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                             46 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Alteration of internal stresses in SiO2/Cu/TiN thin films by X-ray and synchrotron radiation due to heat treatment Matsue, Tatsuya
2006
80 7 p. 836-839
4 p.
artikel
2 A novel magnetron sputtering for flexible coatings as a function for production of high quality films Wang, Cheng-Shih
2006
80 7 p. 650-653
4 p.
artikel
3 Application of high-density plasma to sputtering and reactive sputtering processes Banno, Tatsuya
2006
80 7 p. 667-670
4 p.
artikel
4 Bottom-coverage simulation for magnetron-sputtering apparatus activated with superconducting bulk magnet Yamazaki, Toshinari
2006
80 7 p. 675-678
4 p.
artikel
5 Characterization of photoluminescence of β-FeSi2 thin film fabricated on Si and SIMOX substrate by IBSD method Shimura, Kenichiro
2006
80 7 p. 719-722
4 p.
artikel
6 Concentration profiles of Zn ions implanted with 60keV for nanoparticle formation in silica glass Amekura, H.
2006
80 7 p. 802-805
4 p.
artikel
7 Control of crystallographic orientation of LiNbO3 films grown by electron–cyclotron resonance plasma sputtering on TiN films Akazawa, H.
2006
80 7 p. 704-707
4 p.
artikel
8 DC magnetron sputtering of Si to form SiO2 in low-energy ion beam Lee, Cheng-Chung
2006
80 7 p. 693-697
5 p.
artikel
9 Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation Frach, P.
2006
80 7 p. 679-683
5 p.
artikel
10 Development of a compact angle-resolved secondary ion mass spectrometer for Ar+ sputtering Kawaguchi, Shinichi
2006
80 7 p. 768-770
3 p.
artikel
11 Editorial Board & Publication Information 2006
80 7 p. CO2-
1 p.
artikel
12 Effects of H2O partial pressure on the crystallinity of ZnO thin film and electrical characteristics of film bulk acoustic wave resonators Yamada, H.
2006
80 7 p. 814-817
4 p.
artikel
13 Effects of substrate temperature on tin-doped indium oxide films deposited by dc arc discharge ion plating Omoto, Hideo
2006
80 7 p. 783-787
5 p.
artikel
14 Electrochemical studies of nano-structured diamond thin-film electrodes grown by microwave plasma CVD Chen, Yi-Jiun
2006
80 7 p. 818-822
5 p.
artikel
15 Energetic negative ions in titanium oxide deposition by reactive sputtering in Ar/O2 Tominaga, Kikuo
2006
80 7 p. 654-657
4 p.
artikel
16 Experimental and numerical investigation of ion temperature in an ECR plasma Koga, Mayuko
2006
80 7 p. 771-775
5 p.
artikel
17 Extension of surface-wave-excited high-density plasma column sustained along graphite rod target Kousaka, Hiroyuki
2006
80 7 p. 806-809
4 p.
artikel
18 Fabrication of photocatalytic heat-mirror with TiO2/TiN/TiO2 stacked layers Okada, Masahisa
2006
80 7 p. 732-735
4 p.
artikel
19 Flat erosion magnetron sputtering with a moving unbalanced magnet Iseki, Takayuki
2006
80 7 p. 662-666
5 p.
artikel
20 Formation of polycrystalline SiGe thin films by the RF magnetron sputtering method with Ar–H2 mixture gases Nakamura, Isao
2006
80 7 p. 712-715
4 p.
artikel
21 Frictional property with preferred crystal orientation of platinum oxide and palladium oxide coatings synthesized by combinatorial sputter coating system Goto, Masahiro
2006
80 7 p. 740-743
4 p.
artikel
22 Gas pressure effects on thickness uniformity and circumvented deposition during sputter deposition process Nakano, Takeo
2006
80 7 p. 647-649
3 p.
artikel
23 Growth control of carbon nanotubes by plasma-enhanced chemical vapor deposition and reactive ion etching Sato, Hideki
2006
80 7 p. 798-801
4 p.
