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                             195 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Ab initio investigation of phosphorus and boron diffusion in germanium Janke, C.
2008
5-6 p. 324-327
4 p.
artikel
2 Ab-initio simulation of self-interstitial in germanium Śpiewak, P.
2008
5-6 p. 328-331
4 p.
artikel
3 Accurate carrier profiling of n-type GaAs junctions Clarysse, T.
2008
5-6 p. 259-266
8 p.
artikel
4 Activation level in boron-doped thin germanium-on-insulator (GeOI): Extraction method and impact of mobility Hutin, Louis
2008
5-6 p. 267-270
4 p.
artikel
5 AFM observation of OMVPE grown ErP on InP (001), (111)A and (111)B substrates Kuno, T.
2003
5-6 p. 461-464
4 p.
artikel
6 Amphoteric nature of vacancies in zinc blende semiconductors Chadi, D.J.
2003
5-6 p. 281-284
4 p.
artikel
7 A solid-state near infrared spectrum analyzer based on polycrystalline Ge on Si Colace, L.
2000
5-6 p. 545-549
5 p.
artikel
8 A study of the effect of post-metal etch wet cleaning processes and silicon oxynitride film on charge induced corrosion of tungsten vias Lee, Szetsen
2010
5-6 p. 315-319
5 p.
artikel
9 Atomic oxygen-assisted molecular beam deposition of Gd2O3 films for ultra-scaled Ge-based electronic devices Molle, A.
2008
5-6 p. 236-240
5 p.
artikel
10 Author Index 2000
5-6 p. I-III
nvt p.
artikel
11 Bending properties in oxidized porous silicon waveguides Balucani, M
2000
5-6 p. 351-355
5 p.
artikel
12 Calculation of the optimum vapor pressure for stoichiometry in PbTe and PbSnTe Suto, K.
2003
5-6 p. 289-292
4 p.
artikel
13 Cathodoluminescence characterization of β-SiC nanowires and surface-related silicon dioxide Fabbri, F.
2008
5-6 p. 179-181
3 p.
artikel
14 Characteristics of deep levels in Al-doped ZnSe grown by molecular beam epitaxy Oh, D.C
2003
5-6 p. 567-571
5 p.
artikel
15 Characterizations of In x Al y Ga1−x−y N alloy systems grown on GaN substrates by molecular-beam epitaxy Iwata, S.
2003
5-6 p. 527-530
4 p.
artikel
16 Charge transition levels of the Ge dangling bond defect at Ge/insulator interfaces Broqvist, Peter
2008
5-6 p. 226-229
4 p.
artikel
17 Compact and dynamic optical bypass-exchange switch Oron, R.
2000
5-6 p. 455-458
4 p.
artikel
18 Comparative study of point defects induced in PbTe thin films doped with Ga by different techniques Samoylov, Alexander M
2003
5-6 p. 481-485
5 p.
artikel
19 Comparison of p+–n junction formed by BF2 + and B+ implantation in silicon microstrip detector with low and high thermal budget: impact of fluorine on electrical characteristics Srivastava, Ajay K.
2003
5-6 p. 555-559
5 p.
artikel
20 Complexes of self-interstitials with oxygen atoms in germanium Khirunenko, L.I.
2008
5-6 p. 344-347
4 p.
artikel
21 Conduction type and defect levels of β-FeSi2 films grown by MBE with different Si/Fe ratios Seki, N.
2003
5-6 p. 307-309
3 p.
artikel
22 Control of Ga doping level in β-FeSi2 using Sn–Ga solvent Udono, Haruhiko
2003
5-6 p. 285-287
3 p.
artikel
23 Cooperative two-photon effects in chalcogenide photoresists Sfez, B.G
2000
5-6 p. 499-504
6 p.
artikel
24 Creation of a stable and convex static meniscus, which is appropriate for the growth of a single crystal ribbon with specified half thickness Balint, Stefan
2010
5-6 p. 333-338
6 p.
artikel
25 Defects introduced into SrTiO3 by auto-feeding epitaxy studied using positron annihilation technique Uedono, A.
2003
5-6 p. 367-369
3 p.
artikel
26 Density-functional theory study of Au, Ag and Cu defects in germanium Carvalho, A.
2008
5-6 p. 340-343
4 p.
artikel
27 Density-functional theory study of interstitial iron and its complexes with B and Al in dilute SiGe alloys Carvalho, A.
