| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Age-hardening of surface age high speed steel on high carbon steel after plasma decarbonizing
|
Li, Zhonghou
|
|
2000
|
131 |
1-3 |
p. 579-581
3 p.
|
artikel
|
| 2 |
A homogeneous microwave plasma and its application in material surface modification
|
Wu, Cong-Feng
|
|
2000
|
131 |
1-3 |
p. 26-28
3 p.
|
artikel
|
| 3 |
A model for coated surface hardness
|
Fernandes, J.V.
|
|
2000
|
131 |
1-3 |
p. 457-461
5 p.
|
artikel
|
| 4 |
An approach using thin films as a predictive way to produce new bulk materials
|
Vieira, M.T
|
|
2000
|
131 |
1-3 |
p. 162-166
5 p.
|
artikel
|
| 5 |
Applied high-current N-ion-beam surface engineering of metals and industrial tools at Chiang Mai University
|
Davydov, S
|
|
2000
|
131 |
1-3 |
p. 558-562
5 p.
|
artikel
|
| 6 |
A review of investigations on biocompatibility of diamond-like carbon and carbon nitride films
|
Cui, F.Z
|
|
2000
|
131 |
1-3 |
p. 481-487
7 p.
|
artikel
|
| 7 |
A study of lead zirconate titanate etching characteristics using magnetized inductively coupled plasmas
|
Lee, Y.J.
|
|
2000
|
131 |
1-3 |
p. 257-260
4 p.
|
artikel
|
| 8 |
A study of nickel-based corrosion resisting alloy layer obtained by double glow plasma surface alloying technique
|
Zhang, Xu
|
|
2000
|
131 |
1-3 |
p. 378-382
5 p.
|
artikel
|
| 9 |
A study on band-gap tailoring for InP based QW structure by ion implantation and plasma enhanced chemical vapor deposition
|
Jie, Zhao
|
|
2000
|
131 |
1-3 |
p. 340-344
5 p.
|
artikel
|
| 10 |
A study on the etch characteristics of ITO thin film using inductively coupled plasmas
|
Park, J.Y.
|
|
2000
|
131 |
1-3 |
p. 247-251
5 p.
|
artikel
|
| 11 |
A study on the high rate deposition of CrN x films with controlled microstructure by magnetron sputtering
|
Nam, Kyung H.
|
|
2000
|
131 |
1-3 |
p. 222-227
6 p.
|
artikel
|
| 12 |
A study on the synthesis and microstructure of WC–TiN superlattice coating
|
Yoon, Joo S.
|
|
2000
|
131 |
1-3 |
p. 372-377
6 p.
|
artikel
|
| 13 |
Characteristics of Zn diffusion in planar and patterned InP substrate using Zn3P2 film and rapid thermal annealing process
|
Yang, Seung-Yeul
|
|
2000
|
131 |
1-3 |
p. 66-69
4 p.
|
artikel
|
| 14 |
Deposition of duplex Al2O3/DLC coatings on Al alloys for tribological applications using a combined micro-arc oxidation and plasma-immersion ion implantation technique
|
Nie, X.
|
|
2000
|
131 |
1-3 |
p. 506-513
8 p.
|
artikel
|
| 15 |
Deposition of TiCN and ZrCN layers on light metals by PACVD method using radio frequency and pulsed-DC plasma
|
Wöhle, J.
|
|
2000
|
131 |
1-3 |
p. 127-130
4 p.
|
artikel
|
| 16 |
Development of high-density RF plasma and application to PVD
|
Miyake, S
|
|
2000
|
131 |
1-3 |
p. 171-176
6 p.
|
artikel
|
| 17 |
Development of metal vapor vacuum arc ion source in Thailand
|
Davydov, S
|
|
2000
|
131 |
1-3 |
p. 39-43
5 p.
|
artikel
|
| 18 |
Development of titanium diboride coatings deposited by PACVD
|
Pfohl, C
|
|
2000
|
131 |
1-3 |
p. 141-146
6 p.
|
artikel
|
| 19 |
Dry cleaning of metal surfaces by a vacuum arc
|
Takeda, K
|
|
2000
|
131 |
1-3 |
p. 234-238
5 p.
|
artikel
|
| 20 |
Effect of SiO2 intermediate layer on Al2O3/SiO2/n+-poly Si interface deposited using atomic layer deposition (ALD) for deep submicron device applications
|
Suk Yang, Won
|
|
2000
|
131 |
1-3 |
p. 79-83
5 p.
