| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Agglomeration behavior of Ag films suppressed by alloying with some elements
|
Sugawara, K.
|
|
2008
|
83 |
3 |
p. 610-613
4 p.
|
artikel
|
| 2 |
Angular dependence of sputtering effects by ethanol cluster ion irradiation on solid surfaces
|
Takaoka, G.H.
|
|
2008
|
83 |
3 |
p. 459-462
4 p.
|
artikel
|
| 3 |
Application of TiAl laminate to a sputtering target for TiAlN films
|
Yamazaki, Toshinari
|
|
2008
|
83 |
3 |
p. 479-482
4 p.
|
artikel
|
| 4 |
Are dominant sputtering products from metal targets really monatomic?
|
Sasaki, K.
|
|
2008
|
83 |
3 |
p. 463-466
4 p.
|
artikel
|
| 5 |
Barrier-free Cu metallization with a novel copper seed layer containing various insoluble substances
|
Chu, J.P.
|
|
2008
|
83 |
3 |
p. 668-671
4 p.
|
artikel
|
| 6 |
Characteristics of an AlN-based bulk acoustic wave resonator in the super high frequency range
|
Umeda, Keiichi
|
|
2008
|
83 |
3 |
p. 672-674
3 p.
|
artikel
|
| 7 |
Characterization of organic polymer thin films deposited by rf magnetron sputtering
|
Oya, Toshiyuki
|
|
2008
|
83 |
3 |
p. 564-568
5 p.
|
artikel
|
| 8 |
Characterization of tantalum oxy-nitrides deposited by ECR sputtering
|
Kato, Koji
|
|
2008
|
83 |
3 |
p. 592-595
4 p.
|
artikel
|
| 9 |
Cylindrical film deposition system for three-dimensional titanium–nickel shape memory alloy microstructure
|
Komatsubara, Mamoru
|
|
2008
|
83 |
3 |
p. 703-707
5 p.
|
artikel
|
| 10 |
Development of a magnetron sputtering system with an extraordinary strong magnetic field near the target
|
Ikuta, Hiroshi
|
|
2008
|
83 |
3 |
p. 475-478
4 p.
|
artikel
|
| 11 |
Development of sputtered nanoscale titanium oxide coating on osseointegrated implant devices and their biological evaluation
|
Yang, Yunzhi
|
|
2008
|
83 |
3 |
p. 569-574
6 p.
|
artikel
|
| 12 |
Editorial Board & Publication Information
|
|
|
2008
|
83 |
3 |
p. IFC-
1 p.
|
artikel
|
| 13 |
Effect of argon plasma etching damage on electrical characteristics of gallium nitride
|
Kawakami, Retsuo
|
|
2008
|
83 |
3 |
p. 490-492
3 p.
|
artikel
|
| 14 |
Effect of background gas environment on oxygen incorporation in TiN films deposited using UHV reactive magnetron sputtering
|
Nakano, Takeo
|
|
2008
|
83 |
3 |
p. 467-469
3 p.
|
artikel
|
| 15 |
Effect of deposition conditions on the response and durability of an Mg4Ni film switchable mirror
|
Bao, Shanhu
|
|
2008
|
83 |
3 |
p. 486-489
4 p.
|
artikel
|
| 16 |
Effect of different atmospheres on the electrical stabilization of NiO films
|
Jang, Wei-Luen
|
|
2008
|
83 |
3 |
p. 596-598
3 p.
|
artikel
|
| 17 |
Effect of heating on the residual stresses in TiN films investigated using synchrotron radiation
|
Matsue, Tatsuya
|
|
2008
|
83 |
3 |
p. 585-588
4 p.
|
artikel
|
| 18 |
Effect of process parameters on the growth and properties of impurity-doped zinc oxide transparent conducting thin films by RF magnetron sputtering
|
Houng, Boen
|
|
2008
|
83 |
3 |
p. 534-539
6 p.
|
artikel
|
| 19 |
Effect of Zr content on mechanical properties of Ti–Ni–Zr shape memory alloy films prepared by dc magnetron sputtering
|
Inoue, Shozo
|
|
2008
|
83 |
3 |
p. 664-667
4 p.
|
artikel
|
| 20 |
Enhanced nanoparticle formation by indentation and annealing on 2MeV Cu ion-implanted SiO2
|
Pan, Jin
|
|
2008
|
83 |
3 |
p. 641-644
4 p.
|
artikel
|
| 21 |
Enhancement of visible light-induced hydrophilicity on nitrogen and sulfur-codoped TiO2 thin films
|
Sakai, Yuka W.
|
|
2008
|
83 |
3 |
p. 683-687
5 p.
|
artikel
|
| 22 |
Evaluation of hafnium nitride thin films sputtered from a hafnium nitride target
|
Kanzawa, T.
