| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A common-path fast-scanning interferometer system for thin-film surface profiling
|
Cheon, M.S.
|
|
2003
|
171 |
1-3 |
p. 194-197
4 p.
|
artikel
|
| 2 |
Air mesh plasma for PCB de-smear process
|
Lee, Eung Suok
|
|
2003
|
171 |
1-3 |
p. 328-332
5 p.
|
artikel
|
| 3 |
Analytical studies on MHD oscillatory flow of a micropolar fluid over a vertical porous plate
|
Kim, Youn J.
|
|
2003
|
171 |
1-3 |
p. 187-193
7 p.
|
artikel
|
| 4 |
Application of multi-ion beam enhanced deposition
|
Li, Guoqing
|
|
2003
|
171 |
1-3 |
p. 264-266
3 p.
|
artikel
|
| 5 |
A study on formation of Al and Al2O3 on the porous paper by DC magnetron sputtering
|
Chung, Yun M.
|
|
2003
|
171 |
1-3 |
p. 65-70
6 p.
|
artikel
|
| 6 |
Author Index
|
|
|
2003
|
171 |
1-3 |
p. 333-334
2 p.
|
artikel
|
| 7 |
Characterization of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection
|
Kim, Hyeong Joon
|
|
2003
|
171 |
1-3 |
p. 39-45
7 p.
|
artikel
|
| 8 |
Cold arc-plasma jet under atmospheric pressure for surface modification
|
Toshifuji, Jungo
|
|
2003
|
171 |
1-3 |
p. 302-306
5 p.
|
artikel
|
| 9 |
Comparison of optical and electrical properties of BON and Ti-BON thin films prepared by PAMOCVD method
|
Lim, D.-C.
|
|
2003
|
171 |
1-3 |
p. 101-105
5 p.
|
artikel
|
| 10 |
Decontamination of radioactive metal surface by atmospheric pressure ejected plasma source
|
Kim, Yong-Hwan
|
|
2003
|
171 |
1-3 |
p. 317-320
4 p.
|
artikel
|
| 11 |
Development of shielded cathodic arc deposition with a superconductor shield
|
Takikawa, Hirofumi
|
|
2003
|
171 |
1-3 |
p. 162-166
5 p.
|
artikel
|
| 12 |
Development of the RF plasma source at atmospheric pressure
|
Kang, Jung G.
|
|
2003
|
171 |
1-3 |
p. 144-148
5 p.
|
artikel
|
| 13 |
Diagnostics of neutral species in the low-angle forward-reflected neutral beam etching system
|
Chung, M.J.
|
|
2003
|
171 |
1-3 |
p. 231-236
6 p.
|
artikel
|
| 14 |
Dry etching characteristics of (Ba0.6,Sr0.4)TiO3 thin films in high density CF4/Ar plasma
|
Kang, Pil-Seung
|
|
2003
|
171 |
1-3 |
p. 273-279
7 p.
|
artikel
|
| 15 |
Effect of electron collisions on the plasma–sheath formation
|
Kang, S.W.
|
|
2003
|
171 |
1-3 |
p. 173-177
5 p.
|
artikel
|
| 16 |
Effect of intrinsic properties of ceramic coatings on fatigue behavior of Cr–Mo–V steels
|
Kim, K.R.
|
|
2003
|
171 |
1-3 |
p. 15-23
9 p.
|
artikel
|
| 17 |
Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistry
|
Oh, C.H.
|
|
2003
|
171 |
1-3 |
p. 267-272
6 p.
|
artikel
|
| 18 |
Effects of discharge pulsing on the cleaning of surfaces using a dielectric barrier discharge at atmospheric pressure
|
Kim, Yoon-Kee
|
|
2003
|
171 |
1-3 |
p. 321-327
7 p.
|
artikel
|
| 19 |
Effects of the thickness of Ti buffer layer on the mechanical properties of TiN coatings
|
Kim, G.S.
|
|
2003
|
171 |
1-3 |
p. 83-90
8 p.
|
artikel
|
| 20 |
Epitaxial cobalt silicide formation using a Co/TiSi x bilayer on Si (100) by sputtering
|
Jeong, Jin Jung
|
|
2003
|
171 |
1-3 |
p. 6-10
5 p.
|
artikel
|
| 21 |
Experimental analysis of a DC–RF hybrid plasma flow
|
Kawajiri, Kohtaro
|
|
2003
|
171 |
1-3 |
p. 134-139
6 p.
