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                             62 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A common-path fast-scanning interferometer system for thin-film surface profiling Cheon, M.S.
2003
171 1-3 p. 194-197
4 p.
artikel
2 Air mesh plasma for PCB de-smear process Lee, Eung Suok
2003
171 1-3 p. 328-332
5 p.
artikel
3 Analytical studies on MHD oscillatory flow of a micropolar fluid over a vertical porous plate Kim, Youn J.
2003
171 1-3 p. 187-193
7 p.
artikel
4 Application of multi-ion beam enhanced deposition Li, Guoqing
2003
171 1-3 p. 264-266
3 p.
artikel
5 A study on formation of Al and Al2O3 on the porous paper by DC magnetron sputtering Chung, Yun M.
2003
171 1-3 p. 65-70
6 p.
artikel
6 Author Index 2003
171 1-3 p. 333-334
2 p.
artikel
7 Characterization of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection Kim, Hyeong Joon
2003
171 1-3 p. 39-45
7 p.
artikel
8 Cold arc-plasma jet under atmospheric pressure for surface modification Toshifuji, Jungo
2003
171 1-3 p. 302-306
5 p.
artikel
9 Comparison of optical and electrical properties of BON and Ti-BON thin films prepared by PAMOCVD method Lim, D.-C.
2003
171 1-3 p. 101-105
5 p.
artikel
10 Decontamination of radioactive metal surface by atmospheric pressure ejected plasma source Kim, Yong-Hwan
2003
171 1-3 p. 317-320
4 p.
artikel
11 Development of shielded cathodic arc deposition with a superconductor shield Takikawa, Hirofumi
2003
171 1-3 p. 162-166
5 p.
artikel
12 Development of the RF plasma source at atmospheric pressure Kang, Jung G.
2003
171 1-3 p. 144-148
5 p.
artikel
13 Diagnostics of neutral species in the low-angle forward-reflected neutral beam etching system Chung, M.J.
2003
171 1-3 p. 231-236
6 p.
artikel
14 Dry etching characteristics of (Ba0.6,Sr0.4)TiO3 thin films in high density CF4/Ar plasma Kang, Pil-Seung
2003
171 1-3 p. 273-279
7 p.
artikel
15 Effect of electron collisions on the plasma–sheath formation Kang, S.W.
2003
171 1-3 p. 173-177
5 p.
artikel
16 Effect of intrinsic properties of ceramic coatings on fatigue behavior of Cr–Mo–V steels Kim, K.R.
2003
171 1-3 p. 15-23
9 p.
artikel
17 Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistry Oh, C.H.
2003
171 1-3 p. 267-272
6 p.
artikel
18 Effects of discharge pulsing on the cleaning of surfaces using a dielectric barrier discharge at atmospheric pressure Kim, Yoon-Kee
2003
171 1-3 p. 321-327
7 p.
artikel
19 Effects of the thickness of Ti buffer layer on the mechanical properties of TiN coatings Kim, G.S.
2003
171 1-3 p. 83-90
8 p.
artikel
20 Epitaxial cobalt silicide formation using a Co/TiSi x bilayer on Si (100) by sputtering Jeong, Jin Jung
2003
171 1-3 p. 6-10
5 p.
artikel
21 Experimental analysis of a DC–RF hybrid plasma flow Kawajiri, Kohtaro
2003
171 1-3 p. 134-139
6 p.
artikel
22 Fundamental study on plasma deposition manufacturing Zhang, Haiou
2003
171 1-3 p. 112-118
7 p.
artikel
23 Grain size refinement of the diamond film deposited on the WC–Co cutting inserts using direct current biasing Park, Jong-Keuk
2003
171 1-3 p. 1-5
5 p.
artikel
24 High aspect ratio via etching conditions for deep trench of silicon Park, W.J.
2003
171 1-3 p. 290-295
6 p.
artikel
25 Hydrogenated amorphous and crystalline SiC thin films grown by RF-PECVD and thermal MOCVD; comparative study of structural and optical properties Jung, C.-K.
2003
171 1-3 p. 46-50
5 p.
artikel
26 Influence of substrate temperature on the etching of silver films using inductively coupled Cl2-based plasmas Park, S.D.
2003
171 1-3 p. 285-289
5 p.
artikel
27 Initial deposition stage of LiNb0.5Ta0.5O3 films in thermal plasma CVD Yamaki, T.
2003
171 1-3 p. 11-14
4 p.
artikel
28 Ion dynamics of pulsed plasma source ion implantation in the sheath of a hemispherical bowl-shaped target Liu, Chengsen
2003
171 1-3 p. 119-123
5 p.
artikel
29 Kinetic and mechanistic study on the chemical vapor deposition of titanium dioxide thin films by in situ FT-IR using TTIP Ahn, Kyoung-Ho
2003
171 1-3 p. 198-204
7 p.
artikel
30 Measurement of electron temperature and plasma density in coplanar AC plasma display panels Cho, Iil Ryong
2003
171 1-3 p. 222-225
4 p.
artikel
31 Measurement of ion temperature in ECR Ar/N2 plasma Koga, Mayuko
2003
171 1-3 p. 216-221
6 p.
artikel
32 Microstructure and optical properties of MgO films synthesized by closed-field unbalanced magnetron sputtering with additional electron emission Nam, Kyung H.
