| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Advances in the analysis and characterization of DLC coatings
|
Bellido-González, V.
|
|
1998
|
98 |
1-3 |
p. 1272-1279
8 p.
|
artikel
|
| 2 |
A model for the deposition of a-C:H using an expanding thermal arc
|
Kessels, W.M.M.
|
|
1998
|
98 |
1-3 |
p. 1584-1589
6 p.
|
artikel
|
| 3 |
An emission actinometric method for measuring of plasmachemical reaction kinetic parameters with discharge power modulation by a series of short probing pulses
|
Shogun, V.
|
|
1998
|
98 |
1-3 |
p. 1406-1410
5 p.
|
artikel
|
| 4 |
A new method of power input in batch scale plasma reactors
|
Poll, H.-U.
|
|
1998
|
98 |
1-3 |
p. 845-847
3 p.
|
artikel
|
| 5 |
A novel low-cost process for the deposition of metallic and compound thin films on plastics
|
Kälber, T.
|
|
1998
|
98 |
1-3 |
p. 1116-1120
5 p.
|
artikel
|
| 6 |
Are thin hard coatings (TiN, DLC, diamond) beneficial in tribologically stressed vibrational contacts?—Effects of operational parameters and relative humidity
|
Klaffke, D.
|
|
1998
|
98 |
1-3 |
p. 953-961
9 p.
|
artikel
|
| 7 |
Aspects of tribological testing of diamond coatings
|
Skopp, A.
|
|
1998
|
98 |
1-3 |
p. 1027-1037
11 p.
|
artikel
|
| 8 |
A study on plasma-assisted bonding of steels
|
Nam, K.S.
|
|
1998
|
98 |
1-3 |
p. 886-890
5 p.
|
artikel
|
| 9 |
Asymmetric bipolar pulsed DC: the enabling technology for reactive PVD
|
Sellers, J.
|
|
1998
|
98 |
1-3 |
p. 1245-1250
6 p.
|
artikel
|
| 10 |
Asymmetric bipolar pulsed power: a new power technology
|
Scholl, Richard A.
|
|
1998
|
98 |
1-3 |
p. 823-827
5 p.
|
artikel
|
| 11 |
Author index of volume 98
|
|
|
1998
|
98 |
1-3 |
p. 1601-1602
2 p.
|
artikel
|
| 12 |
Barrier layers on aluminium and gold by plasma polymerization
|
Oehr, C.
|
|
1998
|
98 |
1-3 |
p. 848-850
3 p.
|
artikel
|
| 13 |
Carbon-based coatings for dry sheet-metal working
|
Taube, K.
|
|
1998
|
98 |
1-3 |
p. 976-984
9 p.
|
artikel
|
| 14 |
Ceramics inner coating of narrow tubes by a coaxial magnetron pulsed plasma
|
Fujiyama, H.
|
|
1998
|
98 |
1-3 |
p. 1467-1472
6 p.
|
artikel
|
| 15 |
Ceramic thermal barrier coatings deposited with the electron beam-physical vapour deposition technique
|
Lugscheider, E.
|
|
1998
|
98 |
1-3 |
p. 1221-1227
7 p.
|
artikel
|
| 16 |
Characterization of a magnetron sputtering discharge with simultaneous RF- and DC-excitation of the plasma for the deposition of transparent and conductive ZnO:Al-films
|
Ellmer, K.
|
|
1998
|
98 |
1-3 |
p. 1251-1256
6 p.
|
artikel
|
| 17 |
Characterization of diffused ECR plasma—Application to pulsed plasma ion implantation of nitrogen in titanium
|
Sarkissian, A.H.
|
|
1998
|
98 |
1-3 |
p. 1336-1340
5 p.
|
artikel
|
| 18 |
Characterization of low-frequency plasma generated in a three-electrode reactor
|
Tyczkowski, J.
|
|
1998
|
98 |
1-3 |
p. 1365-1369
5 p.
|
artikel
|
| 19 |
Characterization of Ti(N x O y ) coatings produced by the arc ion plating method
|
Makino, Y.
|
|
1998
|
98 |
1-3 |
p. 934-938
5 p.
|
artikel
|
| 20 |
Characterizing the remote plasma polymerization of octafluorocyclobutane induced by RF-driven hollow-cathode discharge
|
Ningel, K.P.
