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                             57 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A comparative study of high resolution transmission electron microscopy, atomic force microscopy and infrared spectroscopy for GaN thin films grown on sapphire by metalorganic chemical vapor deposition Feng, Zhe Chuan
2006
200 10 p. 3224-3229
6 p.
artikel
2 An investigation of preferred orientation of doped ZnO films on the 36° YX-LiTaO3 substrates and fabrications of Love-mode devices Chang, Ren-Chuan
2006
200 10 p. 3235-3240
6 p.
artikel
3 A novel method for growing polycrystalline Ge layer by using UHVCVD Tu, Chun-Hao
2006
200 10 p. 3261-3264
4 p.
artikel
4 Application of CVD method on grain-oriented electrical steel Yamaguchi, Hiroi
2006
200 10 p. 3351-3354
4 p.
artikel
5 A study of the low temperature plasma polymerization on enhancing interface of painted cold rolled steel in salt bath Lin, Y.-S.
2006
200 10 p. 3355-3365
11 p.
artikel
6 Author Index of Volume 200 Issue 10 2006
200 10 p. 3389-3390
2 p.
artikel
7 Bonding configuration and electrical properties of nitrogen and fluorine incorporated SiOC:H thin film prepared by plasma enhanced chemical vapor deposition JangJian, Shiu-Ko
2006
200 10 p. 3140-3144
5 p.
artikel
8 Characterization of elecrophoretically deposited nanocrystalline titanium dioxide films Lin, C.K.
2006
200 10 p. 3184-3189
6 p.
artikel
9 Combined optical, surface and nuclear microscopic assessment of porous silicon formed in HF-acetonitrile Feng, Z.C.
2006
200 10 p. 3254-3260
7 p.
artikel
10 Comparison in microstructure and mechanical properties of nanocomposite CrWN and nanolayered CrN/WN coatings Wu, Fan-Bean
2006
200 10 p. 3194-3198
5 p.
artikel
11 Comparison with electrical and optical properties of zinc oxide films deposited on the glass and PET substrates Tsai, Shu-Yi
2006
200 10 p. 3241-3244
4 p.
artikel
12 Deposition and characterization of TaN–Cu nanocomposite thin films Hsieh, J.H.
2006
200 10 p. 3179-3183
5 p.
artikel
13 Detection of precursor molecules in the Metal Chloride Reduction CVD of Cu Hibi, Atsushi
2006
200 10 p. 3117-3121
5 p.
artikel
14 Effect of crystallinity and preferred orientation of Ta2N films on diffusion barrier properties for copper metallization Chung, Hung-Chin
2006
200 10 p. 3122-3126
5 p.
artikel
15 Effect of deposition temperature and oxygen flow rate on properties of low dielectric constant SiCOH film prepared by plasma enhanced chemical vapor deposition using diethoxymethylsilane Cheng, Y.L.
2006
200 10 p. 3134-3139
6 p.
artikel
16 Effect of oxygen pressure on the microstructure and properties of the Al2O3–SiO2 thin films deposited by E-beam evaporation Huang, Hong-Hsin
2006
200 10 p. 3309-3313
5 p.
artikel
17 Effect of spray angle on three-dimensional flow and deposition process in atmospheric plasma spray torch: A numerical study Ko, Tzu-Hsiang
2006
200 10 p. 3376-3379
4 p.
artikel
18 Effects of ammonia plasma treatment on the surface characteristics of carbon fibers Wen, Hua-Chiang
2006
200 10 p. 3166-3169
4 p.
artikel
19 Excimer emission from a novel ethyne-based fluorescent dye in organic light-emitting devices Lai, Ke-Yin
2006
200 10 p. 3283-3288
6 p.
artikel
20 Growth of free-standing diamond films of hemispheric shells Huang, Shr-Ming
2006
200 10 p. 3151-3155
5 p.
artikel
21 Growth of high-quality single-walled carbon nanotubes through the thermal chemical vapor deposition using co-sputtering Fe–Mo films as catalysts Chiu, Chien-Chao
2006
200 10 p. 3199-3202
4 p.
artikel
22 Heat, moisture and chemical resistance on low dielectric constant (low-k) film using Diethoxymethylsilane (DEMS) prepared by plasma enhanced chemical vapor deposition Cheng, Y.L.
2006
200 10 p. 3127-3133
7 p.
artikel
23 Investigation of overpotential and seed thickness on damascene copper electroplating Chen, K.W.
2006
200 10 p. 3112-3116
5 p.
artikel
24 Investigation of the corrosion resistance of ZrCN hard coatings fabricated by advanced controlled arc plasma deposition Gu, Jian-De
2006
200 10 p. 3341-3346
6 p.
artikel
25 Low temperature deposition of metal films by metal chloride reduction chemical vapor deposition Ogura, Yuzuru
2006
200 10 p. 3347-3350
4 p.
artikel
26 Low temperature growths of nanocrystalline diamond films by plasma-assisted hot filament chemical vapor deposition Huang, Shr-Ming
2006
200 10 p. 3160-3165
6 p.
artikel
27 Luminescent characteristics of InGaAsP/InP multiple quantum well structures by impurity-free vacancy disordering Zhao, J.
2006
200 10 p. 3245-3249
5 p.
artikel
28 Magnetic property enhancement by sputtering magnetically soft films (Co, Fe and Fe65Co35) on PrFeB-type permanent magnet ribbons Chang, W.C.
