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Journal description
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Details for article 20 of 111 found articles
| Title: |
Effect of SiO2 intermediate layer on Al2O3/SiO2/n+-poly Si interface deposited using atomic layer deposition (ALD) for deep submicron device applications |
| Author: |
Suk Yang, Won Kwan Kim, Yeong Yang, Seung-Yeal Hwak Choi, Jin Soo Park, Heung In Lee, Sang Yoo, Ji-Beom |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 131 (2000) nr. 1-3 pages 5 p. |
| Year: |
2000 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 20 of 111 found articles
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