2008
5-6 p. 332-335
4 p.
artikel
28 Design and fabrication of integrated Si-based optoelectronic devices Libertino, Sebania
2000
5-6 p. 375-381
7 p.
artikel
29 Detailed analysis of absorption data for indium nitride Butcher, K.S.A.
2003
5-6 p. 351-354
4 p.
artikel
30 Determination of the laterally homogeneous barrier height of palladium Schottky barrier diodes on n-Ge (111) Chawanda, A.
2010
5-6 p. 371-375
5 p.
artikel
31 Development of an intelligent design tool for non-stoichiometric compound devices: an example Chang, H.H.
2003
5-6 p. 401-407
7 p.
artikel
32 Development of a visible VCSEL-to-plastic optical fibre module for use in high-speed optical data links Lambkin, J.D
2000
5-6 p. 467-473
7 p.
artikel
33 Device advantage of the dislocation-free pressure grown GaN substrates Boćkowski, M.
2003
5-6 p. 347-350
4 p.
artikel
34 Device assessment of the electrical activity of threading dislocations in strained Ge epitaxial layers Simoen, E.
2008
5-6 p. 364-367
4 p.
artikel
35 Diffusion and activation of phosphorus in germanium Tsouroutas, P.
2008
5-6 p. 372-377
6 p.
artikel
36 Diffusion of nonstoichiometric defects in n-GaP crystals Tanno, Takenori
2003
5-6 p. 441-443
3 p.
artikel
37 Direct MBE growth of GaN on GaAs substrates for integrated short wavelength emitters Georgakilas, A
2000
5-6 p. 511-515
5 p.
artikel
38 Dislocation–impurity interaction in Si Yonenaga, I
2003
5-6 p. 355-358
4 p.
artikel
39 Dopant diffusion in GaP and related compounds: recent results and new considerations Stolwijk, N.A.
2003
5-6 p. 315-318
4 p.
artikel
40 Effect of surface stoichiometry on Be doping in GaAs by intermittent supply of AsH3 and TEG in an ultra-high vacuum Ohno, Takeo
2003
5-6 p. 421-424
4 p.
artikel
41 Effects of annealing of MgO buffer layer on structural quality of ZnO layers grown by P-MBE on c-sapphire Setiawan, A.
2003
5-6 p. 371-374
4 p.
artikel
42 Effects of annealing technique and TiO2 seed layer on the phase composition of 0.7Pb(Mg1/3Nb2/3)O3–0.3PbTiO3 film Li, W.L.
2010
5-6 p. 426-429
4 p.
artikel
43 Effects of AsH3 surface treatment for the improvement of ultra-shallow area-selective regrown GaAs sidewall tunnel junction Ohno, Takeo
2003
5-6 p. 417-420
4 p.
artikel
44 Effects of electron and proton irradiation on embedded SiGe source/drain diodes Ohyama, H.
2008
5-6 p. 310-313
4 p.
artikel
45 Electrical characterization of defects introduced during metallization processes in n-type germanium Auret, F.D.
2008
5-6 p. 348-353
6 p.
artikel
46 Electrical characterization of thiols self-assembled layers on GaP (111) structures Ghita, R.V.
2008
5-6 p. 394-397
4 p.
artikel
47 Electrically active defects induced by hydrogen and helium implantations in Ge Markevich, V.P.
2008
5-6 p. 354-359
6 p.
artikel
48 Electrical methods for estimating the correlation length of insulator thickness fluctuations in MIS tunnel structures Tyaginov, S.E.