2006
200 10 p. 3366-3369
4 p.
artikel
29 Microstructural and electrical studies of nitrogen doped diamond thin films grown by microwave plasma CVD Young, Tai-Fa
2006
200 10 p. 3145-3150
6 p.
artikel
30 Microstructure evolution of ZrN films annealed in vacuum Chieh, Yu-Chih
2006
200 10 p. 3336-3340
5 p.
artikel
31 Modeling and parameter analysis of plasma cleaning Li, Chuan
2006
200 10 p. 3370-3375
6 p.
artikel
32 Multiscale analysis for dissociative adsorption of SiH4 on Si(100) surface Sakiyama, Y.
2006
200 10 p. 3385-3388
4 p.
artikel
33 Nanofabrication and the structure-property analyses of phase-change alloy-ended CNTs Wang, W.H.
2006
200 10 p. 3206-3210
5 p.
artikel
34 Novel process to synthesize the well-size-controlled carbon nanotubes using Fe/TiO2 as catalyst by sol–gel method Su, C.H.
2006
200 10 p. 3211-3214
4 p.
artikel
35 Optical and material properties of sandwiched Si/SiGe/Si heterostructures Feng, Z.C.
2006
200 10 p. 3265-3269
5 p.
artikel
36 Photo-assisted thermally oxidized GaAs insulator layers deposited by photo-CVD Liu, C.H.
2006
200 10 p. 3250-3253
4 p.
artikel
37 Polymerization-like grafting of thermoplastic polyurethane by microwave plasma treatment Su, Cherng-Yuh
2006
200 10 p. 3380-3384
5 p.
artikel
38 Precipitates formation and its impact on the structure of plasma-deposited fluorinated silicon oxide films Wu, Jun
2006
200 10 p. 3303-3308
6 p.
artikel
39 Pressure effect of low-temperature growth of multi-wall carbon nanotubes on Nickel catalyst/barrier-coated glass by thermal-CVD Li, C.H.
2006
200 10 p. 3220-3223
4 p.
artikel
40 Pulse source injection molecular beam epitaxy and characterization of nano-scale thin GaN layers on Si substrates Tong, W.
2006
200 10 p. 3230-3234
5 p.
artikel
41 Red electroluminescence from Ruthenium complexes Chang, S.M.
2006
200 10 p. 3289-3296
8 p.
artikel
42 Solvent effect of excited state intramolecular proton transfer in 2-(2′-hydroxyphenyl) benzothiazole upon luminescent properties Chang, S.M.
2006
200 10 p. 3278-3282
5 p.
artikel
43 Structural and electrical properties of Cr doped a-C:H films synthesized by a cathodic-arc activated deposition process Chang, Yin-Yu
2006
200 10 p. 3170-3174
5 p.
artikel
44 Structure and electrical characteristics of RF magnetron sputtered MgTiO3 Huang, Cheng-Liang
2006
200 10 p. 3319-3325
7 p.
artikel
45 Structure and optical property of the a-C:N films synthesized by filtered cathode vacuum arc Hsieh, Wei-Jen
2006
200 10 p. 3175-3178
4 p.
artikel
46 Subject Index of Volume 200 Issue 10 2006
200 10 p. 3391-3397
7 p.
artikel
47 Surface organic modification of inorganic substrates by plasma deposition of tin oxide organic-like thin films and grafting polymerization Chen, Ko-Shao
2006
200 10 p. 3270-3277
8 p.
artikel
48 Synthesis and characteristics of polyimide/siloxane hybrid films for reliability adhesion Tsai, Mei-Hui
2006
200 10 p. 3297-3302
6 p.
artikel
49 Synthesis of nanosized flake carbons by RF-chemical vapor method Lin, C.R.
2006
200 10 p. 3190-3193
4 p.
artikel
50 Synthesis of ultra long vertically aligned carbon nanotubes using the rapid heating and cooling system in the thermal chemical vapor deposition process Chiu, Chien-Chao
2006
200 10 p. 3215-3219
5 p.
artikel
51 The application of atomic layer deposition for metallization of 65 nm and beyond Kim, H.
2006
200 10 p. 3104-3111
8 p.
artikel
52 The characterization of aluminum nitride thin films prepared by dual ion beam sputtering Chen, Hong-Ying
2006
200 10 p. 3326-3329
4 p.
artikel
53 The effect of the substrate position on microwave plasma chemical vapor deposition of diamond films Lin, C.R.
2006
200 10 p. 3156-3159
4 p.
artikel
54 The mechanical properties evaluation of the CrN coatings deposited by the pulsed DC reactive magnetron sputtering Lee, Jyh-Wei
2006
200 10 p. 3330-3335
6 p.
artikel
55 The 3rd Asian Conference on Chemical Vapor Deposition (3rd Asian-CVD), Taipei, Taiwan, November 12–14, 2004 Feng, Zhe Chuan
2006
200 10 p. 3103-
1 p.
artikel
56 The study of diffusion and nucleation for CoSi2 formation by oxide-mediated cobalt silicidation Chang, Juin-Jie
2006
200 10 p. 3314-3318
5 p.
artikel
57 Ultra-high vacuum system for adsorption–desorption studies of hydrogen storage on/in carbon nanotubes Stobinski, Leszek
2006
200 10 p. 3203-3205
3 p.
artikel
                             57 gevonden resultaten
 
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