nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Alteration of internal stresses in SiO2/Cu/TiN thin films by X-ray and synchrotron radiation due to heat treatment
|
Matsue, Tatsuya |
|
2006 |
80 |
7 |
p. 836-839 4 p. |
artikel |
2 |
A novel magnetron sputtering for flexible coatings as a function for production of high quality films
|
Wang, Cheng-Shih |
|
2006 |
80 |
7 |
p. 650-653 4 p. |
artikel |
3 |
Application of high-density plasma to sputtering and reactive sputtering processes
|
Banno, Tatsuya |
|
2006 |
80 |
7 |
p. 667-670 4 p. |
artikel |
4 |
Bottom-coverage simulation for magnetron-sputtering apparatus activated with superconducting bulk magnet
|
Yamazaki, Toshinari |
|
2006 |
80 |
7 |
p. 675-678 4 p. |
artikel |
5 |
Characterization of photoluminescence of β-FeSi2 thin film fabricated on Si and SIMOX substrate by IBSD method
|
Shimura, Kenichiro |
|
2006 |
80 |
7 |
p. 719-722 4 p. |
artikel |
6 |
Concentration profiles of Zn ions implanted with 60keV for nanoparticle formation in silica glass
|
Amekura, H. |
|
2006 |
80 |
7 |
p. 802-805 4 p. |
artikel |
7 |
Control of crystallographic orientation of LiNbO3 films grown by electron–cyclotron resonance plasma sputtering on TiN films
|
Akazawa, H. |
|
2006 |
80 |
7 |
p. 704-707 4 p. |
artikel |
8 |
DC magnetron sputtering of Si to form SiO2 in low-energy ion beam
|
Lee, Cheng-Chung |
|
2006 |
80 |
7 |
p. 693-697 5 p. |
artikel |
9 |
Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation
|
Frach, P. |
|
2006 |
80 |
7 |
p. 679-683 5 p. |
artikel |
10 |
Development of a compact angle-resolved secondary ion mass spectrometer for Ar+ sputtering
|
Kawaguchi, Shinichi |
|
2006 |
80 |
7 |
p. 768-770 3 p. |
artikel |
11 |
Editorial Board & Publication Information
|
|
|
2006 |
80 |
7 |
p. CO2- 1 p. |
artikel |
12 |
Effects of H2O partial pressure on the crystallinity of ZnO thin film and electrical characteristics of film bulk acoustic wave resonators
|
Yamada, H. |
|
2006 |
80 |
7 |
p. 814-817 4 p. |
artikel |
13 |
Effects of substrate temperature on tin-doped indium oxide films deposited by dc arc discharge ion plating
|
Omoto, Hideo |
|
2006 |
80 |
7 |
p. 783-787 5 p. |
artikel |
14 |
Electrochemical studies of nano-structured diamond thin-film electrodes grown by microwave plasma CVD
|
Chen, Yi-Jiun |
|
2006 |
80 |
7 |
p. 818-822 5 p. |
artikel |
15 |
Energetic negative ions in titanium oxide deposition by reactive sputtering in Ar/O2
|
Tominaga, Kikuo |
|
2006 |
80 |
7 |
p. 654-657 4 p. |
artikel |
16 |
Experimental and numerical investigation of ion temperature in an ECR plasma
|
Koga, Mayuko |
|
2006 |
80 |
7 |
p. 771-775 5 p. |
artikel |
17 |
Extension of surface-wave-excited high-density plasma column sustained along graphite rod target
|
Kousaka, Hiroyuki |
|
2006 |
80 |
7 |
p. 806-809 4 p. |
artikel |
18 |
Fabrication of photocatalytic heat-mirror with TiO2/TiN/TiO2 stacked layers
|
Okada, Masahisa |
|
2006 |
80 |
7 |
p. 732-735 4 p. |
artikel |
19 |
Flat erosion magnetron sputtering with a moving unbalanced magnet
|
Iseki, Takayuki |
|
2006 |
80 |
7 |
p. 662-666 5 p. |
artikel |
20 |
Formation of polycrystalline SiGe thin films by the RF magnetron sputtering method with Ar–H2 mixture gases
|
Nakamura, Isao |
|
2006 |
80 |
7 |
p. 712-715 4 p. |
artikel |
21 |
Frictional property with preferred crystal orientation of platinum oxide and palladium oxide coatings synthesized by combinatorial sputter coating system
|
Goto, Masahiro |
|
2006 |
80 |
7 |
p. 740-743 4 p. |
artikel |
22 |
Gas pressure effects on thickness uniformity and circumvented deposition during sputter deposition process
|
Nakano, Takeo |
|
2006 |
80 |
7 |
p. 647-649 3 p. |
artikel |
23 |