|
artikel
|
| 22 |
Fundamental study on plasma deposition manufacturing
|
Zhang, Haiou
|
|
2003
|
171 |
1-3 |
p. 112-118
7 p.
|
artikel
|
| 23 |
Grain size refinement of the diamond film deposited on the WC–Co cutting inserts using direct current biasing
|
Park, Jong-Keuk
|
|
2003
|
171 |
1-3 |
p. 1-5
5 p.
|
artikel
|
| 24 |
High aspect ratio via etching conditions for deep trench of silicon
|
Park, W.J.
|
|
2003
|
171 |
1-3 |
p. 290-295
6 p.
|
artikel
|
| 25 |
Hydrogenated amorphous and crystalline SiC thin films grown by RF-PECVD and thermal MOCVD; comparative study of structural and optical properties
|
Jung, C.-K.
|
|
2003
|
171 |
1-3 |
p. 46-50
5 p.
|
artikel
|
| 26 |
Influence of substrate temperature on the etching of silver films using inductively coupled Cl2-based plasmas
|
Park, S.D.
|
|
2003
|
171 |
1-3 |
p. 285-289
5 p.
|
artikel
|
| 27 |
Initial deposition stage of LiNb0.5Ta0.5O3 films in thermal plasma CVD
|
Yamaki, T.
|
|
2003
|
171 |
1-3 |
p. 11-14
4 p.
|
artikel
|
| 28 |
Ion dynamics of pulsed plasma source ion implantation in the sheath of a hemispherical bowl-shaped target
|
Liu, Chengsen
|
|
2003
|
171 |
1-3 |
p. 119-123
5 p.
|
artikel
|
| 29 |
Kinetic and mechanistic study on the chemical vapor deposition of titanium dioxide thin films by in situ FT-IR using TTIP
|
Ahn, Kyoung-Ho
|
|
2003
|
171 |
1-3 |
p. 198-204
7 p.
|
artikel
|
| 30 |
Measurement of electron temperature and plasma density in coplanar AC plasma display panels
|
Cho, Iil Ryong
|
|
2003
|
171 |
1-3 |
p. 222-225
4 p.
|
artikel
|
| 31 |
Measurement of ion temperature in ECR Ar/N2 plasma
|
Koga, Mayuko
|
|
2003
|
171 |
1-3 |
p. 216-221
6 p.
|
artikel
|
| 32 |
Microstructure and optical properties of MgO films synthesized by closed-field unbalanced magnetron sputtering with additional electron emission
|
Nam, Kyung H.
|
|
2003
|
171 |
1-3 |
p. 51-58
8 p.
|
artikel
|
| 33 |
Motion and heating of non-spherical particles in a plasma jet
|
Xu, Dong-Yan
|
|
2003
|
171 |
1-3 |
p. 149-156
8 p.
|
artikel
|
| 34 |
Multi-jet atmospheric glow plasma cleaning of ablation debris from micro-via drilling process
|
Lee, Eung Suok
|
|
2003
|
171 |
1-3 |
p. 307-311
5 p.
|
artikel
|
| 35 |
Nucleation and growth behavior of chromium nitride film deposited on various substrates by magnetron sputtering
|
Jung, Min J.
|
|
2003
|
171 |
1-3 |
p. 59-64
6 p.
|
artikel
|
| 36 |
Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures
|
Muta, Hiroshi
|
|
2003
|
171 |
1-3 |
p. 157-161
5 p.
|
artikel
|
| 37 |
Optical measurements of gas temperatures in atmospheric pressure RF cold plasmas
|
Kim, J.H.
|
|
2003
|
171 |
1-3 |
p. 211-215
5 p.
|
artikel
|
| 38 |
Optimum substrate bias condition for TiN thin film deposition using an ECR sputter system
|
Sung, Youl-Moon
|
|
2003
|
171 |
1-3 |
p. 75-82
8 p.
|
artikel
|
| 39 |
Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma
|
You, S.J.
|
|
2003
|
171 |
1-3 |
p. 226-230
5 p.
|
artikel
|
| 40 |
Plasma boronitriding of WC(Co) substrate as an effective pretreatment process for diamond CVD
|
Man, W.D.
|
|
2003
|
171 |
1-3 |
p. 241-246
6 p.
|
artikel
|
| 41 |
Plasma processing of materials for medical applications
|
Lee, In-Seop
|
|
2003
|
171 |
1-3 |
p. 252-256
5 p.
