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                             224 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 6193. A bilevel resist for ion beam lithography 1986
36 10 p. 736-
1 p.
artikel
2 6148. A combined electron and ion beam lithography system 1986
36 10 p. 731-
1 p.
artikel
3 A compact CMA spectrometer with axially integrated hybrid electron-ion gun for ISS, AES and sputter depth profile analysis Gisler, E.
1986
36 10 p. 715-722
8 p.
artikel
4 6130. A comparison of single- and double-carrier injection in amorphous silicon alloys 1986
36 10 p. 729-
1 p.
artikel
5 6120. A comparison of sputtered Ni/Cr interface depth resolution as obtained by the quartz crystal microbalance mass-loss method and Auger spectroscopy 1986
36 10 p. 727-
1 p.
artikel
6 6106. Activation energies and frequency factors for the thermal desorption of He bound at vacancies in Mo 1986
36 10 p. 726-
1 p.
artikel
7 6089. A design analysis of intelligent, articulated vacuum processing systems 1986
36 10 p. 724-
1 p.
artikel
8 6127. Adhesion of titanium nitride coatings on high-speed steels 1986
36 10 p. 728-
1 p.
artikel
9 6209. A high-current hollow cathode as a source of intense line radiation in the VUV 1986
36 10 p. 737-
1 p.
artikel
10 6224. A high energy optically pumped laser system 1986
36 10 p. 739-
1 p.
artikel
11 6147. A high speed EBL column designed to minimized beam interactions 1986
36 10 p. 731-
1 p.
artikel
12 6196. A high-speed, high-precision electron beam lithography system (electron optics) 1986
36 10 p. 736-
1 p.
artikel
13 AirReel Cryoproducts range AirReel Cryoproducts Ltd,
1986
36 10 p. 745-
1 p.
artikel
14 6082. All aluminum alloy, 800-mm-inner diameter gate valve using dual flat-face seals together with differential pumping 1986
36 10 p. 723-
1 p.
artikel
15 6200. Aluminum plasma etching process using vacuum systems without cold traps 1986
36 10 p. 736-
1 p.
artikel
16 Amorphous and amorphous-crystalline coatings of stainless steel with addition of refractory metals obtained by magnetron sputtering in vacuum Grudeva, St.
1986
36 10 p. 599-603
5 p.
artikel
17 6182. An ac field-effect study of TCE-oxidised SiO2Si interface states 1986
36 10 p. 734-
1 p.
artikel
18 6247. Analysis of the transit time effect on the stroboscopic voltage contrast in the scanning electron microscope 1986
36 10 p. 741-
1 p.
artikel
19 6241. A new hemispherical retarding field energy analyser for quantitative voltage measurements in the SEM 1986
36 10 p. 740-
1 p.
artikel
20 6252. A new tool for studying epitaxy and interfaces: the XPS searchlight effect 1986
36 10 p. 741-
1 p.
artikel
21 6149. An experimental variable shaped electron beam lithography system 1986
36 10 p. 731-
1 p.
artikel
22 6099. An improved ion gauge with gold coated electrodes for reliable operation in reactive gases and for use as reference standard 1986
36 10 p. 725-
1 p.
artikel
23 6237. An investigation of oxide coated cathodes using SEM, AES, XPS and SIMS 1986
36 10 p. 740-
1 p.
artikel
24 6194. Anisotropic reactive ion etching technique of GaAs and AlGaAs materials for integrated optical device fabrication 1986
36 10 p. 736-
1 p.
artikel
25 Announcement 1986
36 10 p. 749-
1 p.
artikel
26 6084. An underground remotely controlled cryopump vacuum system utilizing 460-m long helium gas lines 1986
36 10 p. 723-
1 p.
artikel
27 6100. An updated review of getters and gettering 1986
36 10 p. 725-
1 p.
artikel
28 6151. Application of a focussed ion beam system to defect repair of VLSI masks 1986
36 10 p. 731-
1 p.