|
artikel
|
| 21 |
Effects of B(CH3O)3 content on a PACVD plasma-boriding process
|
Qiao, Xueliang
|
|
2000
|
131 |
1-3 |
p. 291-293
3 p.
|
artikel
|
| 22 |
Effects of process parameters on the growth of thick SiO2 using plasma enhanced chemical vapor deposition with hexamethyldisilazane
|
Choi, Jin-Kyung
|
|
2000
|
131 |
1-3 |
p. 136-140
5 p.
|
artikel
|
| 23 |
Effects of superimposed pulse bias on TiN coating in cathodic arc deposition
|
Zhengyang, Li
|
|
2000
|
131 |
1-3 |
p. 158-161
4 p.
|
artikel
|
| 24 |
Electromagnetic wave propagation in an ECR plasma
|
Kawai, Yoshinobu
|
|
2000
|
131 |
1-3 |
p. 12-19
8 p.
|
artikel
|
| 25 |
Etching characteristics of lead magnesium niobate–lead titanate (PMN–PT) relaxor ferroelectrics
|
Jang, J.W.
|
|
2000
|
131 |
1-3 |
p. 252-256
5 p.
|
artikel
|
| 26 |
Excitation frequency dependence of the optical emission intensity vs. deposition rate relationship in silane plasmas
|
Takai, Madoka
|
|
2000
|
131 |
1-3 |
p. 50-53
4 p.
|
artikel
|
| 27 |
Experimental investigation of plasma dust and plasma polymerization
|
Qiu, Zhang Guang
|
|
2000
|
131 |
1-3 |
p. 525-527
3 p.
|
artikel
|
| 28 |
Growth characteristics of carbon nanotubes by plasma enhanced hot filament chemical vapor deposition
|
Han, Jae-hee
|
|
2000
|
131 |
1-3 |
p. 93-97
5 p.
|
artikel
|
| 29 |
Growth of Hf(C,N) thin films on Si(100) and D2 steel substrates by plasma assisted MOCVD
|
Han, J.G.
|
|
2000
|
131 |
1-3 |
p. 73-78
6 p.
|
artikel
|
| 30 |
Growth of TiO2 thin films on Si(100) substrates using single molecular precursors by metal organic chemical vapor deposition
|
Kang, Byung-Chang
|
|
2000
|
131 |
1-3 |
p. 88-92
5 p.
|
artikel
|
| 31 |
Heat transfer simulation of HFCVD and fundamentals of diamond vapor growth reactor designing
|
Song, G.H
|
|
2000
|
131 |
1-3 |
p. 500-505
6 p.
|
artikel
|
| 32 |
High current metal-ion implantation to fabricate metal silicides
|
Zhu, H.N
|
|
2000
|
131 |
1-3 |
p. 307-316
10 p.
|
artikel
|
| 33 |
High rate deposition of poly-Si thin films at low temperature using a new designed magnetron sputtering source
|
Boo, Jin-Hyo
|
|
2000
|
131 |
1-3 |
p. 211-215
5 p.
|
artikel
|
| 34 |
High vacuum chemical vapor deposition of cubic SiC thin films on Si(001) substrates using single source precursor
|
Boo, J.-H.
|
|
2000
|
131 |
1-3 |
p. 147-152
6 p.
|
artikel
|
| 35 |
Humidity resistant MoS x films prepared by pulsed magnetron sputtering
|
Lauwerens, W
|
|
2000
|
131 |
1-3 |
p. 216-221
6 p.
|
artikel
|
| 36 |
Hybrid plasma system for diamond-like carbon film deposition
|
Korzec, D
|
|
2000
|
131 |
1-3 |
p. 20-25
6 p.
|
artikel
|
| 37 |
Improvement of neural cell adherence to silicon surface by hydroxyl ion implantation
|
Fan, Y.W
|
|
2000
|
131 |
1-3 |
p. 355-359
5 p.
|
artikel
|
| 38 |
Index
|
|
|
2000
|
131 |
1-3 |
p. 584-593
10 p.
|
artikel
|
| 39 |
Index
|
|
|
2000
|
131 |
1-3 |
p. 582-583
2 p.
|
artikel
|
| 40 |
Influence of the material composition on the nitriding result of steels by plasma immersion ion implantation
|
Blawert, C.
|
|
2000
|
131 |
1-3 |
p. 334-339
6 p.
|
artikel
|
| 41 |
Inner coating of long-narrow tube by plasma sputtering
|
Fujiyama, Hiroshi
|
|
2000
|
131 |
1-3 |
p. 278-283
6 p.
