Digitale Bibliotheek
Sluiten Bladeren door artikelen uit een tijdschrift
     Tijdschrift beschrijving
       Alle jaargangen van het bijbehorende tijdschrift
         Alle afleveringen van het bijbehorende jaargang
                                       Alle artikelen van de bijbehorende aflevering
 
                             23 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Analysis of high-voltage trench bipolar junction diode (TBJD) You, Budong
1999
43 9 p. 1777-1783
7 p.
artikel
2 Analysis of 0.5 μm channel Al/WSix/Poly-Si gate performance in high-frequency band Si power MOSFETs with process/device/circuit continuous simulation Kataoka, M
1999
43 9 p. 1689-1694
6 p.
artikel
3 An energy relaxation time model for device simulation Gonzalez, B.
1999
43 9 p. 1791-1795
5 p.
artikel
4 A new expression of excess stress and the stability of buried strained heterostructures Jin, Zhi
1999
43 9 p. 1735-1739
5 p.
artikel
5 A numerical investigation into the effect of the p-well/n-substrate injection efficiency on the uniformity of electron injection during substrate hot electron experiments Nuttall, K.
1999
43 9 p. 1665-1671
7 p.
artikel
6 Calculation of the probability of hole injection from polysilicon gate into silicon dioxide in MOS structures under high-field stress Samanta, Piyas
1999
43 9 p. 1677-1687
11 p.
artikel
7 Channel length scaling of 1/f noise in 0.18 μm technology MDD n-MOSFETs Çelik-Butler, Zeynep
1999
43 9 p. 1695-1701
7 p.
artikel
8 Correspondence 1999
43 9 p. 1817-1820
4 p.
artikel
9 Detection and fitting of the soft breakdown failure mode in MOS structures Miranda, E
1999
43 9 p. 1801-1805
5 p.
artikel
10 Effect of strain on band structure and electron transport in InAs Hori, Yasuko
1999
43 9 p. 1813-1816
4 p.
artikel
11 Fabrication of the buried channel polycrystalline silicon TFT Park, Cheol-Min
1999
43 9 p. 1785-1789
5 p.
artikel
12 1/f noise in polycrystalline SiGe analyzed in terms of mobility fluctuations Chen, X.Y.
1999
43 9 p. 1715-1724
10 p.
artikel
13 Formation of shallow n+p junctions by phosphorus implantation into thin polycrystalline-Si films on Si substrates and subsequent cobalt silicidation Juang, M.H
1999
43 9 p. 1763-1767
5 p.
artikel
14 Investigation of the optical, temperature dependent free-carrier absorption of a bipolar electron-hole plasma in silicon Mnatsakanov, T.T
1999
43 9 p. 1703-1708
6 p.
artikel
15 Low-frequency gate current noise of InP based HEMTs Simoen, E.
1999
43 9 p. 1797-1800
4 p.
artikel
16 Mechanism of high density plasma processes for ion-driven etching of materials Lee, J.W.
1999
43 9 p. 1769-1775
7 p.
artikel
17 Nonequilibrium electron relaxation in composite thin film containing silver nano-scale particles Wu, J.L.
1999
43 9 p. 1755-1761
7 p.
artikel
18 Photoresponse of Si1−x Ge x heteroepitaxial p–i–n photodiodes Chattopadhyay, S.
1999
43 9 p. 1741-1745
5 p.
artikel
19 Schottky and ohmic contacts to doped Si1−x−y Ge x C y layers Peterson, Jeff J.
1999
43 9 p. 1725-1734
10 p.
artikel
20 Static characteristics of high-barrier Schottky diode under high injection level Prokopyev, A.I.
1999
43 9 p. 1747-1753
7 p.
artikel
21 The study on the growth and properties of Mg doped and Mg–Si codoped p-type GaN Kim, Ki Soo
1999
43 9 p. 1807-1812
6 p.
artikel
22 Transport properties in microcrystalline silicon solar cells under AM1.5 illumination analysed by two-dimensional numerical simulation Fantoni, Alessandro
1999
43 9 p. 1709-1714
6 p.
artikel
23 Tunnelling-assisted generation-recombination in pn a-Si junctions Furlan, J.
1999
43 9 p. 1673-1676
4 p.
artikel
                             23 gevonden resultaten
 
 Koninklijke Bibliotheek - Nationale Bibliotheek van Nederland