2010
5-6 p. 405-410
6 p.
artikel
49 Electrical passivation by hydrogen plasma treatment of transition metal impurities in germanium Lauwaert, J.
2008
5-6 p. 360-363
4 p.
artikel
50 Electroluminescence of ZnSe enhanced by improved layered optimization structure Jiang, W.W.
2010
5-6 p. 360-363
4 p.
artikel
51 Electronic monolithic interconnect with polyimide Moliton, J.P.
2000
5-6 p. 419-425
7 p.
artikel
52 Elemental specificity of ion cores and ionization entropy of vacancy-group-V-impurity atom pairs in Ge crystals: ACAR and DLTS data Arutyunov, N.Yu.
2008
5-6 p. 295-299
5 p.
artikel
53 E-MRS 2008 Spring Conference Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS Claeys, Cor
2008
5-6 p. 147-
1 p.
artikel
54 Energy level of minority carrier trap centers induced by light illumination in B-doped Cz-Si solar cells Vu, Tuong Khanh
2003
5-6 p. 551-553
3 p.
artikel
55 Enhancement in electrical performance of indium gallium zinc oxide-based thin film transistors by low temperature thermal annealing Jeon, Sang-Jin
2010
5-6 p. 320-324
5 p.
artikel
56 Epitaxial anatase HfO2 on high-mobility substrate for ultra-scaled CMOS devices Debernardi, A.
2008
5-6 p. 241-244
4 p.
artikel
57 Epitaxial lateral overgrowth of InP by liquid-phase epitaxy on InP (001), (111)A,B and (110) surfaces Kochiya, Toshio
2003
5-6 p. 465-468
4 p.
artikel
58 Epitaxial ZnO films grown by RF-assisted low-temperature CVD method Ataev, B.M.
2003
5-6 p. 535-537
3 p.
artikel
59 EPR studies of native and impurity-related defects in II–IV–V2 semiconductors Gehlhoff, W.
2003
5-6 p. 379-383
5 p.
artikel
60 EPR studies of point defects in Cu-III–VI2 chalcopyrite semiconductors Sato, K.
2003
5-6 p. 335-338
4 p.
artikel
61 ESR signature of tetra-interstitial defect in silicon Mchedlidze, T.
2003
5-6 p. 263-266
4 p.
artikel
62 Etch pits observation and etching properties of β-FeSi2 Udono, Haruhiko
2003
5-6 p. 413-416
4 p.
artikel
63 Evidence for a conduction through shallow traps in Hf-doped Ta2O5 Paskaleva, A.
2010
5-6 p. 349-355
7 p.
artikel
64 Excimer laser fabrication of diffractive optical elements Winfield, R.J.
2000
5-6 p. 481-486
6 p.
artikel
65 Excitation photocapacitance study of EL2 in n-GaAs and its relation to non-stoichiometry Oyama, Yutaka
2003
5-6 p. 297-301
5 p.
artikel
66 Experiments for 3-D structuring of thick resists by gray tone lithography Dumbravescu, N.
2000
5-6 p. 569-573
5 p.
artikel
67 Fabrication of low-threshold red VCSELs Calvert, T.M
2000
5-6 p. 517-521
5 p.
artikel
68 Ferroelectric-domain-inverted gratings by electron beam on LiNbO3 Restoin, C
2000
5-6 p. 405-407
3 p.
artikel
69 Flash evaporated cadmium sulfide films Murali, K.R.
2010
5-6 p. 356-359
4 p.
artikel
70 Fluorescence EXAFS analysis of ErP grown on InP by organometallic vapor phase epitaxy using a new organometal Er(EtCp)3 Ofuchi, H.
