| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Adhesion of PVD layers on liquid crystal polymer pretreated by oxygen-containing plasma
|
Wang, B.
|
|
2005
|
79 |
3-4 |
p. 129-133
5 p.
|
artikel
|
| 2 |
Adhesion of PVD layers on liquid crystal polymer pretreated by oxygen-containing plasma
|
Wang, B.
|
|
2005
|
79 |
3-4 |
p. 124-128
5 p.
|
artikel
|
| 3 |
Annealing of niobium coatings deposited on graphite
|
Barzilai, S.
|
|
2005
|
79 |
3-4 |
p. 171-177
7 p.
|
artikel
|
| 4 |
Author Index
|
|
|
2005
|
79 |
3-4 |
p. XI-XII
nvt p.
|
artikel
|
| 5 |
Characterization of p-type In–Sb thin films prepared by vacuum evaporation
|
Senthilkumar, V.
|
|
2005
|
79 |
3-4 |
p. 163-170
8 p.
|
artikel
|
| 6 |
Comparison of theoretical stopping powers and application to the range calculation for bismuth ions in Si and SiO2
|
Gümüş, Hasan
|
|
2005
|
79 |
3-4 |
p. 155-162
8 p.
|
artikel
|
| 7 |
Composition of the first atomic layers of (001)-oriented AuCu3 crystal measured with the use of directional Auger electron spectroscopy at 400K<T<1000K
|
Mróz, S.
|
|
2005
|
79 |
3-4 |
p. 241-249
9 p.
|
artikel
|
| 8 |
Editorial Board & Publication Information
|
|
|
2005
|
79 |
3-4 |
p. CO2-
1 p.
|
artikel
|
| 9 |
Effect of annealing temperature on characteristics of Ni49Fe51 films sputter deposited on SiO2/Si (100)
|
Chen, Xiaobai
|
|
2005
|
79 |
3-4 |
p. 134-139
6 p.
|
artikel
|
| 10 |
Effect of gas mixing ratio on MgO etch behaviour in inductively coupled BCl3/Ar plasma
|
Kim, Gwan-ha
|
|
2005
|
79 |
3-4 |
p. 231-240
10 p.
|
artikel
|
| 11 |
Electrochemical behavior of low-pressure plasma-sprayed Al–Cu–Fe–Cr quasicrystalline coating
|
Kang, Yongwang
|
|
2005
|
79 |
3-4 |
p. 148-154
7 p.
|
artikel
|
| 12 |
Glow discharge assisted oxynitriding of the binary Ti6Al2Cr2Mo titanium alloy
|
Sobiecki, Jerzy Robert
|
|
2005
|
79 |
3-4 |
p. 203-208
6 p.
|
artikel
|
| 13 |
Investigation of an atmospheric pressure radio-frequency capacitive plasma jet
|
Laimer, J.
|
|
2005
|
79 |
3-4 |
p. 209-214
6 p.
|
artikel
|
| 14 |
Modelling of plasma etching process using radial basis function network and genetic algorithm
|
Han, Dongil
|
|
2005
|
79 |
3-4 |
p. 140-147
8 p.
|
artikel
|
| 15 |
Morphology and resistivity of Al thin films grown on Si (111) by molecular beam epitaxy
|
Joshi, Niraj
|
|
2005
|
79 |
3-4 |
p. 178-185
8 p.
|
artikel
|
| 16 |
On wetting behavior of fluorocarbon coatings with various chemical and roughness characteristics
|
Kulinich, S.A.
|
|
2005
|
79 |
3-4 |
p. 255-264
10 p.
|
artikel
|
| 17 |
Pervaporation separation of ethylacetate–water mixtures through a crosslinked poly(vinylalcohol) membrane
|
Salt, Yavuz
|
|
2005
|
79 |
3-4 |
p. 215-220
6 p.
|
artikel
|
| 18 |
Prediction of plasma-induced DC bias using polynomial neural network
|
Kim, Byungwhan
|
|
2005
|
79 |
3-4 |
p. 111-118
8 p.
|
artikel
|
| 19 |
Simulation of silicon etching through a fluorocarbon layer
|
Knizikevičius, R.
|
|
2005
|
79 |
3-4 |
p. 119-123
5 p.
|
artikel
|
| 20 |
Structure and photoluminescence properties of SiC films synthesized by the RF-magnetron sputtering technique
|
Sha, Z.D.
|
|
2005
|
79 |
3-4 |
p. 250-254
5 p.
|
artikel
|
| 21 |
TEOS-PECVD system for high growth rate deposition of SiO2 films
|
Mahajan, A.M.
|
|
2005
|
79 |
3-4 |
p. 194-202
9 p.
|
artikel
|
| 22 |
The structure and properties of copper oxide and copper aluminium oxide coatings prepared by pulsed magnetron sputtering of powder targets
|
Alkoy, E.M.
|
|
2005
|
79 |
3-4 |
p. 221-230
10 p.
|
artikel
|
| 23 |
VAC Diary (normal issue)
|
|
|
2005
|
79 |
3-4 |
p. I-III
nvt p.
|
artikel
|
| 24 |
Zirconium nitride/nickel nanocomposite structures
|
Aouadi, S.M.
|
|
2005
|
79 |
3-4 |
p. 186-193
8 p.
|
artikel
|
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