nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A common-path fast-scanning interferometer system for thin-film surface profiling
|
Cheon, M.S. |
|
2003 |
171 |
1-3 |
p. 194-197 4 p. |
artikel |
2 |
Air mesh plasma for PCB de-smear process
|
Lee, Eung Suok |
|
2003 |
171 |
1-3 |
p. 328-332 5 p. |
artikel |
3 |
Analytical studies on MHD oscillatory flow of a micropolar fluid over a vertical porous plate
|
Kim, Youn J. |
|
2003 |
171 |
1-3 |
p. 187-193 7 p. |
artikel |
4 |
Application of multi-ion beam enhanced deposition
|
Li, Guoqing |
|
2003 |
171 |
1-3 |
p. 264-266 3 p. |
artikel |
5 |
A study on formation of Al and Al2O3 on the porous paper by DC magnetron sputtering
|
Chung, Yun M. |
|
2003 |
171 |
1-3 |
p. 65-70 6 p. |
artikel |
6 |
Author Index
|
|
|
2003 |
171 |
1-3 |
p. 333-334 2 p. |
artikel |
7 |
Characterization of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection
|
Kim, Hyeong Joon |
|
2003 |
171 |
1-3 |
p. 39-45 7 p. |
artikel |
8 |
Cold arc-plasma jet under atmospheric pressure for surface modification
|
Toshifuji, Jungo |
|
2003 |
171 |
1-3 |
p. 302-306 5 p. |
artikel |
9 |
Comparison of optical and electrical properties of BON and Ti-BON thin films prepared by PAMOCVD method
|
Lim, D.-C. |
|
2003 |
171 |
1-3 |
p. 101-105 5 p. |
artikel |
10 |
Decontamination of radioactive metal surface by atmospheric pressure ejected plasma source
|
Kim, Yong-Hwan |
|
2003 |
171 |
1-3 |
p. 317-320 4 p. |
artikel |
11 |
Development of shielded cathodic arc deposition with a superconductor shield
|
Takikawa, Hirofumi |
|
2003 |
171 |
1-3 |
p. 162-166 5 p. |
artikel |
12 |
Development of the RF plasma source at atmospheric pressure
|
Kang, Jung G. |
|
2003 |
171 |
1-3 |
p. 144-148 5 p. |
artikel |
13 |
Diagnostics of neutral species in the low-angle forward-reflected neutral beam etching system
|
Chung, M.J. |
|
2003 |
171 |
1-3 |
p. 231-236 6 p. |
artikel |
14 |
Dry etching characteristics of (Ba0.6,Sr0.4)TiO3 thin films in high density CF4/Ar plasma
|
Kang, Pil-Seung |
|
2003 |
171 |
1-3 |
p. 273-279 7 p. |
artikel |
15 |
Effect of electron collisions on the plasma–sheath formation
|
Kang, S.W. |
|
2003 |
171 |
1-3 |
p. 173-177 5 p. |
artikel |
16 |
Effect of intrinsic properties of ceramic coatings on fatigue behavior of Cr–Mo–V steels
|
Kim, K.R. |
|
2003 |
171 |
1-3 |
p. 15-23 9 p. |
artikel |
17 |
Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistry
|
Oh, C.H. |
|
2003 |
171 |
1-3 |
p. 267-272 6 p. |
artikel |
18 |
Effects of discharge pulsing on the cleaning of surfaces using a dielectric barrier discharge at atmospheric pressure
|
Kim, Yoon-Kee |
|
2003 |
171 |
1-3 |
p. 321-327 7 p. |
artikel |
19 |
Effects of the thickness of Ti buffer layer on the mechanical properties of TiN coatings
|
Kim, G.S. |
|
2003 |
171 |
1-3 |
p. 83-90 8 p. |
artikel |
20 |
Epitaxial cobalt silicide formation using a Co/TiSi x bilayer on Si (100) by sputtering
|
Jeong, Jin Jung |
|
2003 |
171 |
1-3 |
p. 6-10 5 p. |
artikel |
21 |
Experimental analysis of a DC–RF hybrid plasma flow
|
Kawajiri, Kohtaro |
|
2003 |
171 |
1-3 |
p. 134-139 6 p. |
artikel |