artikel
24 Growth properties of AlN films on sapphire substrates by reactive sputtering Guo, Q.X.
2006
80 7 p. 716-718
3 p.
artikel
25 Hollow cathode and hybrid plasma processing Baránková, Hana
2006
80 7 p. 688-692
5 p.
artikel
26 H2S sensing property of porous SnO2 sputtered films coated with various doping films Jin, Chengji
2006
80 7 p. 723-725
3 p.
artikel
27 Improvement in thermal stability of B–C–N thin films fabricated by magnetron sputtering using graphite and BN co-target Yokomichi, H.
2006
80 7 p. 748-751
4 p.
artikel
28 Improvement of thickness uniformity and crystallinity of AlN films prepared by off-axis sputtering Umeda, Keiichi
2006
80 7 p. 658-661
4 p.
artikel
29 Investigation on Ce-doped LnMnO3 ( Ln = La , Nd) thin films by laser molecular beam epitaxy method Yanagida, Takeshi
2006
80 7 p. 780-782
3 p.
artikel
30 Ion-beam processing of single crystal diamond using SOG mask Taniguchi, Jun
2006
80 7 p. 793-797
5 p.
artikel
31 Mechanisms of carrier generation and transport in Ni-doped Cu2O Kikuchi, N.
2006
80 7 p. 756-760
5 p.
artikel
32 Micowave plasma-assisted ionization of sputtered aluminum atoms in DC magnetron sputtering Yonesu, Akira
2006
80 7 p. 671-674
4 p.
artikel
33 New approaches to fabrication of multilayer Fresnel zone plate for high-energy synchrotron radiation X-rays Tamura, Shigeharu
2006
80 7 p. 823-827
5 p.
artikel
34 Optical nonlinearity of metal nanoparticle composites fabricated by negative ion implantation Takeda, Yoshihiko
2006
80 7 p. 776-779
4 p.
artikel
35 Optical switching property of Pd-capped Mg–Ni alloy thin films prepared by magnetron sputtering Yoshimura, Kazuki
2006
80 7 p. 684-687
4 p.
artikel
36 Particularities of condensation of atoms with increased kinetic energy Shaginyan, Leonid R.
2006
80 7 p. 828-831
4 p.
artikel
37 Plasma etching of high-k and metal gate materials Nakamura, Keisuke
2006
80 7 p. 761-767
7 p.
artikel
38 Sputter deposition of nm-thick films for passivation of organic pellicles Kuo, Y.
2006
80 7 p. 698-703
6 p.
artikel
39 Stress control of a-SiC films deposited by dual source dc magnetron sputtering Inoue, S.
2006
80 7 p. 744-747
4 p.
artikel
40 Study on hybrid nano-diamond films formed by plasma chemical vapor deposition (CVD) Ikenaga, N.
2006
80 7 p. 810-813
4 p.
artikel
41 Surface modification of biodegradable plastics by ion beams Takano, Ichiro
2006
80 7 p. 788-792
5 p.
artikel
42 Synthesis of DLC films by PECVD combined with hollow cathode sputtering Anita, V.
2006
80 7 p. 736-739
4 p.
artikel
43 Synthesis of nitrogen-rich carbon nitride thin films via magnetic field-assisted inductively coupled plasma sputtering Ohta, R.
2006
80 7 p. 752-755
4 p.
artikel
44 Temperature effect on structure and surface morphology of indium tin oxide films deposited by reactive ion-beam sputtering Iwatsubo, S.
2006
80 7 p. 708-711
4 p.
artikel
45 Thermomechanical behavior of Ti–Ni shape memory alloy films deposited by DC magnetron sputtering Namazu, Takahiro
2006
80 7 p. 726-731
6 p.
artikel
46 Work function measurement of transition metal nitride and carbide thin films Fujii, R.
2006
80 7 p. 832-835
4 p.
artikel
                             46 gevonden resultaten
 
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