artikel
29 6133. Arcing from coated surfaces: test facility development and coating deposition using ion plating techniques 1986
36 10 p. 729-
1 p.
artikel
30 6192. Arsenic segregation to silicon/silicon oxide interfaces 1986
36 10 p. 736-
1 p.
artikel
31 6167. As+ implantation and transient anneling of MoSi2 thin films 1986
36 10 p. 733-
1 p.
artikel
32 6248. A simple high-voltage electron microscope voltage stabiliser using current-regulated corona tubes 1986
36 10 p. 741-
1 p.
artikel
33 6157. A special glow discharge source of positive ions 1986
36 10 p. 732-
1 p.
artikel
34 6122. A sputtering wind 1986
36 10 p. 728-
1 p.
artikel
35 6152. A stabilised flow control system for ion source gas from volatile liquids 1986
36 10 p. 731-
1 p.
artikel
36 6111. A technique for the production of a thin film with a linearly varying composition 1986
36 10 p. 726-
1 p.
artikel
37 6246. Auger electron spectroscopic study of the etching of cadmium telluride and cadmium manganese telluride 1986
36 10 p. 741-
1 p.
artikel
38 6345. Auger electron spectroscopy study alloy formation on MIS solar-cell metal surfaces 1986
36 10 p. 741-
1 p.
artikel
39 Author index of articles 1986
36 10 p. 703-
1 p.
artikel
40 6219. Automated pressure scanning of tunable dye lasers 1986
36 10 p. 738-
1 p.
artikel
41 6086. A versatile reactor for ultrahigh vacuum surface modification studies based on a reusable metal sealing system based on a reusable metal sealing system 1986
36 10 p. 724-
1 p.
artikel
42 Barrier optimization of metal-semiconductor junctions for high power Schottky rectifiers Sarov, GA
1986
36 10 p. 677-681
5 p.
artikel
43 6146. Beam current stability from localized emission sites in field ion source 1986
36 10 p. 730-
1 p.
artikel
44 Bolt-on SIMS system Rider, Gavin
1986
36 10 p. 744-
1 p.
artikel
45 6155. Broad-beam electron source 1986
36 10 p. 731-
1 p.
artikel
46 6232. Calibration of an energy dispersive spectroscopy k factor using Rutherford backscattering 1986
36 10 p. 739-
1 p.
artikel
47 6096. Calibration stability of two types of hot cathode ionization gauges 1986
36 10 p. 725-
1 p.
artikel
48 6221. Cavity length optimisation in acousto-optically mode-locked argonion lasers 1986
36 10 p. 738-
1 p.
artikel
49 6234. Characterization of NBS standard reference material 2135 for sputter depth profile analysis 1986
36 10 p. 740-
1 p.
artikel
50 6153. Charge and energy transfer in collisions of Cs+ ions with a cesiated W(110) surface 1986
36 10 p. 731-
1 p.
artikel
51 6225. Compact magnetic electron energy analyzer 1986
36 10 p. 739-
1 p.
artikel
52 6171. Comparative study oof intermetallic phases formed by direct ion implantation and radiation enhanced diffusion of tin in two kinds of steel 1986
36 10 p. 733-
1 p.
artikel
53 6123. Computer-controlled four-gun multisubstrate sputtering system for the preparation of composition-modulated structures 1986
36 10 p. 728-
1 p.
artikel
54 6217. Construction, operation, and enhancement of JET 1986
36 10 p. 738-
1 p.
artikel
55 Crystal orientation in CuSn-alloy coatings obtained by magnetron sputtering Tzaneva, D.V.
1986
36 10 p. 605-607
3 p.
artikel
56 6216. Current characteristics of a high voltage 60 Hz crossed-field discharge 1986
36 10 p. 738-
1 p.
artikel
57 CVC announce a new UK manufacturing facility 1986
36 10 p. 745-
1 p.
