Impact of post-deposition anneal on ALD Al2O3/etched GaN interface for gate-first MOSc-HEMT
Titel:
Impact of post-deposition anneal on ALD Al2O3/etched GaN interface for gate-first MOSc-HEMT
Auteur:
Fernandes Paes Pinto Rocha, P. Vauche, L. Mohamad, B. Vandendaele, W. Martinez, E. Veillerot, M. Spelta, T. Rochat, N. Gwoziecki, R. Salem, B. Sousa, V.