2003
5-6 p. 469-472
4 p.
artikel
71 Frequency and voltage dependency of interface states and series resistance in Al/SiO2/p-Si MOS structure Xiao, Hong
2010
5-6 p. 395-399
5 p.
artikel
72 Germanium on sapphire substrates for system on a chip Gamble, H.S.
2008
5-6 p. 195-198
4 p.
artikel
73 Growth rate reduction in self-limiting growth of doped GaAs by molecular layer epitaxy Nishizawa, Jun-ichi
2003
5-6 p. 429-431
3 p.
artikel
74 Growth temperature dependence of InP nanopyramids grown by selective-area flow rate modulation epitaxy Oga, Ryo
2003
5-6 p. 477-480
4 p.
artikel
75 High-dielectric constant AlON prepared by RF gas-timing sputtering for high capacitance density Poyai, A.
2008
5-6 p. 319-323
5 p.
artikel
76 High-energy photoemission spectroscopy of ferromagnetic Ga1−x Mn x N Kim, J.J.
2003
5-6 p. 503-506
4 p.
artikel
77 High-quality NiGe/Ge diodes for Schottky barrier MOSFETs Husain, M.K.
2008
5-6 p. 305-309
5 p.
artikel
78 High-quality oxide formed by evaporation of SiO nanopowder: Application to MOSFETs on plastic substrates and GaN epilayers Nozaki, S.
2008
5-6 p. 384-389
6 p.
artikel
79 Hybridisation of LEDs with silicon microsensors Cristea, Dana
2000
5-6 p. 563-568
6 p.
artikel
80 Impact of the SiGe/Si interface structure upon the low temperature photoluminescence of a Si/Si1−x Ge x multiple quantum well Sidiki, T.P
2000
5-6 p. 389-393
5 p.
artikel
81 Improved light extraction efficiency of GaN-based light emitting diodes using one and two interfaces of ITO/ZnO layer texturing Uthirakumar, Periyayya
2010
5-6 p. 329-332
4 p.
artikel
82 InAlGaAs bulk micromachined tunable Fabry–Pérot filter for dense WDM systems Pfeiffer, J
2000
5-6 p. 409-412
4 p.
artikel
83 Increase of GaP green LED efficiency with pre-annealing of the substrate Tanno, Takenori
2003
5-6 p. 433-435
3 p.
artikel
84 Influence of annealing temperature on field emission from tetrapod-shaped ZnO-whisker films obtained by screen printing Fan, X.M.
2010
5-6 p. 400-404
5 p.
artikel
85 Influence of oxygen flow rate on microstructural, electrical and optical properties of indium tin tantalum oxide films Zhang, Bo
2010
5-6 p. 411-416
6 p.
artikel
86 Influence of passivating interlayer on Ge/HfO2 and Ge/Al2O3 interface band diagrams Afanas’ev, V.V.
2008
5-6 p. 230-235
6 p.
artikel
87 Influence of pinning trap in Ti/4H–SiC Schottky barrier diode Ohtsuka, K.
2003
5-6 p. 359-362
4 p.
artikel
88 Influence of the pre-treatment anneal on Co–germanide Schottky contacts Lajaunie, L.
2008
5-6 p. 300-304
5 p.
artikel
89 Integrated optics based on organo-mineral materials Coudray, P
2000
5-6 p. 331-337
7 p.
artikel
90 Integration of optical interconnects and optoelectronic elements on wafer-scale Dannberg, P.
2000
5-6 p. 437-441
5 p.
artikel
91 Interaction of electrical active intrinsic defects in Sn-doping Bi2Te3 Zhitinskaya, M.K.
2003
5-6 p. 449-452
4 p.
artikel
92 Isochronal annealing study of hydrogen interaction with implantation-induced point defects in p-type silicon Tokuda, Yutaka
2003
5-6 p. 277-279
3 p.
artikel
93 Lateral growth of monocrystalline Ge on silicon oxide by ultrahigh vacuum chemical vapor deposition Cammilleri, V.D.
2008
5-6 p. 214-216
3 p.
artikel
94 Lifetime control by Fe doping in n-type silicon Nishizawa, J.
2003
5-6 p. 273-275
3 p.
artikel
95 Local crystal structural modifications in pulsed laser deposited high-k dielectric thin films on silicon and germanium Alper Sahiner, Mehmet
2008
5-6 p. 245-249
5 p.
artikel
96 Local structures around Er atoms doped in GaAs by low-temperature molecular beam epitaxy Ogawa, K.
2003
5-6 p. 425-427
3 p.
artikel
97 Low dielectric constant porous silica films formed by photo-induced sol–gel processing Zhang, Jun-Ying
2000
5-6 p. 345-349
5 p.
artikel
98 Low-frequency noise properties of GaN Schottky barriers deposited on intermediate temperature buffer layers Leung, B.H.