artikel
58 6250. Dark current transients in HgI2 single crystals used as γ- and X-ray spectrometers 1986
36 10 p. 741-
1 p.
artikel
59 6132. Deposition and characterization of p-type cadmium telluride films 1986
36 10 p. 729-
1 p.
artikel
60 6093. Design and performance of a quartz oscillator vacuum gauge with a controller 1986
36 10 p. 724-
1 p.
artikel
61 6094. Design for improved resolution in a time-of-flight mass spectrometer using a supersonic beam and laser ionization source 1986
36 10 p. 725-
1 p.
artikel
62 6238. Device to cryofracture cultured cells for ion microscopy 1986
36 10 p. 740-
1 p.
artikel
63 6159. Diffusion of ion-implanted Ga in SiO2 1986
36 10 p. 732-
1 p.
artikel
64 6158. Distributions of light ions and foil destruction after irradiation of organic polymers 1986
36 10 p. 732-
1 p.
artikel
65 6160. Dose rate dependence of damage clustering during heavy ion irradiation in Si 1986
36 10 p. 732-
1 p.
artikel
66 Editorial: Software survey section 1986
36 10 p. I-IV
nvt p.
artikel
67 6187. Effect of an Ag or a Pd overlayer on the magnetic moment of a Fe film 1986
36 10 p. 735-
1 p.
artikel
68 6169. Effect of dopant implanation on the properties of TaSi2/poly-Si composite 1986
36 10 p. 733-
1 p.
artikel
69 6104. Effect of oxygen content in the vacuum annealing atmosphere on development of (100) [001] texture in thin Fe-3wt% Si strips 1986
36 10 p. 726-
1 p.
artikel
70 6129. Electrical characterization of plasma-grown oxides on gallium arsenide 1986
36 10 p. 729-
1 p.
artikel
71 6218. Electrical characterization of rf glow discharges using an operating impedance bridge 1986
36 10 p. 738-
1 p.
artikel
72 Electrical properties of hydrogen bombarded silicon surfaces Barhdadi, A.
1986
36 10 p. 705-709
5 p.
artikel
73 6145. Electron beam prober for VLSI diagnosis 1986
36 10 p. 730-
1 p.
artikel
74 6177. Electron microscopy of epitaxial Si/CaF2/Si structures 1986
36 10 p. 734-
1 p.
artikel
75 6242. Electron spectroscopy of vacuum annealing effects on surfaces of some binary and ternary III–V semiconductors 1986
36 10 p. 740-
1 p.
artikel
76 6214. Energy and density measurements of sloshing ions in tandem-mirror-experiment upgrade using solid-state probe techniques 1986
36 10 p. 738-
1 p.
artikel
77 6161. Excess noise in ion beam irradiated polymer films 1986
36 10 p. 732-
1 p.
artikel
78 6141. Experimental performance of a microwave cavity plasma disk ion source 1986
36 10 p. 730-
1 p.
artikel
79 6205. Experimental study of the current penetration in a dense Z pinch 1986
36 10 p. 737-
1 p.
artikel
80 6142. Extraction of volume-produced H− ions 1986
36 10 p. 730-
1 p.
artikel
81 6083. Fermilab accumulator magnets vacuum chamber heating system 1986
36 10 p. 723-
1 p.
artikel
82 Field emission microscopy study of surface self diffusion and crystal growth of refractory metals in high electric fields 1986
36 10 p. 701-
1 p.
artikel
83 Formation and characterization of metal-semiconductor junctions Tove, P.A.
1986
36 10 p. 659-667
9 p.
artikel
84 6188. Formation of metal-semiconductor interfaces: from the submonolayer regime to the real Schottky barrier 1986
36 10 p. 735-
1 p.
artikel
85 6128. Formation of ultrathin tungsten filaments via selective low-pressure chemical vapor deposition 1986
36 10 p. 729-
1 p.