22 |
Fundamental study on plasma deposition manufacturing
|
Zhang, Haiou |
|
2003 |
171 |
1-3 |
p. 112-118 7 p. |
artikel |
23 |
Grain size refinement of the diamond film deposited on the WC–Co cutting inserts using direct current biasing
|
Park, Jong-Keuk |
|
2003 |
171 |
1-3 |
p. 1-5 5 p. |
artikel |
24 |
High aspect ratio via etching conditions for deep trench of silicon
|
Park, W.J. |
|
2003 |
171 |
1-3 |
p. 290-295 6 p. |
artikel |
25 |
Hydrogenated amorphous and crystalline SiC thin films grown by RF-PECVD and thermal MOCVD; comparative study of structural and optical properties
|
Jung, C.-K. |
|
2003 |
171 |
1-3 |
p. 46-50 5 p. |
artikel |
26 |
Influence of substrate temperature on the etching of silver films using inductively coupled Cl2-based plasmas
|
Park, S.D. |
|
2003 |
171 |
1-3 |
p. 285-289 5 p. |
artikel |
27 |
Initial deposition stage of LiNb0.5Ta0.5O3 films in thermal plasma CVD
|
Yamaki, T. |
|
2003 |
171 |
1-3 |
p. 11-14 4 p. |
artikel |
28 |
Ion dynamics of pulsed plasma source ion implantation in the sheath of a hemispherical bowl-shaped target
|
Liu, Chengsen |
|
2003 |
171 |
1-3 |
p. 119-123 5 p. |
artikel |
29 |
Kinetic and mechanistic study on the chemical vapor deposition of titanium dioxide thin films by in situ FT-IR using TTIP
|
Ahn, Kyoung-Ho |
|
2003 |
171 |
1-3 |
p. 198-204 7 p. |
artikel |
30 |
Measurement of electron temperature and plasma density in coplanar AC plasma display panels
|
Cho, Iil Ryong |
|
2003 |
171 |
1-3 |
p. 222-225 4 p. |
artikel |
31 |
Measurement of ion temperature in ECR Ar/N2 plasma
|
Koga, Mayuko |
|
2003 |
171 |
1-3 |
p. 216-221 6 p. |
artikel |
32 |
Microstructure and optical properties of MgO films synthesized by closed-field unbalanced magnetron sputtering with additional electron emission
|
Nam, Kyung H. |
|
2003 |
171 |
1-3 |
p. 51-58 8 p. |
artikel |
33 |
Motion and heating of non-spherical particles in a plasma jet
|
Xu, Dong-Yan |
|
2003 |
171 |
1-3 |
p. 149-156 8 p. |
artikel |
34 |
Multi-jet atmospheric glow plasma cleaning of ablation debris from micro-via drilling process
|
Lee, Eung Suok |
|
2003 |
171 |
1-3 |
p. 307-311 5 p. |
artikel |
35 |
Nucleation and growth behavior of chromium nitride film deposited on various substrates by magnetron sputtering
|
Jung, Min J. |
|
2003 |
171 |
1-3 |
p. 59-64 6 p. |
artikel |
36 |
Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures
|
Muta, Hiroshi |
|
2003 |
171 |
1-3 |
p. 157-161 5 p. |
artikel |
37 |
Optical measurements of gas temperatures in atmospheric pressure RF cold plasmas
|
Kim, J.H. |
|
2003 |
171 |
1-3 |
p. 211-215 5 p. |
artikel |
38 |
Optimum substrate bias condition for TiN thin film deposition using an ECR sputter system
|
Sung, Youl-Moon |
|
2003 |
171 |
1-3 |
p. 75-82 8 p. |
artikel |
39 |
Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma
|
You, S.J. |
|
2003 |
171 |
1-3 |
p. 226-230 5 p. |
artikel |
40 |
Plasma boronitriding of WC(Co) substrate as an effective pretreatment process for diamond CVD
|
Man, W.D. |
|
2003 |
171 |
1-3 |
p. 241-246 6 p. |
artikel |
41 |
Plasma processing of materials for medical applications
