| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Controlled growth and characteristics of single-phase Cu2O and CuO films by pulsed laser deposition
|
Chen, Aiping
|
|
2009
|
83 |
6 |
p. 927-930
4 p.
|
artikel
|
| 2 |
Diary
|
|
|
2009
|
83 |
6 |
p. I-II
nvt p.
|
artikel
|
| 3 |
Dielectric properties of (Ba,Ca)(Zr,Ti)O3/CaRuO3 heterostructure thin films prepared by pulsed laser deposition
|
Jiang, L.L.
|
|
2009
|
83 |
6 |
p. 1018-1021
4 p.
|
artikel
|
| 4 |
Dual-cathode method for sputtering magnetoelastic iron-boron films
|
Johnson, Michael L.
|
|
2009
|
83 |
6 |
p. 958-964
7 p.
|
artikel
|
| 5 |
Editorial Board & Publication Information
|
|
|
2009
|
83 |
6 |
p. IFC-
1 p.
|
artikel
|
| 6 |
Effect of substrate temperature on the physical properties of In2O3:Mo films: Prepared by an activated reactive evaporation
|
Kaleemulla, S.
|
|
2009
|
83 |
6 |
p. 970-975
6 p.
|
artikel
|
| 7 |
Effect of Ti–Zr addition on the microstructure and the arc chopping current of melt-spun CuCr ribbon
|
Yu, Minyxiang
|
|
2009
|
83 |
6 |
p. 980-983
4 p.
|
artikel
|
| 8 |
Erratum to “Time-modulated chemical vapour deposition diamonf on mould making 2738 steel” [Vacuum 82 (2008) 1346–1349]
|
Neto, V.F.
|
|
2009
|
83 |
6 |
p. 1022-
1 p.
|
artikel
|
| 9 |
Fractal growth of Fe–N thin films prepared by magnetron sputtering at elevated temperature
|
Li, Wei-li
|
|
2009
|
83 |
6 |
p. 949-952
4 p.
|
artikel
|
| 10 |
Generation of a long wedge-shaped barium atomic beam and its density characterization
|
Majumder, A.
|
|
2009
|
83 |
6 |
p. 989-995
7 p.
|
artikel
|
| 11 |
Infrared transmission properties of germanium carbon thin films deposited by reactive RF magnetron sputtering
|
Li, Yangping
|
|
2009
|
83 |
6 |
p. 965-969
5 p.
|
artikel
|
| 12 |
Investigation of the thermo-stimulated surface segregation in the ternary Co–Cr–Mo alloy by means of Ionization Spectroscopy
|
Tinkov, V.A.
|
|
2009
|
83 |
6 |
p. 1014-1017
4 p.
|
artikel
|
| 13 |
Magnetic field effect on electron emission from plasma
|
Khaleeq-ur-Rahman, M.
|
|
2009
|
83 |
6 |
p. 936-941
6 p.
|
artikel
|
| 14 |
On the factors affecting the critical indenter penetration for measurement of coating hardness
|
Chen, J.
|
|
2009
|
83 |
6 |
p. 911-920
10 p.
|
artikel
|
| 15 |
Phase formation, chemical composition and electrical studies of Ti/Si bilayer system
|
Lal, Chhagan
|
|
2009
|
83 |
6 |
p. 931-935
5 p.
|
artikel
|
| 16 |
PZT thin film preparation by pulsed DC magnetron sputtering
|
Lin, Y.C.
|
|
2009
|
83 |
6 |
p. 921-926
6 p.
|
artikel
|
| 17 |
Refractive index, optical bandgap and oscillator parameters of organic films deposited by vacuum evaporation technique
|
You, Zhong Zhi
|
|
2009
|
83 |
6 |
p. 984-988
5 p.
|
artikel
|
| 18 |
Simulations of Si and SiO2 etching in SF6 +O2 plasma
|
Knizikevičius, R.
|
|
2009
|
83 |
6 |
p. 953-957
5 p.
|
artikel
|
| 19 |
Studies on the target conditioning for deposition of LiCoO2 films
|
Nimisha, C.S.
|
|
2009
|
83 |
6 |
p. 1001-1006
6 p.
|
artikel
|
| 20 |
Test Particle Monte-Carlo modelling of installations for NEG film pumping properties evaluation
|
Malyshev, O.B.
|
|
2009
|
83 |
6 |
p. 976-979
4 p.
|
artikel
|
| 21 |
The effect of WO3 source stability on the properties of films deposited by electron beam deposition
|
Alamri, S.N.
|
|
2009
|
83 |
6 |
p. 996-1000
5 p.
|
artikel
|
| 22 |
Towards the sub-50nm magnetic device definition: Ion beam etching (IBE) vs plasma-based etching
|
Peng, Xilin
|
|
2009
|
83 |
6 |
p. 1007-1013
7 p.
|
artikel
|
| 23 |
Triple test under high vacuum conditions to control the reliability of thin ice film accretion and desorption for astrophysical applications
|
Luna, R.
|
|
2009
|
83 |
6 |
p. 942-948
7 p.
|
artikel
|
Tijdschrift beschrijving