| no |
title |
author |
magazine |
year |
volume |
issue |
page(s) |
type |
| 1 |
Alteration of internal stresses in SiO2/Cu/TiN thin films by X-ray and synchrotron radiation due to heat treatment
|
Matsue, Tatsuya
|
|
2006
|
80 |
7 |
p. 836-839
4 p.
|
article
|
| 2 |
A novel magnetron sputtering for flexible coatings as a function for production of high quality films
|
Wang, Cheng-Shih
|
|
2006
|
80 |
7 |
p. 650-653
4 p.
|
article
|
| 3 |
Application of high-density plasma to sputtering and reactive sputtering processes
|
Banno, Tatsuya
|
|
2006
|
80 |
7 |
p. 667-670
4 p.
|
article
|
| 4 |
Bottom-coverage simulation for magnetron-sputtering apparatus activated with superconducting bulk magnet
|
Yamazaki, Toshinari
|
|
2006
|
80 |
7 |
p. 675-678
4 p.
|
article
|
| 5 |
Characterization of photoluminescence of β-FeSi2 thin film fabricated on Si and SIMOX substrate by IBSD method
|
Shimura, Kenichiro
|
|
2006
|
80 |
7 |
p. 719-722
4 p.
|
article
|
| 6 |
Concentration profiles of Zn ions implanted with 60keV for nanoparticle formation in silica glass
|
Amekura, H.
|
|
2006
|
80 |
7 |
p. 802-805
4 p.
|
article
|
| 7 |
Control of crystallographic orientation of LiNbO3 films grown by electron–cyclotron resonance plasma sputtering on TiN films
|
Akazawa, H.
|
|
2006
|
80 |
7 |
p. 704-707
4 p.
|
article
|
| 8 |
DC magnetron sputtering of Si to form SiO2 in low-energy ion beam
|
Lee, Cheng-Chung
|
|
2006
|
80 |
7 |
p. 693-697
5 p.
|
article
|
| 9 |
Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation
|
Frach, P.
|
|
2006
|
80 |
7 |
p. 679-683
5 p.
|
article
|
| 10 |
Development of a compact angle-resolved secondary ion mass spectrometer for Ar+ sputtering
|
Kawaguchi, Shinichi
|
|
2006
|
80 |
7 |
p. 768-770
3 p.
|
article
|
| 11 |
Editorial Board & Publication Information
|
|
|
2006
|
80 |
7 |
p. CO2-
1 p.
|
article
|
| 12 |
Effects of H2O partial pressure on the crystallinity of ZnO thin film and electrical characteristics of film bulk acoustic wave resonators
|
Yamada, H.
|
|
2006
|
80 |
7 |
p. 814-817
4 p.
|
article
|
| 13 |
Effects of substrate temperature on tin-doped indium oxide films deposited by dc arc discharge ion plating
|
Omoto, Hideo
|
|
2006
|
80 |
7 |
p. 783-787
5 p.
|
article
|
| 14 |
Electrochemical studies of nano-structured diamond thin-film electrodes grown by microwave plasma CVD
|
Chen, Yi-Jiun
|
|
2006
|
80 |
7 |
p. 818-822
5 p.
|
article
|
| 15 |
Energetic negative ions in titanium oxide deposition by reactive sputtering in Ar/O2
|
Tominaga, Kikuo
|
|
2006
|
80 |
7 |
p. 654-657
4 p.
|
article
|
| 16 |
Experimental and numerical investigation of ion temperature in an ECR plasma
|
Koga, Mayuko
|
|
2006
|
80 |
7 |
p. 771-775
5 p.
|
article
|
| 17 |
Extension of surface-wave-excited high-density plasma column sustained along graphite rod target
|
Kousaka, Hiroyuki
|
|
2006
|
80 |
7 |
p. 806-809
4 p.
|
article
|
| 18 |
Fabrication of photocatalytic heat-mirror with TiO2/TiN/TiO2 stacked layers
|
Okada, Masahisa
|
|
2006
|
80 |
7 |
p. 732-735
4 p.
|
article
|
| 19 |
Flat erosion magnetron sputtering with a moving unbalanced magnet
|
Iseki, Takayuki
|
|
2006
|
80 |
7 |
p. 662-666
5 p.
|
article
|
| 20 |
Formation of polycrystalline SiGe thin films by the RF magnetron sputtering method with Ar–H2 mixture gases
|
Nakamura, Isao
|
|
2006
|
80 |
7 |
p. 712-715
4 p.
|
article
|
| 21 |
Frictional property with preferred crystal orientation of platinum oxide and palladium oxide coatings synthesized by combinatorial sputter coating system
|
Goto, Masahiro
|
|
2006
|
80 |
7 |
p. 740-743
4 p.
|
article
|
| 22 |
Gas pressure effects on thickness uniformity and circumvented deposition during sputter deposition process
|
Nakano, Takeo
|
|
2006
|
80 |
7 |
p. 647-649
3 p.
|
article
|
| 23 |
Growth control of carbon nanotubes by plasma-enhanced chemical vapor deposition and reactive ion etching
|
Sato, Hideki
|
|
2006
|
80 |
7 |
p. 798-801
4 p.
