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Journal description
All volumes of the corresponding journal
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Details for article 48 of 51 found articles
| Title: |
The deposition of copper-based thin films via atmospheric pressure plasma-enhanced CVD |
| Author: |
Hodgkinson, John L. Massey, David Sheel, David W. |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 230 (2013) nr. C pages 6 p. |
| Year: |
2013 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 48 of 51 found articles
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