| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
ANKA – a synchrotron light source for X-ray based micromachining
|
Göttert, J.
|
|
2000
|
6 |
3 |
p. 113-116
|
artikel
|
| 2 |
Development of new position sensitive electron multiplication device fabricated by LIGA process
|
Inoue, M.
|
|
2000
|
6 |
3 |
p. 90-93
|
artikel
|
| 3 |
Direct, high throughput LIGA for commercial applications: a progress report
|
Guckel, H.
|
|
2000
|
6 |
3 |
p. 103-105
|
artikel
|
| 4 |
Fabrication of HARM structures by deep-X-ray lithography using graphite mask technology
|
Coane, P.
|
|
2000
|
6 |
3 |
p. 94-98
|
artikel
|
| 5 |
High aspect ratio silicon trench fabrication by inductively coupled plasma
|
Chung, C. K.
|
|
2000
|
6 |
3 |
p. 106-108
|
artikel
|
| 6 |
Improvement of sidewall roughness in deep silicon etching
|
Chabloz, M.
|
|
2000
|
6 |
3 |
p. 86-89
|
artikel
|
| 7 |
Large area, cost effective X-ray masks for high energy photons
|
Fischer, K.
|
|
2000
|
6 |
3 |
p. 117-120
|
artikel
|
| 8 |
Manufacturing technologies for miniaturized interference filters
|
Frank, M.
|
|
2000
|
6 |
3 |
p. 77-81
|
artikel
|
| 9 |
Proton micromachining: a new technique for the production of three-dimensional microstructures
|
van Kan, J.A.
|
|
2000
|
6 |
3 |
p. 82-85
|
artikel
|
| 10 |
The influence of mask substrate thickness on exposure and development times for the LIGA process
|
Griffiths, S. K.
|
|
2000
|
6 |
3 |
p. 99-102
|
artikel
|
| 11 |
TRANSTEC – A new tool for online educational multimedia training on innovative high aspect ratio microtechnologies
|
Schmidt, A.
|
|
2000
|
6 |
3 |
p. 109-112
|
artikel
|
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