Growth control of carbon nanotubes by plasma-enhanced chemical vapor deposition and reactive ion etching
|
Sato, Hideki |
|
2006 |
80 |
7 |
p. 798-801 4 p. |
artikel |
24 |
Growth properties of AlN films on sapphire substrates by reactive sputtering
|
Guo, Q.X. |
|
2006 |
80 |
7 |
p. 716-718 3 p. |
artikel |
25 |
Hollow cathode and hybrid plasma processing
|
Baránková, Hana |
|
2006 |
80 |
7 |
p. 688-692 5 p. |
artikel |
26 |
H2S sensing property of porous SnO2 sputtered films coated with various doping films
|
Jin, Chengji |
|
2006 |
80 |
7 |
p. 723-725 3 p. |
artikel |
27 |
Improvement in thermal stability of B–C–N thin films fabricated by magnetron sputtering using graphite and BN co-target
|
Yokomichi, H. |
|
2006 |
80 |
7 |
p. 748-751 4 p. |
artikel |
28 |
Improvement of thickness uniformity and crystallinity of AlN films prepared by off-axis sputtering
|
Umeda, Keiichi |
|
2006 |
80 |
7 |
p. 658-661 4 p. |
artikel |
29 |
Investigation on Ce-doped LnMnO3 ( Ln = La , Nd) thin films by laser molecular beam epitaxy method
|
Yanagida, Takeshi |
|
2006 |
80 |
7 |
p. 780-782 3 p. |
artikel |
30 |
Ion-beam processing of single crystal diamond using SOG mask
|
Taniguchi, Jun |
|
2006 |
80 |
7 |
p. 793-797 5 p. |
artikel |
31 |
Mechanisms of carrier generation and transport in Ni-doped Cu2O
|
Kikuchi, N. |
|
2006 |
80 |
7 |
p. 756-760 5 p. |
artikel |
32 |
Micowave plasma-assisted ionization of sputtered aluminum atoms in DC magnetron sputtering
|
Yonesu, Akira |
|
2006 |
80 |
7 |
p. 671-674 4 p. |
artikel |
33 |
New approaches to fabrication of multilayer Fresnel zone plate for high-energy synchrotron radiation X-rays
|
Tamura, Shigeharu |
|
2006 |
80 |
7 |
p. 823-827 5 p. |
artikel |
34 |
Optical nonlinearity of metal nanoparticle composites fabricated by negative ion implantation
|
Takeda, Yoshihiko |
|
2006 |
80 |
7 |
p. 776-779 4 p. |
artikel |
35 |
Optical switching property of Pd-capped Mg–Ni alloy thin films prepared by magnetron sputtering
|
Yoshimura, Kazuki |
|
2006 |
80 |
7 |
p. 684-687 4 p. |
artikel |
36 |
Particularities of condensation of atoms with increased kinetic energy
|
Shaginyan, Leonid R. |
|
2006 |
80 |
7 |
p. 828-831 4 p. |
artikel |
37 |
Plasma etching of high-k and metal gate materials
|
Nakamura, Keisuke |
|
2006 |
80 |
7 |
p. 761-767 7 p. |
artikel |
38 |
Sputter deposition of nm-thick films for passivation of organic pellicles
|
Kuo, Y. |
|
2006 |
80 |
7 |
p. 698-703 6 p. |
artikel |
39 |
Stress control of a-SiC films deposited by dual source dc magnetron sputtering
|
Inoue, S. |
|
2006 |
80 |
7 |
p. 744-747 4 p. |
artikel |
40 |
Study on hybrid nano-diamond films formed by plasma chemical vapor deposition (CVD)
|
Ikenaga, N. |
|
2006 |
80 |
7 |
p. 810-813 4 p. |
artikel |
41 |
Surface modification of biodegradable plastics by ion beams
|
Takano, Ichiro |
|
2006 |
80 |
7 |
p. 788-792 5 p. |
artikel |
42 |
Synthesis of DLC films by PECVD combined with hollow cathode sputtering
|
Anita, V. |
|
2006 |
80 |
7 |
p. 736-739 4 p. |
artikel |
43 |
Synthesis of nitrogen-rich carbon nitride thin films via magnetic field-assisted inductively coupled plasma sputtering
|
Ohta, R. |
|
2006 |
80 |
7 |
p. 752-755 4 p. |
artikel |
44 |
Temperature effect on structure and surface morphology of indium tin oxide films deposited by reactive ion-beam sputtering
|
Iwatsubo, S. |
|
2006 |
80 |
7 |
p. 708-711 4 p. |
artikel |
45 |
Thermomechanical behavior of Ti–Ni shape memory alloy films deposited by DC magnetron sputtering
|
Namazu, Takahiro |
|
2006 |
80 |
7 |
p. 726-731 6 p. |
artikel |
46 |
Work function measurement of transition metal nitride and carbide thin films
|
Fujii, R. |
|
2006 |
80 |
7 |
p. 832-835 4 p. |
artikel |