|
article
|
| 24 |
Growth properties of AlN films on sapphire substrates by reactive sputtering
|
Guo, Q.X.
|
|
2006
|
80 |
7 |
p. 716-718
3 p.
|
article
|
| 25 |
Hollow cathode and hybrid plasma processing
|
Baránková, Hana
|
|
2006
|
80 |
7 |
p. 688-692
5 p.
|
article
|
| 26 |
H2S sensing property of porous SnO2 sputtered films coated with various doping films
|
Jin, Chengji
|
|
2006
|
80 |
7 |
p. 723-725
3 p.
|
article
|
| 27 |
Improvement in thermal stability of B–C–N thin films fabricated by magnetron sputtering using graphite and BN co-target
|
Yokomichi, H.
|
|
2006
|
80 |
7 |
p. 748-751
4 p.
|
article
|
| 28 |
Improvement of thickness uniformity and crystallinity of AlN films prepared by off-axis sputtering
|
Umeda, Keiichi
|
|
2006
|
80 |
7 |
p. 658-661
4 p.
|
article
|
| 29 |
Investigation on Ce-doped LnMnO3 ( Ln = La , Nd) thin films by laser molecular beam epitaxy method
|
Yanagida, Takeshi
|
|
2006
|
80 |
7 |
p. 780-782
3 p.
|
article
|
| 30 |
Ion-beam processing of single crystal diamond using SOG mask
|
Taniguchi, Jun
|
|
2006
|
80 |
7 |
p. 793-797
5 p.
|
article
|
| 31 |
Mechanisms of carrier generation and transport in Ni-doped Cu2O
|
Kikuchi, N.
|
|
2006
|
80 |
7 |
p. 756-760
5 p.
|
article
|
| 32 |
Micowave plasma-assisted ionization of sputtered aluminum atoms in DC magnetron sputtering
|
Yonesu, Akira
|
|
2006
|
80 |
7 |
p. 671-674
4 p.
|
article
|
| 33 |
New approaches to fabrication of multilayer Fresnel zone plate for high-energy synchrotron radiation X-rays
|
Tamura, Shigeharu
|
|
2006
|
80 |
7 |
p. 823-827
5 p.
|
article
|
| 34 |
Optical nonlinearity of metal nanoparticle composites fabricated by negative ion implantation
|
Takeda, Yoshihiko
|
|
2006
|
80 |
7 |
p. 776-779
4 p.
|
article
|
| 35 |
Optical switching property of Pd-capped Mg–Ni alloy thin films prepared by magnetron sputtering
|
Yoshimura, Kazuki
|
|
2006
|
80 |
7 |
p. 684-687
4 p.
|
article
|
| 36 |
Particularities of condensation of atoms with increased kinetic energy
|
Shaginyan, Leonid R.
|
|
2006
|
80 |
7 |
p. 828-831
4 p.
|
article
|
| 37 |
Plasma etching of high-k and metal gate materials
|
Nakamura, Keisuke
|
|
2006
|
80 |
7 |
p. 761-767
7 p.
|
article
|
| 38 |
Sputter deposition of nm-thick films for passivation of organic pellicles
|
Kuo, Y.
|
|
2006
|
80 |
7 |
p. 698-703
6 p.
|
article
|
| 39 |
Stress control of a-SiC films deposited by dual source dc magnetron sputtering
|
Inoue, S.
|
|
2006
|
80 |
7 |
p. 744-747
4 p.
|
article
|
| 40 |
Study on hybrid nano-diamond films formed by plasma chemical vapor deposition (CVD)
|
Ikenaga, N.
|
|
2006
|
80 |
7 |
p. 810-813
4 p.
|
article
|
| 41 |
Surface modification of biodegradable plastics by ion beams
|
Takano, Ichiro
|
|
2006
|
80 |
7 |
p. 788-792
5 p.
|
article
|
| 42 |
Synthesis of DLC films by PECVD combined with hollow cathode sputtering
|
Anita, V.
|
|
2006
|
80 |
7 |
p. 736-739
4 p.
|
article
|
| 43 |
Synthesis of nitrogen-rich carbon nitride thin films via magnetic field-assisted inductively coupled plasma sputtering
|
Ohta, R.
|
|
2006
|
80 |
7 |
p. 752-755
4 p.
|
article
|
| 44 |
Temperature effect on structure and surface morphology of indium tin oxide films deposited by reactive ion-beam sputtering
|
Iwatsubo, S.
|
|
2006
|
80 |
7 |
p. 708-711
4 p.
|
article
|
| 45 |
Thermomechanical behavior of Ti–Ni shape memory alloy films deposited by DC magnetron sputtering
|
Namazu, Takahiro
|
|
2006
|
80 |
7 |
p. 726-731
6 p.
|
article
|
| 46 |
Work function measurement of transition metal nitride and carbide thin films
|
Fujii, R.
|
|
2006
|
80 |
7 |
p. 832-835
4 p.
|
article
|
Journal description