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Journal description
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Details for article 106 of 224 found articles
| Title: |
6195. Ion beam lithography: an investigation of resolution limits and sensitivities of ion-beam exposed PMMA |
| Author: | |
| Appeared in: |
Vacuum |
| Paging: | Volume 36 (1986) nr. 10 pages 1 p. |
| Year: |
1986 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 106 of 224 found articles
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