|
|
1998
|
98 |
1-3 |
p. 1142-1147
6 p.
|
artikel
|
| 21 |
Combined impulse-stationary impulse plasma deposition
|
Zdunek, K.
|
|
1998
|
98 |
1-3 |
p. 1448-1454
7 p.
|
artikel
|
| 22 |
Committees
|
|
|
1998
|
98 |
1-3 |
p. xii-
1 p.
|
artikel
|
| 23 |
Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering
|
Jäger, S.
|
|
1998
|
98 |
1-3 |
p. 1304-1314
11 p.
|
artikel
|
| 24 |
Corona, spark and combined UV and ozone modification of polymer films WeBP23
|
Friedrich, J.
|
|
1998
|
98 |
1-3 |
p. 879-885
7 p.
|
artikel
|
| 25 |
Corrosion and mechanical studies of chromium nitride films prepared by ion-beam-assisted deposition
|
Engel, P.
|
|
1998
|
98 |
1-3 |
p. 1002-1007
6 p.
|
artikel
|
| 26 |
Corrosion properties of alumina coatings on steel and aluminum deposited by ion beam assisted deposition
|
Stippich, F.
|
|
1998
|
98 |
1-3 |
p. 997-1001
5 p.
|
artikel
|
| 27 |
Corrosion studies of stainless steel 316L, modified by ion beam techniques, under simulated physiological conditions
|
Meinert, K.
|
|
1998
|
98 |
1-3 |
p. 1148-1156
9 p.
|
artikel
|
| 28 |
(Cr:Al)N coatings deposited by the cathodic vacuum are evaporation
|
Vetter, J.
|
|
1998
|
98 |
1-3 |
p. 1233-1239
7 p.
|
artikel
|
| 29 |
CVD-processes by hollow cathode glow discharge
|
Hellmich, A.
|
|
1998
|
98 |
1-3 |
p. 1541-1546
6 p.
|
artikel
|
| 30 |
Deposition of AlN layers by collimation magnetron sputtering
|
Miernik, Krzysztof
|
|
1998
|
98 |
1-3 |
p. 1298-1303
6 p.
|
artikel
|
| 31 |
Deposition of aluminium nitride films by electron cyclotron resonance plasma-enhanced chemical vapour deposition
|
Ecke, G.
|
|
1998
|
98 |
1-3 |
p. 1503-1509
7 p.
|
artikel
|
| 32 |
Deposition of carbon nitride thin films in a hybrid r.f.-PLD technique
|
Klotzbücher, T.
|
|
1998
|
98 |
1-3 |
p. 1072-1078
7 p.
|
artikel
|
| 33 |
Deposition of CVD diamond onto ion beam modified ASP 23 cutting tools
|
Fenker, M.
|
|
1998
|
98 |
1-3 |
p. 1053-1059
7 p.
|
artikel
|
| 34 |
Deposition of superhard amorphous carbon films by pulsed vacuum arc deposition
|
Schultrich, B.
|
|
1998
|
98 |
1-3 |
p. 1097-1101
5 p.
|
artikel
|
| 35 |
Determination of O atom density in Ar-O2 and Ar-O2-H2 flowing microwave discharges
|
Czerwiec, T.
|
|
1998
|
98 |
1-3 |
p. 1411-1415
5 p.
|
artikel
|
| 36 |
Development of a transported coaxial ECR plasma source for inner coating of metallic tubes
|
Morisaki, E.
|
|
1998
|
98 |
1-3 |
p. 834-838
5 p.
|
artikel
|
| 37 |
Diagnostic measurements on a dense hollow cathode arc deposition plasma
|
Buuron, A.
|
|
1998
|
98 |
1-3 |
p. 1572-1577
6 p.
|
artikel
|
| 38 |
Diagnostic of arc discharges for plasma nitriding by optical emission spectroscopy
|
Renevier, N.
|
|
1998
|
98 |
1-3 |
p. 1400-1405
6 p.
|
artikel
|
| 39 |
Direct-current low-pressure supersonic plasma jet used for diamond deposition
|
Laimer, J.
|
|
1998
|
98 |
1-3 |
p. 1066-1071
6 p.
|
artikel
|
| 40 |
Distribution of ion current density in a modified pulse arc process as a function of pulse parameters
|
Fuchs, H.
|
|
1998
|
98 |
1-3 |
p. 839-844
6 p.