|
artikel
|
| 42 |
In situ cleaning of a chamber wall divided in a reactive ECR plasma
|
Horiuchi, Kouichiro
|
|
2000
|
131 |
1-3 |
p. 243-246
4 p.
|
artikel
|
| 43 |
In-situ TEM observation of silver nanocrystals in an Ag-implanted SiO2 film
|
Jiang, C.Z
|
|
2000
|
131 |
1-3 |
p. 330-333
4 p.
|
artikel
|
| 44 |
Interface engineering for covalently bonded disordered thin films: boron nitride and diamond-like carbon
|
Wang, X
|
|
2000
|
131 |
1-3 |
p. 514-519
6 p.
|
artikel
|
| 45 |
Investigation of sputtered carbon and carbon/chromium multi-layered coatings
|
Yang, S
|
|
2000
|
131 |
1-3 |
p. 412-416
5 p.
|
artikel
|
| 46 |
Investigation of substoichiometric titanium nitride grown by unbalanced magnetron sputtering
|
Yang, S
|
|
2000
|
131 |
1-3 |
p. 228-233
6 p.
|
artikel
|
| 47 |
Investigation of the microwave propagation in an ECR plasma using a self-consistent particle–wave model
|
Muta, Hiroshi
|
|
2000
|
131 |
1-3 |
p. 44-49
6 p.
|
artikel
|
| 48 |
Investigation on characteristics of IDBD plasma
|
Ge, Yuanjing
|
|
2000
|
131 |
1-3 |
p. 34-38
5 p.
|
artikel
|
| 49 |
Investigation on processing of industrial set-up plasma enhanced chemical vapor deposition with pulsed d.c. power
|
Ma, Shengli
|
|
2000
|
131 |
1-3 |
p. 131-135
5 p.
|
artikel
|
| 50 |
In vitro and in vivo evaluation of degradability of hydroxyapatite coatings synthesized by ion beam-assisted deposition
|
Luo, Z.S
|
|
2000
|
131 |
1-3 |
p. 192-195
4 p.
|
artikel
|
| 51 |
Low temperature nitriding and carburizing of AISI304 stainless steel by a low pressure plasma arc source
|
Liang, Wang
|
|
2000
|
131 |
1-3 |
p. 563-567
5 p.
|
artikel
|
| 52 |
Low-temperature plasma-assisted nitriding
|
Czerwiec, T
|
|
2000
|
131 |
1-3 |
p. 267-277
11 p.
|
artikel
|
| 53 |
Multicomponent and multiphase hard coatings for tribological applications
|
Jehn, Hermann A.
|
|
2000
|
131 |
1-3 |
p. 433-440
8 p.
|
artikel
|
| 54 |
Multi-layer compound coating on cast iron piston ring by multi-arc and magnetron sputtering ion compound plating technique
|
Zhuo, Sun
|
|
2000
|
131 |
1-3 |
p. 422-427
6 p.
|
artikel
|
| 55 |
Nitriding at low temperature
|
Fewell, M.P
|
|
2000
|
131 |
1-3 |
p. 284-290
7 p.
|
artikel
|
| 56 |
Oxidation of sputtered W-based coatings
|
Cavaleiro, A
|
|
2000
|
131 |
1-3 |
p. 441-447
7 p.
|
artikel
|
| 57 |
Pitting corrosion resistance of high nitrogen f.c.c. phase in plasma source ion nitrided austenitic stainless steel
|
Zhu, X.M.
|
|
2000
|
131 |
1-3 |
p. 400-403
4 p.
|
artikel
|
| 58 |
Planar optical waveguide thin films grown by microwave ECR PECVD
|
Zhang, Jinsong
|
|
2000
|
131 |
1-3 |
p. 116-120
5 p.
|
artikel
|
| 59 |
Plasma-based low-energy ion implantation for low-temperature surface engineering
|
Lei, M.K
|
|
2000
|
131 |
1-3 |
p. 317-325
9 p.
|
artikel
|
| 60 |
Plasma carburizing process for the low distortion of automobile gears
|
Baek, J.M
|
|
2000
|
131 |
1-3 |
p. 568-573
6 p.
|
artikel
|
| 61 |
Plasma dry etched p-silicon micromolds for permalloy microstructure array electrodeposition
|
Liu, Z.W.
|
|
2000
|
131 |
1-3 |
p. 239-242
4 p.
|
artikel
|
| 62 |
Plasma parameter measurements and deposition of a-Si:H thin films in pulsed ECR plasma.
|
Itagaki, N
|
|
2000
|
131 |
1-3 |
p. 54-57
4 p.
|
artikel
|
| 63 |
Plasma post-oxidation process for nitrocarburized layer
|
Hong, J.M.