artikel
86 Freeze drying botanical and zoological specimens Edwards High Vacuum Ltd,
1986
36 10 p. 746-
1 p.
artikel
87 6178. GaAs growth in metal-organic MBE 1986
36 10 p. 734-
1 p.
artikel
88 6179. Gas source MBE of InP and Ga x In1−x P yAs1−y: materials properties and heterostructure lasers 1986
36 10 p. 734-
1 p.
artikel
89 6162. Gas trapping induced by argon implantation and irradiation of polymer films 1986
36 10 p. 732-
1 p.
artikel
90 General problems of high resolution lithography Mladenov, Georgy M.
1986
36 10 p. 649-653
5 p.
artikel
91 6175. Germanium incorporation in heavily doped molecular beam epitaxy grown GaAs:Ge 1986
36 10 p. 734-
1 p.
artikel
92 6201. Glow discharge cleaning of stainless steel accelerator beam tubes 1986
36 10 p. 737-
1 p.
artikel
93 6240. High-resolution electron energy loss studies of Al and Ge chemisorption on silicon 1986
36 10 p. 740-
1 p.
artikel
94 6236. High resolution SIMS and neutron depth profiling of boron through oxide-silicon interfaces 1986
36 10 p. 740-
1 p.
artikel
95 6087. Hydrogen pumping with palladium membranes 1986
36 10 p. 724-
1 p.
artikel
96 Imaging of deformed metal surfaces using ion bombardment Shelyakin, L.B.
1986
36 10 p. 631-634
4 p.
artikel
97 6172. Immobilization mechanism for ion-implanted deuterium in aluminum 1986
36 10 p. 733-
1 p.
artikel
98 6174. Indium ion implantation in Hg0.78 Cd0.22 Te/CdTe 1986
36 10 p. 734-
1 p.
artikel
99 Integrated washing/sterilizing plant help antibiotics production Edwards High Vacuum Ltd,
1986
36 10 p. 747-
1 p.
artikel
100 6170. Interaction of slow charged particles (H+, He++) with solids 1986
36 10 p. 733-
1 p.
artikel
101 6185. Interactions between cleaved (Hg, Cd)Te surfaces and deposited overlayers of Al and In 1986
36 10 p. 735-
1 p.
artikel
102 6189. Interdiffusion and chemical ordering in composition-modulated Fe70Si30/Si amorphous thin films 1986
36 10 p. 735-
1 p.
artikel
103 6183. Interface depth resolution of Auger sputter profiled Ni/Cr interfaces: dependence on ion bombardment parameters 1986
36 10 p. 735-
1 p.
artikel
104 Introduction Karpuzov, D.S.
1986
36 10 p. 583-
1 p.
artikel
105 Ion-assisted thin film deposition and applications Martin, P.J.
1986
36 10 p. 585-590
6 p.
artikel
106 6195. Ion beam lithography: an investigation of resolution limits and sensitivities of ion-beam exposed PMMA 1986
36 10 p. 736-
1 p.
artikel
107 6114. Ion beam sputtering apparatus for fabrication of compositionally modulated materials 1986
36 10 p. 727-
1 p.
artikel
108 6135. Kinetics of Si(100) nitridation first stages by ammonia: electro-beam-induced thin film growth at room temperature 1986
36 10 p. 729-
1 p.
artikel
109 6203. Lanthanum hexaboride tapered filament in a plasma source 1986
36 10 p. 737-
1 p.
artikel
110 6228. Large probes in Tokamak scrape-off plasmas. The collisionless scrape-off layer: operation in the shadow of limiters or divertor plates 1986
36 10 p. 739-
1 p.
artikel
111 List of journals scanned 1986
36 10 p. 742-
1 p.
artikel
112 6097. Long-term stability of two types of hot cathode ionization gauges 1986
36 10 p. 725-
1 p.
