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Journal description
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Details for article 90 of 135 found articles
| Title: |
Plasma-engineered Si−SiO2 interfaces: monolayer nitrogen atom incorporation by low-temperature remote plasma-assisted oxidation in N2O |
| Author: |
Koh, K. Niimi, H. Lucovsky, G. |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 98 (1998) nr. 1-3 pages 5 p. |
| Year: |
1998 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 90 of 135 found articles
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