|
|
2008
|
83 |
3 |
p. 589-591
3 p.
|
artikel
|
| 23 |
Fabrication of high frequency ZnO thin film SAW devices on silicon substrate with a diamond-like carbon buffer layer using RF magnetron sputtering
|
Shih, Wen-Ching
|
|
2008
|
83 |
3 |
p. 675-678
4 p.
|
artikel
|
| 24 |
Fabrication of low resistivity tin-doped indium oxide films with high electron carrier densities by a plasma sputtering method
|
Kono, Akihiko
|
|
2008
|
83 |
3 |
p. 548-551
4 p.
|
artikel
|
| 25 |
Fabrication of Ni2In3 alloy nanotubes
|
Kitazawa, Sin-iti
|
|
2008
|
83 |
3 |
p. 649-652
4 p.
|
artikel
|
| 26 |
Fabrication of transparent CuCrO2:Mg/ZnO p–n junctions prepared by pulsed laser deposition on glass substrate
|
Chiu, T.-W.
|
|
2008
|
83 |
3 |
p. 614-617
4 p.
|
artikel
|
| 27 |
First-principles calculations-based model for the reactive ion etching of metal oxide surfaces
|
David, Melanie
|
|
2008
|
83 |
3 |
p. 599-601
3 p.
|
artikel
|
| 28 |
Formation process of Al2O3 thin film by reactive sputtering
|
Chiba, Y.
|
|
2008
|
83 |
3 |
p. 483-485
3 p.
|
artikel
|
| 29 |
Growth control of carbon nanotubes by plasma enhanced chemical vapor deposition
|
Sato, Hideki
|
|
2008
|
83 |
3 |
p. 515-517
3 p.
|
artikel
|
| 30 |
Growth of ultrathin barrier layers with sub-5-nm metallic seeds fabricated by sequential treatments of vacuum plasma and electrochemical solution
|
Hsu, C.S.
|
|
2008
|
83 |
3 |
p. 708-710
3 p.
|
artikel
|
| 31 |
Improved electrochemical capacitive characteristics by controlling the carbon nanotube morphology and electrolyte solution concentration
|
Weng, T.-W.
|
|
2008
|
83 |
3 |
p. 629-632
4 p.
|
artikel
|
| 32 |
Improvement in moisture durability of ZnO transparent conductive films with Ga heavy doping process
|
Kishimoto, Yutaka
|
|
2008
|
83 |
3 |
p. 544-547
4 p.
|
artikel
|
| 33 |
Influence of Ga2O3 addition on transparent conductive oxide films of In2O3–ZnO
|
Tominaga, Kikuo
|
|
2008
|
83 |
3 |
p. 561-563
3 p.
|
artikel
|
| 34 |
Influence of hydrogen on the mechanical properties and microstructure of DLC films synthesized by r.f.-PECVD
|
Hsu, Jiong-Shiun
|
|
2008
|
83 |
3 |
p. 622-624
3 p.
|
artikel
|
| 35 |
In2O3–ZnO transparent conductive oxide film deposition on polycarbonate substrates
|
Moriga, Toshihiro
|
|
2008
|
83 |
3 |
p. 557-560
4 p.
|
artikel
|
| 36 |
Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering
|
Abe, Yoshio
|
|
2008
|
83 |
3 |
p. 528-530
3 p.
|
artikel
|
| 37 |
Measurement of electromigration-induced stress in aluminum alloy interconnection
|
Kusaka, Kazuya
|
|
2008
|
83 |
3 |
p. 637-640
4 p.
|
artikel
|
| 38 |
Morphology of carbon nanotubes synthesized by thermal CVD under high magnetic field up to 10T
|
Yokomichi, Haruo
|
|
2008
|
83 |
3 |
p. 625-628
4 p.
|
artikel
|
| 39 |
Multilevel-type multilayer X-ray lens (Fresnel zone plate) by sputter deposition
|
Tamura, Shigeharu
|
|
2008
|
83 |
3 |
p. 691-694
4 p.
|
artikel
|
| 40 |
New hydrogen sensor based on sputtered Mg–Ni alloy thin film
|
Yoshimura, Kazuki
|
|
2008
|
83 |
3 |
p. 699-702
4 p.
|
artikel
|
| 41 |
New target materials for innovative applications on glass
|
Matthews, Steven
|
|
2008
|
83 |
3 |
p. 518-521
4 p.
|
artikel
|
| 42 |
Optical and photoconductivity properties of ZnO thin films grown by pulsed filtered cathodic vacuum arc deposition
|
Kavak, H.
|
|
2008
|
83 |
3 |
p. 540-543
4 p.
|
artikel
|
| 43 |
Optimum structure of metal oxide under-layer used in Ag-based multilayer
|
Kato, Kazuhiro
|
|
2008
|
83 |
3 |
p. 606-609
4 p.
