nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Advances in atmospheric pressure PECVD: The influence of plasma parameters on film morphology
|
Hodgkinson, J.L. |
|
2013 |
230 |
C |
p. 73-76 4 p. |
artikel |
2 |
Al2O3 coatings on stainless steel using pulsed-pressure MOCVD
|
Krumdieck, S. |
|
2013 |
230 |
C |
p. 208-212 5 p. |
artikel |
3 |
APCVD of ZnO:Al, insight and control by modeling
|
van Deelen, J. |
|
2013 |
230 |
C |
p. 239-244 6 p. |
artikel |
4 |
Binary and complex oxide thin films for microelectronic applications: An insight into their growth and advanced nanoscopic investigation
|
Lo Nigro, Raffaella |
|
2013 |
230 |
C |
p. 152-162 11 p. |
artikel |
5 |
Control of zinc oxide surface structure using combined atmospheric pressure-based CVD growth and plasma etching
|
Thomson, M. |
|
2013 |
230 |
C |
p. 190-195 6 p. |
artikel |
6 |
CVD growth, characterization and applications of carbon nanostructured materials
|
Shanov, Vesselin |
|
2013 |
230 |
C |
p. 77-86 10 p. |
artikel |
7 |
Deposition and properties of silicon oxynitride films with low propagation losses by inductively coupled PECVD at 150°C
|
Rangarajan, Balaji |
|
2013 |
230 |
C |
p. 46-50 5 p. |
artikel |
8 |
Deposition of undoped and H doped WOx (x≤3) films in a hot-wire atomic layer deposition system without the use of tungsten precursors
|
Kostis, I. |
|
2013 |
230 |
C |
p. 51-58 8 p. |
artikel |
9 |
Diamond coatings on hardmetal substrates with CVD coatings as intermediate layers
|
Lessiak, Mario |
|
2013 |
230 |
C |
p. 119-123 5 p. |
artikel |
10 |
Editorial
|
Maury, Francis |
|
2013 |
230 |
C |
p. 1-2 2 p. |
artikel |
11 |
Editorial Board
|
|
|
2013 |
230 |
C |
p. IFC- 1 p. |
artikel |
12 |
Effect of AC electric fields on the aerosol assisted chemical vapour deposition growth of titanium dioxide thin films
|
Romero, Luz |
|
2013 |
230 |
C |
p. 196-201 6 p. |
artikel |
13 |
Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films
|
Warwick, Michael E.A. |
|
2013 |
230 |
C |
p. 28-32 5 p. |
artikel |
14 |
Electrochemical properties of vanadium oxide coatings grown by APCVD on glass substrates
|
Louloudakis, D. |
|
2013 |
230 |
C |
p. 186-189 4 p. |
artikel |
15 |
Experimental and computational investigation of chemical vapor deposition of Cu from Cu amidinate
|
Aviziotis, Ioannis G. |
|
2013 |
230 |
C |
p. 273-278 6 p. |
artikel |
16 |
Experimental study of the chemical vapor deposition from CH3SiHCl2/H2: Application to the synthesis of monolithic SiC tubes
|
Drieux, P. |
|
2013 |
230 |
C |
p. 137-144 8 p. |
artikel |
17 |
Facile synthesis of catalytically active copper oxide from pulsed-spray evaporation CVD
|
Tian, Zhen-Yu |
|
2013 |
230 |
C |
p. 33-38 6 p. |
artikel |
18 |
Gold nanostructure formation in the photonic crystal matrix by means of MOCVD technique
|
Parkhomenko, R.G. |
|
2013 |
230 |
C |
p. 279-283 5 p. |
artikel |
19 |
Growth of CdS nanowire crystals: Vapor–liquid–solid versus vapor–solid mechanisms
|
Grynko, D.A. |
|
2013 |
230 |
C |
p. 234-238 5 p. |
artikel |
20 |
Growth of GeSnSiC layers for photonic applications
|
Jamshidi, A. |
|
2013 |
230 |
C |
p. 106-110 5 p. |
artikel |
21 |
Growth of lanthanide-doped YF3 thin films by pulsed liquid injection MOCVD: Influence of deposition parameters on film microstructure
|
Payrer, E.L. |
|
2013 |
230 |
C |
p. 22-27 6 p. |
artikel |
22 |
Hafnium and silicon carbide multilayer coatings for the protection of carbon composites
|
Verdon, C. |
|
2013 |
230 |
C |
p. 124-129 6 p. |
artikel |
23 |
High-performance tandem silicon solar cells on F:SnO2
|
Yates, H.M. |
|
2013 |
230 |
C |
p. 228-233 6 p. |
artikel |
24 |
High quality graphene synthesized by atmospheric pressure CVD on copper foil
|
Trinsoutrot, Pierre |
|
2013 |
230 |
C |
p. 87-92 6 p. |
artikel |
25 |
High temperature chemical vapor deposition of aluminum nitride, growth and evaluation
|
Pons, M. |
|
2013 |
230 |
C |
p. 111-118 8 p. |
artikel |
26 |
High vacuum chemical vapour deposition of oxides:
|
Kuzminykh, Yury |
|
2013 |
230 |
C |
p. 13-21 9 p. |
artikel |
27 |
Influence of precursor nature on the thermal growth of Tin–Indium oxide layers by MOCVD
|
Szkutnik, P.D. |
|
2013 |
230 |
C |
p. 305-311 7 p. |
artikel |