|
|
2000
|
131 |
1-3 |
p. 547-551
5 p.
|
artikel
|
| 64 |
Plasma processes and film deposition using tetraethoxysilane
|
Nöthe, M
|
|
2000
|
131 |
1-3 |
p. 102-108
7 p.
|
artikel
|
| 65 |
Plasma-sprayed wear-resistant coatings with respect to ecological aspects
|
Steinhäuser, S
|
|
2000
|
131 |
1-3 |
p. 365-371
7 p.
|
artikel
|
| 66 |
Plasma surface alloying of spheroidal graphite iron
|
He, Zhiyong
|
|
2000
|
131 |
1-3 |
p. 574-578
5 p.
|
artikel
|
| 67 |
Plasma surface engineering in first wall of tokamak
|
Kui Shang, Zhen
|
|
2000
|
131 |
1-3 |
p. 109-115
7 p.
|
artikel
|
| 68 |
Plasma vapor deposition hard coating on pre-nitrided low alloy steel
|
Liang, Wang
|
|
2000
|
131 |
1-3 |
p. 452-456
5 p.
|
artikel
|
| 69 |
Polymer modification by MEVVA source deposited and ion implantation
|
Yuguang, Wu
|
|
2000
|
131 |
1-3 |
p. 520-524
5 p.
|
artikel
|
| 70 |
Preface
|
|
|
2000
|
131 |
1-3 |
p. xv-
1 p.
|
artikel
|
| 71 |
Preferential growth of C54 TiSi2 by metal vapor vacuum arc ion source implantation and post-annealing
|
Wang, Shuangbao
|
|
2000
|
131 |
1-3 |
p. 84-87
4 p.
|
artikel
|
| 72 |
Preparation of aluminum oxide films by ion beam assisted deposition
|
Shimizu, I
|
|
2000
|
131 |
1-3 |
p. 187-191
5 p.
|
artikel
|
| 73 |
Preparation of multi-layer carbon nitride films by alternate processes of magnetron sputtering and ion beam implantation
|
Shibata, Tetsuya
|
|
2000
|
131 |
1-3 |
p. 428-432
5 p.
|
artikel
|
| 74 |
Pre-treatment of low temperature GaN buffer layer deposited on AlN/Si substrate by hydride vapor phase epitaxy
|
Jin Kim, Ha
|
|
2000
|
131 |
1-3 |
p. 465-469
5 p.
|
artikel
|
| 75 |
Production of large-area coatings on glasses and plastics
|
Bugaev, S.P
|
|
2000
|
131 |
1-3 |
p. 474-480
7 p.
|
artikel
|
| 76 |
Properties of amorphous tin-doped indium oxide thin films deposited by O2/Ar mixture ion beam-assisted system at room temperature
|
Kim, H.J.
|
|
2000
|
131 |
1-3 |
p. 201-205
5 p.
|
artikel
|
| 77 |
Properties of sputter-deposited MoS2/metal composite coatings deposited by closed field unbalanced magnetron sputter ion plating
|
Rigato, V
|
|
2000
|
131 |
1-3 |
p. 206-210
5 p.
|
artikel
|
| 78 |
Properties of surface layers produced on the Ti–6Al–3Mo–2Cr titanium alloy under glow discharge conditions
|
Fleszar, A.
|
|
2000
|
131 |
1-3 |
p. 62-65
4 p.
|
artikel
|
| 79 |
Recent advance in surface treatment and its applications in China
|
Xianghuai, Liu
|
|
2000
|
131 |
1-3 |
p. 261-266
6 p.
|
artikel
|
| 80 |
Residual stress analysis of SiO2 films deposited by plasma-enhanced chemical vapor deposition
|
Choi, Jin-Kyung
|
|
2000
|
131 |
1-3 |
p. 153-157
5 p.
|
artikel
|
| 81 |
Review of heating mechanism in inductively coupled plasma
|
Seo, Sang-Hun
|
|
2000
|
131 |
1-3 |
p. 1-11
11 p.
|
artikel
|
| 82 |
SEM study of fluorocarbon films by R.F. sputtering PTFE targets on PET substrates
|
Qi, H.J
|
|
2000
|
131 |
1-3 |
p. 177-180
4 p.
|
artikel
|
| 83 |
Sterilization and plasma processing of room temperature surfaces with a one atmosphere uniform glow discharge plasma (OAUGDP)
|
Gadri, Rami Ben
|
|
2000
|
131 |
1-3 |
p. 528-541
14 p.
