no |
title |
author |
magazine |
year |
volume |
issue |
page(s) |
type |
1 |
Analysis and optimisation of lateral thin-film silicon-on-insulator (SOI) PMOS transistor with an NBL layer in the drift region
|
Cortés, I. |
|
2012 |
70 |
C |
p. 8-13 6 p. |
article |
2 |
Analysis of temperature variation influence on the analog performance of 45° rotated triple-gate nMuGFETs
|
Pavanello, Marcelo Antonio |
|
2012 |
70 |
C |
p. 39-43 5 p. |
article |
3 |
An analysis on the ambipolar current in Si double-gate tunnel FETs
|
Hraziia, |
|
2012 |
70 |
C |
p. 67-72 6 p. |
article |
4 |
CMOS without doping: Multi-gate silicon-nanowire field-effect-transistors
|
Wessely, F. |
|
2012 |
70 |
C |
p. 33-38 6 p. |
article |
5 |
Confinement-induced carrier mobility increase in nanowires by quantization of warped bands
|
Neophytou, Neophytos |
|
2012 |
70 |
C |
p. 81-91 11 p. |
article |
6 |
Editorial Board
|
|
|
2012 |
70 |
C |
p. IFC- 1 p. |
article |
7 |
FinFlash with buried storage ONO layer for flash memory application
|
Chang, Sung-Jae |
|
2012 |
70 |
C |
p. 59-66 8 p. |
article |
8 |
Foreword
|
Godoy, Andrés |
|
2012 |
70 |
C |
p. 1-2 2 p. |
article |
9 |
Function of the parasitic bipolar transistor in the 40nm PD SOI NMOS device considering the floating body effect
|
Chena, C.H. |
|
2012 |
70 |
C |
p. 3-7 5 p. |
article |
10 |
GIDL behavior of p- and n-MuGFET devices with different TiN metal gate thickness and high-k gate dielectrics
|
Galeti, M. |
|
2012 |
70 |
C |
p. 44-49 6 p. |
article |
11 |
Improved 1/f noise characterization of strained SiGe on insulator MOSFETs fabricated on wafers obtained by the Ge enrichment technique
|
Valenza, M. |
|
2012 |
70 |
C |
p. 27-32 6 p. |
article |
12 |
Influence of discrete dopant on quantum transport in silicon nanowire transistors
|
Akhavan, Nima Dehdashti |
|
2012 |
70 |
C |
p. 92-100 9 p. |
article |
13 |
LDMOS-transistors on semi-insulating silicon-on-polycrystalline-silicon carbide substrates for improved RF and thermal properties
|
Lotfi, S. |
|
2012 |
70 |
C |
p. 14-19 6 p. |
article |
14 |
Low frequency noise characterization in n-channel FinFETs
|
Talmat, R. |
|
2012 |
70 |
C |
p. 20-26 7 p. |
article |
15 |
Quantum simulation of an ultrathin body field-effect transistor with channel imperfections
|
Vyurkov, V. |
|
2012 |
70 |
C |
p. 106-113 8 p. |
article |
16 |
Reaching sub-32nm nodes: ET-FDSOI and BOX optimization
|
Sampedro, C. |
|
2012 |
70 |
C |
p. 101-105 5 p. |
article |
17 |
Subband engineering in n-type silicon nanowires using strain and confinement
|
Stanojević, Zlatan |
|
2012 |
70 |
C |
p. 73-80 8 p. |
article |
18 |
Ultra-thin body and thin-BOX SOI CMOS technology analog figures of merit
|
Kilchytska, V. |
|
2012 |
70 |
C |
p. 50-58 9 p. |
article |