artikel
113 Low power laser annealing of disordered semiconductors Vitali, G.
1986
36 10 p. 643-648
6 p.
artikel
114 6215. Low-pressure flashlamps: influence of the wall ablation phenomena on their output characteristic 1986
36 10 p. 738-
1 p.
artikel
115 6098. Management of vacuum leak-detection processes, calibration, and standards 1986
36 10 p. 725-
1 p.
artikel
116 6197. Masked ion beam resist exposure using grid support stencil masks 1986
36 10 p. 736-
1 p.
artikel
117 6233. Mean excitation energy and electronic stopping power of solids 1986
36 10 p. 739-
1 p.
artikel
118 6244. Measurement: AES and XPS 1986
36 10 p. 741-
1 p.
artikel
119 6229. Measurement of the ionisation coefficients in binary and ternary mixtures of CO2, N2 and He 1986
36 10 p. 739-
1 p.
artikel
120 6134. Metal doped polymer films prepared by simultaneous plasma polymerization of tetrafluoromethane and evaporation of gold 1986
36 10 p. 729-
1 p.
artikel
121 Metallization for submicron LSI Koleshko, V.M.
1986
36 10 p. 689-700
12 p.
artikel
122 6154. Metastable He+ (2S) production by a rf ion source 1986
36 10 p. 731-
1 p.
artikel
123 Modification of metal properties by ion plating of TiN Zdanowski, J.
1986
36 10 p. 591-594
4 p.
artikel
124 6169. Modification of silicon structure during highly intensive Ar+ ion implantation 1986
36 10 p. 733-
1 p.
artikel
125 6206. Modulation instability of ionization waves 1986
36 10 p. 737-
1 p.
artikel
126 6109. Molecular beam distributions from high rate sources 1986
36 10 p. 726-
1 p.
artikel
127 6181. Molecular beam epitaxy beam flux modeling 1986
36 10 p. 734-
1 p.
artikel
128 6210. Monte Carlo and Boltzmann calculations of the density gradient expanded energy distribution functions of electron swarms in gases 1986
36 10 p. 737-
1 p.
artikel
129 6204. Multichannel heterodyne radiometer with computer control for electron cyclotron emission measurements of a tokomak plasma 1986
36 10 p. 737-
1 p.
artikel
130 6165. Near-surface microstructural modifications in low energy hydrogen ion bombarded silicon 1986
36 10 p. 732-
1 p.
artikel
131 6156. Neutral beam injector oxygen impurity measurements and concentration reduction via gettering processes 1986
36 10 p. 732-
1 p.
artikel
132 New Baratron pressure transducer from Chell Instruments solves nitride deposition problem Chell Instruments Ltd,
1986
36 10 p. 745-
1 p.
artikel
133 New patents 1986
36 10 p. 751-766
16 p.
artikel
134 6131. New radio frequency technique for deposition of hard carbon films 1986
36 10 p. 729-
1 p.
artikel
135 6212. Non-equilibrium in low pressure rare gas discharges 1986
36 10 p. 737-
1 p.
artikel
136 Nucleation and growth of thin films 1986
36 10 p. 701-702
2 p.
artikel
137 On the interpretation of the titanium line in the appearance potential spectroscopy Donchev, V.
1986
36 10 p. 655-657
3 p.
artikel
138 On the nature of the coverage corresponding to work-function minimum in metal-film systems 1986
36 10 p. 701-
1 p.
artikel
139 6108. Optical and crystalline inhomogeneity in evaporated zirconia films 1986
36 10 p. 726-
1 p.
artikel
140 6116. Optical properties of dense thin-film Si and Ge prepared by ion-beam sputtering 1986
36 10 p. 727-
1 p.
artikel
141 6143. Optimization of H− production in a magnetically filtered multicusp source 1986
36 10 p. 730-
1 p.
artikel
142 6222. Optogalvanic fluctuations in a waveguide CO2 laser 1986
36 10 p. 738-
1 p.
