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Journal description
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Details for article 22 of 74 found articles
| Title: |
Electrical characteristics of Ge buried channel FinFETs with interfacial layers treated by F/N/H-based plasma |
| Author: |
Li, Yan-Lin Chang-Liao, Kuei-Shu Ku, Chao-Chen Ruan, Dun-Bao Huang, Chin-Hsiu Hsu, Yi-Wen Tsai, Shang-Fu Yang, Meng-Ying Wu, Wen-Fa |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 178 (2017) nr. C pages 5-9 |
| Year: |
2017 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 22 of 74 found articles
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