2003
171 1-3 p. 51-58
8 p.
artikel
33 Motion and heating of non-spherical particles in a plasma jet Xu, Dong-Yan
2003
171 1-3 p. 149-156
8 p.
artikel
34 Multi-jet atmospheric glow plasma cleaning of ablation debris from micro-via drilling process Lee, Eung Suok
2003
171 1-3 p. 307-311
5 p.
artikel
35 Nucleation and growth behavior of chromium nitride film deposited on various substrates by magnetron sputtering Jung, Min J.
2003
171 1-3 p. 59-64
6 p.
artikel
36 Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures Muta, Hiroshi
2003
171 1-3 p. 157-161
5 p.
artikel
37 Optical measurements of gas temperatures in atmospheric pressure RF cold plasmas Kim, J.H.
2003
171 1-3 p. 211-215
5 p.
artikel
38 Optimum substrate bias condition for TiN thin film deposition using an ECR sputter system Sung, Youl-Moon
2003
171 1-3 p. 75-82
8 p.
artikel
39 Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma You, S.J.
2003
171 1-3 p. 226-230
5 p.
artikel
40 Plasma boronitriding of WC(Co) substrate as an effective pretreatment process for diamond CVD Man, W.D.
2003
171 1-3 p. 241-246
6 p.
artikel
41 Plasma processing of materials for medical applications Lee, In-Seop
2003
171 1-3 p. 252-256
5 p.
artikel
42 Plasma-treatment of MgO film in a.c. plasma display Lee, Sung Ha
2003
171 1-3 p. 247-251
5 p.
artikel
43 Preface Whang, Prof.K.W.
2003
171 1-3 p. ix-
1 p.
artikel
44 Preparation and characterization of TiN coatings produced by combination of PI3D and ICP assisted magnetron PVD Nikiforov, S.A.
2003
171 1-3 p. 106-111
6 p.
artikel
45 Preparation of TiN films at room temperature by inductively coupled plasma assisted chemical vapor deposition Lee, Dong-Kak
2003
171 1-3 p. 24-28
5 p.
artikel
46 Refractive index control of core layer using PECVD and FHD for silica optical waveguide Kim, Y.T.
2003
171 1-3 p. 34-38
5 p.
artikel
47 Sapphire etching with BCl3/HBr/Ar plasma Jeong, C.H.
2003
171 1-3 p. 280-284
5 p.
artikel
48 Spectroscopic study for pulsed DC plasma nitriding of narrow deep holes Kim, Yong M.
2003
171 1-3 p. 205-210
6 p.
artikel
49 Stability of weak discharge at Y-reset period in plasma display panel discharge Song, Su-Bin
2003
171 1-3 p. 140-143
4 p.
artikel
50 Studies of a magnetic null discharge plasma for sputtering application Sung, Youl-Moon
2003
171 1-3 p. 178-182
5 p.
artikel
51 Subject Index 2003
171 1-3 p. 335-340
6 p.
artikel
52 Surface modification for hydrophilic property of stainless steel treated by atmospheric-pressure plasma jet Kim, M.C.
2003
171 1-3 p. 312-316
5 p.
artikel
53 Surface modification of natural leather using low-pressure parallel plate plasma Choi, Jai Hyuk
2003
171 1-3 p. 257-263
7 p.
artikel
54 Synthesis of CrN/AlN superlattice coatings using closed-field unbalanced magnetron sputtering process Kim, Gwang S.
2003
171 1-3 p. 91-95
5 p.
artikel
55 The effect of pulsed magnetron sputtering on the properties of indium tin oxide thin films Hwang, Man-Soo
2003
171 1-3 p. 29-33
5 p.
artikel
56 The mechanical properties of the SiOC(H) composite thin films with a low dielectric constant Lee, Hean Ju
2003
171 1-3 p. 296-301
6 p.
artikel
57 The physiochemical properties of TiO x N y films with controlled oxygen partial pressure Jung, Min J.
2003
171 1-3 p. 71-74
4 p.
artikel
58 The RF plasma polymer of lysine and the growth of human nerve cells on its surface Feng, Xiangfen
2003
171 1-3 p. 96-100
5 p.
artikel
59 The study of atmospheric pressure plasma for surface cleaning Yi, C.H.
2003
171 1-3 p. 237-240
4 p.
artikel
60 Three-dimensional flow and heat transfer in thermal plasma systems Chen, Xi
2003
171 1-3 p. 124-133
10 p.
artikel
61 Three-dimensional heating model of inductively coupled plasma with rectangular geometry Song, Su-Bin
2003
171 1-3 p. 183-186
4 p.
artikel
62 Uniformity of VHF plasma produced with ladder shaped electrode Mashima, Hiroshi
2003
171 1-3 p. 167-172
6 p.
artikel
                             62 gevonden resultaten
 
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