nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A design consideration of channel doping profile for sub-0.12 μm partially depleted SOI n-MOSFET's
|
Juang, M.H |
|
2002 |
46 |
8 |
p. 1117-1121 5 p. |
artikel |
2 |
Analog circuit design using graded-channel silicon-on-insulator nMOSFETs
|
Pavanello, Marcelo Antonio |
|
2002 |
46 |
8 |
p. 1215-1225 11 p. |
artikel |
3 |
Analysis of body bias effect with PD-SOI for analog and RF applications
|
Lee, Hyeokjae |
|
2002 |
46 |
8 |
p. 1169-1176 8 p. |
artikel |
4 |
Analysis of two-dimensional effects on subthreshold current in submicron MOS transistors
|
Mutlu, Ayhan A |
|
2002 |
46 |
8 |
p. 1133-1137 5 p. |
artikel |
5 |
A novel GaAs MESFET with surface oxygen implantation
|
Hsin, Yue-Ming |
|
2002 |
46 |
8 |
p. 1151-1154 4 p. |
artikel |
6 |
Comparison of GaN epitaxial films on silicon nitride buffer and Si(111)
|
Huang, Jingyun |
|
2002 |
46 |
8 |
p. 1231-1234 4 p. |
artikel |
7 |
DC and microwave performance of a GaN/AlGaN MOSHFET under high temperature stress
|
Tarakji, A |
|
2002 |
46 |
8 |
p. 1211-1214 4 p. |
artikel |
8 |
Degradation of passivated and non-passivated N-channel low-temperature polycrystalline silicon TFTs prepared by excimer laser processing
|
Teng, T.H |
|
2002 |
46 |
8 |
p. 1079-1083 5 p. |
artikel |
9 |
Drift region optimization of lateral RESURF devices
|
Vestling, L |
|
2002 |
46 |
8 |
p. 1177-1184 8 p. |
artikel |
10 |
Formation of low resistivity ohmic contacts to n-type 3C-SiC
|
Wan, Jianwei |
|
2002 |
46 |
8 |
p. 1227-1230 4 p. |
artikel |
11 |
Impact of nitrogen and/or fluorine implantation on deep-submicron Co–salicide process
|
Chang, T.Y |
|
2002 |
46 |
8 |
p. 1097-1101 5 p. |
artikel |
12 |
Influence of the silicon substrate thickness on the response of thin film pyroelectric detectors
|
Ko, Jong Soo |
|
2002 |
46 |
8 |
p. 1155-1161 7 p. |
artikel |
13 |
Investigation of disturbance for the new dual floating gate multilevel flash cells
|
Lin, Hongchin |
|
2002 |
46 |
8 |
p. 1145-1150 6 p. |
artikel |
14 |
Investigation of double-delta-doped InAlGaP/GaAs/InGaAs field effect transistors
|
Lee, Hsin-Ying |
|
2002 |
46 |
8 |
p. 1075-1078 4 p. |
artikel |
15 |
Low-dielectric constant FLARE 2.0 films for bottom antireflective coating layers in KrF lithography
|
Chen, H.L |
|
2002 |
46 |
8 |
p. 1127-1131 5 p. |
artikel |
16 |
MOCVD-grown HEMTs on Al2O3 substrates
|
Johnson, J.W |
|
2002 |
46 |
8 |
p. 1193-1204 12 p. |
artikel |
17 |
New “silicon limit” of power devices
|
Chen, Xing-Bi |
|
2002 |
46 |
8 |
p. 1185-1192 8 p. |
artikel |
18 |
Novel applications of X-ray analysis to microelectronic materials and devices
|
Cargill III, G.S |
|
2002 |
46 |
8 |
p. 1139-1143 5 p. |
artikel |
19 |
Optimization of current spreading metal layer for GaN/InGaN-based light emitting diodes
|
Cao, X.A |
|
2002 |
46 |
8 |
p. 1235-1239 5 p. |
artikel |
20 |
Self-aligned fabrication of thin-film transistors with field-induced drain
|
Yu, C.M |
|
2002 |
46 |
8 |
p. 1091-1095 5 p. |
artikel |
21 |
Study on dopant activation of phosphorous implanted polycrystalline silicon thin films by KrF excimer laser annealing
|
Tseng, Chang-Ho |
|
2002 |
46 |
8 |
p. 1085-1090 6 p. |
artikel |
22 |
Surface treatment and electrical properties of directly wafer-bonded InP epilayer on GaAs substrate
|
Horng, R.H |
|
2002 |
46 |
8 |
p. 1103-1108 6 p. |
artikel |
23 |
Temperature characteristics of 850 nm, intra-cavity contacted, shallow implant-apertured vertical-cavity surface-emitting lasers
|
Dang, G |
|
2002 |
46 |
8 |
p. 1247-1249 3 p. |
artikel |
24 |
The band-edge light emission from the metal-oxide-silicon tunneling diode on (110) substrates
|
Chang, S.T |
|
2002 |
46 |
8 |
p. 1113-1116 4 p. |
artikel |
25 |
The design and fabrication of a micro-thermal/pressure-sensor for medical electro-skin application
|
Ho, Jyh-Jier |
|
2002 |
46 |
8 |
p. 1205-1209 5 p. |
artikel |
26 |
The extraction of MOSFET gate capacitance from S-parameter measurements
|
Su, Jiong-Guang |
|
2002 |
46 |
8 |
p. 1163-1167 5 p. |
artikel |
27 |
The impact of implantation sequence on the characterization of n-MOSFET's with gate oxide grown on nitrogen-implanted Si substrate
|
Wu, You-Lin |
|
2002 |
46 |
8 |
p. 1241-1245 5 p. |
artikel |
28 |
Thermal annealing effects on stimulated emission of high-indium-content InGaN/GaN single quantum well structure
|
Chen, Chii-Chang |
|
2002 |
46 |
8 |
p. 1123-1126 4 p. |
artikel |
29 |
Well width dependence for novel AlInAsSb/InGaAs double-barrier resonant tunneling diode
|
Su, Yan-Kuin |
|
2002 |
46 |
8 |
p. 1109-1111 3 p. |
artikel |