2003
5-6 p. 523-525
3 p.
artikel
99 Low power, GHz class ADC for broadband applications Tauqeer, T.
2008
5-6 p. 402-406
5 p.
artikel
100 Low-stress hybridisation of emitters, detectors and driver circuitry on a silicon motherboard for optoelectronic interconnect architecture Corbett, B
2000
5-6 p. 449-453
5 p.
artikel
101 Low-temperature deposition of SiO2 films using plasma-enhanced oxygen with reduction of oxygen-originated damage Nishizawa, Jun-ichi
2003
5-6 p. 363-366
4 p.
artikel
102 Low-temperature growth of nitrogen-doped BeTe and ZnSe/BeTe:N superlattices for delta doping Kojima, K.
2003
5-6 p. 511-514
4 p.
artikel
103 Low temperature TiO2 rutile phase thin film synthesis by chemical spray pyrolysis (CSP) of titanyl acetylacetonate Moses Ezhil Raj, A.
2010
5-6 p. 389-394
6 p.
artikel
104 Luminescence and microstructure of Er/O co-doped Si structures grown by MBE using Er and SiO evaporation Duteil, F
2000
5-6 p. 523-528
6 p.
artikel
105 Luminescence measurements on MOS tunnel diodes as a method of finding the photon emission rates in silicon Asli, N.
2000
5-6 p. 539-543
5 p.
artikel
106 Luminescent properties of ZnCdSe/ZnMnSe superlattices Fujita, Atsuki
2003
5-6 p. 457-460
4 p.
artikel
107 Material and process considerations for terahertz planar nanodevices Lu, X.F.
2008
5-6 p. 407-410
4 p.
artikel
108 Materials for the recording of thin holographic grating couplers Weiss, Victor
2000
5-6 p. 413-418
6 p.
artikel
109 Melt growth and stoichiometry control of (Cd1−x Zn x )1+yTe single crystals Takahashi, Junichi
2003
5-6 p. 453-456
4 p.
artikel
110 Metal implants-dependent carrier recombination characteristics in Ge Gaubas, E.
2008
5-6 p. 291-294
4 p.
artikel
111 Modelling and simulation of low-frequency broadband LNA using InGaAs/InAlAs structures: A new approach Boudjelida, B.
2008
5-6 p. 398-401
4 p.
artikel
112 MOVPE growth of GaAsN: surface study by AFM and optical properties Auvray, L.
2000
5-6 p. 505-509
5 p.
artikel
113 MT™-compatible connectorisation of VCSEL and RCLED arrays to plastic optical fibre ribbon for low cost parallel datalinks Coosemans, T
2000
5-6 p. 475-480
6 p.
artikel
114 Nanoscale electrical characterization of ultrathin high-k dielectric MOS stacks: A conducting AFM study Uppal, H.J.
2008
5-6 p. 250-253
4 p.
artikel
115 Nanoscale strain characterisation for ultimate CMOS and beyond Olsen, Sarah H.
2008
5-6 p. 271-278
8 p.
artikel
116 NANOSIL network of excellence—silicon-based nanostructures and nanodevices for long-term nanoelectronics applications Balestra, F.
2008
5-6 p. 148-159
12 p.
artikel
117 New types of microlens arrays for the IR based on inorganic chalcogenide photoresists Eisenberg, N.P
2000
5-6 p. 443-448
6 p.
artikel
118 Nitrogen doped silicon films heavily boron implanted for MOS structures: Simulation and characterization Mahamdi, R.
2010
5-6 p. 383-388
6 p.
artikel
119 Nonequilibrium aspects of armchair graphene nanoribbon conduction Deretzis, I.
2008
5-6 p. 190-194
5 p.
artikel
120 Nonstoichiometric deep levels in Mg-doped GaP epitaxial layers Tanno, Takenori
2003
5-6 p. 437-440
4 p.
artikel
121 Non-stoichiometric growth of GaAs by the vapour pressure controlled Czochralski (VCz) method without B2O3 encapsulation Kiessling, F.-M.