28 |
Isotopic study on metalorganic chemical vapor deposition of manganite films
|
Nakamura, Toshihiro |
|
2013 |
230 |
C |
p. 213-218 6 p. |
artikel |
29 |
Langasite crystal microbalance frequency behavior over wide gas phase conditions for chemical vapor deposition
|
Habuka, Hitoshi |
|
2013 |
230 |
C |
p. 312-315 4 p. |
artikel |
30 |
Mass-spectrometric and kinetic study of Ni films MOCVD from bis-(ethylcyclopentadienyl) nickel
|
Protopopova, V.S. |
|
2013 |
230 |
C |
p. 316-321 6 p. |
artikel |
31 |
Metallization of polymer composites by metalorganic chemical vapor deposition of Cu: Surface functionalization driven films characteristics
|
Duguet, Thomas |
|
2013 |
230 |
C |
p. 254-259 6 p. |
artikel |
32 |
Metal PVD honey-combs coated with TIO2 and Al2O3 via PECVD suitable for sensoring applications
|
Cavallin, T. |
|
2013 |
230 |
C |
p. 66-72 7 p. |
artikel |
33 |
Molecular layer deposition of amine-containing alucone thin films
|
Bahlawane, Naoufal |
|
2013 |
230 |
C |
p. 101-105 5 p. |
artikel |
34 |
Monitoring the microstructure of nanosized palladium layers obtained via thermal and VUV stimulated MOCVD
|
Kuchumov, B.M. |
|
2013 |
230 |
C |
p. 266-272 7 p. |
artikel |
35 |
Morphological, electrical and optical properties of highly oriented undoped and doped zinc oxide and cadmium oxide films grown by atmospheric-pressure chemical vapor deposition
|
Terasako, Tomoaki |
|
2013 |
230 |
C |
p. 245-253 9 p. |
artikel |
36 |
Nanocrystallized SnO2 thin films deposited on Si and LaAlO3 substrates by pulsed-MOCVD technique for electrochemical applications
|
Drevet, R. |
|
2013 |
230 |
C |
p. 180-185 6 p. |
artikel |
37 |
O,N-coordinated Ni(II) beta-diketonate derivatives: Synthesis, thermal properties, MOCVD applications
|
Zharkova, G.I. |
|
2013 |
230 |
C |
p. 290-296 7 p. |
artikel |
38 |
PECVD synthesis and optical properties of BCXNY films obtained from N-triethylborazine as a single-source precursor
|
Sulyaeva, V.S. |
|
2013 |
230 |
C |
p. 145-151 7 p. |
artikel |
39 |
Perovskite LaCoO3 thin films on single crystal substrates: MOCVD growth and characterization
|
Catalano, Maria R. |
|
2013 |
230 |
C |
p. 174-179 6 p. |
artikel |
40 |
Photoassisted H2 production by metal oxide nanomaterials fabricated through CVD-based approaches
|
Maccato, Chiara |
|
2013 |
230 |
C |
p. 219-227 9 p. |
artikel |
41 |
Piezoelectric domains in BiFeO3 films grown via MOCVD: Structure/property relationship
|
Condorelli, Guglielmo G. |
|
2013 |
230 |
C |
p. 168-173 6 p. |
artikel |
42 |
Plasma enhanced atomic layer deposition of copper: A comparison of precursors
|
Hagen, D.J. |
|
2013 |
230 |
C |
p. 3-12 10 p. |
artikel |
43 |
Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium β-diketonate precursor
|
Reinke, Michael |
|
2013 |
230 |
C |
p. 297-304 8 p. |
artikel |
44 |
Pulsed-spray evaporation CVD synthesis of hematite thin films for catalytic conversion of CO
|
Mountapmbeme Kouotou, Patrick |
|
2013 |
230 |
C |
p. 59-65 7 p. |
artikel |
45 |
Scale-up design for industrial development of a PP-MOCVD coating system
|
Lee, Darryl |
|
2013 |
230 |
C |
p. 39-45 7 p. |
artikel |
46 |
Synthesis of BI2O3/SiO2 core–shell nanoparticles by an atmospheric CVS/CVD process and their modification by hydrogen or electron-beam induced reduction
|
Weis, Frederik |
|
2013 |
230 |
C |
p. 93-100 8 p. |
artikel |
47 |
Synthesis of nanostructured Pt/oxide catalyst particles by MOCVD process at ambient pressure
|
Faust, Matthias |
|
2013 |
230 |
C |
p. 284-289 6 p. |
artikel |
48 |
The deposition of copper-based thin films via atmospheric pressure plasma-enhanced CVD
|
Hodgkinson, John L. |
|
2013 |
230 |
C |
p. 260-265 6 p. |
artikel |
49 |
Thermochromic vanadium dioxide thin films from electric field assisted aerosol assisted chemical vapour deposition
|
Warwick, Michael E.A. |
|
2013 |
230 |
C |
p. 163-167 5 p. |
artikel |
50 |
Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors
|
Srinivasan, N.B. |
|
2013 |
230 |
C |
p. 130-136 7 p. |
artikel |
51 |
Vapor-deposited hydrogenated and oxygen-deficient molybdenum oxide thin films for application in organic optoelectronics
|
Vasilopoulou, Maria |
|
2013 |
230 |
C |
p. 202-207 6 p. |
artikel |