|
artikel
|
| 41 |
Dual magnetron sputtering (DMS) system with sine-wave power supply for large-area coating
|
Kirchhoff, V.
|
|
1998
|
98 |
1-3 |
p. 828-833
6 p.
|
artikel
|
| 42 |
Duplex antiabrasive coatings (Fe-based alloy-tin) produced by impulse plasma deposition
|
Zdunek, K.
|
|
1998
|
98 |
1-3 |
p. 1444-1447
4 p.
|
artikel
|
| 43 |
Editorial Board
|
|
|
1998
|
98 |
1-3 |
p. iv-
1 p.
|
artikel
|
| 44 |
Effect of plasma nitriding on wear and pitting corrosion resistance of X2 CrNiMoN 22 5 3 duplex stainless steel
|
Kliauga, A.M.
|
|
1998
|
98 |
1-3 |
p. 1205-1210
6 p.
|
artikel
|
| 45 |
Elastic modulus: a suitable quantity for characterization of thin films
|
Schneider, Dieter
|
|
1998
|
98 |
1-3 |
p. 962-970
9 p.
|
artikel
|
| 46 |
Electrical conductivity measurements with submicrometer lateral resolution
|
Kazimierski, P.
|
|
1998
|
98 |
1-3 |
p. 939-943
5 p.
|
artikel
|
| 47 |
Emission actinometric investigations of atomic hydrogen and CH radicals in plasma-enhanced chemical vapour deposition processes of hexamethyldisiloxane
|
Shogun, V.
|
|
1998
|
98 |
1-3 |
p. 1382-1386
5 p.
|
artikel
|
| 48 |
Energy-mass spectrometry and automatic Langmuir probe measurements in reactive ICP plasmas for diamond deposition
|
Awakowicz, Peter
|
|
1998
|
98 |
1-3 |
p. 1020-1026
7 p.
|
artikel
|
| 49 |
Ferroelectric characteristics of SrBi2Ta2O9 thin films fabricated by the radio frequency magnetron sputtering deposition technique
|
Lee, Jeon-Kook
|
|
1998
|
98 |
1-3 |
p. 908-911
4 p.
|
artikel
|
| 50 |
Formation of hydrophobic layers on biologically degradable polymeric foils by plasma polymerization
|
Behnisch, J.
|
|
1998
|
98 |
1-3 |
p. 872-874
3 p.
|
artikel
|
| 51 |
Fundamental economical aspects of functional coatings for tribological applications
|
Friedrich, C.
|
|
1998
|
98 |
1-3 |
p. 816-822
7 p.
|
artikel
|
| 52 |
Fundamentals and applications of the combination of plasma nitrocarburizing and oxidizing
|
Hoppe, Steffen
|
|
1998
|
98 |
1-3 |
p. 1199-1204
6 p.
|
artikel
|
| 53 |
Fundamentals of elementary processes in plasmas
|
Vlček, J.
|
|
1998
|
98 |
1-3 |
p. 1557-1564
8 p.
|
artikel
|
| 54 |
Glow-discharge treatment for the modification of textiles
|
Vohrer, U.
|
|
1998
|
98 |
1-3 |
p. 1128-1131
4 p.
|
artikel
|
| 55 |
Gradient metal—a-C:H coatings deposited from dense plasma by a combined PVD/CVD process
|
Bolt, H.
|
|
1998
|
98 |
1-3 |
p. 1518-1523
6 p.
|
artikel
|
| 56 |
Hard coating by plasma-assisted CVD on plasma nitrided stellite
|
Park, Jeong-Real
|
|
1998
|
98 |
1-3 |
p. 1329-1335
7 p.
|
artikel
|
| 57 |
Hard coatings on soft metallic substrates
|
Navinšek, B.
|
|
1998
|
98 |
1-3 |
p. 809-815
7 p.
|
artikel
|
| 58 |
High-temperature oxidation of TiN/CrN multilayers reactively sputtered at low temperatures
|
Panjan, P.
|
|
1998
|
98 |
1-3 |
p. 1497-1502
6 p.
|
artikel
|
| 59 |
Improvement of the wear and corrosion resistance of oil pump materials using plasma immersion ion implantation
|
Wang, S.Y.
|
|
1998
|
98 |
1-3 |
p. 897-900
4 p.