2003
5-6 p. 303-306
4 p.
artikel
122 Nonstoichiometry and defects in III–V compounds Zlomanov, Vladimir P.
2003
5-6 p. 311-314
4 p.
artikel
123 Nonstoichiometry and point defects in nonlinear optical crystals A2B4C2 5 Voevodin, Valeriy G.
2003
5-6 p. 385-388
4 p.
artikel
124 Non-stoichiometry and problem of heavy doping in semiconductor phases Rogacheva, E.I.
2003
5-6 p. 491-496
6 p.
artikel
125 Nonstoichiometry and solubility of impurity in In-doped PbTe films on Si substrates Samoylov, Alexander M
2003
5-6 p. 327-333
7 p.
artikel
126 Non-stoichiometry in SnTe thin films and temperature instabilities of thermoelectric properties Rogacheva, E.I.
2003
5-6 p. 497-501
5 p.
artikel
127 [No title] Crean, G.M
2000
5-6 p. 329-
1 p.
artikel
128 No trace of divacancies at room temperature in germanium Kolkovsky, Vl.
2008
5-6 p. 336-339
4 p.
artikel
129 N-type implantation doping of GaN Nakano, Yoshitaka
2003
5-6 p. 515-517
3 p.
artikel
130 Optical broadcast and clock distribution for multi-chip-modules Pez, M
2000
5-6 p. 459-466
8 p.
artikel
131 Optical interference effect of a thick absorbing LT-GaAs layer on a Bragg reflector Giehler, M.
2003
5-6 p. 257-261
5 p.
artikel
132 Optical study of porous silicon buried waveguides fabricated from p-type silicon Charrier, J
2000
5-6 p. 357-361
5 p.
artikel
133 Optical waveguides fabricated on polymer substrate by electron beam Darraud-Taupiac, C.
2000
5-6 p. 363-365
3 p.
artikel
134 Organic electronics: Materials, technology and circuit design developments enabling new applications de Leeuw, D.M.
2008
5-6 p. 199-204
6 p.
artikel
135 Oxidation characteristics of Si0.85Ge0.15 nanowires Kim, Sang-Yeon
2008
5-6 p. 182-186
5 p.
artikel
136 Phase separation in Ga-doped MgZnO layers grown by plasma-assisted molecular-beam epitaxy Harada, Chihiro
2003
5-6 p. 539-541
3 p.
artikel
137 Photonic band structures of 2D non-circular air lattices in Si Hillebrand, R.
2000
5-6 p. 493-497
5 p.
artikel
138 Photophysical properties of nano Si/SiO x composites in Al/composite/mono Si structures for green light emitting and photodetector-Schottky diodes Buzaneva, E
2000
5-6 p. 529-537
9 p.
artikel
139 Planar integration of a polarization-insensitive optical switch with holographic elements Moreau, V
2000
5-6 p. 551-555
5 p.
artikel
140 Polarity control of GaN epilayers grown on ZnO templates Suzuki, Takuma
2003
5-6 p. 519-521
3 p.
artikel
141 Possibilities to increase the resolution of photoelectric incremental rotary encoders Dumbrǎvescu, N
2000
5-6 p. 557-561
5 p.
artikel
142 Preface Suto, K.
2003
5-6 p. 247-
1 p.
artikel
143 Present status and future needs of free-space optical interconnects Esener, Sadik
2000
5-6 p. 433-435
3 p.
artikel
144 Properties of Bi-doped PbTe epitaxial layers and pn junction diodes grown by TDM-CVP Yasuda, Arata
2003
5-6 p. 487-490
4 p.
artikel
145 Properties of pulsed laser deposited vanadium oxide thin film thermistor kumar, R.T.Rajendra
2003
5-6 p. 375-377
3 p.
