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                                       Details for article 69 of 74 found articles
 
 
  Technology and characterization of MIS structures with co-doped silicon nanocrystals (Si-NCs) embedded in hafnium oxide (HfOx) ultra-thin layers
 
 
Title: Technology and characterization of MIS structures with co-doped silicon nanocrystals (Si-NCs) embedded in hafnium oxide (HfOx) ultra-thin layers
Author: Mazurak, A.
Mroczyński, R.
Jasiński, J.
Tanous, D.
Majkusiak, B.
Kano, S.
Sugimoto, H.
Fujii, M.
Valenta, J.
Appeared in: Microelectronic engineering
Paging: Volume 178 (2017) nr. C pages 298-303
Year: 2017
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 69 of 74 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands