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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
7 results found
| no | title | author | magazine | year | volume | issue | page(s) | type |
| 1 | Copper-related defects in silicon |
Knack, S. |
2004 |
7 | 3 |
p. 125-141 17 p. |
article |
|
| 2 | Copper related diffusion phenomena in germanium and silicon |
Bracht, H. |
2004 |
7 | 3 |
p. 113-124 12 p. |
article |
|
| 3 | Editorial board |
2004 |
7 | 3 |
p. IFC- 1 p. |
article |
||
| 4 | Effect of low k dielectrics on electromigration reliability for Cu interconnects |
Ho, Paul S. |
2004 |
7 | 3 |
p. 157-163 7 p. |
article |
|
| 5 | First-principles theory of copper in silicon |
Estreicher, Stefan K. |
2004 |
7 | 3 |
p. 101-111 11 p. |
article |
|
| 6 | Interfacial reactions of ultrahigh-vacuum-deposited Cu thin films on Si, Ge and on epitaxial Si–Ge layers on Si and Ge |
Chen, L.J. |
2004 |
7 | 3 |
p. 143-156 14 p. |
article |
|
| 7 | Preface |
Mesli, Dr. A. |
2004 |
7 | 3 |
p. 99-100 2 p. |
article |
7 results found