|
Lee, In-Seop |
|
2003 |
171 |
1-3 |
p. 252-256 5 p. |
artikel |
42 |
Plasma-treatment of MgO film in a.c. plasma display
|
Lee, Sung Ha |
|
2003 |
171 |
1-3 |
p. 247-251 5 p. |
artikel |
43 |
Preface
|
Whang, Prof.K.W. |
|
2003 |
171 |
1-3 |
p. ix- 1 p. |
artikel |
44 |
Preparation and characterization of TiN coatings produced by combination of PI3D and ICP assisted magnetron PVD
|
Nikiforov, S.A. |
|
2003 |
171 |
1-3 |
p. 106-111 6 p. |
artikel |
45 |
Preparation of TiN films at room temperature by inductively coupled plasma assisted chemical vapor deposition
|
Lee, Dong-Kak |
|
2003 |
171 |
1-3 |
p. 24-28 5 p. |
artikel |
46 |
Refractive index control of core layer using PECVD and FHD for silica optical waveguide
|
Kim, Y.T. |
|
2003 |
171 |
1-3 |
p. 34-38 5 p. |
artikel |
47 |
Sapphire etching with BCl3/HBr/Ar plasma
|
Jeong, C.H. |
|
2003 |
171 |
1-3 |
p. 280-284 5 p. |
artikel |
48 |
Spectroscopic study for pulsed DC plasma nitriding of narrow deep holes
|
Kim, Yong M. |
|
2003 |
171 |
1-3 |
p. 205-210 6 p. |
artikel |
49 |
Stability of weak discharge at Y-reset period in plasma display panel discharge
|
Song, Su-Bin |
|
2003 |
171 |
1-3 |
p. 140-143 4 p. |
artikel |
50 |
Studies of a magnetic null discharge plasma for sputtering application
|
Sung, Youl-Moon |
|
2003 |
171 |
1-3 |
p. 178-182 5 p. |
artikel |
51 |
Subject Index
|
|
|
2003 |
171 |
1-3 |
p. 335-340 6 p. |
artikel |
52 |
Surface modification for hydrophilic property of stainless steel treated by atmospheric-pressure plasma jet
|
Kim, M.C. |
|
2003 |
171 |
1-3 |
p. 312-316 5 p. |
artikel |
53 |
Surface modification of natural leather using low-pressure parallel plate plasma
|
Choi, Jai Hyuk |
|
2003 |
171 |
1-3 |
p. 257-263 7 p. |
artikel |
54 |
Synthesis of CrN/AlN superlattice coatings using closed-field unbalanced magnetron sputtering process
|
Kim, Gwang S. |
|
2003 |
171 |
1-3 |
p. 91-95 5 p. |
artikel |
55 |
The effect of pulsed magnetron sputtering on the properties of indium tin oxide thin films
|
Hwang, Man-Soo |
|
2003 |
171 |
1-3 |
p. 29-33 5 p. |
artikel |
56 |
The mechanical properties of the SiOC(H) composite thin films with a low dielectric constant
|
Lee, Hean Ju |
|
2003 |
171 |
1-3 |
p. 296-301 6 p. |
artikel |
57 |
The physiochemical properties of TiO x N y films with controlled oxygen partial pressure
|
Jung, Min J. |
|
2003 |
171 |
1-3 |
p. 71-74 4 p. |
artikel |
58 |
The RF plasma polymer of lysine and the growth of human nerve cells on its surface
|
Feng, Xiangfen |
|
2003 |
171 |
1-3 |
p. 96-100 5 p. |
artikel |
59 |
The study of atmospheric pressure plasma for surface cleaning
|
Yi, C.H. |
|
2003 |
171 |
1-3 |
p. 237-240 4 p. |
artikel |
60 |
Three-dimensional flow and heat transfer in thermal plasma systems
|
Chen, Xi |
|
2003 |
171 |
1-3 |
p. 124-133 10 p. |
artikel |
61 |
Three-dimensional heating model of inductively coupled plasma with rectangular geometry
|
Song, Su-Bin |
|
2003 |
171 |
1-3 |
p. 183-186 4 p. |
artikel |
62 |
Uniformity of VHF plasma produced with ladder shaped electrode
|
Mashima, Hiroshi |
|
2003 |
171 |
1-3 |
p. 167-172 6 p. |
artikel |