artikel
143 6199. Pattern profile control of polysilicon plasma etching 1986
36 10 p. 736-
1 p.
artikel
144 6243. Performance of a microchannel plate ion detector in the energy range 3–25 keV 1986
36 10 p. 741-
1 p.
artikel
145 6239. Performance of a new ion optics for quasisimultaneous secondary ion, secondary neutral, and residual gas mass spectrometry 1986
36 10 p. 740-
1 p.
artikel
146 6136. Plasma deposited hydrogenated carbon on GaAs and InP 1986
36 10 p. 729-
1 p.
artikel
147 6137. Practical laser-activated photoemissive electron source 1986
36 10 p. 730-
1 p.
artikel
148 6117. Preparation and electrochromic properties of rf-sputtered molybdenum oxide films 1986
36 10 p. 727-
1 p.
artikel
149 Preparing and applying thin film nickel temperature sensors Stoychev, SM
1986
36 10 p. 683-685
3 p.
artikel
150 6138. Production and characterization of pulsed large-area homogenous electron beams 1986
36 10 p. 730-
1 p.
artikel
151 6207. Pulsed electrical discharges in helium gas 1986
36 10 p. 737-
1 p.
artikel
152 6249. Pulsed-jet etch chamber for preparing silicon samples for transmission electron microscopy 1986
36 10 p. 741-
1 p.
artikel
153 6090. Pumping of methane by a low power hot-cathode ion pump/gage 1986
36 10 p. 724-
1 p.
artikel
154 6088. Pumping systems 1986
36 10 p. 724-
1 p.
artikel
155 Quadrupole gas analyzers from Hiden Analytical Ltd. 1986
36 10 p. 743-
1 p.
artikel
156 6163. Rapid thermal annealing of dopants implanted into preamorphized silicon 1986
36 10 p. 732-
1 p.
artikel
157 Reduced contamination risk from lint free wipes Ward, Alan
1986
36 10 p. 743-
1 p.
artikel
158 6126. Refractory metal silicide formation by sputtering a refractory metal on heated Si substrates 1986
36 10 p. 728-
1 p.
artikel
159 6227. Resolution of the Thomson spectrometer 1986
36 10 p. 739-
1 p.
artikel
160 6144. Reversal ion source: a new source of negative ion beams 1986
36 10 p. 730-
1 p.
artikel
161 6118. Secondary ion and sputtered neutral formation from oxygen loaded Si(100) 1986
36 10 p. 727-
1 p.
artikel
162 Secondary particle emission from metals under ion bombardment in the region of phase transitions—Part 2. Charged-particle and photon emission Yurasova, V.E.
1986
36 10 p. 609-630
22 p.
artikel
163 6139. Selective focusing of different ion species produced by magnetically insulated ion beam diodes 1986
36 10 p. 730-
1 p.
artikel
164 6115. SiO2 planarization by two-step rf bias-sputtering 1986
36 10 p. 727-
1 p.
artikel
165 6112. Spectroscopic investigation of tantalum nitride thin film deposition by reactive sputtering in a triode system 1986
36 10 p. 727-
1 p.
artikel
166 6176. Spin- and angle-resolved photoemission study of bcc-Co films grown on (110) GaAs by molecular beam epitaxy 1986
36 10 p. 734-
1 p.
artikel
167 Sputter deposition of multilayered structures for use in sputter depth profile calibration Navinšek, B.
1986
36 10 p. 711-714
4 p.
artikel
168 6119. Sputter depositions of silicon film by a planar magnetron cathode equipped with three targets 1986
36 10 p. 727-
1 p.
artikel
169 6095. Stability improvement of TaN thin films used as resistive thermoconductive vacuum gauges 1986
36 10 p. 725-
1 p.
artikel
170 6223. Statistics of mode competition in a miniature TEA CO2 laser 1986
36 10 p. 738-
1 p.