|
artikel
|
| 60 |
Influence of particle energies on the properties of magnetron sputtered tungsten films
|
Paturaud, C.
|
|
1998
|
98 |
1-3 |
p. 1257-1261
5 p.
|
artikel
|
| 61 |
Influence of substrate roughness and lateral spacing on morphology and brittleness of different Cr-C PVD coatings
|
Soro, J.M.
|
|
1998
|
98 |
1-3 |
p. 1490-1496
7 p.
|
artikel
|
| 62 |
Influence of the PACVD process parameters on the properties of titanium carbide thin films
|
Jarms, C.
|
|
1998
|
98 |
1-3 |
p. 1547-1552
6 p.
|
artikel
|
| 63 |
Influence of the preliminary irradiation upon transitional layer formation in the titanium coating—steel system
|
Khodasevich, V.V.
|
|
1998
|
98 |
1-3 |
p. 1433-1436
4 p.
|
artikel
|
| 64 |
Innovative plasma diagnostics and control of process in reactive low-temperature plasmas
|
Klick, M.
|
|
1998
|
98 |
1-3 |
p. 1395-1399
5 p.
|
artikel
|
| 65 |
In situ-force measurement for the determination of the evaporation rate with high-rate electron beam evaporation
|
Scheffel, B.
|
|
1998
|
98 |
1-3 |
p. 944-947
4 p.
|
artikel
|
| 66 |
Langmuir probe measurements in expanding magnetized argon, nitrogen and hydrogen plasmas
|
Brussaard, G.J.H.
|
|
1998
|
98 |
1-3 |
p. 1416-1419
4 p.
|
artikel
|
| 67 |
Large-scale antireflective coatings on glass produced by reactive magnetron sputtering
|
Szczyrbowski, J.
|
|
1998
|
98 |
1-3 |
p. 1460-1466
7 p.
|
artikel
|
| 68 |
Low temperature coating of aluminium alloys by plasma-CVD using metallo-organic compounds
|
Rie, K.-T.
|
|
1998
|
98 |
1-3 |
p. 1534-1540
7 p.
|
artikel
|
| 69 |
Measurement of carbon atom density in the flowing afterglow of a CH4−N2 microwave plasma
|
Diamy, A-M.
|
|
1998
|
98 |
1-3 |
p. 1377-1381
5 p.
|
artikel
|
| 70 |
Mechanically reinforced and corrosion-resistant sputtered amorphous aluminium alloy coatings
|
Sanchette, F.
|
|
1998
|
98 |
1-3 |
p. 1162-1168
7 p.
|
artikel
|
| 71 |
Mechanisms of diamond films deposition from MPACVD in methane-hydrogen and nitrogen mixtures
|
Chatei, H.
|
|
1998
|
98 |
1-3 |
p. 1013-1019
7 p.
|
artikel
|
| 72 |
Mechanistic approach to the plasma polymerization of acrylic acid by a pulsed MW(ECR) plasma
|
Behnisch, J.
|
|
1998
|
98 |
1-3 |
p. 875-878
4 p.
|
artikel
|
| 73 |
Metallographic investigations of nitrogen-implanted titanium alloys
|
Seidel, F.
|
|
1998
|
98 |
1-3 |
p. 1174-1180
7 p.
|
artikel
|
| 74 |
Microwave-plasma-CVD of diamond coatings onto titanium and titanium alloys
|
Grögler, T.
|
|
1998
|
98 |
1-3 |
p. 1079-1091
13 p.
|
artikel
|
| 75 |
Modelling plasma-induced reactions on polymer surfaces using aliphatic self-assembling and LB layers
|
Friedrich, J.
|
|
1998
|
98 |
1-3 |
p. 1132-1141
10 p.
|
artikel
|
| 76 |
Multilayer systems for corrosion protection of stainless steel implants
|
Neumann, H.-G.
|
|
1998
|
98 |
1-3 |
p. 1157-1161
5 p.
|
artikel
|
| 77 |
New scan and control system (ESCOSYS™) for high power electron beam techniques
|
Bähr, M.
|
|
1998
|
98 |
1-3 |
p. 1211-1220
10 p.
|
artikel
|
| 78 |
Nucleation and early growth of CVD diamond on silicon nitride
|
Buchkremer-Hermanns, H.
|
|
1998
|
98 |
1-3 |
p. 1038-1046
9 p.
