artikel
57 Shape evolution of oxidized silicon V-grooves during high dose ion implantation Müller, T.
2001
178 1-4 p. 109-114
6 p.
artikel
58 Sn nanoclusters formed in thermally grown SiO2 studied by Mössbauer spectroscopy Koops, G.E.J
2001
178 1-4 p. 93-96
4 p.
artikel
59 Structural and magnetic studies of CoCu granular alloy obtained by ion implantation of Co into a Cu matrix Errahmani, H
2001
178 1-4 p. 69-73
5 p.
artikel
60 Structural modifications in amorphous Ge produced by ion implantation Desnica-Franković, I.D.
2001
178 1-4 p. 192-195
4 p.
artikel
61 Structure and magnetic properties of Co+-implanted silica Cı́ntora-González, O
2001
178 1-4 p. 144-147
4 p.
artikel
62 Synthesis of buried metal oxide films by high fluence oxygen ion implantation into metals Hammerl, C
2001
178 1-4 p. 220-223
4 p.
artikel
63 Synthesis of cobalt silicide on porous silicon by high dose ion implantation Ramos, A.R.
2001
178 1-4 p. 283-286
4 p.
artikel
64 Synthesizing single-phase β-FeSi2 via ion beam irradiations of Fe/Si bilayers Milosavljevic, M.
2001
178 1-4 p. 229-232
4 p.
artikel
65 The behaviour of deuterium incorporated into the buried oxide of SIMOX Rivera, A
2001
178 1-4 p. 287-290
4 p.
artikel
66 The Dresden EBIT: An ion source for materials research and technological applications of low-energy highly charged ions Werner, T.
2001
178 1-4 p. 260-264
5 p.
artikel
67 The effects of ion mass, energy, dose, flux and irradiation temperature on implantation disorder in GaN Kucheyev, S.O
2001
178 1-4 p. 209-213
5 p.
artikel
68 The evolution of point defects in semiconductors studied using the decay of implanted radioactive isotopes Henry, M.O
2001
178 1-4 p. 256-259
4 p.
artikel
69 Theoretical and experimental investigations of defect evolution in silicon carbide during N+ and Al+ ion implantation taking into account internal stress fields Rybin, P.V.
2001
178 1-4 p. 269-274
6 p.
artikel
70 Three-dimensional kinetic lattice Monte-Carlo simulation of ion erosion of fcc(111) surfaces Strobel, M.
2001
178 1-4 p. 105-108
4 p.
artikel
71 Trapping of aluminium by dislocation loops in Si Ortiz, Ch
2001
178 1-4 p. 188-191
4 p.
artikel
                             71 gevonden resultaten
 
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