|
artikel
|
| 84 |
Stress design in hard coatings
|
Uhlmann, E
|
|
2000
|
131 |
1-3 |
p. 448-451
4 p.
|
artikel
|
| 85 |
Structural characteristics of boron nitride thin films synthesized by the technique of unequal-potential hollow-cathode effect
|
Tian, Linhai
|
|
2000
|
131 |
1-3 |
p. 70-72
3 p.
|
artikel
|
| 86 |
Studies on calcium phosphate coatings
|
Lee, In-Seop
|
|
2000
|
131 |
1-3 |
p. 181-186
6 p.
|
artikel
|
| 87 |
Study of the surface-modified Teflon/ceramics complex material treated by microwave plasma with XPS analysis
|
Liang, R.Q.
|
|
2000
|
131 |
1-3 |
p. 294-299
6 p.
|
artikel
|
| 88 |
Study on functionally gradient coatings of Ti–Al–N
|
Qiao, Xueliang
|
|
2000
|
131 |
1-3 |
p. 462-464
3 p.
|
artikel
|
| 89 |
Study on the structure and tribological properties of CrN coating by IBED
|
Bin, Tang
|
|
2000
|
131 |
1-3 |
p. 391-394
4 p.
|
artikel
|
| 90 |
Surface-mediated absorption of (Au,Ag) alloy granular nano-composite films
|
Wang, Ququan
|
|
2000
|
131 |
1-3 |
p. 408-411
4 p.
|
artikel
|
| 91 |
Surface properties of Nb+C ion co-implanted stainless steel
|
Yi, Z
|
|
2000
|
131 |
1-3 |
p. 360-364
5 p.
|
artikel
|
| 92 |
Surface structure and corrosion properties of binary Ti-C and Mo-C coatings co-deposited by filtered vacuum arc plasma deposition system
|
Liang, H
|
|
2000
|
131 |
1-3 |
p. 58-61
4 p.
|
artikel
|
| 93 |
Synthesis of aluminum nitride films by activated reactive ion plating with a cathodic arc source
|
Xin, Hai-Wei
|
|
2000
|
131 |
1-3 |
p. 167-170
4 p.
|
artikel
|
| 94 |
The corrosion behavior of TiAlN coatings prepared by PVD in a hydrofluoric gas atmosphere
|
S. Choi, In
|
|
2000
|
131 |
1-3 |
p. 383-385
3 p.
|
artikel
|
| 95 |
The dependence of GaN growth rate on electron temperature in an ECR plasma
|
Pu, Yi-Kang
|
|
2000
|
131 |
1-3 |
p. 470-473
4 p.
|
artikel
|
| 96 |
The effect of metallic oxide layer on reliability of lead zirconate titante thin film capacitors
|
Han, Geunjo
|
|
2000
|
131 |
1-3 |
p. 542-546
5 p.
|
artikel
|
| 97 |
The effect of nitrogen partial pressure on the bonding in sputtered CN x films: implications for formation of β-C3N4
|
Monclus, M.A
|
|
2000
|
131 |
1-3 |
p. 488-492
5 p.
|
artikel
|
| 98 |
The effect of plasma density on the deposition and ion implantation to the materials with three-dimensional topologies in metal d.c. plasma-based ion implantation
|
Yukimura, K.
|
|
2000
|
131 |
1-3 |
p. 98-101
4 p.
|
artikel
|
| 99 |
The influence of nitrogen on the mechanical behaviour of multilayered coatings
|
Vieira, M.T
|
|
2000
|
131 |
1-3 |
p. 417-421
5 p.
|
artikel
|
| 100 |
The nature of expanded austenite
|
Fewell, M.P
|
|
2000
|
131 |
1-3 |
p. 300-306
7 p.
|
artikel
|
| 101 |
The optical properties of Ag–Si nano-composite films prepared by sputtering
|
Wang, Ququan
|
|
2000
|
131 |
1-3 |
p. 404-407
4 p.
|
artikel
|
| 102 |
The properties of AlN prepared by plasma nitriding and plasma source ion implantation techniques
|
Shim, Yun-Keun
|
|
2000
|
131 |
1-3 |
p. 345-349
5 p.
|
artikel
|
| 103 |
Thermal plasma processing — syntheses of diamond and β″-alumina
|
Fukumasa, Osamu
|
|
2000
|
131 |
1-3 |
p. 493-499
7 p.
|
artikel
|
| 104 |
The strain-induced ferroelectric properties of c-axis oriented (Ba,Sr)TiO3 thin films
|
Jun, Sungjin
|
|
2000
|
131 |
1-3 |
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