|
artikel
|
| 42 |
Plasma-treatment of MgO film in a.c. plasma display
|
Lee, Sung Ha
|
|
2003
|
171 |
1-3 |
p. 247-251
5 p.
|
artikel
|
| 43 |
Preface
|
Whang, Prof.K.W.
|
|
2003
|
171 |
1-3 |
p. ix-
1 p.
|
artikel
|
| 44 |
Preparation and characterization of TiN coatings produced by combination of PI3D and ICP assisted magnetron PVD
|
Nikiforov, S.A.
|
|
2003
|
171 |
1-3 |
p. 106-111
6 p.
|
artikel
|
| 45 |
Preparation of TiN films at room temperature by inductively coupled plasma assisted chemical vapor deposition
|
Lee, Dong-Kak
|
|
2003
|
171 |
1-3 |
p. 24-28
5 p.
|
artikel
|
| 46 |
Refractive index control of core layer using PECVD and FHD for silica optical waveguide
|
Kim, Y.T.
|
|
2003
|
171 |
1-3 |
p. 34-38
5 p.
|
artikel
|
| 47 |
Sapphire etching with BCl3/HBr/Ar plasma
|
Jeong, C.H.
|
|
2003
|
171 |
1-3 |
p. 280-284
5 p.
|
artikel
|
| 48 |
Spectroscopic study for pulsed DC plasma nitriding of narrow deep holes
|
Kim, Yong M.
|
|
2003
|
171 |
1-3 |
p. 205-210
6 p.
|
artikel
|
| 49 |
Stability of weak discharge at Y-reset period in plasma display panel discharge
|
Song, Su-Bin
|
|
2003
|
171 |
1-3 |
p. 140-143
4 p.
|
artikel
|
| 50 |
Studies of a magnetic null discharge plasma for sputtering application
|
Sung, Youl-Moon
|
|
2003
|
171 |
1-3 |
p. 178-182
5 p.
|
artikel
|
| 51 |
Subject Index
|
|
|
2003
|
171 |
1-3 |
p. 335-340
6 p.
|
artikel
|
| 52 |
Surface modification for hydrophilic property of stainless steel treated by atmospheric-pressure plasma jet
|
Kim, M.C.
|
|
2003
|
171 |
1-3 |
p. 312-316
5 p.
|
artikel
|
| 53 |
Surface modification of natural leather using low-pressure parallel plate plasma
|
Choi, Jai Hyuk
|
|
2003
|
171 |
1-3 |
p. 257-263
7 p.
|
artikel
|
| 54 |
Synthesis of CrN/AlN superlattice coatings using closed-field unbalanced magnetron sputtering process
|
Kim, Gwang S.
|
|
2003
|
171 |
1-3 |
p. 91-95
5 p.
|
artikel
|
| 55 |
The effect of pulsed magnetron sputtering on the properties of indium tin oxide thin films
|
Hwang, Man-Soo
|
|
2003
|
171 |
1-3 |
p. 29-33
5 p.
|
artikel
|
| 56 |
The mechanical properties of the SiOC(H) composite thin films with a low dielectric constant
|
Lee, Hean Ju
|
|
2003
|
171 |
1-3 |
p. 296-301
6 p.
|
artikel
|
| 57 |
The physiochemical properties of TiO x N y films with controlled oxygen partial pressure
|
Jung, Min J.
|
|
2003
|
171 |
1-3 |
p. 71-74
4 p.
|
artikel
|
| 58 |
The RF plasma polymer of lysine and the growth of human nerve cells on its surface
|
Feng, Xiangfen
|
|
2003
|
171 |
1-3 |
p. 96-100
5 p.
|
artikel
|
| 59 |
The study of atmospheric pressure plasma for surface cleaning
|
Yi, C.H.
|
|
2003
|
171 |
1-3 |
p. 237-240
4 p.
|
artikel
|
| 60 |
Three-dimensional flow and heat transfer in thermal plasma systems
|
Chen, Xi
|
|
2003
|
171 |
1-3 |
p. 124-133
10 p.
|
artikel
|
| 61 |
Three-dimensional heating model of inductively coupled plasma with rectangular geometry
|
Song, Su-Bin
|
|
2003
|
171 |
1-3 |
p. 183-186
4 p.
|
artikel
|
| 62 |
Uniformity of VHF plasma produced with ladder shaped electrode
|
Mashima, Hiroshi
|
|
2003
|
171 |
1-3 |
p. 167-172
6 p.
|
artikel
|
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