artikel
171 6202. Status of TFTR with ohmic heating and neutral beam injection 1986
36 10 p. 737-
1 p.
artikel
172 6110. Structural properties of evaporated silicon films 1986
36 10 p. 726-
1 p.
artikel
173 6102. Studies of photon induced desorption of surface gas within an aluminium vacuum chamber using an X-ray source 1986
36 10 p. 725-
1 p.
artikel
174 6198. Submicron pattern fabrication by focused ion beams 1986
36 10 p. 736-
1 p.
artikel
175 6140. Subnanosecond bunching of a positron beam 1986
36 10 p. 730-
1 p.
artikel
176 6113. Superconducting properties of layered Nb0.53 Ti0.47/Ge structures prepared by dc sputtering 1986
36 10 p. 727-
1 p.
artikel
177 6208. Superdense high-temperature exploded-wire plasma observations in a high-current vacuum diode 1986
36 10 p. 737-
1 p.
artikel
178 6235. Surface analysis of contaminated GaAs: comparison of new laser-based techniques with SIMS 1986
36 10 p. 740-
1 p.
artikel
179 6213. Surface flashover of solid insulators in atmospheric air and in vacuum 1986
36 10 p. 738-
1 p.
artikel
180 6173. Surface preciption of boron nitrate on the surface of type 304]' stainless steels doped with nitrogen, boron, and cerium 1986
36 10 p. 733-
1 p.
artikel
181 6226. Synchronizable Q-switched, mode-locked, and cavity-dumped ruby laser for plasma diagnostics 1986
36 10 p. 739-
1 p.
artikel
182 Technical note on the ‘dynamic steam’ autoclave process Edwards High Vacuum Ltd,
1986
36 10 p. 747-
1 p.
artikel
183 Technological considerations when obtaining high-precision resistors with controllable temperature coefficient of resistance Stoychev, S.M.
1986
36 10 p. 687-688
2 p.
artikel
184 TEGAL announces custom equipment operation Contact: Chris Ridge,
1986
36 10 p. 745-
1 p.
artikel
185 6220. Temperature rise induced by a cw laser beam revisited 1986
36 10 p. 738-
1 p.
artikel
186 6180. The dependence of RHEED oscillations on MBE growth parameters 1986
36 10 p. 734-
1 p.
artikel
187 The effect of inert gas ion bombardment on the oxidation of metal surfaces Chenakin, S.P.
1986
36 10 p. 635-641
7 p.
artikel
188 6121. The effects of hydrogenation on the properties of ion beam sputter deposited amorphous carbon 1986
36 10 p. 728-
1 p.
artikel
189 The enhanced threshold level detection mode Hiden Analytical Ltd,
1986
36 10 p. 743-
1 p.
artikel
190 6125. The influence of discharge current on the intrinsic stress in Mo films deposited using cylindrical and planar magnetron sputtering sources 1986
36 10 p. 728-
1 p.
artikel
191 The mid mode for trend analysis 1986
36 10 p. 743-
1 p.
artikel
192 6186. Thermal reaction of gold metallization on InP 1986
36 10 p. 735-
1 p.
artikel
193 6211. The space distribution of the electron beam in a glow discharge electron gun and its correlation with the cathode geometry 1986
36 10 p. 737-
1 p.
artikel
194 6091. The spinning rotor gauge 1986
36 10 p. 724-
1 p.
artikel
195 6168. The trapping of deuterium in argon-implanted nickle 1986
36 10 p. 733-
1 p.
artikel
196 6190. The use of mixed alloy contacts to engineer the interfaces and electrical characteristics of metal-InP contacts 1986
36 10 p. 735-
1 p.
artikel
197 6101. The use of the exponential tempering function in multiple order desorption analysis 1986
36 10 p. 725-
1 p.
artikel
198 The versatile cracking pattern mode 1986
36 10 p. 743-
1 p.
