nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A novel on-chip electrostatic discharge protection design for RF ICs
|
Feng, H.G. |
|
|
32 |
3 |
p. 189-195 |
artikel |
2 |
A versatile 3.3V CMOS laser driver system
|
Colonna, V |
|
|
32 |
3 |
p. 253-263 |
artikel |
3 |
Compact DC model for submicron GaAs MESFETs including gate-source modulation effects
|
McNally, P.J. |
|
|
32 |
3 |
p. 249-251 |
artikel |
4 |
Conductivity of conductive polymer for flip chip bonding and BGA socket
|
Sun, M |
|
|
32 |
3 |
p. 197-203 |
artikel |
5 |
Design and testing of a CMOS BDJ detector for integrated micro-analysis systems
|
Lu, G.N. |
|
|
32 |
3 |
p. 227-234 |
artikel |
6 |
Development of a rapid and automated TEM sample preparation method in semiconductor failure analysis and the study of the relevant TEM artifact
|
Dai, J.Y. |
|
|
32 |
3 |
p. 221-226 |
artikel |
7 |
Effective modeling of temperature-dependent body current for submicron devices under Bi–MOS hybrid-mode operation
|
Seah, Siau Hing Lionel |
|
|
32 |
3 |
p. 205-214 |
artikel |
8 |
Erratum to “Mechanical-thermal noise in micromachined gyros” [Microelectron. J. 30 (1999) 1227–1230]
|
Annovazzi-Lodi, V. |
|
|
32 |
3 |
p. 285 |
artikel |
9 |
Handbook Series on Semiconductors Parameters
|
Henini, M. |
|
|
32 |
3 |
p. 274-275 |
artikel |
10 |
I d–V d characteristics of optically biased short channel GaAs MESFET
|
Bose, S. |
|
|
32 |
3 |
p. 241-247 |
artikel |
11 |
Rail-to-rail adaptive biased low-power Op-Amp
|
Ferri, G. |
|
|
32 |
3 |
p. 265-272 |
artikel |
12 |
RF Circuit Design — Theory and Applications
|
Krstić, D. |
|
|
32 |
3 |
p. 274 |
artikel |
13 |
Sampling in Digital Signal Processing and Control
|
Naumović, M. |
|
|
32 |
3 |
p. 273-274 |
artikel |
14 |
Surface-potential-based charge sheet model for the polysilicon thin film transistors without considering kink effect
|
Siddiqui, M.J. |
|
|
32 |
3 |
p. 235-240 |
artikel |
15 |
Thickness-dependent thermal reliability of low-dielectric constant polycrystalline PTFE submicron dielectric thin films
|
Kim, H.K. |
|
|
32 |
3 |
p. 215-219 |
artikel |