|
artikel
|
| 79 |
Observation of electromagnetic waves in a large-diameter uniform electron cyclotron resonance plasma by a multislot antenna
|
Ueda, Yoko
|
|
1998
|
98 |
1-3 |
p. 1341-1346
6 p.
|
artikel
|
| 80 |
Optical emission of magnetron discharges as a function of the composition of argon—nitrogen gas mixtures
|
Debal, F.
|
|
1998
|
98 |
1-3 |
p. 1387-1394
8 p.
|
artikel
|
| 81 |
Optimization and control of a plasma carburizing process by means of optical emission spectroscopy
|
Rie, K.-T.
|
|
1998
|
98 |
1-3 |
p. 1192-1198
7 p.
|
artikel
|
| 82 |
Optogalvanic detection of oxygen negative ions in reactive sputtering process
|
Matsuda, Y.
|
|
1998
|
98 |
1-3 |
p. 1420-1425
6 p.
|
artikel
|
| 83 |
Oxidation resistance of (Ti, Al, Si)N coatings in air
|
Vaz, F.
|
|
1998
|
98 |
1-3 |
p. 912-917
6 p.
|
artikel
|
| 84 |
Plasma assisted deposition of Pd thin films
|
Thomann, A.-L.
|
|
1998
|
98 |
1-3 |
p. 1228-1232
5 p.
|
artikel
|
| 85 |
Plasma cathode—surface interaction in reactive magnetron sputtering for indium—tin-oxide thin film deposition
|
Matsuda, Y.
|
|
1998
|
98 |
1-3 |
p. 1286-1292
7 p.
|
artikel
|
| 86 |
Plasma-deposited dielectrics for Cu metallization systems
|
Vogt, M.
|
|
1998
|
98 |
1-3 |
p. 948-952
5 p.
|
artikel
|
| 87 |
Plasma deposition of Si-N and Si-O passivation layers on three-dimensional sensor devices
|
Schmid, P.
|
|
1998
|
98 |
1-3 |
p. 1510-1517
8 p.
|
artikel
|
| 88 |
Plasma diagnostics for surface modification of polymers
|
Meichsner, J.
|
|
1998
|
98 |
1-3 |
p. 1565-1571
7 p.
|
artikel
|
| 89 |
Plasma diagnostics of r.f. PACVD of boron nitride using a BCl3−N2−H2−Ar gas mixture
|
Schaffnit, C.
|
|
1998
|
98 |
1-3 |
p. 1262-1266
5 p.
|
artikel
|
| 90 |
Plasma-engineered Si−SiO2 interfaces: monolayer nitrogen atom incorporation by low-temperature remote plasma-assisted oxidation in N2O
|
Koh, K.
|
|
1998
|
98 |
1-3 |
p. 1524-1528
5 p.
|
artikel
|
| 91 |
Plasma enhanced deposition of titanium aluminium composite films using organometallic aluminium precursors
|
Täschner, Ch.
|
|
1998
|
98 |
1-3 |
p. 925-933
9 p.
|
artikel
|
| 92 |
Plasma parameter and deposited films measurements in reactive SiH4 based electron cyclotron resonance plasmas
|
Ueda, Yoko
|
|
1998
|
98 |
1-3 |
p. 1359-1364
6 p.
|
artikel
|
| 93 |
Plasma-polymerised organosiloxane thin films as selective gas sensors
|
Janča, J.
|
|
1998
|
98 |
1-3 |
p. 851-854
4 p.
|
artikel
|
| 94 |
Plasma pretreatment of polypropylene for improved adhesive bonding
|
Mühlhan, C.
|
|
1998
|
98 |
1-3 |
p. 1107-1111
5 p.
|
artikel
|
| 95 |
Plasma properties at the transition from remote to direct plasma
|
Schiller, Matthias
|
|
1998
|
98 |
1-3 |
p. 1590-1599
10 p.
|
artikel
|
| 96 |
Plasma-sheath ion nitriding: a cost-efficient technology for the surface modification of SS304
|
Mukherjee, S.
|
|
1998
|
98 |
1-3 |
p. 1437-1439
3 p.
|
artikel
|
| 97 |
Plasma treatments and plasma deposition of polymers for biomedical applications
|
Favia, Pietro
|
|
1998
|
98 |
1-3 |
p. 1102-1106
5 p.