artikel
146 Proton exchange in Y-cut LiNbO3 Kuneva, M.
2000
5-6 p. 581-583
3 p.
artikel
147 Radiation damage in proton-irradiated strained Si n-MOSFETs Hayama, K.
2008
5-6 p. 314-318
5 p.
artikel
148 Radiation damage of Ge-on-Si devices Ohyama, H.
2008
5-6 p. 217-220
4 p.
artikel
149 Raman spectra of GaPAs–GaP heterostructure waveguides Tanabe, T.
2003
5-6 p. 445-447
3 p.
artikel
150 Raman spectroscopy determination of composition and strain in Si 1 - x Ge x / Si heterostructures Pezzoli, F.
2008
5-6 p. 279-284
6 p.
artikel
151 Realization of one-chip-two-wavelength light sources Song, J.S.
2003
5-6 p. 561-565
5 p.
artikel
152 Real structure of partially ordered crystals Kienle, L.
2003
5-6 p. 393-396
4 p.
artikel
153 Reduction of defect states of tantalum oxide thin films with additive elements Salam, K.M.A.
2003
5-6 p. 531-533
3 p.
artikel
154 Region-dependent behavior of I–V characteristics in n-ZnO:Al/p-Si contacts Shen, L.
2010
5-6 p. 339-343
5 p.
artikel
155 Reliability assessment of SiO2/ZrO2 stack gate dielectric on strained-Si/Si0.8Ge0.2 heterolayers under dynamic and AC stress Bera, M.K.
2008
5-6 p. 254-258
5 p.
artikel
156 Room-temperature light-emitting diodes with Ge islands Vescan, L
2000
5-6 p. 383-387
5 p.
artikel
157 Science and prospects for non-stoichiometry in dielectrics Pei, Z.
2003
5-6 p. 339-342
4 p.
artikel
158 Self-diffusion of cadmium in cadmium telluride annealed in tellurium-saturated atmosphere Kanno, R.
2003
5-6 p. 319-322
4 p.
artikel
159 SEM observation of InP/ErP/InP double heterostructures grown on InP(001), InP(111)A, and InP(111)B Hirata, T.
2003
5-6 p. 473-476
4 p.
artikel
160 Sensing pulsed light by means of Multi-Walled Carbon Nanotubes Ambrosio, A.
2008
5-6 p. 187-189
3 p.
artikel
161 Shallow boron implantations in Ge and the role of the pre-amorphization depth Simoen, E.
2008
5-6 p. 368-371
4 p.
artikel
162 β-SiC-on insulator waveguide structures for modulators and sensor systems Vonsovici, Adrian
2000
5-6 p. 367-374
8 p.
artikel
163 Silicon-based optical receivers in BiCMOS technology for advanced optoelectronic integrated circuits Kieschnick, K
2000
5-6 p. 395-398
4 p.
artikel
164 Silicon nanodot-array device with multiple gates Jo, Mingyu
2008
5-6 p. 175-178
4 p.
artikel
165 Simultaneous diffusion of Si and Ge in isotopically controlled Si 1 - x Ge x heterostructures Kube, R.
2008
5-6 p. 378-383
6 p.
artikel
166 Sm2O3 gate dielectric on Si substrate Chin, Wen Chiao
2010
5-6 p. 303-314
12 p.
artikel
167 Sol–gel derived germanium sulfide planar waveguides Xu, Jian
2000
5-6 p. 339-344
6 p.
artikel
168 STM nanospectroscopic studies of individual As-antisite defects in GaAs Maeda, K.
2003
5-6 p. 253-256
4 p.
artikel
169 Stoichiometry control and point defects in compound semiconductors Nishizawa, Jun-ichi
2003
5-6 p. 249-252
4 p.
artikel
170 Stoichiometry control of some II–VI ternary solid solutions during sublimation growth Mochizuki, Katsumi
2003
5-6 p. 293-296
4 p.
artikel
171 Stress analysis of Si1− x Ge x embedded source/drain junctions Bargallo Gonzalez, M.
2008
5-6 p. 285-290
6 p.
artikel
172 Structural characterization of DC magnetron-sputtered TiO2 thin films using XRD and Raman scattering studies Karunagaran, B.