artikel
199 The very new dual mass/pressure mode 1986
36 10 p. 743-
1 p.
artikel
200 6184. Thin film deposition for permeability increase of gas being implanted (theoretical consideration) 1986
36 10 p. 735-
1 p.
artikel
201 Thin films of rare-earth metal silicides in microelectronics Koleshko, V.M.
1986
36 10 p. 669-676
8 p.
artikel
202 Titanium carbide thin films obtained by reactive magnetron sputtering Georgiev, G.
1986
36 10 p. 595-597
3 p.
artikel
203 6231. Tokamak Fusion Test Reactor horizontal high-resolution Bragg X-ray spectrometer 1986
36 10 p. 739-
1 p.
artikel
204 6230. Tokamak ion temperature and poloidal field diagnostics using 3-MeV protons 1986
36 10 p. 739-
1 p.
artikel
205 6107. Ultrahigh-vacuum cryostat and sample manipulator for operation between 5 and 800 K 1986
36 10 p. 726-
1 p.
artikel
206 Ultrahigh vacuum hybrid stepper motors AML Microelectronics Ltd,
1986
36 10 p. 744-
1 p.
artikel
207 6124. Use of TiSi2 to form metal-oxide-silicon field effect transistors with self-aligned source/drain and gate electrode 1986
36 10 p. 728-
1 p.
artikel
208 6164. UV laser incorporation of dopants into silicon: comparison of two processes 1986
36 10 p. 732-
1 p.
artikel
209 6105. UV/ozone cleaning of surfaces 1986
36 10 p. 726-
1 p.
artikel
210 Vacuum evaporation sources—filaments, boats, crucibles, baskets, chrome-plated rods Busch (UK) Ltd,
1986
36 10 p. 744-
1 p.
artikel
211 Vacuum publications Balzers Vacuum News March 1986 issue No 50 (also Coating Materials Price List) Balzers High Vacuum Ltd,
1986
36 10 p. 748-
1 p.
artikel
212 Vacuum publications CVC Catalogue on High Vacuum Deposition Systems CVC Scientific Products Ltd,
1986
36 10 p. 748-
1 p.
artikel
213 Vacuum publications Duravac Vacuum Fluids 1986 Price List Duravac,
1986
36 10 p. 748-
1 p.
artikel
214 Vacuum publications Granville-Phillips High Vacuum Instrumentation Ltd Testbourne Ltd,
1986
36 10 p. 748-
1 p.
artikel
215 Vacuum publications Kratos Catalogue 48 Components for surface analysis Surface Analysis Division, Kratos Analytical,
1986
36 10 p. 748-
1 p.
artikel
216 Vacuum publications Montedison UK Ltd Mr K Jones, Montedison UK Ltd,
1986
36 10 p. 748-
1 p.
artikel
217 Vacuum publications Plasma Technology Plasma News 1986 Plasma Technology UK Ltd,
1986
36 10 p. 748-
1 p.
artikel
218 6085. Vacuum systems for vacuum microbalances 1986
36 10 p. 723-
1 p.
artikel
219 Varian Elettrorava reach agreement Varian SpA,
1986
36 10 p. 745-
1 p.
artikel
220 6191. Vibrational study of the SiO2/Si interface by high resolution electron energy loss spectroscopy 1986
36 10 p. 735-
1 p.
artikel
221 6103. Vibrations of CO chemisorbed on metal surfaces: Cluster model studies 1986
36 10 p. 726-
1 p.
artikel
222 6251. X-ray photoelectron spectroscopy studies of thin films of TiN x having different annealing histories 1986
36 10 p. 741-
1 p.
artikel
223 6150. Yaw corrected precision X-Y stage for high-throughput electron-beam lithography systems 1986
36 10 p. 731-
1 p.
artikel
224 6092. Zero stability of spinning rotor vacuum gages 1986
36 10 p. 724-
1 p.
artikel
                             224 gevonden resultaten
 
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