|
artikel
|
| 98 |
Possibilities and limits of the characterization of wear resistant PVD coatings by photothermal spectroscopy
|
Knotek, O.
|
|
1998
|
98 |
1-3 |
p. 971-975
5 p.
|
artikel
|
| 99 |
Preface
|
Ricard, A.
|
|
1998
|
98 |
1-3 |
p. xi-
1 p.
|
artikel
|
| 100 |
Preparation, characterization and properties of sputtered electrochromic and thermochromic devices
|
Sella, C.
|
|
1998
|
98 |
1-3 |
p. 1477-1482
6 p.
|
artikel
|
| 101 |
Preparation of iron nitride thin films by magnetron sputtering under surface magnetic field on substrates
|
Kiriake, Wataru
|
|
1998
|
98 |
1-3 |
p. 1293-1297
5 p.
|
artikel
|
| 102 |
Properties of carbides, nitrides and carbonitrides based on Ti and Mo multicomponent layers
|
Kozłowski, J.
|
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1998
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98 |
1-3 |
p. 1440-1443
4 p.
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artikel
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| 103 |
Properties of duplex treated (gas-nitriding and PVD-TiN, -Cr2N) low alloy steel
|
Bader, M.
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|
1998
|
98 |
1-3 |
p. 891-896
6 p.
|
artikel
|
| 104 |
Properties of surface layers produced from a metallorganic titanium compound under glow discharge conditions
|
Wierzchoñ, T.
|
|
1998
|
98 |
1-3 |
p. 1455-1459
5 p.
|
artikel
|
| 105 |
Reactive ionized magnetron sputtering of crystalline alumina coatings
|
Schneider, Jochen M.
|
|
1998
|
98 |
1-3 |
p. 1473-1476
4 p.
|
artikel
|
| 106 |
Reactively r.f. magnetron sputtered carbon nitride films
|
Sebald, T.
|
|
1998
|
98 |
1-3 |
p. 1280-1285
6 p.
|
artikel
|
| 107 |
Reference materials for composition-depth profiles of TiN, Ti(C,N) and (Ti,Al)N with different chemical composition
|
Stock, H.-R.
|
|
1998
|
98 |
1-3 |
p. 918-924
7 p.
|
artikel
|
| 108 |
Relation between cathode-fall and ion-sheath thicknesses in multi-electrode-type magnetron discharges
|
Kuwahara, K.
|
|
1998
|
98 |
1-3 |
p. 1347-1350
4 p.
|
artikel
|
| 109 |
Rf-plasma nitriding of stainless steel
|
Baldwin, M.J.
|
|
1998
|
98 |
1-3 |
p. 1187-1191
5 p.
|
artikel
|
| 110 |
Sputtered thermionic hexaboride coatings
|
Waldhauser, W.
|
|
1998
|
98 |
1-3 |
p. 1315-1323
9 p.
|
artikel
|
| 111 |
Stress behaviour of reactively sputtered nitrogenated carbon films
|
Gilvarry, J.
|
|
1998
|
98 |
1-3 |
p. 985-990
6 p.
|
artikel
|
| 112 |
Structural, electrical and optical properties of SnO2-x:F-layers deposited by DC-reactive magnetron-sputtering from a metallic target in Ar–O2/CF4 mixtures
|
Mientus, R.
|
|
1998
|
98 |
1-3 |
p. 1267-1271
5 p.
|
artikel
|
| 113 |
Structure and properties of TiB2 based coatings prepared by unbalanced DC magnetron sputtering
|
Kelesoglu, E.
|
|
1998
|
98 |
1-3 |
p. 1483-1489
7 p.
|
artikel
|
| 114 |
Studies on synthesis of aluminium containing layer systems on steel and cermet substrates by PACVD
|
Rie, K.-T.
|
|
1998
|
98 |
1-3 |
p. 1324-1328
5 p.
|
artikel
|
| 115 |
Study of an RF planar magnetron sputtering discharge with Langmuir probe measurements
|
Jouan, P.-Y.
|
|
1998
|
98 |
1-3 |
p. 1426-1432
7 p.
|
artikel
|
| 116 |
Study of oxygen/TEOS plasmas and thin SiO x films obtained in an helicon diffusion reactor
|
Nicolazo, F.
|
|
1998
|
98 |
1-3 |
p. 1578-1583
6 p.
