nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Advanced mask manufacturing
|
Reita, Carlo |
|
2006 |
7 |
8 |
p. 896-909 14 p. |
artikel |
2 |
Advanced metrology needs for nanoelectronics lithography
|
Knight, Stephen |
|
2006 |
7 |
8 |
p. 931-941 11 p. |
artikel |
3 |
An introduction to ultimate lithography
|
Brillouët, Michel |
|
2006 |
7 |
8 |
p. 837-840 4 p. |
artikel |
4 |
Direct write lithography: the global solution for R&D and manufacturing
|
Pain, Laurent |
|
2006 |
7 |
8 |
p. 910-923 14 p. |
artikel |
5 |
Dossier
|
|
|
2006 |
7 |
8 |
p. iii-iv nvt p. |
artikel |
6 |
Editorial Board
|
|
|
2006 |
7 |
8 |
p. CO3- 1 p. |
artikel |
7 |
Editorial Board
|
|
|
2006 |
7 |
8 |
p. CO2- 1 p. |
artikel |
8 |
EUV lithography
|
Kemp, Kevin |
|
2006 |
7 |
8 |
p. 875-886 12 p. |
artikel |
9 |
From 120 to 32 nm CMOS technology: development of OPC and RET to rescue optical lithography
|
Trouiller, Yorick |
|
2006 |
7 |
8 |
p. 887-895 9 p. |
artikel |
10 |
Glossary
|
|
|
2006 |
7 |
8 |
p. 841-843 3 p. |
artikel |
11 |
Optical lithography—a historical perspective
|
Ronse, Kurt |
|
2006 |
7 |
8 |
p. 844-857 14 p. |
artikel |
12 |
Optical lithography—present and future challenges
|
Lin, Burn J. |
|
2006 |
7 |
8 |
p. 858-874 17 p. |
artikel |
13 |
Photosensitive resists for optical lithography
|
Mortini, Bénédicte |
|
2006 |
7 |
8 |
p. 924-930 7 p. |
artikel |