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                                       Details for article 5 of 11 found articles
 
 
  Impact of post-deposition anneal on ALD Al2O3/etched GaN interface for gate-first MOSc-HEMT
 
 
Title: Impact of post-deposition anneal on ALD Al2O3/etched GaN interface for gate-first MOSc-HEMT
Author: Fernandes Paes Pinto Rocha, P.
Vauche, L.
Mohamad, B.
Vandendaele, W.
Martinez, E.
Veillerot, M.
Spelta, T.
Rochat, N.
Gwoziecki, R.
Salem, B.
Sousa, V.
Appeared in: Power electronic devices and components
Paging: Volume 4 () nr. C pages p.
Year: 2023
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 5 of 11 found articles
 
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