|
artikel
|
| 117 |
Study of the wear behaviour of diamond-like coatings at elevated temperatures
|
Vanhulsel, A.
|
|
1998
|
98 |
1-3 |
p. 1047-1052
6 p.
|
artikel
|
| 118 |
Subject index of volume 98
|
|
|
1998
|
98 |
1-3 |
p. 1603-1615
13 p.
|
artikel
|
| 119 |
Surface modification of fluoropolymers by microwave plasmas: FTIR investigations
|
Sprang, N.
|
|
1998
|
98 |
1-3 |
p. 865-871
7 p.
|
artikel
|
| 120 |
Surface modification of polymer materials by transient gas discharges at atmospheric pressure
|
Meiners, S.
|
|
1998
|
98 |
1-3 |
p. 1121-1127
7 p.
|
artikel
|
| 121 |
Surface treatment of nitriding steel 34CrAlNi7: a comparison between pulsed plasma nitriding and plasma immersion ion implantation
|
Blawert, C.
|
|
1998
|
98 |
1-3 |
p. 1181-1186
6 p.
|
artikel
|
| 122 |
Synthesis of plasma-polymerized hexamethyldisiloxane (HMDSO) films by microwave discharge
|
Schwarz, J.
|
|
1998
|
98 |
1-3 |
p. 859-864
6 p.
|
artikel
|
| 123 |
Synthesis of pseudobinary Cr-Al-N films with B1 structure by rf-assisted magnetron sputtering method
|
Makino, Y.
|
|
1998
|
98 |
1-3 |
p. 1008-1012
5 p.
|
artikel
|
| 124 |
TAMEK vacuum arc techniques for metal ion and plasma surface engineering
|
Tolopa, Alexander
|
|
1998
|
98 |
1-3 |
p. 901-907
7 p.
|
artikel
|
| 125 |
The determination of the current-voltage characteristics of a closed-field unbalanced magnetron sputtering system
|
Kelly, P.J.
|
|
1998
|
98 |
1-3 |
p. 1370-1376
7 p.
|
artikel
|
| 126 |
The effect of arc ion pre-bombardment on the impact failure of TiN coating on Co-WC
|
Han, J.G.
|
|
1998
|
98 |
1-3 |
p. 991-996
6 p.
|
artikel
|
| 127 |
The influence of gradient SiN x IBAD coating on corrosion resistance of alloy steels in oxidizing and sulphidizing—oxidizing atmosphere at high temperature
|
Pitter, J.
|
|
1998
|
98 |
1-3 |
p. 1169-1173
5 p.
|
artikel
|
| 128 |
TiAlN and TiAlCN deposition in an industrial PaCVD-plant
|
Heim, D.
|
|
1998
|
98 |
1-3 |
p. 1553-1556
4 p.
|
artikel
|
| 129 |
Transformer-free semiconductor switches for the energization of a pulsed PVD plasma
|
Reschke, J.
|
|
1998
|
98 |
1-3 |
p. 1240-1244
5 p.
|
artikel
|
| 130 |
Transport of negatively charged particles by E × B drift in silane plasmas
|
Maemura, Y.
|
|
1998
|
98 |
1-3 |
p. 1351-1358
8 p.
|
artikel
|
| 131 |
Ultrathin oxide gate dielectrics prepared by low temperature remote plasma-assisted oxidation
|
Niimi, H.
|
|
1998
|
98 |
1-3 |
p. 1529-1533
5 p.
|
artikel
|
| 132 |
Vacuum-ultraviolet photolysis of polymers
|
Holländer, A.
|
|
1998
|
98 |
1-3 |
p. 855-858
4 p.
|
artikel
|
| 133 |
Wool treatment in the gas flow from gliding discharge plasma at atmospheric pressure
|
Janča, J.
|
|
1998
|
98 |
1-3 |
p. 1112-1115
4 p.
|
artikel
|
| 134 |
W/WC diffusion barrier layers for CVD diamond coatings deposited on WC-Co: microstructure and properties
|
Vandierendonck, K.
|
|
1998
|
98 |
1-3 |
p. 1060-1065
6 p.
|
artikel
|
| 135 |
XPS and FTIR analysis of nitrogen incorporation in CNx thin films
|
Tabbal, M.
|
|
1998
|
98 |
1-3 |
p. 1092-1096
5 p.
|
artikel
|
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