2003
5-6 p. 547-550
4 p.
artikel
173 Structural properties of V2O5 thin films prepared by vacuum evaporation Rajendra Kumar, R.T.
2003
5-6 p. 543-546
4 p.
artikel
174 Structure and optical properties of ZnSeO alloys with O composition up to 6.4% Nabetani, Y.
2003
5-6 p. 343-346
4 p.
artikel
175 Subject Index 2000
5-6 p. IV-V
nvt p.
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176 Synthesis and functionalization of epitaxial quantum dot nanostructures for nanoelectronic architectures Hull, R.
2008
5-6 p. 160-168
9 p.
artikel
177 Synthesis of ZnO and Fe2O3 nanoparticles by sol–gel method and their application in dye-sensitized solar cells Reda, S.M.
2010
5-6 p. 417-425
9 p.
artikel
178 Systematic defect improvement integration of dual damascene processes development on nano semiconductor fabrication Weng, Chun-Jen
2010
5-6 p. 376-382
7 p.
artikel
179 TCAD modeling of NPN-SI-BJT electrical performance improvement through SiGe extrinsic stress layer Al-Sa'di, Mahmoud
2010
5-6 p. 344-348
5 p.
artikel
180 Technological processes and modeling of opto-electro-mechanical microstructures Muller, Raluca
2000
5-6 p. 427-431
5 p.
artikel
181 TEM characterization of Si nanowires grown by CVD on Si pre-structured by nanosphere lithography Lindner, Jörg K.N.
2008
5-6 p. 169-174
6 p.
artikel
182 The behaviour of in-diffused copper in n-type CdSnAs2 Daunov, M.I
2003
5-6 p. 323-326
4 p.
artikel
183 The Ge condensation technique: A solution for planar SOI/GeOI co-integration for advanced CMOS technologies? Vincent, B.
2008
5-6 p. 205-213
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artikel
184 The magnetic properties in transition metal-doped chalcopyrite semiconductors Kamatani, T
2003
5-6 p. 389-391
3 p.
artikel
185 The one-step vacuum growth of high-quality CuInS2 thin film suitable for photovoltaic applications Shao, Lexi
2003
5-6 p. 397-400
4 p.
artikel
186 Theoretical analysis of microscopic strain distribution and phase stability of Zn chalcogenide alloys using valence force field model Ito, Y.
2003
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4 p.
artikel
187 Thermal oxidation of tin layers and study of the effect of their annealings on their structural and electrical properties Laghrib, Souad
2010
5-6 p. 364-370
7 p.
artikel
188 Transmission of a microcavity structure in a two-dimensional photonic crystal based on macroporous silicon Birner, A.
2000
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5 p.
artikel
189 Ultrafast Si-based MSM mesa photodetectors with optical waveguide connection Buchal, Ch
2000
5-6 p. 399-403
5 p.
artikel
190 Very low leakage InGaAs/InAlAs pHEMTs for broadband (300MHz to 2GHz) low-noise applications Bouloukou, A.
2008
5-6 p. 390-393
4 p.
artikel
191 Vibrational and morphological properties of Sn-doped CdS films deposited by ultrasonic spray pyrolysis method Özer, Tülay
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5-6 p. 325-328
4 p.
artikel
192 Waveguide properties of optical thin films grown by pulsed laser deposition Eugenieva, E.D.
2000
5-6 p. 575-579
5 p.
artikel
193 XPS and IPE analysis of HfO2 band alignment with high-mobility semiconductors Perego, M.
2008
5-6 p. 221-225
5 p.
artikel
194 X-ray excited spectroscopy of defects and impurities in compound semiconductors Takeda, Y.
2003
5-6 p. 267-271
5 p.
artikel
195 Zincblende CrSb/GaAs multilayer structures with room-temperature ferromagnetism Zhao, J.H.
2003
5-6 p. 507-509
3 p.
artikel
                             195 gevonden resultaten
 
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