|
artikel
|
| 44 |
Photocatalytic performance of very thin TiO2/SnO2 stacked-film prepared by magnetron sputtering
|
Okada, Masahisa
|
|
2008
|
83 |
3 |
p. 688-690
3 p.
|
artikel
|
| 45 |
Photocatalytic properties of Cr-doped TiO2 films prepared by oxygen cluster ion beam assisted deposition
|
Takaoka, G.H.
|
|
2008
|
83 |
3 |
p. 679-682
4 p.
|
artikel
|
| 46 |
Physical and electrochemical properties of Pt–Ru/C samples prepared on various carbon supports by using the barrel sputtering system
|
Inoue, Mitsuhiro
|
|
2008
|
83 |
3 |
p. 658-663
6 p.
|
artikel
|
| 47 |
Plasma processes at atmospheric and low pressures
|
Bárdos, Ladislav
|
|
2008
|
83 |
3 |
p. 522-527
6 p.
|
artikel
|
| 48 |
Preparation of various DLC films by T-shaped filtered arc deposition and the effect of heat treatment on film properties
|
Kamiya, Masao
|
|
2008
|
83 |
3 |
p. 510-514
5 p.
|
artikel
|
| 49 |
Pulsed laser deposition synthesis of superconducting (Cu,C)–Ba–O thin films
|
Yamamoto, Tetsuro
|
|
2008
|
83 |
3 |
p. 531-533
3 p.
|
artikel
|
| 50 |
Rapid treatment of polyimide film surfaces using high-density microwave plasma for enhancement of Cu layer adhesion
|
Takagi, Y.
|
|
2008
|
83 |
3 |
p. 501-505
5 p.
|
artikel
|
| 51 |
Reactive DC sputter-deposited tantalum oxide thin film for all-solid-state switchable mirror
|
Tajima, Kazuki
|
|
2008
|
83 |
3 |
p. 602-605
4 p.
|
artikel
|
| 52 |
Reduction of hydrogen and helium retention in stainless steel by argon glow discharge
|
Hino, Tomoaki
|
|
2008
|
83 |
3 |
p. 493-496
4 p.
|
artikel
|
| 53 |
Scattering of fast protons on densely stepped surfaces of ionic crystals
|
Fukazawa, Yuuko
|
|
2008
|
83 |
3 |
p. 653-657
5 p.
|
artikel
|
| 54 |
Structure and mechanical properties of ZrO2 films deposited by gas flow sputtering
|
Iwatsubo, Satoshi
|
|
2008
|
83 |
3 |
p. 579-581
3 p.
|
artikel
|
| 55 |
Study of the surface morphology of platinum thin films on powdery substrates prepared by the barrel sputtering system
|
Taguchi, Akira
|
|
2008
|
83 |
3 |
p. 575-578
4 p.
|
artikel
|
| 56 |
Surface coating of microparticles with tungsten carbide by using the barrel sputtering system
|
Akamaru, Satoshi
|
|
2008
|
83 |
3 |
p. 633-636
4 p.
|
artikel
|
| 57 |
Surface modification of carbon electrodes using an argon plasma
|
Tashima, D.
|
|
2008
|
83 |
3 |
p. 695-698
4 p.
|
artikel
|
| 58 |
Surface modification of steel surfaces by electron beam excited plasma processing
|
Abraha, P.
|
|
2008
|
83 |
3 |
p. 497-500
4 p.
|
artikel
|
| 59 |
Surface wettability of silicon rubber after irradiation with a glow discharge plasma
|
Hino, Tomoaki
|
|
2008
|
83 |
3 |
p. 506-509
4 p.
|
artikel
|
| 60 |
Synthesis and characterization of BN thin films prepared by plasma MOCVD with organoboron precursors
|
Yasui, Haruyuki
|
|
2008
|
83 |
3 |
p. 582-584
3 p.
|
artikel
|
| 61 |
The effects of plasma pre-treatment and post-treatment on diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition
|
Tzeng, Shinn-Shyong
|
|
2008
|
83 |
3 |
p. 618-621
4 p.
|
artikel
|
| 62 |
The properties of transparent conductive In–Ga–Zn oxide films produced by pulsed laser deposition
|
Inoue, Kenichi
|
|
2008
|
83 |
3 |
p. 552-556
5 p.
|
artikel
|
| 63 |
Void formation in silica glass induced by thermal oxidation after Zn+ ion implantation
|
Umeda, N.
|
|
2008
|
83 |
3 |
p. 645-648
4 p.
|
artikel
|
| 64 |
Wide erosion nickel magnetron sputtering using an eccentrically rotating center magnet
|
Iseki, Takayuki
|
|
2008
|
83 |
3 |
p. 470-474
5 p.
|
artikel
|
Tijdschrift beschrijving